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1. 发明授权

US09715992B2 Integrated optical and charged particle inspection apparatus 有权
公开(公告)号：US09715992B2
公开(公告)日：2017-07-25
申请号：US14390095
申请日：2013-04-02
申请人： DELMIC B.V. , Jacob Pieter Hoogenboom , Pieter Kruit , Nalan M. SC Liv , Aernout Christiaan Zonnevylle
发明人： Jacob Pieter Hoogenboom , Pieter Kruit , Nalan Liv , Aernout Christiaan Zonnevylle
IPC分类号： H01J37/22 , G01C21/32 , H01J37/28 , G01C21/34
CPC分类号： H01J37/222 , G01C21/32 , G01C21/3484 , H01J37/22 , H01J37/226 , H01J37/228 , H01J37/28 , H01J2237/221 , H01J2237/226 , H01J2237/24475 , H01J2237/2806
摘要： An apparatus for inspecting a sample, is equipped with a charged particle column for producing a focused beam of charged particles to observe or modify the sample, and an optical microscope to observe a region of interest on the sample as is observed by the charged particle beam or vice versa. The apparatus is accommodated with a processing unit adapted and equipped to represent an image as generated with the column and an image as generated with the microscope. The unit is further adapted to perform an alignment procedure mutually correlating a region of interest in one of the images, wherein the alignment procedure involves detecting a change in the optical image as caused by the charged particle beam.

2. 发明授权

US08895921B2 Inspection apparatus and replaceable door for a vacuum chamber of such an inspection apparatus and a method for operating an inspection apparatus 有权
标题翻译：这种检查装置的真空室的检查装置和可更换门以及检查装置的操作方法
公开(公告)号：US08895921B2
公开(公告)日：2014-11-25
申请号：US13809685
申请日：2011-07-14
申请人： Pieter Kruit , Jacob Pieter Hoogenboom , Aernout Christiaan Zonnevylle
发明人： Pieter Kruit , Jacob Pieter Hoogenboom , Aernout Christiaan Zonnevylle
IPC分类号： H01J37/26 , G01N21/62 , H01J37/22 , H01J37/256 , H01J37/28
CPC分类号： H01J37/22 , G01N21/62 , G01N2021/625 , H01J37/226 , H01J37/228 , H01J37/256 , H01J37/26 , H01J37/28 , H01J2237/204 , H01J2237/2445 , H01J2237/2482 , H01J2237/2808
摘要： An inspection apparatus is provided comprising in combination at least an optical microscope (2, 3, 4) and an ion- or electron microscope (7, 8) equipped with a source (7) for emitting a primary beam (9) of radiation to a sample (10) in a sample holder. The apparatus may comprise a detector (8) for detection of secondary radiation (11) backscattered from the sample and induced by the primary beam. The optical microscope is equipped with an light collecting device (2) to receive in use luminescence light (12) emitted by the sample and to focus it on a photon-detector (4).
摘要翻译：提供一种检查装置，其至少包括光学显微镜（2,3,4）和配备有用于发射辐射的主光束（9）的源（7）的离子或电子显微镜（7,8）的组合，在样品架中的样品（10）。该装置可包括检测器（8），用于检测从样品反向散射并由主光束引发的次级辐射（11）。光学显微镜配备有光收集装置（2），以使用由样品发射的发光（12）接收并将其聚焦在光子检测器（4）上。

3. 发明申请

US20130200262A1 INSPECTION APPARATUS AND REPLACEABLE DOOR FOR A VACUUM CHAMBER OF SUCH AN INSPECTION APPARATUS AND A METHOD FOR OPERATING AN INSPECTION APPARATUS 有权
标题翻译：这种检查装置的真空室的检查装置和可更换的门以及操作检查装置的方法
公开(公告)号：US20130200262A1
公开(公告)日：2013-08-08
申请号：US13809685
申请日：2011-07-14
申请人： Pieter Kruit , Jacob Pieter Hoogenboom , Aernout Christiaan Zonnevylle
发明人： Pieter Kruit , Jacob Pieter Hoogenboom , Aernout Christiaan Zonnevylle
IPC分类号： H01J37/22 , H01J37/26 , G01N21/62
CPC分类号： H01J37/22 , G01N21/62 , G01N2021/625 , H01J37/226 , H01J37/228 , H01J37/256 , H01J37/26 , H01J37/28 , H01J2237/204 , H01J2237/2445 , H01J2237/2482 , H01J2237/2808
摘要： An inspection apparatus is provided comprising in combination at least an optical microscope (2, 3, 4) and an ion- or electron microscope (7, 8) equipped with a source (7) for emitting a primary beam (9) of radiation to a sample (10) in a sample holder. The apparatus may comprise a detector (8) for detection of secondary radiation (11) backscattered from the sample and induced by the primary beam. The optical microscope is equipped with an light collecting device (2) to receive in use luminescence light (12) emitted by the sample and to focus it on a photon-detector (4).
摘要翻译：提供一种检查装置，其至少包括光学显微镜（2,3,4）和配备有用于发射辐射的主光束（9）的源（7）的离子或电子显微镜（7,8）的组合，在样品架中的样品（10）。该装置可包括检测器（8），用于检测从样品反向散射并由主光束引发的次级辐射（11）。光学显微镜配备有光收集装置（2），以使用由样品发射的发光（12）接收并将其聚焦在光子检测器（4）上。

