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81. 发明授权

US07456963B2 Method and equipment for detecting pattern defect 失效
标题翻译：检测图案缺陷的方法和设备
公开(公告)号：US07456963B2
公开(公告)日：2008-11-25
申请号：US11593091
申请日：2006-11-06
申请人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
发明人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
IPC分类号： G01J4/00
CPC分类号： G01N21/9501 , G01J3/0218 , G01J3/0224 , G01J3/10 , G01N21/8851 , G01N21/956 , G01N21/95607 , G01N2021/479 , G01N2021/95676 , G01N2201/06113 , G02B5/09 , G02B21/365 , G02B26/12
摘要： An Inspection apparatus and method includes utilizing an emitter which emits a light beam, an illumination optical system, a detection optical system, and a processor. The illumination optical system includes a polarization controller, a coherence reducer, and an objective lens, for illuminating a specimen with a polarization condition controlled and coherency reduced light beam through the objective lens. The detection optical system includes an imaging lens and a sensor for detecting an image of the specimen illuminated by the light beam through the illumination optical system. The processor processes a signal outputted from the sensor and detects a defect on the specimen.
摘要翻译：检查装置和方法包括利用发射光束的发射器，照明光学系统，检测光学系统和处理器。照明光学系统包括偏振控制器，相干减少器和物镜，用于照射具有偏振状态的样本并通过物镜降低光束的相干性。检测光学系统包括成像透镜和用于检测由通过照明光学系统的光束照射的样本的图像的传感器。处理器处理从传感器输出的信号并检测样本上的缺陷。

82. 发明申请

US20080223117A1 Scanning probe microscope and sample observation method using the same and device manufacturing method 有权
标题翻译：扫描探针显微镜和样品观察方法采用相同的器件制造方法
公开(公告)号：US20080223117A1
公开(公告)日：2008-09-18
申请号：US11411022
申请日：2006-04-26
申请人： Masahiro Watanabe , Toshihiko Nakata , Shuichi Baba
发明人： Masahiro Watanabe , Toshihiko Nakata , Shuichi Baba
IPC分类号： G01B5/28
CPC分类号： G01Q60/34
摘要： The present invention provides a method of using an accurate three-dimensional shape without damaging a sample by making a probe contact the sample only at a measuring point, lifting and retracting the probe when moving to the next measuring point and making the probe approach the sample after moving to the next measuring point, wherein high frequency/minute amplitude cantilever excitation and vibration detection are performed and further horizontal direction excitation or vertical/horizontal double direction excitation are performed to improve the sensitivity of contacting force detection on a slope of steep inclination. The method uses unit for inclining the probe in accordance with the inclination of a measurement target and a structure capable of absorbing or adjusting the orientation of the light detecting the condition of contact between the probe and sample after reflection on the cantilever, which varies a great deal depending on the inclination of the probe.
摘要翻译：本发明提供了一种使用准确的三维形状而不损害样品的方法，该方法是使探针仅在测量点接触样品，当移动到下一个测量点时提升和缩回探针并使探针接近样品在移动到下一个测量点之后，执行高频/分钟幅度的悬臂激励和振动检测，并且执行进一步的水平方向激励或垂直/水平双向激励，以提高在陡倾斜度上的接触力检测的灵敏度。该方法使用用于根据测量对象的倾斜度和能够吸收或调节探测器和样品之间的接触条件的光的方向来倾斜测量头的单元，其反射在悬臂上，其变化很大取决于探头的倾斜度。

