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    • 1. 发明申请
    • APPARATUS FOR MOVING AND SECURING A SUBSTRATE
    • 移动和安全基板的装置
    • US20120251272A1
    • 2012-10-04
    • US13180295
    • 2011-07-11
    • Scott SnodgrassGregory M. Gibson
    • Scott SnodgrassGregory M. Gibson
    • B65G49/00
    • H01L21/6838B65G49/061B65G49/065B65G49/067B65G2249/02B65G2249/04
    • An apparatus for transferring and securing a substrate is shown. A pressure source is provided that is adapted to provide positive and negative pressure. A vacuum chuck is provided having a top side with a plurality of vacuum chuck portals formed therein. Each vacuum chuck portal is in fluid communication with the pressure source. The substrate is secured to the top side of the vacuum chuck when the pressure source provides negative pressure to the vacuum chuck portals. An intermediate member that selectively cooperates with the vacuum chuck to support and transfer the substrate between the vacuum chuck and the intermediate member is provided. The intermediate member has a plurality of receiving spaces and a plurality of transfer members. The receiving spaces and transfer members are adjacent to one another in an alternating pattern, and each transfer member has a top side with a plurality of transfer member portals formed therein. Each transfer member portal is in fluid communication with the pressure source. A carriage extending along at least a portion of the periphery of the vacuum chuck and along at least a portion of the periphery of the intermediate member is provided. The carriage engages at least a portion of the substrate when the pressure source provides positive pressure to the vacuum chuck portals and transfer member portals to transfer the substrate between the intermediate member and the vacuum chuck.
    • 示出了用于传送和固定基板的装置。 提供了适于提供正压和负压的压力源。 提供一种真空吸盘,其具有在其中形成有多个真空吸盘入口的顶侧。 每个真空吸盘入口与压力源流体连通。 当压力源向真空吸盘入口提供负压时,衬底被固定到真空吸盘的顶侧。 提供了选择性地与真空吸盘配合以支撑和传送基板在真空吸盘和中间构件之间的中间构件。 中间构件具有多个容纳空间和多个转印构件。 接收空间和传送构件以交替图案彼此相邻,并且每个传送构件具有形成在其中的多个传送构件入口的顶侧。 每个转移构件入口与压力源流体连通。 提供沿着真空吸盘的周边的至少一部分并且沿着中间构件的周边的至少一部分延伸的托架。 当压力源向真空吸盘入口和转移构件入口提供正压力以在中间构件和真空吸盘之间转移衬底时,托架接合衬底的至少一部分。
    • 2. 发明授权
    • System and method for clean and priming extrusion head
    • 清洁和起动挤压头的系统和方法
    • US06488041B1
    • 2002-12-03
    • US09227381
    • 1999-01-08
    • Gregory M. GibsonJohn E. HawesSamer Mahmoud KabbaniOcie T. Snodgrass
    • Gregory M. GibsonJohn E. HawesSamer Mahmoud KabbaniOcie T. Snodgrass
    • B08B902
    • B05C5/0254
    • The present invention relates to a system and method suitable for automatic cleaning of a coating or extrusion head of a coating apparatus. The invention includes a scrubbing station wherein a combination of physical contact and strong solvent solution combine to remove coating fluid from the exterior of an extrusion head. A second cleaning station, preferably a rinsing station then further cleans the head of coating fluid and removes solvent used at a first cleaning station. The solvent used at the rinsing station is preferably self-drying thereby obviating the need for any further cleaning action. The invention also provides for the ability to prime the coating bead at the extrusion head so as to have a fully formed bead ready before the head begins coating a substrate, thereby providing an even coating across said substrate. The priming operation preferably comprises holding the head steady over a rotating priming roller while extruding fluid preferably at a constant volumetric flow rate. The extrusion head is removed from the priming station when the coating bead is properly formed, and the extruded coating material is dissolved in a solvent bath at the priming station. The priming operation may also be performed at either of the cleaning stations.
