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1. 发明授权

US07705994B2 Monolithic displacement measuring interferometer with spatially separated but substantially equivalent optical pathways and optional dual beam outputs 有权
标题翻译：单片位移测量干涉仪，具有空间分离但基本相同的光学路径和可选的双光束输出
公开(公告)号：US07705994B2
公开(公告)日：2010-04-27
申请号：US11286817
申请日：2005-11-23
申请人： Alan B Ray
发明人： Alan B Ray
IPC分类号： G01B9/02
CPC分类号： G01B9/02067 , G01B9/02007 , G01B9/02051 , G01B2290/70
摘要： An interferometer and corresponding system are provided having several aspects. In a first aspect, there is provided an interferometer adapted to receive separate first and second beams f1 and f2 therein, the interferometer comprising substantially equivalent and separate first and second optical pathways for the first and second beams f1 and f2. In a second aspect, there is provided an interferometer adapted to receive as separate inputs therein first and second beams f1 and f2, where such beams are not mixed or combined until just prior to being output by the interferometer. In a third aspect, an interferometer is provided having one or more beam blockers for intercepting extraneous or undesired light, and keeping such light from contaminating or interfering with separate beams f1 and f2.
摘要翻译：提供了具有几个方面的干涉仪和相应的系统。在第一方面，提供了一种适于在其中接收单独的第一和第二光束f1和f2的干涉仪，所述干涉仪包括用于第一和第二光束f1和f2的基本相同且分离的第一和第二光学路径。在第二方面，提供了一种适于在第一和第二光束f1和f2内作为单独输入接收的干涉仪，其中这些光束不被混合或组合直到刚好在由干涉仪输出之前。在第三方面，提供一种具有一个或多个光束阻挡器的干涉仪，用于拦截外来或不期望的光，并且保持这种光不受污染或干扰分离的光束f1和f2。

2. 发明授权

US07561280B2 Displacement measurement sensor head and system having measurement sub-beams comprising zeroth order and first order diffraction components 有权
$Displacement measurement sensor head and system having measurement sub-beams comprising zeroth order and first order diffraction components$
标题翻译：位移测量传感器头和具有包括零级和一级衍射分量的测量子光束的系统
公开(公告)号：US07561280B2
公开(公告)日：2009-07-14
申请号：US12172810
申请日：2008-07-14
申请人： William Clay Schluchter , Miao Zhu , Alan B. Ray , Gerry Owen , Carol Courville
发明人： William Clay Schluchter , Miao Zhu , Alan B. Ray , Gerry Owen , Carol Courville
IPC分类号： G01B11/02
CPC分类号： G01B9/02018 , G01B9/02003 , G01B9/02019 , G01B9/02022 , G01B2290/15 , G01B2290/30 , G01B2290/70 , G01D5/34715 , G01D5/38 , G03F7/70775 , G03F7/7085 , G03F9/7049 , G03F9/7088
摘要： A sensor head for use with a measurement grating is described. The sensor head comprises: a splitter grating configured to split a light beam into first and second measurement beams; a first retroreflector configured to retroreflect the first and second measurement beams toward the measurement grating; and a second retroreflector configured to retroreflect the first and second measurement beams toward the measurement grating. In one embodiment the second measurement beam is diffracted by the measurement grating to form first and second sub-beams and one of the first and second sub-beams comprises a zeroth order diffraction component and a first order diffraction component. In another embodiment, the first and second sub-beams each comprise a zeroth order diffraction component and a first order diffraction component.
摘要翻译：描述了与测量光栅一起使用的传感器头。传感器头包括：分束器光栅，被配置为将光束分成第一和第二测量光束; 第一后向反射器，被配置为将所述第一和第二测量光束向所述测量光栅反向反射; 以及第二后向反射器，被配置为将第一和第二测量光束向后向反射向测量光栅。在一个实施例中，第二测量光束被测量光栅衍射以形成第一和第二子光束，并且第一和第二子光束中的一个包括零级衍射分量和一阶衍射分量。在另一个实施例中，第一和第二子光束各自包括零级衍射分量和一阶衍射分量。