83. 发明授权

US07417721B2 Defect detector and defect detecting method 有权
标题翻译：缺陷检测器和缺陷检测方法
公开(公告)号：US07417721B2
公开(公告)日：2008-08-26
申请号：US10536715
申请日：2003-11-27
申请人： Sachio Uto , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Akira Hamamatsu , Takahiro Jingu , Toshihiko Nakata , Masahiro Watanabe
发明人： Sachio Uto , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Akira Hamamatsu , Takahiro Jingu , Toshihiko Nakata , Masahiro Watanabe
IPC分类号： G01N21/00
CPC分类号： G01N21/00 , G01N21/9501 , G06T7/0004 , G06T2207/30148
摘要： A defects inspecting apparatus having: a scanning stage for running into a predetermined direction while mounting an inspection target substrate thereon; an illumination optic system for irradiating an illumination light beam upon a surface of the inspection target substrate at a predetermined angle inclined thereto; a detection optic system including, an upper-directed photo-detector for receiving upper-directed reflected/scattered lights emitting upwards from the inspection target substrate, thereby converting them into an upper-directed image signal, and a side-directed photo-detector for receiving side-directed reflected/scattered lights emitting for the inspection target substrate into an inclined direction, so as to flatly intersects the illumination light beam, and thereby converting into a side-directed image signal; and a signal processing system-for detecting defects upon basis of the upper-directed image signal and the side-directed image signal.
摘要翻译：一种缺陷检查装置，具有：在其上安装检查对象基板的同时沿预定方向行进的扫描台; 照明光学系统，用于以与其倾斜的预定角度将照明光束照射在检查对象基板的表面上; 检测光学系统，包括：用于接收从检查对象基板向上发射的上方反射/散射光的上位光检测器，从而将其转换为高定向图像信号;以及侧向光检测器，将检测对象基板发射的侧向反射/散射光倾斜到倾斜方向，以与照明光束平坦地相交，从而转换为侧向图像信号; 以及信号处理系统 - 用于基于上限图像信号和侧向图像信号来检测缺陷。

84. 发明申请

US20080121894A1 METHOD OF MANUFACTURING DISPLAY DEVICE 有权
标题翻译：制造显示装置的方法
公开(公告)号：US20080121894A1
公开(公告)日：2008-05-29
申请号：US12021714
申请日：2008-01-29
申请人： Mikio HONGO , Sachio Uto , Mineo Nomoto , Toshihiko Nakata , Mutsuko Hatano , Shinya Yamaguchi , Makoto Ohkura
发明人： Mikio HONGO , Sachio Uto , Mineo Nomoto , Toshihiko Nakata , Mutsuko Hatano , Shinya Yamaguchi , Makoto Ohkura
IPC分类号： H01L33/00
CPC分类号： H01L29/04 , B23K26/0622 , B23K26/064 , B23K26/0648 , B23K26/066 , B23K26/0665 , B23K26/0732 , H01L21/02422 , H01L21/02532 , H01L21/02678 , H01L21/02683 , H01L21/268 , H01L27/1285 , H01L27/1296 , H01L29/66757 , H01L29/78675
摘要： A TFT device having a pixel portion and a driving circuit portion formed on a glass substrate; wherein at least the active layer (active region) of a transistor constituting said driving circuit comprises polycrystalline silicon including crystals that do not have crystal grain boundaries which cross the direction of current flow.
摘要翻译：一种具有形成在玻璃基板上的像素部分和驱动电路部分的TFT器件; 其中构成所述驱动电路的晶体管的至少有源层（有源区）包括多晶硅，其包括不具有与电流方向交叉的晶界的晶体。

