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81. 发明申请

US20140202499A1 SUBSTRATE PROCESSING METHOD 审中-公开
标题翻译：基板处理方法
公开(公告)号：US20140202499A1
公开(公告)日：2014-07-24
申请号：US14223391
申请日：2014-03-24
申请人： DAINIPPON SCREEN MFG. CO., LTD.
发明人： Ichiro MITSUYOSHI , Jun SHIBUKAWA , Shinji KIYOKAWA , Tomohiro KUREBAYASHI
IPC分类号： B08B3/04
CPC分类号： B08B3/04 , H01L21/67201 , H01L21/67742 , H01L21/67754 , H01L21/67766 , H01L21/67781
摘要： A substrate processing apparatus has an indexer block and a processing block. One side of the processing block has a vertical stack of a plurality of top surface cleaning units and the other side of the processing block has a vertical stack of a plurality of back surface cleaning units. Reversing units for reversing the substrate W are provided one above the other between the indexer block and the processing block. For example, one reversing unit is used for reversing the substrate before a back surface cleaning processing by the back surface cleaning unit or for other purposes, and the other reversing unit is used for placing the substrate W after a top surface cleaning processing by the top surface cleaning unit or for other purposes.
摘要翻译：基板处理装置具有分度器块和处理块。处理块的一侧具有多个顶表面清洁单元的垂直堆叠，并且处理块的另一侧具有多个后表面清洁单元的垂直堆叠。用于反转衬底W的反转单元在分度器块和处理块之间一个一个地设置。例如，在由背面清洁单元进行后表面清洁处理之前或为了其他目的而使用一个反转单元来反转基板，并且另一个反转单元用于在通过顶部进行顶部表面清洁处理之后将基板W放置表面清洁单元或其他用途。

82. 发明授权

US08764370B2 Scalable stockers with automatic handling buffer 有权
标题翻译：具有自动处理缓冲区的可扩展存储器
公开(公告)号：US08764370B2
公开(公告)日：2014-07-01
申请号：US13284963
申请日：2011-10-30
申请人： Lutz Rebstock
发明人： Lutz Rebstock
IPC分类号： B65G1/00
CPC分类号： H01L21/67769 , B65G37/02 , B65G2201/0297 , H01L21/67276 , H01L21/67766 , Y10S414/14
摘要： Scalable storage can be achieved with linear array storage of wafers, comprising two linear arrays of storage compartments on opposite walls, with a middle transfer mechanism. Together with a buffer station for automatic material handling system, a scalable bare wafer stocker can provide flexible and uninterrupted services to a fabrication facility.
摘要翻译：可以通过线性阵列存储晶片来实现可扩展的存储，其包括在相对的壁上的两个线性阵列的存储隔间和中间转移机构。与自动材料处理系统的缓冲站一起，可扩展的裸晶片储存器可以为制造设备提供灵活且不间断的服务。

83. 发明授权

US08746631B2 Article carrier robot 有权
标题翻译：文章载体机器人
公开(公告)号：US08746631B2
公开(公告)日：2014-06-10
申请号：US12990731
申请日：2009-04-27
申请人： Yasuhiko Hashimoto , Toshiaki Yoshida , Tetsuya Yoshida
发明人： Yasuhiko Hashimoto , Toshiaki Yoshida , Tetsuya Yoshida
IPC分类号： H02G11/00
CPC分类号： B25J19/0025 , H01L21/67766 , H02G11/00
摘要： An article carrier robot includes: a horizontal base; a horizontally movable unit supported by the horizontal base so as to be movable in a horizontal direction; a robot main body supported by the horizontally movable unit; at least one of wiring and piping introduced into the robot main body from the horizontal base; and a restriction unit supported by the horizontally movable unit so as to be swayable about a pivot provided to the horizontally movable unit. The restriction unit is configured to restrict deformation of a part of the at least one of wiring and piping.
摘要翻译：物品载体机器人包括：水平底座; 水平移动单元，其由水平基座支撑，以便能够在水平方向上移动; 由水平移动单元支撑的机器人主体; 从水平底座引入机器人主体的布线和管道中的至少一个; 以及由水平移动单元支撑的限制单元，以便围绕设置在水平移动单元的枢轴摆动。限制单元被配置为限制布线和管道中的至少一个的一部分的变形。