4. 发明申请

US20150108350A1 INTEGRATED OPTICAL AND CHARGED PARTICLE INSPECTION APPARATUS 有权
标题翻译：集成光学和充电颗粒检测装置
公开(公告)号：US20150108350A1
公开(公告)日：2015-04-23
申请号：US14390095
申请日：2013-04-02
申请人： Jacob Pieter HOOGENBOOM , Pieter KRUIT , Nalan LIV , Aernout Christaan ZONNEVYLLE , DELMIC B.V.
发明人： Jacob Pieter Hoogenboom , Pieter Kruit , Nalan Liv , Aernout Christiaan Zonnevylle
IPC分类号： H01J37/22 , H01J37/28
CPC分类号： H01J37/222 , G01C21/32 , G01C21/3484 , H01J37/22 , H01J37/226 , H01J37/228 , H01J37/28 , H01J2237/221 , H01J2237/226 , H01J2237/24475 , H01J2237/2806
摘要： An apparatus for inspecting a sample, is equipped with a charged particle column for producing a focused beam of charged particles to observe or modify the sample, and an optical microscope to observe a region of interest on the sample as is observed by the charged particle beam or vice versa. The apparatus is accommodated with a processing unit adapted and equipped to represent an image as generated with the column and an image as generated with the microscope. The unit is further adapted to perform an alignment procedure mutually correlating a region of interest in one of the images, wherein the alignment procedure involves detecting a change in the optical image as caused by the charged particle beam.
摘要翻译：用于检查样品的装置装备有带电粒子柱，用于产生聚焦的带电粒子束以观察或改变样品，以及光学显微镜以观察样品上的感兴趣区域，如通过带电粒子束或相反亦然。该装置容纳有适于和配备为表示用柱产生的图像和用显微镜产生的图像的处理单元。该单元进一步适于执行在一个图像中相互关联感兴趣区域的对准过程，其中对准过程涉及检测由带电粒子束引起的光学图像的变化。

5. 发明申请

US20110068276A1 MULTIPLE BEAM CHARGED PARTICLE OPTICAL SYSTEM 有权
标题翻译：多束光束粒子光学系统
公开(公告)号：US20110068276A1
公开(公告)日：2011-03-24
申请号：US12885380
申请日：2010-09-17
申请人： Pieter Kruit , Aernout Christiaan Zonnevylle
发明人： Pieter Kruit , Aernout Christiaan Zonnevylle
IPC分类号： G21K1/08
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/12 , H01J37/1477 , H01J2237/0435 , H01J2237/04924 , H01J2237/1205
摘要： The invention relates to a multiple beam charged particle optical system comprising: a charged particle source for generating a plurality of charged particle beamlets, and charged particle optics for directing the charged particle beamlets from the charged particle source towards a target, wherein each charged particle beamlet defines a beamlet centre line, said charged particle optics comprising one or more electrostatic lens arrays, each comprising two or more array electrodes for generating a plurality of electrostatic lenslets, wherein each lenslet is arranged for focusing a corresponding charged particle beamlet, and wherein each lenslet defines a lenslet optical axis, wherein at least one of said one or more electrostatic lens arrays comprises one or more off-axis electrostatic lenslets, wherein the beamlet centre line of the corresponding charged particle beamlet passes through said off-axis electrostatic lenslet at a distance from its lenslet optical axis.
摘要翻译：本发明涉及一种多光束带电粒子光学系统，包括：用于产生多个带电粒子子束的带电粒子源和用于将带电粒子子束从带电粒子源引向靶的带电粒子光学器件，其中每个带电粒子子束定义了子束中心线，所述带电粒子光学器件包括一个或多个静电透镜阵列，每个静电透镜阵列包括用于产生多个静电小透镜的两个或更多个阵列电极，其中每个小透镜被布置用于聚焦相应的带电粒子子束，并且其中每个小透镜限定了小透镜光轴，其中所述一个或多个静电透镜阵列中的至少一个包括一个或多个离轴静电小透镜，其中相应带电粒子子束的子束中心线以一定距离穿过离轴静电透镜从其小透镜光轴。

