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    • 2. 发明授权
    • Aqueous acidic solutions for the electrodeposition of tin and lead/tin
alloys
    • 用于电沉积锡和铅/锡合金的酸性水溶液
    • US5021130A
    • 1991-06-04
    • US469066
    • 1990-01-23
    • Willi MetzgerManfred SchmitzKarl-Jurgen Schmidt
    • Willi MetzgerManfred SchmitzKarl-Jurgen Schmidt
    • C25D3/32C25D3/56C25D3/60
    • C25D3/32C25D3/56C25D3/60
    • Described are aqueous acidic solutions for the electrodeposition of tin and lead/tin alloys for improving electro- deposition in the high current density range and for providing a uniform luster distribution of metals deposited in the low current density range. The solutions contain a mixture of metal salts, free alkanesulfonic acid, a non-ionic wetting agent and optionally aromatic short-chain aldehydes and/or optionally aromatic ketones and/or optionally short-chain unsaturated carboxylic acids. In the solutions, tin and/or lead salts of the alkanesulfonic acid are employed as the metal salt(s), the alkyl moiety of the alkanesulfonic acid consisting of from 1 to 5 carbon atoms, the free alkanesulfonic acid having alkyl moieties with from 1 to 5 carbon atoms. They contain, as a further brightener, a mixture comprising a reaction product of acetaldehyde and/or its aidol condensation product with ammonia and/or acyclic ketones and/or aliphatic amines, amides, amino acids and or hydrazine compounds.
    • 描述了用于电沉积锡和铅/锡合金的酸性水溶液,用于改善在高电流密度范围内的电沉积,并提供在低电流密度范围内沉积的金属的均匀光泽分布。 溶液含有金属盐,游离烷基磺酸,非离子润湿剂和任选的芳族短链醛和/或任选的芳族酮和/或任选的短链不饱和羧酸的混合物。 在该溶液中,使用烷基磺酸的锡和/或铅盐作为金属盐,由1至5个碳原子组成的烷基磺酸的烷基部分,具有烷基部分的游离烷基磺酸具有1 至5个碳原子。 它们作为另外的增白剂包含包含乙醛和/或其辅助缩合产物与氨和/或无环酮和/或脂族胺,酰胺,氨基酸和/或肼化合物的反应产物的混合物。
    • 4. 发明授权
    • Through-hole plate printed circuit board with resist and process for
manufacturing same
    • 通孔板印刷电路板与抗蚀剂及其制造方法相同
    • US5373629A
    • 1994-12-20
    • US836261
    • 1992-02-28
    • Jurgen HupeWalter Kronenberg
    • Jurgen HupeWalter Kronenberg
    • C08G61/10C08G61/12C25D5/56C25D7/00H05K3/10H05K3/40H05K3/42H05K3/46H01K3/10B32B3/10
    • H05K3/424C08G61/123H05K3/4038H05K2201/0329H05K2203/0796H05K2203/107H05K2203/122H05K2203/1415H05K3/108H05K3/427Y10T29/49144Y10T29/49165Y10T428/24322Y10T428/24802Y10T428/24917Y10T428/31
    • A process is described for manufacturing through-hole plated single-layer or multi-layer printed circuit boards based on a polymeric substrate material or on a ceramic material provided optionally on both sides with at least one photoresist layer temporarily exposing the electroconductive circuit pattern by electroplating or electroless plating with a metal layer also on those surfaces which have not been coated with a conductive metal layer, characterized in thata) the surfaces of the substrate, after hole-drilling and a subsequent mechanical surface-treatment, are laminated with a suitable photoresist, exposed to light and developed so that the circuit pattern image is exposed,b) the surfaces of the substrate are pre-treated in a solution having oxidizing activity,c) after removal of the residual solution by rinsing, the substrate is introduced into a solution which contains at least one heterocyclic monomer, and more specifically pyrrole, thiophene, furane or derivative(s) thereof, which in a polymeric form is electrically conductive,d) the substrate is then transferred into an acidic solution whereby an electrically conductive polymeric layer is formed,whereupon, if desired or required, any residual solution is removed by rinsing, and the through-holes and the circuit pattern image are metallized in one step by galvanic or, preferably, electroless metallization.
