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1. 发明申请

US20070182808A1 Writing apparatuses and methods 审中-公开
标题翻译：书写设备和方法
公开(公告)号：US20070182808A1
公开(公告)日：2007-08-09
申请号：US11586612
申请日：2006-10-26
申请人： Lars Stiblert , Torbjorn Sandstrom , Jarek Luberek , Tomas Lock
发明人： Lars Stiblert , Torbjorn Sandstrom , Jarek Luberek , Tomas Lock
IPC分类号： B41J2/435 , B41J2/47 , G01D15/14
CPC分类号： G03F7/24 , B41J2/442 , G02F1/1303 , G02F2203/12 , G03F7/70275 , G03F7/70291 , G03F7/70358 , G03F7/70366 , G03F7/70383 , G03F7/70391 , G03F7/704 , G03F7/70425 , G03F7/70783 , G03F7/70791 , H04N1/06 , H04N1/0607 , H04N1/0628 , H04N1/0664 , H04N1/0671 , H05K1/0393 , H05K3/0082
摘要： Patterns are written on workpieces, such as, glass sheets and/or plastic sheets used in, for example, electronic display devices such as LCDs. The workpiece may be larger than about 1500 mm may be used. An optical writing head with a plurality of writing units may be used. The workpiece and the writing head may be moved relative to one another to provide oblique writing.
摘要翻译：图案写在工件上，例如用于例如LCD等电子显示装置中的玻璃板和/或塑料片。可以使用工件大于约1500mm。可以使用具有多个写入单元的光学写入头。工件和书写头可以相对于彼此移动以提供斜写。

2. 发明授权

US06792251B2 Arrangement and method for improving multi-carrier power amplifier efficiency 有权
标题翻译：改善多载波功率放大器效率的方案和方法
公开(公告)号：US06792251B2
公开(公告)日：2004-09-14
申请号：US09350719
申请日：1999-07-09
申请人： Björn Johannisson , Jarek Luberek
发明人： Björn Johannisson , Jarek Luberek
IPC分类号： H04Q1112
CPC分类号： H03F1/3252 , H01Q3/2605 , H01Q23/00 , H03F1/3229 , H03F1/3241 , H03F3/211
摘要： A multi-carrier power amplifying arrangement has a number of amplifying devices, each of which includes a main amplifier and a linearizing device. Furthermore it includes a device signal for adding the adding output signals from the amplifying devices in phase, a device for detecting the average phase error of the amplified signals and for providing a compensating control signal. The compensating control signal is provided to each amplifying device at least to compensate for the average phase error.
摘要翻译：多载波功率放大装置具有多个放大装置，每个放大装置包括主放大器和线性化装置。此外，它还包括一个装置信号，用于同相放大放大装置的相加输出信号，用于检测放大信号的平均相位误差的装置和用于提供补偿控制信号的装置。补偿控制信号至少提供给每个放大装置以补偿平均相位误差。

3. 发明授权

US08822879B2 Writing apparatuses and methods 有权
标题翻译：书写设备和方法
公开(公告)号：US08822879B2
公开(公告)日：2014-09-02
申请号：US12805708
申请日：2010-08-16
申请人： Lars Stiblert , Torbjörn Sandström , Jarek Luberek , Tomas Lock
发明人： Lars Stiblert , Torbjörn Sandström , Jarek Luberek , Tomas Lock
IPC分类号： B23K26/00
CPC分类号： G03F7/24 , B41J2/442 , G02F1/1303 , G02F2203/12 , G03F7/70275 , G03F7/70291 , G03F7/70358 , G03F7/70366 , G03F7/70383 , G03F7/70391 , G03F7/704 , G03F7/70425 , G03F7/70783 , G03F7/70791 , H04N1/06 , H04N1/0607 , H04N1/0628 , H04N1/0664 , H04N1/0671 , H05K1/0393 , H05K3/0082
摘要： Patterns are written on workpieces, such as, glass sheets and/or plastic sheets used in, for example, electronic display devices such as LCDs. The workpiece may be larger than about 1500 mm may be used. An optical writing head with a plurality of writing units may be used. The workpiece and the writing head may be moved relative to one another to provide oblique writing.
摘要翻译：图案写在工件上，例如用于例如LCD等电子显示装置中的玻璃板和/或塑料片。可以使用工件大于约1500mm。可以使用具有多个写入单元的光学写入头。工件和书写头可以相对于彼此移动以提供斜写。

