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    • 81. 发明申请
    • Nitride-based semiconductor light emitting diode
    • 氮化物半导体发光二极管
    • US20070228388A1
    • 2007-10-04
    • US11651023
    • 2007-01-09
    • Kun Yon KoBang Won OhHun Joo HahmJe Won KimHyung Jin ParkSeok Min HwangDong Woo Kim
    • Kun Yon KoBang Won OhHun Joo HahmJe Won KimHyung Jin ParkSeok Min HwangDong Woo Kim
    • H01L33/00
    • H01L33/38H01L33/20H01L33/32
    • A nitride-based semiconductor LED comprises a substrate; an n-type nitride semiconductor layer formed on the substrate; an active layer formed on a predetermined region of the n-type nitride semiconductor layer; a p-type nitride semiconductor layer formed on the active layer; a transparent electrode formed on the p-type nitride semiconductor layer; a p-type electrode pad formed on the transparent electrode; a pair of p-type connection electrodes formed in a line extending from the p-type electrode pad so as to have an inclination angle of less than 90 degrees with respect to one side of the transparent electrode adjacent to the p-type electrode pad; a pair of p-electrodes extending from both ends of the p-type connection electrodes in the direction of the n-type electrode pad, the p-electrode being formed in parallel to one side of the adjacent transparent electrode; and an n-type electrode pad formed on the n-type nitride semiconductor layer, on which the active layer is not formed, such that the n-type electrode pad faces the p-type electrode pad.
    • 氮化物系半导体LED包括基板; 在该基板上形成的n型氮化物半导体层; 形成在所述n型氮化物半导体层的预定区域上的有源层; 形成在有源层上的p型氮化物半导体层; 形成在p型氮化物半导体层上的透明电极; 形成在透明电极上的p型电极焊盘; 一对p型连接电极,形成在从p型电极焊盘延伸的线中,以相对于与p型电极焊盘相邻的透明电极的一侧具有小于90度的倾斜角; 一对p电极,其从p型连接电极的两端沿着n型电极焊盘的方向延伸,p电极与相邻的透明电极的一侧平行地形成; 以及n型电极焊盘,形成在n型氮化物半导体层上,其上没有形成有源层,使得n型电极焊盘面向p型电极焊盘。
    • 83. 发明授权
    • Method for manufacturing vertical GaN light emitting diodes
    • 制造垂直GaN发光二极管的方法
    • US06818531B1
    • 2004-11-16
    • US10611898
    • 2003-07-03
    • Seung Jin YooIn Eung KimHun Joo HahmYoung Ho ParkJeong Seok Na
    • Seung Jin YooIn Eung KimHun Joo HahmYoung Ho ParkJeong Seok Na
    • H01L2130
    • H01L33/0079Y10S438/977
    • A method for manufacturing vertical GaN light emitting diodes starts by forming a light emitting structure on a sapphire substrate, said light emitting structure including a first conductive GaN clad layer, an active layer and a second conductive GaN clad layer. The light emitting structure is divided into plural units so that the first conductive GaN clad layer of a thickness of at least approximately 100 Å remains. A conductive substrate is attached to the divided upper surface of the light emitting structures using a conductive adhesive layer. A lower surface of the sapphire substrate is irradiated by laser beam so that the sapphire substrate is removed from the unit light emitting structures. First and second contacts are formed respectively on the surfaces of the first conductive clad layer and the conductive substrate. Finally, the resulting structure is cut into plural unit light emitting diodes.