6. 发明授权

US09607806B2 Charged particle multi-beam apparatus including a manipulator device for manipulation of one or more charged particle beams 有权
公开(公告)号：US09607806B2
公开(公告)日：2017-03-28
申请号：US13484231
申请日：2012-05-30
申请人： Aernout Christiaan Zonnevylle , Pieter Kruit
发明人： Aernout Christiaan Zonnevylle , Pieter Kruit
IPC分类号： G21K1/08 , H01J37/30 , H01J37/317 , B82Y10/00 , B82Y40/00
CPC分类号： H01J37/3007 , B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J37/3177 , H01J2237/0435 , H01J2237/04924 , H01J2237/1205 , H01J2237/15 , H01J2237/1532
摘要： The invention relates to a method and a device for manipulation of one or more charged particle beams of a plurality of charged particle beamlets in a charged particle multi-beamlet apparatus. The manipulator device comprises a planar substrate comprising an array of through openings in the plane of the substrate, each of these through openings is arranged for passing the at least one charged particle beamlet there through, wherein each of the through openings is provided with one or more electrodes arranged around the through opening, and a electronic control circuit for providing control signals to the one or more electrodes of each through opening, wherein the electronic control circuit is arranged for providing the one or more electrodes of each individual through opening with an at least substantially analog adjustable voltage.

7. 发明申请

US20120305798A1 CHARGED PARTICLE MULTI-BEAMLET APPARATUS 有权
标题翻译：充电颗粒多波束装置
公开(公告)号：US20120305798A1
公开(公告)日：2012-12-06
申请号：US13484231
申请日：2012-05-30
申请人： Aernout Christiaan Zonnevylle , Pieter Kruit
发明人： Aernout Christiaan Zonnevylle , Pieter Kruit
IPC分类号： G21K5/04 , H01J3/26 , H01J3/18 , H01J3/14
CPC分类号： H01J37/3007 , B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J37/3177 , H01J2237/0435 , H01J2237/04924 , H01J2237/1205 , H01J2237/15 , H01J2237/1532
摘要： The invention relates to a method and a device for manipulation of one or more charged particle beams of a plurality of charged particle beamlets in a charged particle multi-beamlet apparatus. The manipulator device comprises a planar substrate comprising an array of through openings in the plane of the substrate, each of these through openings is arranged for passing the at least one charged particle beamlet there through, wherein each of the through openings is provided with one or more electrodes arranged around the through opening, and a electronic control circuit for providing control signals to the one or more electrodes of each through opening, wherein the electronic control circuit is arranged for providing the one or more electrodes of each individual through opening with an at least substantially analog adjustable voltage.
摘要翻译：本发明涉及一种用于在带电粒子多子束装置中操纵多个带电粒子束的一个或多个带电粒子束的方法和装置。所述操纵器装置包括平面基板，所述平面基板包括在所述基板的平面中的通孔的阵列，这些通孔中的每一个布置成使所述至少一个带电粒子束通过，其中每个所述通孔具有一个或布置在通孔周围的更多电极和用于向每个通孔的一个或多个电极提供控制信号的电子控制电路，其中电子控制电路被布置用于通过开口提供每个个体的一个或多个电极，最小的模拟可调电压。

