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1. 发明申请

US20120258389A1 TITANIA-DOPED QUARTZ GLASS AND MAKING METHOD 有权
标题翻译： TITANIA-DOPED QUARTZ玻璃和制造方法
公开(公告)号：US20120258389A1
公开(公告)日：2012-10-11
申请号：US13442550
申请日：2012-04-09
申请人： Shigeru Maida , Hisatoshi Otsuka , Tetsuji Ueda , Masanobu Ezaki
发明人： Shigeru Maida , Hisatoshi Otsuka , Tetsuji Ueda , Masanobu Ezaki
IPC分类号： G03F1/24 , C03B19/06
CPC分类号： G03F1/24 , C03B19/1415 , C03B19/1423 , C03B2201/42 , C03B2207/64 , C03C3/06 , C03C4/0085 , C03C4/08 , C03C2201/42 , C03C2203/42 , G03F1/50
摘要： On an EUV light-reflecting surface of titania-doped quartz glass, an angle (θ) included between a straight line connecting an origin (O) at the center of the reflecting surface to a birefringence measurement point (A) and a fast axis of birefringence at the measurement point (A) has an average value of more than 45 degrees. Since fast axes of birefringence are distributed in a concentric fashion, a titania-doped quartz glass substrate having a high flatness is obtainable which is suited for use in the EUV lithography.
摘要翻译：在二氧化钛掺杂的石英玻璃的EUV光反射表面上，包括在连接反射表面中心的原点（O）到双折射测量点（A）的直线和快速轴线之间的角度（＆amp; 在测量点（A）处的双折射的平均值大于45度。由于双折射的快轴以同心的方式分布，所以可获得适用于EUV光刻的具有高平坦度的二氧化钛掺杂石英玻璃基板。

2. 发明申请

US20080115533A1 Manufacture of synthetic quartz glass ingot and synthetic quartz glass member 有权
标题翻译：合成石英玻璃锭和合成石英玻璃构件的制造
公开(公告)号：US20080115533A1
公开(公告)日：2008-05-22
申请号：US11896873
申请日：2007-09-06
申请人： Hisatoshi Otsuka , Kazuo Shirota , Osamu Sekizawa
发明人： Hisatoshi Otsuka , Kazuo Shirota , Osamu Sekizawa
IPC分类号： C03B19/00
CPC分类号： C03B19/14 , C03B2201/02 , C03B2207/20 , C03B2207/62 , C03B2207/66
摘要： A synthetic quartz glass ingot is prepared by vapor phase hydrolyzing or oxidatively decomposing a silica feedstock in a flame to form fine particles of silica, depositing the silica particles on a target and melting and vitrifying the particles to form a synthetic quartz glass ingot on the target while the target is moved back and forth. The method further comprises: (i) continuously feeding the silica feedstock at a predetermined rate, (ii) keeping the flame in constant contact with an overall growing face, (iii) cyclically repeating the back and forth movement of the target at a predetermined speed, and (iv) maintaining the shape of the growing ingot unchanged.
摘要翻译：通过气相水解或氧化分解火焰中的二氧化硅原料来制备合成石英玻璃锭，以形成二氧化硅细颗粒，将二氧化硅颗粒沉积在靶上并熔化并玻璃化颗粒以在靶上形成合成石英玻璃锭而目标是来回移动的。该方法还包括：（i）以预定速率连续供给二氧化硅原料，（ii）使火焰与整个生长面保持恒定接触，（iii）以预定速度循环地重复靶的前后运动，（iv）保持生长锭的形状不变。