    • 通过在蓝宝石衬底上形成发光结构,开始制造垂直GaN发光二极管的方法,所述发光结构包括第一导电GaN覆层,有源层和第二导电GaN覆层。 发光结构被分成多个单元,从而保留至少约100埃的厚度的第一导电GaN覆层。 使用导电性粘合剂层将导电性基板附着到发光结构的分割的上表面。 由激光束照射蓝宝石衬底的下表面,从而将蓝宝石衬底从单位发光结构中去除。 分别在第一导电覆盖层和导电基板的表面上形成第一和第二触点。 最后,将所得到的结构切成多个单位发光二极管。
    • 85. 发明授权
    • High power flip chip LED
    • 大功率倒装芯片LED
    • US07015512B2
    • 2006-03-21
    • US10852437
    • 2004-05-25
    • Young Ho ParkHun Joo HahmSeung Jin Yoo
    • Young Ho ParkHun Joo HahmSeung Jin Yoo
    • H01L33/00
    • H01L27/156H01L33/08
    • A high power flip chip LED has an n-doped semiconductor layer formed on the sapphire substrate, with a plurality of first regions and a second region of intersecting lines for separating the first regions from each other. P-doped semiconductor layers are on the first regions of the n-doped semiconductor layer to form mesa structures. At least one pair of diagonal corners of the respective mesa structures are rounded inward to form first basins between adjacent inward-rounded corners. First metal layers are on the mesa structures in a same configuration. A second metal layer is on the second region of the n-doped semiconductor layer. First ohmic contacts are on the first metal layers. Second ohmic contacts are on the second metal layer in the first basins. The LED can prevent the current channeling to increase the luminous area while equalizing the current density area thereby generating high brightness light.
    • 高功率倒装芯片LED具有形成在蓝宝石衬底上的n掺杂半导体层,具有多个第一区域和用于将第一区域彼此分离的相交线的第二区域。 P掺杂半导体层在n掺杂半导体层的第一区上,以形成台面结构。 相应台面结构的至少一对对角线向内倒圆,以在相邻的内圆角之间形成第一盆。 第一金属层在相同构型的台面结构上。 第二金属层位于n掺杂半导体层的第二区上。 第一个欧姆接触位于第一个金属层上。 第二个欧姆接触位于第一个盆地的第二个金属层上。 LED可以防止电流通道增加发光面积,同时均衡电流密度区域,从而产生高亮度光。
    • 89. 发明授权
    • Bipolar transistor and method for manufacturing the same
    • 双极晶体管及其制造方法
    • US06703687B2
    • 2004-03-09
    • US10141113
    • 2002-05-09
    • Hun Joo Hahm
    • Hun Joo Hahm
    • H01L27082
    • H01L29/735H01L29/732
    • A bipolar transistor and a method for manufacturing the bipolar transistor are provided. The bipolar transistor includes a collector region including a semiconductor substrate doped with a first conductive dopant, an intrinsic base region low-density doped with a second conductive dopant on the semiconductor substrate, the second conductive dopant being contrary to the first conductive dopant, an extrinsic base region high-density doped with the second conductive dopant on a first portion of the upper surface of the intrinsic base region and formed in a single well with at least two branched lower terminals, an emitter region doped with the first conductive dopant on a second portion of the upper surface of the intrinsic base region, the second portion spaced from the first portion by a designated interval, a collector electrode formed on the lower surface of the semiconductor substrate, an emitter electrode formed on the upper surface of the emitter region, and a base electrode formed on the upper surface of the extrinsic base region.
    • 提供了双极晶体管和制造双极晶体管的方法。 所述双极晶体管包括集电极区域,所述集电极区域包括掺杂有第一导电掺杂剂的半导体衬底,在所述半导体衬底上掺杂有第二导电掺杂剂的低密度本征基极区域,所述第二导电掺杂物与所述第一导电掺杂剂相反, 在所述本征基极区的上表面的第一部分上掺杂有所述第二导电掺杂剂的基底区域,并且形成在具有至少两个分支的下部末端的单个阱中,在第二导电掺杂剂上掺杂有所述第一导电掺杂剂的发射极区域 本征基区的上表面的一部分,第二部分与第一部分隔开指定的间隔,形成在半导体衬底的下表面上的集电极,形成在发射极区的上表面上的发射电极, 以及形成在外部基极区域的上表面上的基极。