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1. 发明申请

US20080115533A1 Manufacture of synthetic quartz glass ingot and synthetic quartz glass member 有权
标题翻译：合成石英玻璃锭和合成石英玻璃构件的制造
公开(公告)号：US20080115533A1
公开(公告)日：2008-05-22
申请号：US11896873
申请日：2007-09-06
申请人： Hisatoshi Otsuka , Kazuo Shirota , Osamu Sekizawa
发明人： Hisatoshi Otsuka , Kazuo Shirota , Osamu Sekizawa
IPC分类号： C03B19/00
CPC分类号： C03B19/14 , C03B2201/02 , C03B2207/20 , C03B2207/62 , C03B2207/66
摘要： A synthetic quartz glass ingot is prepared by vapor phase hydrolyzing or oxidatively decomposing a silica feedstock in a flame to form fine particles of silica, depositing the silica particles on a target and melting and vitrifying the particles to form a synthetic quartz glass ingot on the target while the target is moved back and forth. The method further comprises: (i) continuously feeding the silica feedstock at a predetermined rate, (ii) keeping the flame in constant contact with an overall growing face, (iii) cyclically repeating the back and forth movement of the target at a predetermined speed, and (iv) maintaining the shape of the growing ingot unchanged.
摘要翻译：通过气相水解或氧化分解火焰中的二氧化硅原料来制备合成石英玻璃锭，以形成二氧化硅细颗粒，将二氧化硅颗粒沉积在靶上并熔化并玻璃化颗粒以在靶上形成合成石英玻璃锭而目标是来回移动的。该方法还包括：（i）以预定速率连续供给二氧化硅原料，（ii）使火焰与整个生长面保持恒定接触，（iii）以预定速度循环地重复靶的前后运动，（iv）保持生长锭的形状不变。

2. 发明申请

US20070049482A1 Synthetic quartz glass substrate for excimer lasers and making method 审中-公开
标题翻译：用于准分子激光器的合成石英玻璃基板和制造方法
公开(公告)号：US20070049482A1
公开(公告)日：2007-03-01
申请号：US11501887
申请日：2006-08-10
申请人： Hisatoshi Otsuka , Kazuo Shirota , Osamu Sekizawa
发明人： Hisatoshi Otsuka , Kazuo Shirota , Osamu Sekizawa
IPC分类号： C03C3/06 , C03B21/00 , C03B25/00
CPC分类号： C03B19/1469 , C03B19/1423 , C03B19/1453 , C03B2201/21 , C03B2207/06 , C03B2207/20 , C03B2207/22 , C03B2207/32 , C03B2207/34 , C03C3/06 , C03C4/0071 , C03C2201/21 , Y02P40/57
摘要： When a synthetic quartz glass substrate is prepared from a synthetic quartz glass block, (I) the block has a hydrogen molecule concentration of 5×1017-1×1019 molecules/cm3, (II) the substrate has a hydrogen molecule concentration of 5×1015-5×1017 molecules/cm3, (III) the substrate has an in-plane variation of its internal transmittance at 193.4 nm which is up to 0.2%, and (IV) the substrate has an internal transmittance of at least 99.6% at 193.4 nm. The synthetic quartz glass substrate has a high transmittance and a uniform transmittance distribution, and is adapted for use with excimer lasers, particularly ArF excimer lasers.
摘要翻译：当从合成石英玻璃块制备合成石英玻璃基板时，（I）该嵌段具有5×10 17分子/ cm 2的氢分子浓度（II）底物的氢分子浓度为5×10 15 -5×10 17分子/ cm 3，（ III）衬底的内部透射率在193.4nm处具有高达0.2％的面内变化，以及（IV）衬底在193.4nm具有至少99.6％的内部透射率。合成石英玻璃基板具有高透射率和均匀的透射率分布，并且适用于准分子激光器，特别是ArF准分子激光器。