    • PCT No.PCT / EP90 / 01326 Sec。 一九九二年二月二十八日 102(e)日期1992年2月28日PCT 1990年8月11日PCT PCT。 公开号WO91 / 03920 日本1991年3月21日。描述了一种用于制造基于聚合物基材的通孔电镀单层或多层印刷电路板的工艺,或者在任选地在两侧设置有至少一个光致抗蚀剂层的陶瓷材料 在没有涂覆有导电金属层的那些表面上也用金属层进行电镀或无电镀来暴露导电电路图案,其特征在于:a)所述基板的表面,在钻孔后和随后的机械表面 - 处理,与合适的光致抗蚀剂层合,暴露于光并显影,使得电路图案图像被曝光,b)基板的表面在具有氧化活性的溶液中预处理,c)在通过 将底物引入含有至少一种杂环单体的溶液中,更具体地说是吡咯,噻吩,呋喃或d 以聚合形式导电,d)然后将基底转移到酸性溶液中,由此形成导电聚合物层,然后如果需要或需要,通过冲洗除去任何残留的溶液, 并且通过电流或优选地,无电金属化在一个步骤中对通孔和电路图案图像进行金属化。
    • 5. 发明授权
    • Process and device for producing through-connected printed circuit
boards and multilayered printed circuit boards
    • 用于生产贯穿连接的印刷电路板和多层印刷电路板的工艺和设备
    • US6007866A
    • 1999-12-28
    • US473
    • 1998-03-13
    • Jurgen HupeSabine Fix
    • Jurgen HupeSabine Fix
    • C25D5/56C25D7/00H05K3/00H05K3/38H05K3/42B05D5/10
    • H05K3/424H05K3/0055
    • The process for producing through-connected printed circuit boards or multilayered printed circuit boards with a polymer base with conductive polymers using a combined desmearing and direct metalization process (multilayering) is performed by subjecting the polymer base materials, provided with bore holes, to the following process steps:1) swelling in a per se known treatment liquid and rinsing with water;2) treatment with alkaline permanganate solution (desmearing);3) rinsing with water;4) rinsing with acidic aqueous solution (pH value about 1, rinsing time 10 to 120 s, depending on acid content);5) rinsing with water;6) rinsing with alkaline aqueous solution (pH 8 to 9.5);7) rinsing with water;8) rinsing with microemulsion of ethylene-3,4-dioxythiophene (catalyst);9) rinsing with acid (fixation);10) rinsing with water;11) coppering;12) rinsing with water; and13) drying;14) usual process steps for creating the printed circuit pattern.
    • PCT No.PCT / EP96 / 03134 Sec。 371日期1998年3月13日 102(e)1998年3月13日PCT PCT 1996年7月17日PCT公布。 出版物WO97 / 05758 日期1997年2月13日通过使用组合除尘和直接金属化工艺(多层)的具有导电聚合物的聚合物基底制造贯通印刷电路板或多层印刷电路板的方法是通过使聚合物基体材料 孔,以下处理步骤:1)本身已知的处理液体膨胀并用水冲洗; 2)用碱性高锰酸盐溶液处理(去污); 3)用水冲洗; 4)用酸性水溶液冲洗(pH值约1,漂洗时间10〜120秒,取决于酸含量); 5)用水冲洗; 6)用碱性水溶液(pH8〜9.5)冲洗; 7)用水冲洗; 8)用乙烯-3,4-二氧噻吩(催化剂)的微乳液冲洗; 9)用酸冲洗(固定); 10)用水冲洗; 11)铜; 12)用水冲洗; 和13)干燥; 14)用于创建印刷电路图案的通常处理步骤。