3. 发明授权

US07440113B2 Littrow interferometer 失效
标题翻译： Littrow干涉仪
公开(公告)号：US07440113B2
公开(公告)日：2008-10-21
申请号：US11316855
申请日：2005-12-23
申请人： William R Trutna, Jr. , Geraint Owen , Alan B Ray , James Prince , Eric Stephen Johnstone , Miao Zhu , Leonard S Cutler
发明人： William R Trutna, Jr. , Geraint Owen , Alan B Ray , James Prince , Eric Stephen Johnstone , Miao Zhu , Leonard S Cutler
IPC分类号： G01D5/36 , G01N11/02
CPC分类号： G01D5/266 , G01D5/38
摘要： An apparatus and method for measuring displacement includes a light beam directed to an interferometer core that splits the light beam into first and second component beams. The first component beam is directed to a diffraction grating at approximately a Littrow angle. A diffraction is received by the interferometer core and is combined with the second component beam. The combination of the first and second component beams is measured to determine displacement of the diffraction grating.
摘要翻译：用于测量位移的装置和方法包括指向干涉仪芯的光束，其将光束分成第一和第二分量光束。第一分量光束以大约Littrow角度被引导到衍射光栅。衍射由干涉仪芯接收并与第二分量光束组合。测量第一和第二分量光束的组合以确定衍射光栅的位移。

4. 发明授权

US07224466B2 Compact multi-axis interferometer 失效
标题翻译：紧凑型多轴干涉仪
公开(公告)号：US07224466B2
公开(公告)日：2007-05-29
申请号：US10360262
申请日：2003-02-05
申请人： Alan B. Ray
发明人： Alan B. Ray
IPC分类号： G01B11/02
CPC分类号： G01B9/02018 , G01B9/02027 , G01B9/02049 , G01B9/02061 , G01B2290/15 , G01B2290/45 , G01B2290/70
摘要： A multi-axis plane mirror interferometer uses shared measurement and reference beams that respectively reflect from measurement and reference reflectors before that shared beams are split into individual beams corresponding to the measurement axes of the interferometer. An N-axis interferometer thus requires only N+1 measurement beam paths, one for the shared measurement beam and N for individual measurement beams, to provide for each measurement axis the two reflections that cancel angular misalignment between the measurement and reference reflectors.
摘要翻译：多轴平面镜干涉仪使用共享的测量和参考光束，分别从测量和参考反射器反射，共享光束被分成与干涉仪的测量轴对应的单个光束。因此，N轴干涉仪仅需要N + 1个测量光束路径，一个用于共享测量光束，另外N个用于各个测量光束，以为每个测量轴提供消除测量和参考反射器之间角度偏移的两个反射。

5. 发明授权

US07130056B2 System and method of using a side-mounted interferometer to acquire position information 失效
标题翻译：使用侧面安装的干涉仪获取位置信息的系统和方法
公开(公告)号：US07130056B2
公开(公告)日：2006-10-31
申请号：US10783199
申请日：2004-02-20
申请人： William Clay Schluchter , Louis F. Mueller , Douglas P. Woolverton , Jeffrey A. Young , Alan B. Ray , David C. Chu
发明人： William Clay Schluchter , Louis F. Mueller , Douglas P. Woolverton , Jeffrey A. Young , Alan B. Ray , David C. Chu
IPC分类号： G01B11/02
CPC分类号： G03F7/70775
摘要： A system and method for acquiring position information of a movable apparatus relevant to a specific axis is disclosed. In one embodiment, an interferometer generates first and second beams and various beam-steering members are located to define beam path segments for the two beams, but no beam path segment varies in length in unity with displacements of the movable apparatus along the specific axis. In another or the same embodiment, each beam path segment in which the first beam either impinges or has been reflected from the movable apparatus is symmetrical to a corresponding beam path segment of the second beam. The movable apparatus may be a wafer stage in which the “specific axis” is the exposure axis of a projection lens, but with all optical members which cooperate with the stage being located beyond the ranges of the wafer stage in directions perpendicular to the lithographic exposure axis.
摘要翻译：公开了一种用于获取与特定轴相关的可移动装置的位置信息的系统和方法。在一个实施例中，干涉仪产生第一和第二光束，并且定位各种光束转向构件以限定用于两个光束的光束路径段，但是没有光束路径段随着可移动装置沿特定轴线的位移而在长度上变化。在另一个或相同的实施例中，其中第一光束撞击或已经从可移动装置反射的每个光束路径段与第二光束的相应光束路径段对称。可移动装置可以是其中“特定轴线”是投影透镜的曝光轴线的晶片台，但是与垂直于光刻曝光的方向的晶片台的位置超出晶片台的范围的所有光学构件轴。