3. 发明授权

US08596095B2 Manufacture of synthetic quartz glass ingot and synthetic quartz glass member 有权
标题翻译：合成石英玻璃锭和合成石英玻璃构件的制造
公开(公告)号：US08596095B2
公开(公告)日：2013-12-03
申请号：US11896873
申请日：2007-09-06
申请人： Hisatoshi Otsuka , Kazuo Shirota , Osamu Sekizawa
发明人： Hisatoshi Otsuka , Kazuo Shirota , Osamu Sekizawa
IPC分类号： C03B37/018
CPC分类号： C03B19/14 , C03B2201/02 , C03B2207/20 , C03B2207/62 , C03B2207/66
摘要： A synthetic quartz glass ingot is prepared by vapor phase hydrolyzing or oxidatively decomposing a silica feedstock in a flame to form fine particles of silica, depositing the silica particles on a target and melting and vitrifying the particles to form a synthetic quartz glass ingot on the target while the target is moved back and forth. The method further comprises: (i) continuously feeding the silica feedstock at a predetermined rate, (ii) keeping the flame in constant contact with an overall growing face, (iii) cyclically repeating the back and forth movement of the target at a predetermined speed, and (iv) maintaining the shape of the growing ingot unchanged.
摘要翻译：通过气相水解或氧化分解火焰中的二氧化硅原料来制备合成石英玻璃锭，以形成二氧化硅细颗粒，将二氧化硅颗粒沉积在靶上并熔化并玻璃化颗粒以在靶上形成合成石英玻璃锭而目标是来回移动的。该方法还包括：（i）以预定速率连续供给二氧化硅原料，（ii）使火焰与整个生长面保持恒定接触，（iii）以预定速度循环地重复靶的前后运动，（iv）保持生长锭的形状不变。

4. 发明授权

US07827824B2 Synthetic quartz glass substrate for excimer lasers and making method 有权
标题翻译：用于准分子激光器的合成石英玻璃基板和制造方法
公开(公告)号：US07827824B2
公开(公告)日：2010-11-09
申请号：US11896948
申请日：2007-09-06
申请人： Hisatoshi Otsuka , Kazuo Shirota , Osamu Sekizawa
发明人： Hisatoshi Otsuka , Kazuo Shirota , Osamu Sekizawa
IPC分类号： C03B21/00 , C03B23/00 , C03B25/00 , C03B27/00 , C03B37/018 , C03B31/00 , C03B33/00 , C03C3/06
CPC分类号： G03F7/70958 , C03B19/1453 , C03B2201/21 , C03B2201/23 , C03C3/06 , C03C4/0071 , C03C4/0085 , C03C2201/21 , C03C2201/23 , C03C2203/54 , Y02P40/57
摘要： A synthetic quartz glass substrate having (i) an OH concentration of 1-100 ppm and a hydrogen molecule concentration of 1×1016-1×1019 molecules/cm3, (ii) an in-plane variation of its internal transmission at wavelength 193.4 nm which is up to 0.2%, and (iii) an internal transmission of at least 99.6% at wavelength 193.4 nm is suited for use with excimer lasers.
摘要翻译：（i）OH浓度为1-100ppm，氢分子浓度为1×1016-1×1019分子/ cm3的合成石英玻璃基板，（ii）其波长为193.4nm的内部透光率的面内变化其高达0.2％，和（iii）在波长193.4nm处的至少99.6％的内部透射率适用于准分子激光器。