4. 发明申请

US20100225236A1 Statistical Illuminator 审中-公开
标题翻译：统计照明
公开(公告)号：US20100225236A1
公开(公告)日：2010-09-09
申请号：US12718926
申请日：2010-03-05
申请人： Jarek Luberek , Torbjörn Sandström
发明人： Jarek Luberek , Torbjörn Sandström
IPC分类号： H05B37/02
CPC分类号： G01B11/303 , G03F7/70291 , G03F7/70366 , G03F7/70433 , G03F7/70508 , G03F7/70516 , G03F7/70591 , G03F7/70783
摘要： The technology disclosed relates to an illumination source including numerous laser diodes. In particular, it relates to extending the duty cycle and/or reducing the frequency of component replacement by detecting failure of one or more individual laser diodes and compensating for the failure, without replacing the laser diodes.The technology disclosed can be used in cases of catastrophic laser diode failure by changing the power of remaining laser diodes to restore illumination to the coherence function similar to the pre-failure illumination field. Particular aspects of the technology disclosed are described in the claims, specification and drawings.
摘要翻译：所公开的技术涉及包括许多激光二极管的照明源。特别地，它涉及通过检测一个或多个单个激光二极管的故障并补偿故障来延长占空比和/或降低部件更换的频率，而无需更换激光二极管。所公开的技术可以用于灾难性激光二极管故障的情况下，通过改变剩余的激光二极管的功率来恢复照射到类似于故障前照明场的相干功能。所公开的技术的特定方面在权利要求，说明书和附图中描述。

5. 发明申请

US20100308024A1 Writing apparatuses and methods 有权
标题翻译：书写设备和方法
公开(公告)号：US20100308024A1
公开(公告)日：2010-12-09
申请号：US12805708
申请日：2010-08-16
申请人： Lars Stiblert , Torbjörn Sandström , Jarek Luberek , Tomas Lock
发明人： Lars Stiblert , Torbjörn Sandström , Jarek Luberek , Tomas Lock
IPC分类号： B23K26/00
CPC分类号： G03F7/24 , B41J2/442 , G02F1/1303 , G02F2203/12 , G03F7/70275 , G03F7/70291 , G03F7/70358 , G03F7/70366 , G03F7/70383 , G03F7/70391 , G03F7/704 , G03F7/70425 , G03F7/70783 , G03F7/70791 , H04N1/06 , H04N1/0607 , H04N1/0628 , H04N1/0664 , H04N1/0671 , H05K1/0393 , H05K3/0082
摘要： Patterns are written on workpieces, such as, glass sheets and/or plastic sheets used in, for example, electronic display devices such as LCDs. The workpiece may be larger than about 1500 mm may be used. An optical writing head with a plurality of writing units may be used. The workpiece and the writing head may be moved relative to one another to provide oblique writing.
摘要翻译：图案写在工件上，例如用于例如LCD等电子显示装置中的玻璃板和/或塑料片。可以使用工件大于约1500mm。可以使用具有多个写入单元的光学写入头。工件和书写头可以相对于彼此移动以提供斜写。

6. 发明申请

US20090008580A1 FOURIER PLANE ANALYSIS AND REFINEMENT OF SLM CALIBRATION 有权
标题翻译：傅立叶计算机分析与精简SLM校准
公开(公告)号：US20090008580A1
公开(公告)日：2009-01-08
申请号：US11773360
申请日：2007-07-03
申请人： Jarek Luberek
发明人： Jarek Luberek
IPC分类号： G01N21/84 , G02B27/46
CPC分类号： G03F7/70291 , G02B27/46 , G03F7/70191 , G03F7/70283 , G03F7/70516
摘要： The present disclosure relates to phase-sensitive calibration of an SLM system. In particular, it relates to selecting among local calibrations when there is more than one calibration that satisfies a calibration intensity criteria. It utilizes information available before Fourier filtering, from non-zeroth order diffraction components to counter drift among alternative local calibrations.
摘要翻译：本公开涉及SLM系统的相敏校准。具体地，涉及当满足校准强度标准的多于一个的校准时，在局部校准中进行选择。它利用傅里叶滤波之前的可用信息，从非零阶衍射分量到备选局部校准之间的反相漂移。

7. 发明授权

US06965119B2 Method and apparatus of calibrating multi-position SLM elements 有权
标题翻译：校准多位置SLM单元的方法和装置
公开(公告)号：US06965119B2
公开(公告)日：2005-11-15
申请号：US10238220
申请日：2002-09-10
申请人： Torbjörn Sandström , Jarek Luberek
发明人： Torbjörn Sandström , Jarek Luberek
IPC分类号： G02B26/08 , G02B27/46 , G03F7/20 , G01N21/86
CPC分类号： G03F7/70291 , G02B26/0841 , G02B27/46
摘要： The present invention relates to a method for calibrating elements in a spatial light modulator (SLM) as a function of an applied element control signal. A plurality of elements are calibrated simultaneously. A beam of electromagnetic radiation is projected onto at least a part of the SLM. An image of said part of said SLM is formed on a device for measuring intensity of electromagnetic radiation. Element calibrating data is generated by using the intensity data as a function of the applied element control signal by either driving a sub-matrix comprising at least two elements out of said part of the SLM to a sequence of applied element control signals or by seeking out the control signal for each element which give the same predetermined intensity value on the device for measuring the intensity of electromagnetic radiation and stepping through N different predetermined intensity values. The invention also relates to an apparatus for patterning a workpiece having such a calibration method. Other aspects of the present invention are reflected in the detailed description.
摘要翻译：本发明涉及一种用于校准空间光调制器（SLM）中的元件的方法，该方法是应用元件控制信号的函数。多个元件被同时校准。一束电磁辐射投射到SLM的至少一部分上。所述SLM的所述部分的图像形成在用于测量电磁辐射强度的装置上。通过使用强度数据作为所施加的元素控制信号的函数，通过将包括所述SLM的所述部分中的至少两个元素的子矩阵驱动到所应用的元素控制信号的序列或通过寻找所述元素校准数据来生成元素校准数据在用于测量电磁辐射的强度并跨过N个不同的预定强度值的装置上给出相同的预定强度值的每个元件的控制信号。本发明还涉及一种用于使具有这种校准方法的工件图案化的装置。本发明的其他方面在详细描述中被体现。