84. 发明申请

US20140107825A1 METHOD FOR POSITIONING A TRANSFER UNIT, METHOD FOR CALCULATING POSITIONAL DEVIATION AMOUNT OF AN OBJECT TO BE PROCESSED, AND METHOD FOR CORRECTING TEACHING DATA OF THE TRANSFER UNIT 有权
标题翻译：用于定位传送单元的方法，用于计算要处理的对象的位置偏移量的方法，以及用于校正传送单元的教学数据的方法
公开(公告)号：US20140107825A1
公开(公告)日：2014-04-17
申请号：US14043725
申请日：2013-10-01
申请人： TOKYO ELECTRON LIMITED
发明人： Masato KUBODERA , Hirohito KIKUSHIMA , Hirofumi YAMAGUCHI , Yoshiaki SASAKI , Meng yiau YU
IPC分类号： G05B19/418
CPC分类号： G05B19/4189 , G05B2219/37608 , H01L21/67259 , H01L21/67748 , H01L21/67766 , H01L21/681
摘要： In a method for positioning a transfer unit including, support pins for supporting object, and a pick having at a leading end thereof a detection unit for detecting presence or absence of the object, a height reference position of the pick is determined by detecting an upper edge of one of the support pins by the detection unit. A forward moving angle of the pick is corrected by obtaining a deviation angle between a radial direction of the mounting table passing through the corresponding support pin and a forward moving direction of the pick. A forward movement starting point of the pick is corrected by obtaining a horizontal deviation distance between the radial direction of the mounting table and the forward moving direction of the pick. A forward moving reference amount of the pick is obtained from coordinates of the corresponding support pin.
摘要翻译：在用于定位包括用于支撑物体的支撑销的转移单元的方法中，以及在其前端具有用于检测物体的存在或不存在的检测单元的拾取器，通过检测拾取器的高度参考位置来确定拾取器的高度参考位置检测单元之一的支撑销的边缘。通过获得通过相应的支撑销的安装台的径向与拾取的向前移动方向之间的偏离角度来校正拾取器的向前移动角度。通过获得安装台的径向与拾取的向前移动方向之间的水平偏离距离来校正拾取的向前移动起始点。从对应的支撑销的坐标获得拾取的向前移动参考量。

85. 发明授权

US08698104B2 System and method for handling multiple workpieces for matrix configuration processing 失效
标题翻译：用于处理多个工件以进行矩阵配置处理的系统和方法
公开(公告)号：US08698104B2
公开(公告)日：2014-04-15
申请号：US12941656
申请日：2010-11-08
申请人： William T. Weaver , Jaime A. Carrera , Robert B. Vopat , Aaron Webb , Charles T. Carlson
发明人： William T. Weaver , Jaime A. Carrera , Robert B. Vopat , Aaron Webb , Charles T. Carlson
IPC分类号： G01J1/00
CPC分类号： H01L21/67739 , G21K5/10 , H01L21/67742 , H01L21/67766 , H01L21/68707
摘要： A system for loading workpieces into a process chamber for processing in a matrix configuration includes a conveyor configured to transport multiple workpieces in a linear fashion. A workpiece hotel is configured to receive the multiple workpieces from the conveyor. The workpiece hotel comprises a matrix of cells arranged in N columns and M floors. A pick blade is configured to insert into the hotel and retract from the hotel in order to unload a plurality of substrates from a first floor into a single row of the pick blade, and to repeat the unloading operation to form a matrix comprising a plurality of rows of substrates disposed on the pick blade. In one example, the workpiece hotel has a staggered configuration that provides individual accessibility of each hotel cell.
摘要翻译：用于将工件加载到用于以矩阵构造处理的处理室中的系统包括被构造成以线性方式输送多个工件的传送器。工件酒店被配置为从输送机接收多个工件。工件酒店包括排列在N列和M层的单元矩阵。拾取刀片被配置成插入酒店并从酒店退回，以便将多个基板从第一层卸载到单行拾取刀片中，并且重复卸载操作以形成矩阵，其包括多个设置在拾取刀片上的一排衬底。在一个例子中，工件酒店具有交错的配置，可以提供每个酒店单元的个人可访问性。