    • 本发明涉及一种适用于自动清洁涂布装置的涂布或挤压头的系统和方法。 本发明包括洗涤站,其中物理接触和强溶剂溶液的组合组合以从挤出头的外部除去涂布液。 第二清洁站,优选漂洗站,然后进一步清洁涂布液的头部并除去在第一清洁站使用的溶剂。 在漂洗站使用的溶剂优选是自干燥的,从而避免需要进一步的清洁作用。 本发明还提供了在挤出头处填充涂布珠的能力,以便在头开始涂覆基底之前具有准备好的完全成形的珠,从而在所述基底上提供均匀的涂层。 起动操作优选地包括将头部稳定地保持在旋转启动辊上,同时优选以恒定的体积流速挤出流体。 当涂覆珠被适当地形成时,挤出头从灌注站移除,并且将挤出的涂覆材料溶解在起动站的溶剂浴中。 启动操作也可以在任一个清洁站进行。
    • 4. 发明授权
    • System and method for adjusting a working distance to correspond with the work surface
    • 用于调整与工作面对应的工作距离的系统和方法
    • US06319323B1
    • 2001-11-20
    • US09227459
    • 1999-01-08
    • Gregory M. GibsonAltaf A. PoonawalaJohn E. HawesDarwin R. FrerkingZi-Qin Wang
    • Gregory M. GibsonAltaf A. PoonawalaJohn E. HawesDarwin R. FrerkingZi-Qin Wang
    • B05C1100
    • B05C5/0216B05C11/02
    • The inventive mechanism adjusts a working distance between a tool and a work surface. The provision for automatically setting and adjusting the working distance between two parts of an apparatus, possibly a coating apparatus, permits the mechanism to adjust in real time for unknown and possibly random variations in the dimensions of the work surface, the apparatus supporting the work surface, and imperfect leveling of the tool or the work surface. In a preferred embodiment, the inventive mechanism is used to accurately set and maintain the working distance of a dispenser above a substrate so as to provide that a consistent coating thickness is applied across the substrate. The mechanism preferably employs direct precision distance sensing means independent of the motor of drive means to continuously measure the working distance in real time with a high degree of resolution and accuracy. When the sensor reports that the working distance has deviated from the ideal setting, a control system employs a standard P.I.D. control scheme to precisely restore the ideal working distance. The mechanism may perform the working distance control function using the main or host software, or, more preferably delegate this function to a dedicated processor for the duration of the process during which working distance is being precisely adjusted. The host preferably resumes control of the drive means in the direction of the working distance once the precision adjustment scheme is concluded, and may then perform larger scale motion of the tool using feedback from the position reporting means integral to the motor or drive means.
    • 本发明的机构调节工具和工作表面之间的工作距离。 用于自动设定和调节设备的两个部件(可能是涂覆设备)之间的工作距离的设置允许机构实时地调整工作表面的尺寸的未知和可能的随机变化,支撑工作表面的设备 ,以及工具或工作台面的不均匀调平。 在优选实施例中,使用本发明的机构来精确地设置和维持分配器在基板上方的工作距离,以便提供在基板上施加一致的涂层厚度。 该机构优选采用独立于驱动装置的电动机的直接精密距离感测装置,以高分辨率和精确度实时地连续测量工作距离。 当传感器报告工作距离偏离理想设置时,控制系统采用标准P.I.D. 控制方案精确恢复理想的工作距离。 该机构可以使用主机或主机软件执行工作距离控制功能,或者更优选地,在工作距离被精确调整的过程的持续时间内将该功能委托给专用处理器。 一旦精密调整方案结束,主机就优选地在工作距离方向上恢复驱动装置的控制,然后使用来自位于电动机或驱动装置的积分的位置报告装置的反馈来执行工具的大规模运动。
    • 6. 发明授权
    • Moving head, coating apparatus
    • 摇头,涂装机
    • US07169229B2
    • 2007-01-30
    • US10364537
    • 2003-02-11
    • Gregory M. GibsonCarl W. NewquistJohn E. HawesRene SolizSamer Mahmoud KabbaniScott A. SnodgrassAltaf A. PoonawalaDarwin R. FrerkingZi-Qin WangOcie T. SnodgrassEric E. Anderson
    • Gregory M. GibsonCarl W. NewquistJohn E. HawesRene SolizSamer Mahmoud KabbaniScott A. SnodgrassAltaf A. PoonawalaDarwin R. FrerkingZi-Qin WangOcie T. SnodgrassEric E. Anderson
    • B05C3/02
    • B05C13/00B05C5/0245B05C5/0254B05C11/1013B05C11/1015
    • The invention pertains to a coating apparatus and method in which most of the relative movement between a dispensing head and the substrate to be coated is provided by the coating head. The moving head configuration reduces the system footprint and diminishes leveling problems. A powered shuttle mechanism carries a dispensing head above a substrate to be coated while riding on a bearing located underneath the chuck holding the substrate thereby providing rigidity and reducing the system footprint. Chuck support is designed to accommodate anticipated vertical sag in the dispensing head by supporting the chuck at points along its periphery thereby permitting the chuck to sag in conjunction with the dispensing head. The shuttle mechanism is equipped with means for automatically adjusting the height of the dispensing head with respect to substrate to compensate for substrate placement error, substrate dimensional variation, and mechanical drift in the mechanical machine parts. Coating consistency is enhanced using such height adjustment. A part of the apparatus containing the fluid delivery equipment and in communication with the dispensing head may be placed on a cart and removably attached to the rest of the apparatus. There is a utility station comprising equipment for cleaning and priming the dispensing head which may be located on the removable cart. A pump in addition to main remote pumping means may be integrally mounted on the dispensing head to more precisely control fluid flow to the dispensing head. The chuck may be configured to be micro deformable so as to maintain the surface of a substrate upon it at a constant height. Fluid may be dispensed along openings of selected lengths along the length of the dispensing head using die lips attached to the dispensing head or by cutting a plurality of slots in a single dispensing head.