85. 发明授权

US07305015B2 Ultraviolet laser-generating device and defect inspection apparatus and method therefor 有权
标题翻译：紫外线激光发生装置及缺陷检查装置及其方法
公开(公告)号：US07305015B2
公开(公告)日：2007-12-04
申请号：US10888980
申请日：2004-07-13
申请人： Sachio Uto , Minoru Yoshida , Toshihiko Nakata , Shunji Maeda
发明人： Sachio Uto , Minoru Yoshida , Toshihiko Nakata , Shunji Maeda
IPC分类号： H01S3/10
CPC分类号： G01N21/956 , G01N21/33 , G02F2001/3505 , G02F2001/3542 , H01S3/0092
摘要： An ultraviolet laser-generating device, for use in a defect inspection apparatus and a method thereof, etc., comprising: a laser ray source for irradiating and emitting a basic wave of laser ray therefrom; a wavelength converter device for receiving the basic wave of laser ray emitted from the laser ray source and for converting it into an ultraviolet laser ray composed of a multiplied high harmonic light of the basic wave of laser ray; and a container having an inlet window, upon which the basic wave of laser ray emitted from the laser ray source is incident upon, and an outlet window for emitting the ultraviolet laser ray composed of the multiplied high harmonic light of the basic wave of laser ray, and installing the wavelength converter device therein, wherein the container is hermetically sealed and is filled up with an inert gas, such as nitrogen or argon gas, therein.
摘要翻译：一种用于缺陷检查装置及其方法的紫外线激光发生装置，包括：用于从其照射和发射激光光线的基本波的激光束源; 波长转换器装置，用于接收从激光射线源发射的激光的基波，并将其转换为由激光的基波的相乘的高次谐波构成的紫外激光; 以及具有入射窗的容器，从激光射线源发射的激光的基波入射到该入口窗口，以及用于发射由激光的基波的倍增的高次谐波构成的紫外线激光的出射窗并且在其中安装波长转换器装置，其中容器被气密密封，并在其中填充有惰性气体，例如氮气或氩气。

86. 发明申请

US20060219900A1 Scanning probe microscope and specimen observation method and semiconductor device manufacturing method using said scanning probe microscope 有权
标题翻译：扫描探针显微镜和样本观察方法以及使用所述扫描探针显微镜的半导体器件制造方法
公开(公告)号：US20060219900A1
公开(公告)日：2006-10-05
申请号：US11439618
申请日：2006-05-23
申请人： Masahiro Watanabe , Toshihiko Nakata
发明人： Masahiro Watanabe , Toshihiko Nakata
IPC分类号： G01N23/00 , G21K7/00
CPC分类号： G01Q10/06 , G01Q10/02 , G01Q20/02 , G01Q60/32 , Y10S977/852
摘要： In order to provide a scanning probe microscope capable of measuring with high throughput distribution information relating to local characteristics of a sample concurrently with accurate three-dimensional shape information of the sample without damaging the sample, the speed of approach to each measurement location is increased by controlling the approach of the sample and probe by the provision of a high-sensitivity proximity sensor of the optical type. Also, additional information relating to the distribution of material quality on the sample can be obtained without lowering the scanning speed by: applying a voltage to the probe, or measuring the response on vibrating the probe, or detecting the local optical intensity of the sample surface concurrently with obtaining sample height data and concurrently with the contact period with the sample, whilst ensuring that the probe is not dragged over the sample, by bringing the probe into contact with the sample intermittently.
摘要翻译：为了提供一种扫描探针显微镜，能够与样品的局部特性相关的高通量分布信息同时测量而不损害样品的准确的三维形状信息，因此，每个测量位置的接近速度通过通过提供光学类型的高灵敏度接近传感器来控制样品和探针的接近。此外，通过以下方式可以获得关于样品的材料质量分布的附加信息，而不降低扫描速度：向探针施加电压，或测量振动探针时的响应，或检测样品表面的局部光强度同时获得样品高度数据，同时与样品的接触期，同时确保探针未被拖动到样品上，通过使探针间断地与样品接触。