6. 发明授权

US06897962B2 Interferometer using beam re-tracing to eliminate beam walk-off 有权
标题翻译：干涉仪使用光束重新追踪消除光束偏移
公开(公告)号：US06897962B2
公开(公告)日：2005-05-24
申请号：US10126002
申请日：2002-04-18
申请人： Eric S. Johnstone , John J. Bockman , Alan B. Ray , Kerry Bagw ell
发明人： Eric S. Johnstone , John J. Bockman , Alan B. Ray , Kerry Bagw ell
IPC分类号： G01B9/02 , G02B5/04
CPC分类号： G01B9/02007 , G01B9/02003 , G01B9/02018 , G01B9/02061 , G01B2290/15 , G01B2290/70
摘要： An interferometer returns parallel beams that are subject to walk-off caused by reflector misalignment for an additional pass through the interferometer optics and thereby eliminates beam walk-off. A return reflector can be a plane mirror that directs returning beams to retrace paths through the interferometer optics to combine and exit along the axis of the input beam. Separation optics can separate the combined beam from the input beam. Alternatively, a return reflector such as an isosceles prism or a trapezoidal prism reflects and offsets returning beams so that the combined beam is offset from the input beam. The return reflector more generally responds to a shift in incident beam position with a matching shift of the reflected beam in contrast to a retroreflector, which shifts a reflected beam in a direction opposite to the shift in the incident beam.
摘要翻译：干涉仪返回平行光束，该平行光束由反射器未对准引起的偏离，以便额外通过干涉仪光学元件，从而消除光束的离散。返回反射器可以是平面镜，其引导返回的光束以通过干涉仪光学器件回扫路径，以沿输入光束的轴线组合和退出。分离光学器件可以将组合光束与输入光束分离。或者，诸如等腰棱镜或梯形棱镜的返回反射器反射和偏移返回光束，使得组合的光束从输入光束偏移。返回反射器更一般地响应入射光束位置的移动，与反射器相反，反射光束的反转光束在与入射光束中的偏移相反的方向上偏移反射光束。

7. 发明授权

US4676868A Method for planarizing semiconductor substrates 失效
标题翻译：半导体衬底平面化方法
公开(公告)号：US4676868A
公开(公告)日：1987-06-30
申请号：US855207
申请日：1986-04-23
申请人： Paul E. Riley , Alan B. Ray , Paul Bayer
发明人： Paul E. Riley , Alan B. Ray , Paul Bayer
IPC分类号： H01L21/302 , H01L21/3065 , H01L21/3105 , H01L21/311 , H01L21/3205 , H01L21/768 , B44C1/22 , B29C37/00 , C03C15/00 , C03C25/06
CPC分类号： H01L21/76819 , H01L21/31055 , H01L21/31116
摘要： A method for planarizing an insulating layer overlying an irregular topographic substrate, e.g., a conductive layer, is planarized by use of a sacrificial planarization layer. The planarization layer is removed using an oxygen-containing plasma generated in a parallel electrode reactor operating at a low excitation frequency and high pressure. Once the interface between the planarization layer and the conductive layer is reached, a second plasma with a reduced oxygen content is employed to avoid overetching the planarization layer. It has been observed that oxidizing species liberated during the etching of the insulating layer, typically silicon dioxide, contribute to the oxidation and hence removal of the planarization layer. The process may be monitored by observing the spectral emissions from species generated or consumed during planarization or by changes in the optical interference pattern, allowing termination of the etch at the proper time to avoid over-etching and under-etching of the insulating layer.
摘要翻译：通过使用牺牲平坦化平面化用于平坦化覆盖不规则形状衬底（例如导电层）的绝缘层的方法。使用在低激发频率和高压下工作的并联电极反应器中产生的含氧等离子体来除去平坦化层。一旦达到平坦化层和导电层之间的界面，则采用具有降低的氧含量的第二等离子体来避免过刻蚀平坦化层。已经观察到，在绝缘层（通常是二氧化硅）的蚀刻期间释放的氧化物质有助于氧化并因此去除平坦化层。可以通过观察在平坦化期间产生或消耗的物质的光谱发射或通过光学干涉图案的变化来监测该过程，从而允许在适当时间终止蚀刻，以避免绝缘层的过蚀刻和蚀刻不足。

8. 发明授权

US06806960B2 Compact beam re-tracing optics to eliminate beam walk-off in an interferometer 有权
标题翻译：紧凑型光束重新跟踪光学元件，以消除干涉仪中的光束偏移
公开(公告)号：US06806960B2
公开(公告)日：2004-10-19
申请号：US10285058
申请日：2002-10-30
申请人： Kerry D. Bagwell , Greg C. Felix , John J. Bockman , Alan B. Ray
发明人： Kerry D. Bagwell , Greg C. Felix , John J. Bockman , Alan B. Ray
IPC分类号： G01B902
CPC分类号： G01B9/02007 , G01B9/02003 , G01B9/02018 , G01B9/02061 , G01B2290/15 , G01B2290/70
摘要： A multi-axis interferometer uses a combined beam for a first pass through the interferometer optics. Measurement and reference components of the combined beam that exit the interferometer optics are subject to walk-off that measurement or reference reflector misalignment can cause. A return reflector and non-polarizing beam splitter system split the combined beam into separated input beams for the various axes of the interferometer and return the separated beams for respective second passes through the interferometer optics. Walk-off for the separated beams in the interferometer optics cancels the walk-off for the combined beam to eliminate beam walk-off in separated output beams. Sharing a combined beam for a first pass through the interferometer optics reduces the sizes required for the interferometer optics and reference and measurement mirrors. The multi-axis interferometer may have a single return reflector.
摘要翻译：多轴干涉仪使用组合光束进行第一次通过干涉仪光学元件。离开干涉仪光学元件的组合光束的测量和参考分量可能导致测量或参考反射器不对准可能导致的偏离。返回反射器和非偏振分束器系统将组合的光束分成用于干涉仪的各个轴的分离的输入光束，并且将分离的光束返回用于相应的第二次通过干涉仪光学器件。在干涉仪光学元件中的分离光束的偏离消除组合光束的散射以消除分离的输出光束中的光束偏移。共享用于第一遍的组合光束通过干涉仪光学器件减少干涉仪光学元件和参考和测量镜所需的尺寸。多轴干涉仪可以具有单个返回反射器。