8. 发明授权

US08294117B2 Multiple beam charged particle optical system 有权
标题翻译：多光束带电粒子光学系统
公开(公告)号：US08294117B2
公开(公告)日：2012-10-23
申请号：US12885380
申请日：2010-09-17
申请人： Pieter Kruit , Aernout Christiaan Zonnevylle
发明人： Pieter Kruit , Aernout Christiaan Zonnevylle
IPC分类号： G21K1/08
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/12 , H01J37/1477 , H01J2237/0435 , H01J2237/04924 , H01J2237/1205
摘要： The invention relates to a multiple beam charged particle optical system comprising: a charged particle source for generating a plurality of charged particle beamlets, and charged particle optics for directing the charged particle beamlets from the charged particle source towards a target, wherein each charged particle beamlet defines a beamlet center line, said charged particle optics comprising one or more electrostatic lens arrays, each comprising two or more array electrodes for generating a plurality of electrostatic lenslets, wherein each lenslet is arranged for focusing a corresponding charged particle beamlet, and wherein each lenslet defines a lenslet optical axis, wherein at least one of said one or more electrostatic lens arrays comprises one or more off-axis electrostatic lenslets, wherein the beamlet center line of the corresponding charged particle beamlet passes through said off-axis electrostatic lenslet at a distance from its lenslet optical axis.
摘要翻译：本发明涉及一种多光束带电粒子光学系统，包括：用于产生多个带电粒子子束的带电粒子源和用于将带电粒子子束从带电粒子源引向靶的带电粒子光学器件，其中每个带电粒子子束定义了子束中心线，所述带电粒子光学器件包括一个或多个静电透镜阵列，每个静电透镜阵列包括用于产生多个静电小透镜的两个或更多个阵列电极，其中每个小透镜被布置用于聚焦相应的带电粒子子束，并且其中每个小透镜限定了小透镜光轴，其中所述一个或多个静电透镜阵列中的至少一个包括一个或多个离轴静电小透镜，其中相应带电粒子子束的子束中心线以一定距离穿过离轴静电透镜从其小透镜光轴。

9. 发明授权

US08325321B2 Lithography system, method of heat dissipation and frame 有权
标题翻译：平版印刷系统，散热方法和框架
公开(公告)号：US08325321B2
公开(公告)日：2012-12-04
申请号：US11880833
申请日：2007-07-24
申请人： Pieter Kruit , Michel Pieter Dansberg , Marco Jan-Jaco Wieland
发明人： Pieter Kruit , Michel Pieter Dansberg , Marco Jan-Jaco Wieland
IPC分类号： F28D15/00 , G03B27/42 , G03B27/52 , G03B27/58 , G03B27/62
CPC分类号： G03F7/70875
摘要： The present invention relates to a lithography system for projecting an image or an image pattern on to a target such as a wafer. Energy that is accumulated in the target by the projection of the image or image pattern is removed from said target, such that expansion by local and/or overall heating is limited to a relevant pre-defined value, and wherein such heat removal is realised by the use of a phase transition in a heat absorbing material that is brought into thermal contact with said target. As a further elaboration, such material may be applied in combination with a further material having a superior coefficient of heat transport, and may be incorporated in an emulsion comprising a material having a superior coefficient of heat transfer. Said material may e.g. be adhered to a bottom face of the target, and may also be included in a frame.
摘要翻译：本发明涉及用于将图像或图像图案投影到诸如晶片的靶上的光刻系统。通过图像或图像图案的投影而累积在目标物中的能量从所述目标去除，使得通过局部和/或整体加热的膨胀被限制到相关的预定义值，并且其中这种除热由在与所述靶导致热接触的吸热材料中使用相变。作为进一步的阐述，这种材料可以与具有优异传热系数的另外的材料结合使用，并且可以结合在包含具有优良传热系数的材料的乳液中。所述材料可以例如粘附到目标的底面，并且也可以包括在框架中。

10. 发明申请

US20120211677A1 MULTIPLE BEAM CHARGED PARTICLE OPTICAL SYSTEM 有权
标题翻译：多束光束粒子光学系统
公开(公告)号：US20120211677A1
公开(公告)日：2012-08-23
申请号：US13461594
申请日：2012-05-01
申请人： Pieter Kruit , Yanxia Zhang , Matijn J. Van Bruggen , Stijn Willem Herman Karel Steenbrink
发明人： Pieter Kruit , Yanxia Zhang , Matijn J. Van Bruggen , Stijn Willem Herman Karel Steenbrink
IPC分类号： G21K5/10
CPC分类号： H01J37/12 , H01J37/153 , H01J2237/04924 , H01J2237/1205 , H01J2237/121 , H01J2237/317
摘要： The invention relates to a multiple beam charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one mm, more in particular less than a few tens of microns. In further elaboration, a lens is combined with a current limiting aperture, aligned such relative to a lens of said structure, that a virtual aperture effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total.
摘要翻译：本发明涉及一种多束带电粒子光学系统，其包括具有至少一个具有孔的电极的静电透镜结构，其中由所述孔处的所述电极实现的透镜场的有效尺寸最小化。该系统可以包括发散的带电粒子束部分，其中包括透镜结构。透镜的物理尺寸最终变小，特别是小于1mm，更特别地小于几十微米。在进一步的阐述中，透镜与限流孔结合，相对于所述结构的透镜对准，所述透镜中由所述电流限制孔影响的虚拟孔位于最小化像差总数的最佳位置。

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