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81. 发明授权

US07723243B2 Multi-layered structure forming method, method of manufacturing wiring substrate, and method of manufacturing electronic apparatus 有权
标题翻译：多层结构形成方法，布线基板的制造方法以及电子设备的制造方法
公开(公告)号：US07723243B2
公开(公告)日：2010-05-25
申请号：US11707022
申请日：2007-02-16
申请人： Tsuyoshi Shintate , Toshiaki Mikoshiba , Kenji Wada , Kazuaki Sakurada , Jun Yamada
发明人： Tsuyoshi Shintate , Toshiaki Mikoshiba , Kenji Wada , Kazuaki Sakurada , Jun Yamada
IPC分类号： H01L21/31
CPC分类号： H05K3/4664 , H05K3/125 , H05K2203/013 , Y10S257/921
摘要： There is provided a multi-layered structure forming method comprising: (A) forming a first insulating material layer containing a first photo-curing material on a substrate; (B) semi-hardening the first insulating material layer by radiating light having a first wavelength to the first insulating material layer; (C) forming a conductive material layer on the semi-hardened first insulating material layer by ejecting droplets of a conductive material to the semi-hardened first insulating material layer from a nozzle of a liquid droplet ejecting apparatus; (D) forming a second insulating material layer containing a second photo-curing material so as to cover the semi-hardened first insulating material layer and the conductive material layer; and (E) forming a first insulating layer, a conductive layer positioned on the first insulating material, and a second insulating layer covering the first insulating layer and the conductive layer by simultaneously heating the first insulating material layer, the conductive material layer, and the second insulating material layer.
摘要翻译：提供一种多层结构形成方法，包括：（A）在基板上形成含有第一光固化材料的第一绝缘材料层; （B）通过向第一绝缘材料层照射具有第一波长的光而使第一绝缘材料层半硬化; （C）通过从液滴喷射装置的喷嘴向半硬化的第一绝缘材料层喷射导电材料的液滴，在半硬化的第一绝缘材料层上形成导电材料层; （D）形成包含第二光固化材料的第二绝缘材料层以覆盖半硬化的第一绝缘材料层和导电材料层; 和（E）形成第一绝缘层，位于第一绝缘材料上的导电层和通过同时加热第一绝缘材料层，导电材料层和覆盖第一绝缘层和导电层的第二绝缘层第二绝缘材料层。

82. 发明授权

US07527911B2 Photosensitive composition, pattern-forming method using the photosensitive composition and compounds used in the photosensitive composition 失效
标题翻译：感光组合物，使用光敏组合物中使用的化合物和化合物的图案形成方法
公开(公告)号：US07527911B2
公开(公告)日：2009-05-05
申请号：US11708017
申请日：2007-02-20
申请人： Kenji Wada
发明人： Kenji Wada
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0395 , G03F7/0397 , G03F7/0758 , Y10S430/122
摘要： A photosensitive composition, which comprises (A) a compound capable of generating an organic acid represented by formula (I) upon irradiation with actinic ray or radiation: wherein Z represents a monovalent organic group, when two Z's are present, the two Z's may be the same or different, and they may be bonded to each other to form a cyclic structure; X represents —CO— or —SO2—, when two X's are present, the two X's may be the same or different; R represents a monovalent organic group, when two R's are present, the two R's may be the same or different, and they may be bonded to each other to form a cyclic structure; Z and R may be bonded to each other to form a cyclic structure; and n represents an integer of 1 or 2; and the compound capable of generating the organic acid represented by formula (I).
摘要翻译：一种光敏组合物，其包含（A）在通过光化射线或辐射照射时能够产生由式（I）表示的有机酸的化合物：其中Z表示一价有机基团，当存在两个Z时，两个Z可以是相同或不同，并且它们可以彼此键合以形成环状结构; 当存在两个X时，X表示-CO-或-SO2-，两个X可以相同或不同; R表示一价有机基团，当存在两个R时，两个R可以相同或不同，并且它们可以彼此键合以形成环状结构; Z和R可以彼此键合形成环状结构; n表示1或2的整数; 和能够产生由式（I）表示的有机酸的化合物。