9. 发明申请

US20080304079A1 DISPLACEMENT MEASUREMENT SENSOR HEAD AND SYSTEM HAVING MEASUREMENT SUB-BEAMS COMPRISING ZEROTH ORDER AND FIRST ORDER DIFFRACTION COMPONENTS 有权
标题翻译：位移测量传感器头和系统具有包含零件订单和第一订单差分成分的测量子
公开(公告)号：US20080304079A1
公开(公告)日：2008-12-11
申请号：US12172810
申请日：2008-07-14
申请人： William Clay Schluchter , Miao Zhu , Alan B. Ray , Gerry Owen , Carol Courville
发明人： William Clay Schluchter , Miao Zhu , Alan B. Ray , Gerry Owen , Carol Courville
IPC分类号： G01B11/02
CPC分类号： G01B9/02018 , G01B9/02003 , G01B9/02019 , G01B9/02022 , G01B2290/15 , G01B2290/30 , G01B2290/70 , G01D5/34715 , G01D5/38 , G03F7/70775 , G03F7/7085 , G03F9/7049 , G03F9/7088
摘要： A sensor head for use with a measurement grating is described. The sensor head comprises: a splitter grating configured to split a light beam into first and second measurement beams; a first retroreflector configured to retroreflect the first and second measurement beams toward the measurement grating; and a second retroreflector configured to retroreflect the first and second measurement beams toward the measurement grating. In one embodiment the second measurement beam is diffracted by the measurement grating to form first and second sub-beams and one of the first and second sub-beams comprises a zeroth order diffraction component and a first order diffraction component. In another embodiment, the first and second sub-beams each comprise a zeroth order diffraction component and a first order diffraction component.
摘要翻译：描述了与测量光栅一起使用的传感器头。传感器头包括：分束器光栅，被配置为将光束分成第一和第二测量光束; 第一后向反射器，被配置为将所述第一和第二测量光束向所述测量光栅反向反射; 以及第二后向反射器，被配置为将第一和第二测量光束向后向反射向测量光栅。在一个实施例中，第二测量光束被测量光栅衍射以形成第一和第二子光束，并且第一和第二子光束中的一个包括零级衍射分量和一阶衍射分量。在另一个实施例中，第一和第二子光束各自包括零级衍射分量和一阶衍射分量。

10. 发明申请

US20080225262A1 Displacement Measurement System 有权
标题翻译：位移测量系统
公开(公告)号：US20080225262A1
公开(公告)日：2008-09-18
申请号：US11686855
申请日：2007-03-15
申请人： William Clay Schluchter , Miao Zhu , Geraint Owen , Alan B. Ray , Carol J. Courville
发明人： William Clay Schluchter , Miao Zhu , Geraint Owen , Alan B. Ray , Carol J. Courville
IPC分类号： G01C3/08 , G02B5/18 , G02B5/30
CPC分类号： G01D5/38 , G01D5/28 , G03F7/70775
摘要： A displacement measurement apparatus includes a light source, a splitter grating, a measurement grating, and first a second detector arrays. The splitter grating splits a light beam into first and second measurement channels that each illuminates the measurement grating. The first and second measurement channels split into 0th and 1st order diffraction products at the measurement grating in a first pass and recombine at the measurement grating in a second pass before being measured at the first and second detector arrays.
摘要翻译：位移测量装置包括光源，分离器光栅，测量光栅以及第一检测器阵列。分离器光栅将光束分成第一和第二测量通道，每个测量通道照亮测量光栅。第一和第二测量通道在第一次通过时在测量光栅处分裂为0和/或1阶衍射产物，并在第二次通过期间在测量光栅处重新组合，之后为在第一和第二检测器阵列处测量。

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