87. 发明授权

US06943086B2 Laser annealing apparatus, TFT device and annealing method of the same 有权
标题翻译：激光退火装置，TFT器件及退火方法相同
公开(公告)号：US06943086B2
公开(公告)日：2005-09-13
申请号：US10267680
申请日：2002-10-10
申请人： Mikio Hongo , Sachio Uto , Mineo Nomoto , Toshihiko Nakata , Mutsuko Hatano , Shinya Yamaguchi , Makoto Ohkura
发明人： Mikio Hongo , Sachio Uto , Mineo Nomoto , Toshihiko Nakata , Mutsuko Hatano , Shinya Yamaguchi , Makoto Ohkura
IPC分类号： G02F1/1368 , B23K26/06 , B23K26/073 , G09F9/30 , H01L21/20 , H01L21/26 , H01L21/268 , H01L21/324 , H01L21/336 , H01L21/77 , H01L21/84 , H01L27/12 , H01L29/04 , H01L29/786 , H01S3/00 , B66C21/00
CPC分类号： H01L29/04 , B23K26/0622 , B23K26/064 , B23K26/0648 , B23K26/066 , B23K26/0665 , B23K26/0732 , H01L21/02422 , H01L21/02532 , H01L21/02678 , H01L21/02683 , H01L21/268 , H01L27/1285 , H01L27/1296 , H01L29/66757 , H01L29/78675
摘要： A laser beam is concentrated using an objective lens and radiated on a amorphous silicon film or polycrystalline silicon film having a grain size of one micron or less, the laser beam being processed from a continuous wave laser beam (1) to be pulsed using an EO modulator and to have arbitrary temporal energy change while pulsing ; (2) to have an arbitrary spatial energy distribution using a beam-homogenizer, filter having an arbitrary transmittance distribution, and rectangular slit; and (3) to eliminate coherency thereof using a high-speed rotating diffuser. In this manner, it is possible to realize a liquid crystal display device in which a driving circuit comprising a polycrystalline silicon film having substantially the same properties as a single crystal is incorporated in a TFT panel device.
摘要翻译：使用物镜将激光束集中并照射在具有1微米或更小的晶粒尺寸的非晶硅膜或多晶硅膜上，激光束从连续波激光束（1）处理以使用EO脉冲并且在脉冲时具有任意的时间能量变化; （2）使用束均化器，具有任意透射率分布的滤光器和矩形狭缝具有任意的空间能量分布; 和（3）消除使用高速旋转扩散器的相干性。以这种方式，可以实现一种液晶显示装置，其中包括具有与单晶基本上相同性质的多晶硅膜的驱动电路并入TFT面板装置中。

88. 发明授权

US06877365B2 Scanning probe microscope and specimen observation method and semiconductor device manufacturing method using said scanning probe microscope 失效
标题翻译：扫描探针显微镜和样本观察方法以及使用所述扫描探针显微镜的半导体器件制造方法
公开(公告)号：US06877365B2
公开(公告)日：2005-04-12
申请号：US10340517
申请日：2003-01-09
申请人： Masahiro Watanabe , Toshihiko Nakata
发明人： Masahiro Watanabe , Toshihiko Nakata
IPC分类号： G01B21/16 , G01B21/30 , G01Q10/00 , G01Q10/02 , G01Q10/04 , G01Q10/06 , G01Q20/00 , G01Q20/02 , G01Q30/02 , G01Q30/20 , G01Q60/24 , G01Q60/32 , H01L21/66 , G01B5/28 , H01J3/14
CPC分类号： G01Q10/06 , G01Q10/02 , G01Q20/02 , G01Q60/32 , Y10S977/852
摘要： In order to provide a scanning probe microscope capable of measuring with high throughput distribution information relating to local characteristics of a sample concurrently with accurate three-dimensional shape information of the sample without damaging the sample, the speed of approach to each measurement location is increased by controlling the approach of the sample and probe by the provision of a high-sensitivity proximity sensor of the optical type. Also, additional information relating to the distribution of material quality on the sample can be obtained without lowering the scanning speed by: applying a voltage to the probe, or measuring the response on vibrating the probe, or detecting the local optical intensity of the sample surface concurrently with obtaining sample height data and concurrently with the contact period with the sample, whilst ensuring that the probe is not dragged over the sample, by bringing the probe into contact with the sample intermittently.
摘要翻译：为了提供一种扫描探针显微镜，能够与样品的局部特性相关的高通量分布信息同时测量而不损害样品的准确的三维形状信息，因此，每个测量位置的接近速度通过通过提供光学类型的高灵敏度接近传感器来控制样品和探针的接近。此外，通过以下方式可以获得关于样品的材料质量分布的附加信息，而不降低扫描速度：向探针施加电压，或测量振动探针时的响应，或检测样品表面的局部光强度同时获得样品高度数据，同时与样品的接触期，同时确保探针未被拖动到样品上，通过使探针间断地与样品接触。