83. 发明授权

US07425404B2 Chemical amplification resist composition and pattern-forming method using the same 失效
标题翻译：化学放大抗蚀剂组合物和使用其的图案形成方法
公开(公告)号：US07425404B2
公开(公告)日：2008-09-16
申请号：US11206220
申请日：2005-08-18
申请人： Shinji Tarutani , Hyou Takahashi , Kenji Wada
发明人： Shinji Tarutani , Hyou Takahashi , Kenji Wada
IPC分类号： G03F7/039 , G03F7/038
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0392
摘要： A chemical amplification resist composition comprising (A) a resin increasing the solubility in an alkali developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation, (C) a compound having a fluorine atom and a hydroxyl group, and a pKa value of from 4 to 15, and (D) a solvent, and a pattern-forming method using the same.
摘要翻译：一种化学放大抗蚀剂组合物，其包含（A）通过酸的作用增加在碱性显影剂中的溶解度的树脂，（B）在用光化射线或辐射照射时能够产生酸的化合物，（C）具有氟原子和羟基，pKa值为4〜15，和（D）溶剂，以及使用其的图案形成方法。

84. 发明授权

US07351515B2 Positive resist composition and pattern-forming method using the same 有权
标题翻译：正型抗蚀剂组合物和使用其的图案形成方法
公开(公告)号：US07351515B2
公开(公告)日：2008-04-01
申请号：US10941822
申请日：2004-09-16
申请人： Shoichiro Yasunami , Kenji Wada , Kunihiko Kodama , Kenichiro Sato
发明人： Shoichiro Yasunami , Kenji Wada , Kunihiko Kodama , Kenichiro Sato
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/111 , Y10S430/115 , Y10S430/122 , Y10S430/126
摘要： A positive resist composition includes: (A) a resin capable of increasing a solubility thereof in an alkali developer by an action of an acid; (B) a compound capable of generating a sulfonic acid represented by the following formula (I) upon irradiation with one of an actinic ray and a radiation; and (C1) at least one of an amine compound having at least an aliphatic hydroxyl group in a molecule and an amine compound having at least an ether bond in a molecule: A1A2-SO3H)n (I) wherein A1 represents an n-valent linking group, A2 represents a single bond or a divalent aliphatic group, and A2's each may be the same or different, provided that at least one group represented by A1 or A2 contains a fluorine atom, and n represents an integer of from 2 to 4.
摘要翻译：正型抗蚀剂组合物包括：（A）能够通过酸的作用增加其在碱性显影剂中的溶解度的树脂; （B）在用光化学射线和辐射之一照射时能够产生由下式（I）表示的磺酸的化合物; 和（C1）分子中至少具有脂肪族羟基的胺化合物和分子中具有至少一个醚键的胺化合物中的至少一种：＆lt;线内配方说明=“在线式” end =“lead”？> A _{1 A 2 3 （I）<？in-line-formula description =“In-line Formulas”end =“tail”？>其中A 1代表n价连接基团，A < SUB 2表示单键或二价脂族基团，并且A 2各自可以相同或不同，条件是至少一个由A 1表示的基团或A 2 含有氟原子，n表示2〜4的整数。}

85. 发明授权

US07276738B2 Miniature optical element for wireless bonding in an electronic instrument 有权
标题翻译：微型光学元件，用于电子仪器中的无线键合
公开(公告)号：US07276738B2
公开(公告)日：2007-10-02
申请号：US11437805
申请日：2006-05-22
申请人： Kenji Wada
发明人： Kenji Wada
IPC分类号： H01L33/00
CPC分类号： H01L27/14683 , H01L21/76898 , H01L23/481 , H01L24/48 , H01L24/73 , H01L27/14618 , H01L27/1462 , H01L27/14621 , H01L27/14627 , H01L27/14632 , H01L27/14636 , H01L27/14687 , H01L31/0203 , H01L31/18 , H01L33/382 , H01L2224/32225 , H01L2224/48227 , H01L2224/48465 , H01L2224/73265 , H01L2924/00014 , H01L2924/00015 , H01L2924/01013 , H01L2924/01029 , H01L2924/01046 , H01L2924/01057 , H01L2924/01078 , H01L2924/01079 , H01L2924/12042 , H01L2924/15153 , H01L2924/15165 , H01L2924/15312 , H01L2924/16195 , H01L2924/3025 , H01L2933/0016 , Y10S257/911 , H01L2924/00 , H01L2924/00012 , H01L2224/45099 , H01L2224/85399 , H01L2224/05599 , H01L2224/45015 , H01L2924/207
摘要： A method of manufacturing an optical element including the steps of: forming a through hole in a semiconductor element which has an optical section and an electrode electrically connected to the optical section; and forming a conductive layer extending from a first surface of the semiconductor element on which the optical section is formed, through an inner wall surface of the through hole, to a second surface opposite to the first surface.
摘要翻译：一种制造光学元件的方法，包括以下步骤：在具有光学部分和电连接到光学部分的电极的半导体元件中形成通孔; 以及形成从其上形成有所述光学部分的所述半导体元件的第一表面延伸穿过所述通孔的内壁表面到与所述第一表面相对的第二表面的导电层。