3. 发明申请

US20070049482A1 Synthetic quartz glass substrate for excimer lasers and making method 审中-公开
标题翻译：用于准分子激光器的合成石英玻璃基板和制造方法
公开(公告)号：US20070049482A1
公开(公告)日：2007-03-01
申请号：US11501887
申请日：2006-08-10
申请人： Hisatoshi Otsuka , Kazuo Shirota , Osamu Sekizawa
发明人： Hisatoshi Otsuka , Kazuo Shirota , Osamu Sekizawa
IPC分类号： C03C3/06 , C03B21/00 , C03B25/00
CPC分类号： C03B19/1469 , C03B19/1423 , C03B19/1453 , C03B2201/21 , C03B2207/06 , C03B2207/20 , C03B2207/22 , C03B2207/32 , C03B2207/34 , C03C3/06 , C03C4/0071 , C03C2201/21 , Y02P40/57
摘要： When a synthetic quartz glass substrate is prepared from a synthetic quartz glass block, (I) the block has a hydrogen molecule concentration of 5×1017-1×1019 molecules/cm3, (II) the substrate has a hydrogen molecule concentration of 5×1015-5×1017 molecules/cm3, (III) the substrate has an in-plane variation of its internal transmittance at 193.4 nm which is up to 0.2%, and (IV) the substrate has an internal transmittance of at least 99.6% at 193.4 nm. The synthetic quartz glass substrate has a high transmittance and a uniform transmittance distribution, and is adapted for use with excimer lasers, particularly ArF excimer lasers.
摘要翻译：当从合成石英玻璃块制备合成石英玻璃基板时，（I）该嵌段具有5×10 17分子/ cm 2的氢分子浓度（II）底物的氢分子浓度为5×10 15 -5×10 17分子/ cm 3，（ III）衬底的内部透射率在193.4nm处具有高达0.2％的面内变化，以及（IV）衬底在193.4nm具有至少99.6％的内部透射率。合成石英玻璃基板具有高透射率和均匀的透射率分布，并且适用于准分子激光器，特别是ArF准分子激光器。

4. 发明授权

US06705115B2 Synthetic quartz glass and production process 失效
标题翻译：合成石英玻璃及生产工艺
公开(公告)号：US06705115B2
公开(公告)日：2004-03-16
申请号：US09747953
申请日：2000-12-27
申请人： Koji Matsuo , Hisatoshi Otsuka , Kazuo Shirota
发明人： Koji Matsuo , Hisatoshi Otsuka , Kazuo Shirota
IPC分类号： C03B1914
CPC分类号： C03B19/1423 , C03B2201/075 , C03B2201/12 , C03B2201/23 , C03B2207/06 , C03B2207/20 , C03B2207/36 , C03C3/06 , C03C2201/12 , C03C2201/23 , C03C2203/40
摘要： A process for producing synthetic quartz glass using a burner composed of a plurality of concentric nozzles involves the steps of feeding a silica-forming raw material gas and a fluorine compound gas to a reaction zone from a center nozzle, feeding oxygen gas from a second nozzle outside the center nozzle, and feeding oxygen gas and/or hydrogen gas from a third nozzle. The silica-forming raw material gas is hydrolyzed to form fine particles of silica, which particles are deposited on a rotatable substrate so as to form a porous silica matrix, which is then fused to give the quartz glass. The flow rate of the oxygen gas fed from the second nozzle and the flow rate of the raw material gas are controlled so as to provide a 1.1- to 3.5-fold stoichiometric excess of oxygen. The excess oxygen suppresses Si—Si bond formation in the quartz glass, enabling the production of synthetic quartz glass having a high transmittance in the vacuum ultraviolet region.
摘要翻译：使用由多个同心喷嘴构成的燃烧器来生产合成石英玻璃的方法包括以下步骤：将来自中心喷嘴的二氧化硅生成原料气体和氟化合物气体供给到反应区域，从第二喷嘴在中心喷嘴外部，并且从第三喷嘴供给氧气和/或氢气。二氧化硅形成原料气体被水解以形成二氧化硅细颗粒，该颗粒沉积在可转动的基底上，以便形成多孔二氧化硅基质，然后熔化以得到石英玻璃。控制从第二喷嘴供给的氧气的流量和原料气体的流量，从而提供1.1-3.5倍化学计量的过量的氧气。过量的氧抑制石英玻璃中的Si-Si键的形成，能够在真空紫外线区域中制造具有高透射率的合成石英玻璃。

