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    • 3. 发明授权
    • Passive millimeter wave sensor using high temperature superconducting leads
    • 无源毫米波传感器采用高温超导导线
    • US07132655B2
    • 2006-11-07
    • US10727187
    • 2003-12-02
    • Michael D. JackEli E. Gordon
    • Michael D. JackEli E. Gordon
    • G01J5/00
    • H01Q21/26G01J5/08G01J5/0837G01J5/20H01Q1/002H01Q1/364
    • A radiation sensor (20) has a substrate (34); an antenna (24) coupled to the substrate (34), a thermal detector unit TDU (22) spaced from the antenna (24) and the substrate (34); and a multi-layered conductive lead (30). The conductive lead (30) physically contacts the antenna (24) and the TDU (22). The conductive lead (30) defines a support layer (44) adjacent to the substrate (34) for structurally supporting the TDU (22) over a cavity defined by the substrate (34), a buffer layer (46) disposed on the support layer (44), and a superconductive layer (48) disposed on the buffer layer (46). The buffer layer has a crystalline structure to facilitate bonding with other layers. A method for making the sensor (20) is disclosed wherein the superconductive layer (48) and the buffer layer (46) are deposited using laser deposit, the buffer layer (46) with ion beam assist for alignment.
    • 辐射传感器(20)具有基板(34); 耦合到所述衬底(34)的天线(24),与所述天线(24)和所述衬底(34)间隔开的热检测器单元TDU(22); 和多层导电引线(30)。 导电引线(30)物理地接触天线(24)和TDU(22)。 导电引线(30)限定与衬底(34)相邻的支撑层(44),用于在由衬底(34)限定的空腔上结构地支撑TDU(22);缓冲层(46),设置在支撑层 (44)和设置在缓冲层(46)上的超导层(48)。 缓冲层具有便于与其它层结合的晶体结构。 公开了一种用于制造传感器(20)的方法,其中使用激光沉积沉积超导层(48)和缓冲层(46),缓冲层(46)具有用于对准的离子束辅助。
    • 4. 发明授权
    • Hybrid microelectronic array structure having electrically isolated supported islands, and its fabrication
    • 具有电隔离的支撑岛的混合微电子阵列结构及其制造
    • US06828545B1
    • 2004-12-07
    • US09859575
    • 2001-05-15
    • William J. Hamilton, Jr.Eli E. GordonRonald W. Berry
    • William J. Hamilton, Jr.Eli E. GordonRonald W. Berry
    • H01L3100
    • H01L27/1465H01L2924/351
    • A hybrid microelectronic array structure is fabricated from a readout integrated circuit array of microelectronic integrated circuits and a supported array of supported islands. The supported islands include one or more supported elements, with a respective supported element for each of the readout integrated circuits. The supported array is made by depositing the first semiconductor region onto a supported substrate and depositing the second semiconductor region onto the first semiconductor region, and defining supported islands as electrically isolated segments. On each supported element, a first interconnect is formed to the first semiconductor region and a second interconnect is formed to the second semiconductor region. The supported array is joined to the readout integrated circuit array by an interconnect structure, preferably a bump interconnect structure, to form the hybrid microelectronic array structure, with each readout integrated electrically interconnected to the respective one of the supported elements.
    • 混合微电子阵列结构由微电子集成电路的读出集成电路阵列和支持的岛的支持阵列制成。 支撑的岛包括一个或多个受支撑的元件,以及用于每个读出集成电路的相应的支撑元件。 支撑的阵列通过将第一半导体区域沉积到受支撑的衬底上并将第二半导体区域沉积到第一半导体区域上并且将支撑的岛作为电隔离段来制造。 在每个支撑元件上,第一互连形成于第一半导体区域,第二互连形成于第二半导体区域。 支撑的阵列通过互连结构(优选地是凸块互连结构)连接到读出集成电路阵列,以形成混合微电子阵列结构,其中每个读出器电互连到相应的一个支持元件。