86. 发明授权

US08696816B2 Semiconductor manufacturing apparatus 有权
标题翻译：半导体制造装置
公开(公告)号：US08696816B2
公开(公告)日：2014-04-15
申请号：US11571971
申请日：2005-01-11
申请人： Norifumi Tokuda , Yuuko Okada
发明人： Norifumi Tokuda , Yuuko Okada
IPC分类号： C23C16/00 , B25B11/00
CPC分类号： H01L21/6875 , H01L21/67028 , H01L21/67173 , H01L21/67757 , H01L21/67766 , H01L21/67769 , H01L21/67772 , H01L21/67775 , H01L21/67778 , H01L21/67781 , H01L21/68757
摘要： The present invention relates to a semiconductor manufacturing apparatus, and an object of the invention is to prevent breakage and deformation of semiconductor substrates without deteriorating operability in processing.In order to achieve the object, a semiconductor manufacturing apparatus has a stage (100) on which a semiconductor substrate (30) is placed, and the stage (100) has a first metal portion (10) that is made of metal and that comes in contact with the semiconductor substrate (30) placed thereon, and an electroconductive elastic-body portion (20) that is made of an electroconductive elastic body and that comes in contact with the semiconductor substrate (30) placed thereon. A contaminant (40) is embedded in the electroconductive elastic-body portion (20).
摘要翻译：半导体制造装置技术领域本发明涉及一种半导体制造装置，其目的在于防止半导体基板的破坏和变形，而不会降低加工的可操作性。为了实现该目的，半导体制造装置具有放置半导体基板（30）的载物台（100），载台（100）具有由金属制成的第一金属部（10），并且来自与其上放置的半导体衬底（30）接触的导电弹性体部分（20）和由导电弹性体制成并与其上放置的半导体衬底（30）接触的导电弹性体部分（20）。污染物（40）嵌入在导电弹性体部分（20）中。

87. 发明申请

US20140093337A1 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD FOR PERFORMING CLEANING PROCESS AND THE LIKE ON SUBSTRATE 有权
标题翻译：用于执行清洁过程的基板处理设备和基板处理方法和基板上的类似
公开(公告)号：US20140093337A1
公开(公告)日：2014-04-03
申请号：US14019595
申请日：2013-09-06
申请人： DAINIPPON SCREEN MFG CO., LTD.
发明人： Motoyasu HAYASHI , Jun SHIBUKAWA , Mitsukazu TAKAHASHI
IPC分类号： B65G49/00
CPC分类号： B65G49/00 , H01L21/67201 , H01L21/67742 , H01L21/67766 , H01L21/67781 , H01L21/68707
摘要： For the transport of a substrate from a cassette to a back surface cleaning processing unit in a cleaning processing block, a transfer robot rotates the substrate through 90 degrees from a horizontal attitude in which the front surface of the substrate is positioned to face upward into a standing attitude while transporting the substrate out of a cassette to a substrate passing part, and passes the substrate in the standing attitude to the substrate passing part. The substrate passing part holds the substrate in the standing attitude. A main transport robot receives the substrate held in the standing attitude. The main transport robot rotates the substrate through 90 degrees from the standing attitude into a horizontal attitude in which the back surface of the substrate is positioned to face upward while transporting the substrate from the substrate passing part to the back surface cleaning processing unit.
摘要翻译：为了将基板从盒子传送到清洁处理块中的背面清洁处理单元，传送机器人将基板从其中基板的前表面定位的水平姿态向上旋转90度，使其成为同时将基板从盒子输送到基板通过部分，并将基板以站立姿态通过到基板通过部分。基板通过部将基板保持在站立姿态。主运输机器人接收以站立姿态保持的基板。主运输机器人将基板从立式姿态旋转90度，使基板的背面朝向上方的水平姿态旋转，同时将基板从基板通过部分输送到后表面清洁处理单元。

88. 发明授权

US08672602B2 Vertical thermal processing apparatus 有权
标题翻译：立式热处理设备
公开(公告)号：US08672602B2
公开(公告)日：2014-03-18
申请号：US12549455
申请日：2009-08-28
申请人： Satoshi Asari , Kiichi Takahashi , Toshihiro Abe
发明人： Satoshi Asari , Kiichi Takahashi , Toshihiro Abe
IPC分类号： B66F19/00
CPC分类号： H01L21/68707 , H01L21/67109 , H01L21/67766
摘要： The present invention is a processing apparatus comprising a transfer mechanism including at least one transfer plate, the transfer mechanism being configured to cause, when a substrate to be processed is placed on an upper surface of the transfer plate, the transfer plate to move while maintaining the substrate to be processed placed horizontally thereon. The transfer plate has a cantilevered support structure horizontally extending from a proximal end thereof to a distal end thereof in a fore and aft direction. An upper surface of the transfer plate is provided with a plurality of support projections configured to horizontally support the substrate to be processed at a substantially central position thereof and a rear position thereof in the fore and aft direction. The substrate to be processed is not supported on the distal portion of the transfer plate.
摘要翻译：本发明是一种包括至少一个转印板的转印机构的处理装置，所述转印机构被配置为当待处理的基板被放置在所述转印板的上表面上时，所述转印板在保持待处理的基板水平放置在其上。转印板具有悬臂支撑结构，其从前端和远端的近端水平延伸到其远端。转印板的上表面设置有多个支撑突起，其被构造成水平地支撑待处理的基板在其基本中心位置和其前后方向上的后部位置。待处理的基板不支撑在转印板的远端部分上。