5. 发明申请

US20090188281A1 SYNTHETIC QUARTZ GLASS SUBSTRATE FOR EXCIMER LASERS AND MAKING METHOD 有权
标题翻译：用于激光激光和合成方法的合成石英玻璃基板
公开(公告)号：US20090188281A1
公开(公告)日：2009-07-30
申请号：US12417466
申请日：2009-04-02
申请人： Hisatoshi Otsuka , Kazuo Shirota , Osamu Sekizawa
发明人： Hisatoshi Otsuka , Kazuo Shirota , Osamu Sekizawa
IPC分类号： C03C19/00
CPC分类号： C03B19/1469 , C03B19/1423 , C03B19/1453 , C03B2201/21 , C03B2207/06 , C03B2207/20 , C03B2207/22 , C03B2207/32 , C03B2207/34 , C03C3/06 , C03C4/0071 , C03C2201/21 , Y02P40/57
摘要： When a synthetic quartz glass substrate is prepared from a synthetic quartz glass block, (I) the block has a hydrogen molecule concentration of 5×1017-1×1019 molecules/cm3, (II) the substrate has a hydrogen molecule concentration of 5×1015-5×1017 molecules/cm3, (III) the substrate has an in-plane variation of its internal transmittance at 193.4 nm which is up to 0.2%, and (IV) the substrate has an internal transmittance of at least 99.6% at 193.4 nm. The synthetic quartz glass substrate has a high transmittance and a uniform transmittance distribution, and is adapted for use with excimer lasers, particularly ArF excimer lasers.
摘要翻译：当由合成石英玻璃块制备合成石英玻璃基板时，（I）该嵌段的氢分子浓度为5×10 17 -1×10 19分子/ cm 3，（II）底物的氢分子浓度为5×10 15 -5×10 17分子/ cm 3 ，（III）衬底的内部透射率在193.4nm处具有高达0.2％的面内变化，（IV）衬底在193.4nm具有至少99.6％的内透射率。合成石英玻璃基板具有高透射率和均匀的透射率分布，并且适用于准分子激光器，特别是ArF准分子激光器。

6. 发明申请

US20080119346A1 Synthetic quartz glass substrate for excimer lasers and making method 有权
标题翻译：用于准分子激光器的合成石英玻璃基板和制造方法
公开(公告)号：US20080119346A1
公开(公告)日：2008-05-22
申请号：US11896948
申请日：2007-09-06
申请人： Hisatoshi Otsuka , Kazuo Shirota , Osamu Sekizawa
发明人： Hisatoshi Otsuka , Kazuo Shirota , Osamu Sekizawa
IPC分类号： C03B21/02 , C03C3/04
CPC分类号： G03F7/70958 , C03B19/1453 , C03B2201/21 , C03B2201/23 , C03C3/06 , C03C4/0071 , C03C4/0085 , C03C2201/21 , C03C2201/23 , C03C2203/54 , Y02P40/57
摘要： A synthetic quartz glass substrate having (i) an OH concentration of 1-100 ppm and a hydrogen molecule concentration of 1×1016-1×1019 molecules/cm3, (ii) an in-plane variation of its internal transmission at wavelength 193.4 nm which is up to 0.2%, and (iii) an internal transmission of at least 99.6% at wavelength 193.4 nm is suited for use with excimer lasers.
摘要翻译：一种合成石英玻璃基板，其具有（i）OH浓度为1-100ppm，氢分子浓度为1×10 16×10 9分子/ cm 3，（ⅱ）其波长193.4nm处的内部透射的面内变化，其最高达0.2％，和（iii）在波长193.4nm处的至少99.6％的内部透射率适用于准分子激光器。