    • 本发明涉及一种涂布装置和方法,其中分配头与要涂覆的基底之间的大部分相对运动由涂覆头提供。 移动头配置减少了系统占用空间并减少了调平问题。 动力穿梭机构在被涂覆的基底上方运送分配头,同时骑在位于夹持基底的卡盘下方的轴承上,从而提供刚性并减少系统占地面积。 卡盘支撑件设计成通过在其周边的点处支撑卡盘来适应分配头部中的预期垂直松弛,从而允许卡盘与分配头一起下垂。 穿梭机构配备有用于自动调节分配头相对于基底的高度以补偿机械机器部件中的基板放置误差,基板尺寸变化和机械漂移的装置。 使用这种高度调节可提高涂层的一致性。 包含流体输送设备并与分配头连通的装置的一部分可以放置在推车上并且可移除地附接到装置的其余部分上。 有一个实用工作站,包括用于清洁和启动分配头的设备,该分配头可以位于可移动的推车上。 除了主远程泵送装置之外的泵可以一体地安装在分配头上,以更精确地控制流到分配头的流体。 卡盘可以被配置为可微变形的,以便将基板的表面保持在恒定的高度。 可以使用附接到分配头的模唇或通过在单个分配头中切割多个狭槽沿着分配头的长度沿着选定长度的开口分配流体。
    • 9. 发明授权
    • Linear developer
    • 线性显影剂
    • US6092937A
    • 2000-07-25
    • US227362
    • 1999-01-08
    • Ocie T. SnodgrassGregory M. GibsonCarl W. Newquist
    • Ocie T. SnodgrassGregory M. GibsonCarl W. Newquist
    • G03D5/04G03F7/30B65D3/00
    • G03D5/04G03F7/3042Y10S134/902
    • The inventive dispenser mechanism uniformly develops a photosensitive layer on a substrate. The mechanism uses a developer head that moves in a substantially linear relative motion with respect to the substrate and dispenses a developer at a controlled rate. Contact of the developer material with the photosensitive layer commences a chemical reaction of developing. The mechanism also uses a rinse head that has the same motion as the developer head and travels at the same velocity. The rinse head dispenses a rinse material at a controlled rate. Contact of the rinse material with the developer material on the photosensitive layer retards the chemical reaction of developing. The rinse head waits for a predetermined dwell period after the developer head has dispensed the developer material before dispensing the rinse material. The mechanism may also use a suction head that has the same motion and velocity and removes loose material on a surface of the substrate.
    • 本发明的分配机构在基板上均匀地形成感光层。 该机构使用显影头,其相对于基底以基本线性的相对运动移动,并以受控的速率分配显影剂。 显影剂材料与感光层的接触开始发生化学反应。 该机构还使用具有与显影头相同的运动并以相同速度行进的冲洗头。 冲洗头以受控的速率分配冲洗材料。 冲洗材料与感光层上的显影剂材料的接触阻碍了显影的化学反应。 在分配冲洗材料之前,在显影剂头分配显影剂材料之后,冲洗头等待预定的停留时间。 该机构还可以使用具有相同运动和速度的吸头,并去除衬底表面上的松散材料。