89. 发明申请

US20050062961A1 Apparatus and method for inspecting pattern 失效
标题翻译：用于检查图案的装置和方法
公开(公告)号：US20050062961A1
公开(公告)日：2005-03-24
申请号：US10979169
申请日：2004-11-03
申请人： Sachio Uto , Minoru Yoshida , Toshihiko Nakata , Shunzi Maeda , Atsushi Shimoda
发明人： Sachio Uto , Minoru Yoshida , Toshihiko Nakata , Shunzi Maeda , Atsushi Shimoda
IPC分类号： G01N21/33 , G01N21/95 , G01N21/956 , H01L21/66 , G01N21/88
CPC分类号： G01N21/21 , G01N21/33 , G01N21/55 , G01N21/9501 , G01N21/956 , G01N21/95607 , G01N2021/151 , G01N2021/95615 , G01N2201/06113 , G01N2201/1035
摘要： An apparatus for inspecting defects including a table which mounts a specimen to be inspected and which is movable in a plane, an ultraviolet light source for emitting ultraviolet light, an illuminating unit for illuminating the specimen mounted on the table with light emitted from the ultraviolet light source, a detecting unit for forming an image of the specimen illuminated by the illuminating unit and for detecting the image with an image sensor, and an image processing unit for processing the image detected by the image sensor and for outputting information about defects detected on the specimen. The illuminating unit and detecting unit are disposed in a clean environment which is supplied therein with clean gas and which is separated from outside by a wall.
摘要翻译：一种用于检查缺陷的装置，包括安装待检查样本并且可在平面中移动的台面，用于发射紫外线的紫外光源的照明单元，用于对从紫外线发射的光照射安装在桌子上的样本的照明单元源，用于形成由所述照明单元照射的所述样本的图像并且用图像传感器检测图像的检测单元，以及图像处理单元，用于处理由所述图像传感器检测到的图像，并且用于输出关于在所述图像传感器上检测到的缺陷的信息; 标本。照明单元和检测单元设置在清洁的环境中，其中提供有清洁的气体并且由壁与外部分离。

90. 发明授权

US06831737B2 Apparatus and method for inspecting pattern 失效
标题翻译：用于检查图案的装置和方法
公开(公告)号：US06831737B2
公开(公告)日：2004-12-14
申请号：US10050778
申请日：2002-01-18
申请人： Sachio Uto , Minoru Yoshida , Toshihiko Nakata , Shunzi Maeda , Atsushi Shimoda
发明人： Sachio Uto , Minoru Yoshida , Toshihiko Nakata , Shunzi Maeda , Atsushi Shimoda
IPC分类号： G01N2100
CPC分类号： G01N21/21 , G01N21/33 , G01N21/55 , G01N21/9501 , G01N21/956 , G01N21/95607 , G01N2021/151 , G01N2021/95615 , G01N2201/06113 , G01N2201/1035
摘要： The present invention provides a pattern defect inspecting apparatus wherein an amount-of-light monitor unit detects a variation in the amount of ultraviolet laser light during inspection to thereby determine the presence or absence of an influence thereof exerted on the inspection and detects the prediction of the life of a light source and a malfunction thereof, and the interior of an optical system is cleaned up to thereby ensure the prolongation of the life of each optical part and long-term reliability thereof, and a method thereof.
摘要翻译：本发明提供了一种图案缺陷检查装置，其中光量监视器单元检测检查期间紫外激光量的变化，从而确定其对检查的影响的有无，并检测预测光源的寿命和故障以及光学系统的内部被清理，从而确保每个光学部件的寿命延长及其长期可靠性及其方法。

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