7. 发明授权

US07954340B2 Synthetic quartz glass substrate for excimer lasers and making method 有权
标题翻译：用于准分子激光器的合成石英玻璃基板和制造方法
公开(公告)号：US07954340B2
公开(公告)日：2011-06-07
申请号：US12417466
申请日：2009-04-02
申请人： Hisatoshi Otsuka , Kazuo Shirota , Osamu Sekizawa
发明人： Hisatoshi Otsuka , Kazuo Shirota , Osamu Sekizawa
IPC分类号： C03C19/00
CPC分类号： C03B19/1469 , C03B19/1423 , C03B19/1453 , C03B2201/21 , C03B2207/06 , C03B2207/20 , C03B2207/22 , C03B2207/32 , C03B2207/34 , C03C3/06 , C03C4/0071 , C03C2201/21 , Y02P40/57
摘要： When a synthetic quartz glass substrate is prepared from a synthetic quartz glass block, (I) the block has a hydrogen molecule concentration of 5×1017-1×1019 molecules/cm3, (II) the substrate has a hydrogen molecule concentration of 5×1015-5×1017 molecules/cm3, (III) the substrate has an in-plane variation of its internal transmittance at 193.4 nm which is up to 0.2%, and (IV) the substrate has an internal transmittance of at least 99.6% at 193.4 nm. The synthetic quartz glass substrate has a high transmittance and a uniform transmittance distribution, and is adapted for use with excimer lasers, particularly ArF excimer lasers.
摘要翻译：当从合成石英玻璃块制备合成石英玻璃基板时，（I）该嵌段的氢分子浓度为5×1017-1×1019分子/ cm3，（II）基板的氢分子浓度为5× 1015-5×1017分子/ cm3，（III）基板的内部透射率在193.4nm处具有高达0.2％的面内变化，（IV）基板的内透射率至少为99.6％ 193.4nm。合成石英玻璃基板具有高透射率和均匀的透射率分布，并且适用于准分子激光器，特别是ArF准分子激光器。

8. 发明授权

US06705115B2 Synthetic quartz glass and production process 失效
标题翻译：合成石英玻璃及生产工艺
公开(公告)号：US06705115B2
公开(公告)日：2004-03-16
申请号：US09747953
申请日：2000-12-27
申请人： Koji Matsuo , Hisatoshi Otsuka , Kazuo Shirota
发明人： Koji Matsuo , Hisatoshi Otsuka , Kazuo Shirota
IPC分类号： C03B1914
CPC分类号： C03B19/1423 , C03B2201/075 , C03B2201/12 , C03B2201/23 , C03B2207/06 , C03B2207/20 , C03B2207/36 , C03C3/06 , C03C2201/12 , C03C2201/23 , C03C2203/40
摘要： A process for producing synthetic quartz glass using a burner composed of a plurality of concentric nozzles involves the steps of feeding a silica-forming raw material gas and a fluorine compound gas to a reaction zone from a center nozzle, feeding oxygen gas from a second nozzle outside the center nozzle, and feeding oxygen gas and/or hydrogen gas from a third nozzle. The silica-forming raw material gas is hydrolyzed to form fine particles of silica, which particles are deposited on a rotatable substrate so as to form a porous silica matrix, which is then fused to give the quartz glass. The flow rate of the oxygen gas fed from the second nozzle and the flow rate of the raw material gas are controlled so as to provide a 1.1- to 3.5-fold stoichiometric excess of oxygen. The excess oxygen suppresses Si—Si bond formation in the quartz glass, enabling the production of synthetic quartz glass having a high transmittance in the vacuum ultraviolet region.
摘要翻译：使用由多个同心喷嘴构成的燃烧器来生产合成石英玻璃的方法包括以下步骤：将来自中心喷嘴的二氧化硅生成原料气体和氟化合物气体供给到反应区域，从第二喷嘴在中心喷嘴外部，并且从第三喷嘴供给氧气和/或氢气。二氧化硅形成原料气体被水解以形成二氧化硅细颗粒，该颗粒沉积在可转动的基底上，以便形成多孔二氧化硅基质，然后熔化以得到石英玻璃。控制从第二喷嘴供给的氧气的流量和原料气体的流量，从而提供1.1-3.5倍化学计量的过量的氧气。过量的氧抑制石英玻璃中的Si-Si键的形成，能够在真空紫外线区域中制造具有高透射率的合成石英玻璃。