8. 发明授权

US08122846B2 Platforms, apparatuses, systems and methods for processing and analyzing substrates 有权
标题翻译：用于处理和分析基板的平台，设备，系统和方法
公开(公告)号：US08122846B2
公开(公告)日：2012-02-28
申请号：US11711895
申请日：2007-02-28
申请人： Lars Stiblert , Torbjörn Sandström , Jarek Luberek , Tomas Lock
发明人： Lars Stiblert , Torbjörn Sandström , Jarek Luberek , Tomas Lock
IPC分类号： B05B7/00 , B05B5/00 , H05B6/00 , B41J2/435 , G01B11/24
CPC分类号： G03F7/704 , G03F7/70391 , Y10T29/497 , Y10T29/4976 , Y10T29/49998 , Y10T29/534 , Y10T29/53961
摘要： Devices and methods for manufacturing displays, solar panels and other devices using larger size workpieces are provided. The workpiece is rolled into a cylinder, thereby reducing the physical size by a factor of 3 in one dimension. The stages on which the workpieces are rolled have a cylindrical shape, which allows a more robust and/or compact movement of the glass, reduced machine weight. The workpieces are relatively thin, more flexible, and are rolled onto a cylinder with a diameter of about 1 meter.
摘要翻译：提供用于制造显示器，太阳能电池板和使用较大尺寸工件的其它装置的装置和方法。工件滚动成圆柱体，从而在一个维度上将物理尺寸减小了3倍。工件被轧制的阶段具有圆柱形形状，这允许玻璃更坚固和/或紧凑的移动，减小了机器重量。工件相对较薄，更灵活，并滚动到直径约1米的圆柱体上。

9. 发明申请

US20110216302A1 ILLUMINATION METHODS AND DEVICES FOR PARTIALLY COHERENT ILLUMINATION 审中-公开
标题翻译：用于部分相干照明的照明方法和装置
公开(公告)号：US20110216302A1
公开(公告)日：2011-09-08
申请号：US12718904
申请日：2010-03-05
申请人： Jarek Luberek
发明人： Jarek Luberek
IPC分类号： G03B27/32 , G02B26/00
CPC分类号： G03F7/70425 , G03F7/70116 , G03F7/70583
摘要： The technology disclosed relates to a partially coherent illuminators. In particular, it relates to a partially coherent illuminator that directs laser radiation across multiple areas of an illumination pupil. In some circumstances, this reduces spatial and/or temporal coherence of the laser radiation. It must be used with a continuous laser to provide partially coherent illumination from a coherent laser. It can be combined with a workpiece tracker that effectively freezes the workpiece and extends the time that laser radiation can be applied to expose a pattern stamp on the workpiece or, it can be used with a stepper platform, without a tracker. A dynamically controllable aperture architecture is a by product of the technology disclosed.
摘要翻译：所公开的技术涉及部分相干的照明器。特别地，它涉及将激光辐射引导到照明瞳孔的多个区域上的部分相干照明器。在某些情况下，这降低了激光辐射的空间和/或时间相干性。必须使用连续激光来提供来自相干激光的部分相干照明。它可以与有效冻结工件的工件跟踪器组合，并延长激光辐射可以施加的时间，以露出工件上的图案印模，或者可以与步进平台一起使用，而不需要跟踪器。动态可控的孔径结构是所公开的技术的产物。

10. 发明授权

US07759620B2 Fourier plane analysis and refinement of SLM calibration 有权
标题翻译：傅里叶平面分析和SLM校准精细化
公开(公告)号：US07759620B2
公开(公告)日：2010-07-20
申请号：US11773360
申请日：2007-07-03
申请人： Jarek Luberek
发明人： Jarek Luberek
IPC分类号： G01J1/20
CPC分类号： G03F7/70291 , G02B27/46 , G03F7/70191 , G03F7/70283 , G03F7/70516
摘要： The present disclosure relates to phase-sensitive calibration of an SLM system. In particular, it relates to selecting among local calibrations when there is more than one calibration that satisfies a calibration intensity criteria. It utilizes information available before Fourier filtering, from non-zeroth order diffraction components to counter drift among alternative local calibrations.
摘要翻译：本公开涉及SLM系统的相敏校准。具体地，涉及当满足校准强度标准的多于一个的校准时，在局部校准中进行选择。它利用傅里叶滤波之前的可用信息，从非零阶衍射分量到备选局部校准之间的反相漂移。

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