5. 发明申请

US20120058419A1 TITANIA-DOPED QUARTZ GLASS AND MAKING METHOD 有权
标题翻译： TITANIA-DOPED QUARTZ玻璃和制造方法
公开(公告)号：US20120058419A1
公开(公告)日：2012-03-08
申请号：US13223808
申请日：2011-09-01
申请人： Shigeru Maida , Hisatoshi Otsuka , Osamu Sekizawa , Naoki Yanagisawa
发明人： Shigeru Maida , Hisatoshi Otsuka , Osamu Sekizawa , Naoki Yanagisawa
IPC分类号： C03C14/00 , G03F1/00 , C03B19/00
CPC分类号： C03C3/06 , C03B19/1423 , C03B19/1453 , C03B2201/23 , C03B2201/42 , C03B2207/06 , C03B2207/12 , C03B2207/20 , C03B2207/62 , C03B2207/64 , C03C4/0085 , C03C2201/21 , C03C2201/42
摘要： A titania-doped quartz glass suited as an EUV lithographic member is prepared by feeding a silicon-providing reactant gas and a titanium-providing reactant gas through a burner along with hydrogen and oxygen, subjecting the reactant gases to oxidation or flame hydrolysis to form synthetic silica-titania fine particles, depositing the particles on a rotating target, and concurrently melting and vitrifying the deposited particles to grow an ingot of titania-doped quartz glass. The target is retracted such that the growth front of the ingot may be spaced a distance of at least 250 mm from the burner tip.
摘要翻译：通过将供氧反应气体和提供钛的反应气体与氢气和氧气一起通过燃烧器进行供给，使反应物气体进行氧化或火焰水解以形成合成物，制备适合作为EUV光刻元件的二氧化钛掺杂石英玻璃二氧化硅 - 二氧化钛细颗粒，将颗粒沉积在旋转靶上，并同时熔化和玻璃化沉积的颗粒以生长掺杂二氧化钛的石英玻璃的锭。目标被缩回，使得锭的生长前部可以与燃烧器尖端间隔至少250mm的距离。

6. 发明申请

US20110159413A1 TITANIA-DOPED QUARTZ GLASS AND MAKING METHOD 审中-公开
标题翻译： TITANIA-DOPED QUARTZ玻璃和制造方法
公开(公告)号：US20110159413A1
公开(公告)日：2011-06-30
申请号：US12967175
申请日：2010-12-14
申请人： Shigeru Maida , Hisatoshi Otsuka , Tetsuji Ueda , Masanobu Ezaki
发明人： Shigeru Maida , Hisatoshi Otsuka , Tetsuji Ueda , Masanobu Ezaki
IPC分类号： G03F1/00 , C03B19/00 , C03C3/04
CPC分类号： G03F7/2008 , B82Y10/00 , B82Y40/00 , C03B19/1423 , C03B19/1453 , C03B2201/21 , C03B2201/23 , C03B2201/42 , C03B2207/06 , C03B2207/12 , C03B2207/36 , C03C3/06 , C03C2201/06 , G03F1/24
摘要： A titania-doped quartz glass which experiences a reduction in OH group concentration of less than or equal to 100 ppm upon heat treatment at 900° C. for 100 hours is suitable as the EUV lithography member.
摘要翻译：在900℃热处理100小时时，OH基浓度小于或等于100ppm的二氧化钛掺杂石英玻璃适合作为EUV光刻元件。

7. 发明授权

US06413682B1 Synthetic quartz glass substrate for photomask and making method 有权
标题翻译：用于光掩模和制造方法的合成石英玻璃基板
公开(公告)号：US06413682B1
公开(公告)日：2002-07-02
申请号：US09576006
申请日：2000-05-22
申请人： Yukio Shibano , Hisatoshi Otsuka
发明人： Yukio Shibano , Hisatoshi Otsuka
IPC分类号： G03F900
CPC分类号： G03F1/60 , C03B19/12 , C03B19/1453 , C03B19/1469 , C03B32/00 , C03B2201/23 , C03C3/06 , C03C2201/23 , C03C2203/20 , C03C2203/40
摘要： A synthetic quartz glass substrate is prepared by annealing a synthetic quartz glass member having a higher hydroxyl content in a peripheral portion than in a central portion, machining off the peripheral portion of the member, slicing the member into a plate shaped substrate, chamfering and etching the substrate. The synthetic quartz glass substrate has a minimized birefringence and is suited for use as a photomask in photolithography.
摘要翻译：合成石英玻璃基板通过在周边部分比在中心部分退火具有较高羟基含量的合成石英玻璃构件来制备，将构件的周边部分切除，将构件切割成板状基板，倒角和蚀刻底物。合成石英玻璃基板具有最小的双折射，并且适合用作光刻中的光掩模。

