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    • 2. 发明授权
    • Robot positioning system for semiconductor tools
    • 半导体工具机器人定位系统
    • US09352466B2
    • 2016-05-31
    • US13486019
    • 2012-06-01
    • Wen-Huang LiaoHsien-Mao Huang
    • Wen-Huang LiaoHsien-Mao Huang
    • B25J9/16H01L21/67H01L21/68G06K9/32
    • B25J9/1697B25J9/1692G05B2219/39008G05B2219/39046G05B2219/45031G06K9/3208H01L21/67259H01L21/681
    • A system and method for adjusting the position and orientation of a feed arm associated with a wafer handling robot. In one embodiment, the system includes a positioning plate detachably carried by the feed arm and insertable therewith into a wafer carrier. The positioning plate includes graphic alignment indicia. An alignment apparatus is provided configured for insertion into wafer-holding slots in the wafer carrier. The apparatus includes at least one digital image sensor. With the positioning plate and alignment apparatus located in the wafer carrier, an image of the alignment indicia is displayed on a video monitor by the image sensor for comparison to a reference mark superimposed on the monitor for determining the relative position and orientation of the feed arm with respect to the wafer carrier. Some embodiments of the apparatus further include a distance detection device to measure the distance to the plate.
    • 一种用于调节与晶片处理机器人相关联的进给臂的位置和方向的系统和方法。 在一个实施例中,系统包括可由进给臂可拆卸地承载并可插入到晶片载体中的定位板。 定位板包括图形对齐标记。 提供配置用于插入晶片载体中的晶片保持槽的对准装置。 该装置包括至少一个数字图像传感器。 利用位于晶片载体中的定位板和对准装置,通过图像传感器在视频监视器上显示对准标记的图像,以与叠加在监视器上的参考标记进行比较,以确定进给臂的相对位置和方向 相对于晶片载体。 该装置的一些实施例还包括测量到板的距离的距离检测装置。
    • 3. 发明授权
    • Method and device for controlling manipulators
    • 用于控制操纵器的方法和装置
    • US07571025B2
    • 2009-08-04
    • US11141899
    • 2005-06-01
    • Rainer Bischoff
    • Rainer Bischoff
    • G05B19/418
    • B25J9/1692B25J9/1682G05B2219/39008G05B2219/39045G05B2219/39046G05B2219/39051G05B2219/39114G05B2219/39397Y10T74/20207Y10T74/20305Y10T74/20311Y10T74/20329Y10T74/20335
    • A method for controlling a plurality of manipulators, such as multiaxial or multiaxle industrial robots. At least one manipulator functions as the reference manipulator and is moved in a plurality of preset poses within its working area at which internal position values are determined as first desired poses. For each desired pose, subsequently a first actual pose of the reference manipulator is determined by an external measuring system. Subsequently at least one further manipulator moves up to specific poses of the reference manipulator as second desired poses and for each of these poses an actual pose of the further manipulator is determined by an external measuring system. On the basis of actual-desired deviations between the thus determined desired and actual poses of the two manipulators, subsequently a parameter model for the further manipulator is established and with it it is possible to compensate simultaneously both its own errors and those of the reference manipulator. The method can be used in conjunction with a simplified, improved cooperation between manipulators.
    • 一种用于控制多个操作器的方法,例如多轴或多轴工业机器人。 至少一个操纵器用作参考操纵器并且在其工作区域内以多个预设姿势移动,在该区域内确定内部位置值作为第一期望姿态。 对于每个期望的姿态,随后参考操纵器的第一实际姿势由外部测量系统确定。 随后,至少一个另外的操纵器移动到参考操纵器的特定姿势作为第二期望姿态,并且对于这些姿势中的每一个,另外的操纵器的实际姿势由外部测量系统确定。 基于这样确定的两个操纵器的期望和实际姿态之间的实际期望的偏差,随后建立用于另外的操纵器的参数模型,并且随之可以同时补偿其自身的误差和参考机械手的误差 。 该方法可以与操纵器之间的简化,改进的协作结合使用。