89. 发明授权

US08668422B2 Low cost high throughput processing platform 有权
标题翻译：低成本高吞吐量处理平台
公开(公告)号：US08668422B2
公开(公告)日：2014-03-11
申请号：US10919582
申请日：2004-08-17
申请人： Leszek Niewmierzycki , David Barker , Daniel J. Devine , Michael Kuhlman , Ryan Pakulski , Hongqing Shan , Martin Zucker
发明人： Leszek Niewmierzycki , David Barker , Daniel J. Devine , Michael Kuhlman , Ryan Pakulski , Hongqing Shan , Martin Zucker
IPC分类号： H01L21/677
CPC分类号： B65G15/12 , H01L21/67742 , H01L21/67766 , H01L21/68707 , Y10S414/135 , Y10S414/139
摘要： As part of a system for processing workpieces, a workpiece support arrangement, separate from a process chamber arrangement supports at least two workpieces at least generally in a stacked relationship to form a workpiece column. A transfer arrangement transports at least two of the workpieces between the workpiece column and the process chamber arrangement by simultaneously moving the two workpieces at least generally along first and second transfer paths, respectively, that are defined between the workpiece column and the first and second process stations. The transfer arrangement can simultaneously move untreated and treated workpieces. Vertical motion swing arms and coaxial swing arms are described. A pair of spaced apart swing arms, the workpiece column and the processing stations can cooperatively define a pentagonal shape. Timing belt backlash elimination, a dual degree of freedom slot valve and low point chamber pumping, for removing chamber contaminants, are also described.
摘要翻译：作为用于处理工件的系统的一部分，与处理室装置分离的工件支撑装置至少大体上以堆叠关系支撑至少两个工件以形成工件柱。传送装置通过同时移动两个工件至少大致沿着分别在工件柱和第一和第二过程之间的第一和第二传送路径移动工件柱和处理室装置之间的至少两个工件车站。传送装置可以同时移动未经处理和处理的工件。描述了垂直运动摆臂和同轴摆臂。一对间隔开的摆臂，工件列和加工台可以协调地限定五边形形状。还描述了同步带齿隙消除，双自由度槽阀和低点室泵送，用于去除室污染物。

90. 发明申请

US20140036403A1 SUBSTRATE HOLDER, SUBSTRATE HOLDER UNIT, SUBSTRATE TRANSPORT APPARATUS, AND SUBSTRATE BONDING APPARATUS 审中-公开
标题翻译：基板支架，基板支架单元，基板运输装置和基板接合装置
公开(公告)号：US20140036403A1
公开(公告)日：2014-02-06
申请号：US14050697
申请日：2013-10-10
申请人： Masahiro Yoshihashi , Hidehiro Maeda
发明人： Hidehiro Maeda , Masahiro Yoshihashi
IPC分类号： H01L21/683
CPC分类号： H01L21/6831 , H01L21/67742 , H01L21/67766 , H01L21/68771
摘要： A substrate holder is reliably transported in a state of holding a substrate. There is provided a substrate holder for holding a substrate by means of electrostatic force generated by power supplied from an external source. The substrate holder is to be transported in a state of holding the substrate. The substrate holder includes a holder body that is to have the substrate placed thereon, and a connector terminal that is externally exposed through the holder body, where the connector terminal is attachable to and detachable from an external power supply terminal. There is also provided a substrate transport apparatus for transporting a substrate holder holding a substrate by means of electrostatic force generated by power supplied from an external source. The substrate transport apparatus includes a placement section that has a placement surface on which the substrate holder is placed, where the placement section holds the substrate holder, and a power supply terminal that supplies power to the substrate holder placed on the placement surface.
摘要翻译：在保持基板的状态下，可靠地输送基板保持架。提供了一种用于通过由外部源提供的电力产生的静电力来保持基板的基板保持器。在保持基板的状态下输送基板支架。衬底保持器包括：具有放置在其上的衬底的保持器主体和通过保持器主体外部暴露的连接器端子，其中连接器端子可附接到外部电源端子并可从其拆卸。还提供了一种用于通过由从外部源供给的电力产生的静电力来运送保持基板的基板保持架的基板输送装置。基板输送装置包括：放置部，其具有放置基板保持件的放置面，放置部保持基板保持件;电源端子，其向放置面放置的基板保持器供电。

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