9. 发明授权

US06990836B2 Method of producing fluorine-containing synthetic quartz glass 有权
标题翻译：含氟合成石英玻璃的制造方法
公开(公告)号：US06990836B2
公开(公告)日：2006-01-31
申请号：US09789744
申请日：2001-02-22
申请人： Shigeru Maida , Motoyuki Yamada , Hisatoshi Otsuka , Kazuo Shirota , Koji Matsuo
发明人： Shigeru Maida , Motoyuki Yamada , Hisatoshi Otsuka , Kazuo Shirota , Koji Matsuo
IPC分类号： C03B20/00
CPC分类号： C03B19/1453 , C03B19/1415 , C03B2201/075 , C03B2201/12 , C03B2201/21 , C03B2207/32 , C03C3/06 , C03C4/0085 , C03C2201/12 , C03C2203/40 , C03C2203/46 , C03C2203/54 , Y02P40/57
摘要： Synthetic quartz glass is produced by feeding a silica-forming raw material gas, hydrogen gas, oxygen gas and a fluorine compound gas from a burner to a reaction zone, flame hydrolyzing the silica-forming raw material gas in the reaction zone to form fine particles of fluorine-containing silica, depositing the silica fine particles on a rotatable substrate in the reaction zone so as to create a fluorine-containing porous silica matrix, and heat vitrifying the porous silica matrix in a fluorine compound gas-containing atmosphere. This process enables the low-cost manufacture of a synthetic quartz glass having a higher and more uniform transmittance to light in the vacuum ultraviolet region than has hitherto been achieved.
摘要翻译：合成石英玻璃是通过将来自燃烧器的二氧化硅形成原料气体，氢气，氧气和氟化合物气体从反应区域供给到反应区域而进行的，在反应区域中对二氧化硅形成原料气体进行火焰水解而形成微粒子的含氟二氧化硅，将二氧化硅微粒沉积在反应区中的可旋转基板上，以产生含氟多孔二氧化硅基质，并在含氟化合物气体的气氛中对多孔二氧化硅基质进行玻璃化。该方法使得能够低成本地制造与迄今为止已经实现的在真空紫外区域中对于光的透射率更高且更均匀的合成石英玻璃。

10. 发明授权

US06761951B2 Synthetic quartz glass blank 有权
标题翻译：合成石英玻璃毛坯
公开(公告)号：US06761951B2
公开(公告)日：2004-07-13
申请号：US10315990
申请日：2002-12-11
申请人： Hisatoshi Otsuka , Kazuo Shirota , Akira Fujinoki , Hiroyuki Nishimura , Takayuki Shimakawa
发明人： Hisatoshi Otsuka , Kazuo Shirota , Akira Fujinoki , Hiroyuki Nishimura , Takayuki Shimakawa
IPC分类号： B32B300
CPC分类号： C03C3/06 , C03B19/1423 , C03B19/1453 , C03B19/1469 , C03B2201/21 , C03B2201/23 , C03B2207/06 , C03B2207/20 , C03B2207/32 , C03C2201/21 , C03C2201/23 , Y02P40/57 , Y10T428/21 , Y10T428/2913
摘要： A cylindrical, chlorine-free synthetic quartz glass blank of a specific size obtained by homogenizing a synthetic quartz glass ingot having periodic striae along a direction of growth has (a) striae grades in the working and off-axis directions which meet grade A of U.S. military specification MIL-G-174B, (b) average hydroxyl group concentrations in the working and off-axis directions of 700 to 1,000 ppm each, (c) average fictive temperatures in the working and off-axis directions of 850 to 950° C. each, and (d) a refractive index distribution for 633 nm wavelength light in the working direction of at most 1×10−6. The blank has a good transmittance to laser light, undergoes little deterioration when irradiated with laser light, and is particularly suitable for ArF excimer laser-related applications.
摘要翻译：通过沿着生长方向均匀化具有周期条纹的合成石英玻璃锭获得的具有特定尺寸的圆柱形，无氯合成石英玻璃坯料具有（a）在工作和离轴方向上的条纹等级，其满足美国A级军事规格MIL-G-174B，（b）工作和离轴方向的平均羟基浓度分别为700〜1,000ppm，（c）工作和离轴方向的平均假想温度为850〜950℃ ，和（d）工作方向上最多为1×10 -6的633nm波长的光的折射率分布。该空白对激光具有良好的透射率，当用激光照射时几乎不发生劣化，并且特别适用于ArF准分子激光相关应用。

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