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    • 1. 发明申请
    • Multilayer Wiring Substrate
    • 多层接线基板
    • US20110155438A1
    • 2011-06-30
    • US12978750
    • 2010-12-27
    • Tatsuya ITOTetsuo SUZUKITakuya HANDOShinnosuke MAEDAAtsuhiko SUGIMOTOSatoshi HIRANO
    • Tatsuya ITOTetsuo SUZUKITakuya HANDOShinnosuke MAEDAAtsuhiko SUGIMOTOSatoshi HIRANO
    • H05K1/11
    • H05K3/4682H05K1/113H05K3/4007H05K2201/094H05K2201/09427H05K2201/09472
    • A multilayer wiring substrate has a multilayer wiring laminate portion in which a plurality of resin insulation layers made primarily of the same resin insulation material, and a plurality of conductive layers are laminated alternately. A plurality of first-main-surface-side connection terminals are disposed on one side of the laminate structure where a first main surface thereof is present, and a plurality of second-main-surface-side connection terminals being disposed on an other side of the laminate structure where a second main surface thereof is present. The plurality of conductive layers are formed in the plurality of resin insulation layers and interconnected by means of via conductors whose diameters increase toward the first main surface or the second main surface. The plurality of first-main-surface-side connection terminals comprising at least two types of terminals for connection of different articles-to-be-connected. Top surfaces of the plurality of first-main-surface-side connection terminals differ in height according to types of the articles-to-be-connected.
    • 多层布线基板具有多层布线层叠部,其中主要由相同树脂绝缘材料制成的多个树脂绝缘层和多个导电层交替层叠。 多个第一主表面侧连接端子设置在层叠结构的存在第一主表面的一侧上,并且多个第二主表面侧连接端子设置在 其中存在第二主表面的层压结构。 多个导电层形成在多个树脂绝缘层中,并且通过直径朝向第一主表面或第二主表面增大的通孔导体互连。 多个第一主表面侧连接端子包括用于连接不同待连接物品的至少两种类型的端子。 多个第一主表面侧连接端子的顶表面根据要连接的物品的类型而不同。
    • 8. 发明授权
    • Process for manufacturing a wiring substrate
    • 制造布线基板的工艺
    • US07202156B2
    • 2007-04-10
    • US10989515
    • 2004-11-17
    • Hajime SaikiAtsuhiko SugimotoMikiya Sakurai
    • Hajime SaikiAtsuhiko SugimotoMikiya Sakurai
    • H01L21/4763
    • H05K3/4661H05K3/108H05K3/181H05K3/4602H05K2201/0209
    • A process for manufacturing a wiring substrate, comprising: a step of forming an insulating resin layer containing an inorganic filler over a wiring layer formed on at least one surface of an insulating substrate; a step of forming a thin copper film layer by roughening a surface of the insulating resin layer and plating the same electrolessly with copper; a step of forming an insulating film over the thin copper film layer; a step of forming plated resists profiling a pattern by exposing and developing the insulating film with the pattern; and a step of forming wiring pattern layers by an electrolytic copper plating on a surface of the insulating resin layer having the plated resists formed thereon, wherein at least one of the plated resists has a width of less than 20 μm, and the plated resists include adjoining plated resists in which a clearance between said adjoining plated resists has a width of less than 20 μm.
    • 一种布线基板的制造方法,包括:在绝缘基板的至少一个面上形成的布线层上形成含有无机填料的绝缘树脂层的工序; 通过使绝缘树脂层的表面粗糙化并用铜电化而使其形成薄铜膜层的步骤; 在所述薄铜膜层上形成绝缘膜的步骤; 通过用图案曝光和显影绝缘膜来形成电镀抗蚀剂的步骤; 以及在其上形成有电镀抗蚀剂的绝缘树脂层的表面上通过电解铜电镀形成布线图案层的步骤,其中至少一个电镀抗蚀剂具有小于20μm的宽度,并且电镀抗蚀剂包括 邻接的电镀抗蚀剂,其中所述相邻的电镀抗蚀剂之间的间隙具有小于20μm的宽度。