8. 发明授权

US06339940B1 Synthetic quartz glass manufacturing process 有权
标题翻译：合成石英玻璃制造工艺
公开(公告)号：US06339940B1
公开(公告)日：2002-01-22
申请号：US09553392
申请日：2000-04-20
申请人： Motoyuki Yamada , Hisatoshi Otsuka , Koji Matsuo
发明人： Motoyuki Yamada , Hisatoshi Otsuka , Koji Matsuo
IPC分类号： C03B1906
CPC分类号： C03B37/0144 , C03B19/1407 , C03B19/1446
摘要： A process for manufacturing synthetic quartz glass involves feeding a quartz glass-forming raw material to a high-temperature gas zone within a chamber, converting the quartz glass-forming raw material into quartz soot, and forming synthetic quartz glass from the soot. A suspended soot-discharging gas which has been flow-straightened in a suspended soot discharging direction flows through the chamber in the vicinity of the high-temperature gas zone. This process keeps free suspended soot from settling onto the surface of the quartz ingot where fusion and growth take place, thereby preventing the formation of bubbles within the quartz glass under growth.
摘要翻译：制造合成石英玻璃的方法包括将石英玻璃形成原料进料到室内的高温气体区域，将石英玻璃形成原料转化成石英烟灰，并从烟灰形成合成石英玻璃。在悬浮烟炱排出方向上流动整流的悬浮的烟灰排出气体在高温气体区域附近流过室。该过程保持游离的悬浮烟灰沉降到熔融和生长发生的石英锭的表面上，从而防止石英玻璃生长过程中的气泡形成。

9. 发明授权

US06333284B1 Synthetic fused silica member 有权
标题翻译：合成熔融石英片
公开(公告)号：US06333284B1
公开(公告)日：2001-12-25
申请号：US09520442
申请日：2000-03-07
申请人： Hisatoshi Otsuka , Kazuo Shirota , Kazuhiro Kumakura
发明人： Hisatoshi Otsuka , Kazuo Shirota , Kazuhiro Kumakura
IPC分类号： C03C306
CPC分类号： C03C3/06 , C03C2201/12 , C03C2201/23
摘要： There is disclosed a synthetic fused silica member used at a wavelength of 200 nm or less which has a hydroxyl group-content of 1 to 50 ppm and a fluorine-content of 100 to 1000 ppm, and contains no chlorine, and has a birefringence of the synthetic fused silica member of 2 nm/cm or less. The synthetic fused silica member can be used as a synthetic fused silica substrate for photomask, or in an optical system wherein a fluorine excimer laser is used as a light source. There can be provided a synthetic fused silica member which can efficiently transmit a light having a wavelength as 200 nm or less, especially fluorine excimer laser (157 nm), and does not suffer from lowering of transmittance due to damage.
摘要翻译：公开了在200nm以下的波长下使用的合成石英玻璃构件，其羟基含量为1〜50ppm，氟含量为100〜1000ppm，不含氯，并且具有双折射率合成石英玻璃成分为2nm / cm以下。合成石英玻璃构件可用作光掩模的合成熔融二氧化硅基板，或其中使用氟准分子激光作为光源的光学系统。可以提供能够有效透射波长为200nm以下的光，特别是氟准分子激光（157nm）的合成石英玻璃构件，不会由于损伤而导致透光率降低。

10. 发明授权

US09346700B2 Titania-doped quartz glass and making method 有权
标题翻译：二氧化钛掺杂石英玻璃及其制备方法
公开(公告)号：US09346700B2
公开(公告)日：2016-05-24
申请号：US13569429
申请日：2012-08-08
申请人： Shigeru Maida , Hisatoshi Otsuka
发明人： Shigeru Maida , Hisatoshi Otsuka
IPC分类号： C03B19/14 , C03C3/06 , G03F1/24 , B82Y10/00 , B82Y40/00
CPC分类号： G03F1/24 , B82Y10/00 , B82Y40/00 , C03B19/1415 , C03B2201/42 , C03B2207/06 , C03B2207/12 , C03B2207/20 , C03B2207/81 , C03C3/06 , C03C2201/42 , C03C2203/42 , Y02P40/57
摘要： Titania-doped quartz glass is manufactured by mixing a silicon-providing reactant gas and a titanium-providing reactant gas, preheating the reactant gas mixture at 200-400° C., and subjecting the mixture to oxidation or flame hydrolysis. A substrate of the glass is free of concave defects having a volume of at least 30,000 nm3 in an effective region of the EUV light-reflecting surface and is suited for use in the EUV lithography.
摘要翻译：通过混合提供硅的反应物气体和提供钛的反应物气体，在200-400℃下预热反应气体混合物，并对混合物进行氧化或火焰水解，制造掺杂二氧化钛的石英玻璃。在EUV光反射表面的有效区域中，玻璃的基底不具有体积至少为30,000nm 3的凹陷缺陷，适用于EUV光刻。

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