86. 发明申请

US20070148592A1 Photosensitive composition, pattern-forming method using the photosensitive composition and compounds used in the photosensitive composition 有权
标题翻译：感光组合物，使用光敏组合物中使用的化合物和化合物的图案形成方法
公开(公告)号：US20070148592A1
公开(公告)日：2007-06-28
申请号：US11642533
申请日：2006-12-21
申请人： Kenji Wada , Kunihiko Kodama
发明人： Kenji Wada , Kunihiko Kodama
IPC分类号： G03C1/00
CPC分类号： G03F7/0045 , C07D307/33 , C07D307/77 , C07D409/12 , C07D409/14 , C07D493/08 , C07D493/14 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0395 , G03F7/0397 , G03F7/0758 , Y10S430/115 , Y10S430/122
摘要： A photosensitive composition containing a compound having a specific structure, a pattern-forming method using the photosensitive composition, and a compound having a specific structure used in the photosensitive composition.
摘要翻译：含有具有特定结构的化合物的光敏组合物，使用该感光性组合物的图案形成方法和在感光性组合物中使用的具有特定结构的化合物。

87. 发明申请

US20070082289A1 Photosensitive composition, pattern forming method using the photosensitive composition and compound for use in the photosensitive composition 有权
标题翻译：感光组合物，使用光敏组合物的图案形成方法和用于感光组合物中的化合物
公开(公告)号：US20070082289A1
公开(公告)日：2007-04-12
申请号：US11471713
申请日：2006-06-21
申请人： Kenji Wada
发明人： Kenji Wada
IPC分类号： G03C1/00
CPC分类号： C07C309/80 , C07C311/48 , C07C381/12 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0395 , G03F7/0397 , Y10S430/122 , Y10S430/124 , Y10S430/126
摘要： A photosensitive composition comprising a compound capable of generating a compound having a specific structure upon irradiation with actinic rays or radiation; a pattern forming method using the photosensitive composition; a compound having a specific structure; and a compound capable of generating a compound having a specific structure upon irradiation with actinic rays or radiation.
摘要翻译：一种光敏组合物，其包含能够在用光化射线或辐射照射时产生具有特定结构的化合物的化合物; 使用该感光性组合物的图案形成方法; 具有特定结构的化合物; 以及能够在用光化射线或辐射照射时产生具有特定结构的化合物的化合物。

88. 发明申请

US20070054217A1 Positive photosensitive composition and pattern-forming method using the same 审中-公开
标题翻译：正光敏组合物和使用其的图案形成方法
公开(公告)号：US20070054217A1
公开(公告)日：2007-03-08
申请号：US11514957
申请日：2006-09-05
申请人： Kunihiko Kodama , Kenji Wada
发明人： Kunihiko Kodama , Kenji Wada
IPC分类号： G03C1/00
CPC分类号： G03F7/0397
摘要： A positive photosensitive composition comprises: (A) a compound capable of generating an acid upon irradiation with actinic ray or radiation; and (B) a resin having a group capable of decomposing by action of an acid to increase solubility of the group in an alkali developer, wherein the resin (B) comprises: at least one methacrylate repeating unit; at least one acrylate repeating unit; and at least one repeating unit (Ba) having a diamantane structure.
摘要翻译：正型感光性组合物包含：（A）能够在光化射线或辐射照射时能够产生酸的化合物; 和（B）具有能够通过酸分解的基团的树脂，以增加基团在碱性显影剂中的溶解度，其中树脂（B）包含：至少一个甲基丙烯酸酯重复单元; 至少一个丙烯酸酯重复单元; 和至少一个具有双金刚烷结构的重复单元（Ba）。

89. 发明申请

US20060172228A1 Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition 有权
标题翻译：感光组合物，用于感光组合物的化合物和使用感光组合物的图案形成方法
公开(公告)号：US20060172228A1
公开(公告)日：2006-08-03
申请号：US11337899
申请日：2006-01-24
申请人： Kenji Wada
发明人： Kenji Wada
IPC分类号： G03C5/00 , C07C309/45
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0046 , G03F7/0382
摘要： The invention provides a photosensitive composition for use in the production process of a semiconductor such as IC, in the production of a circuit substrate of liquid crystal, thermal head and the like or in other photofabrication processes, a pattern forming method using the photosensitive composition, and a specific organic acid, which are: a photosensitive composition comprising a compound having a proton acceptor functional group and producing a sulfonic acid group upon irradiation with actinic rays or radiation to reduce or lose the acceptor property or change the proton acceptor functional group to be acidic, or a compound capable of generating a specific organic acid upon irradiation with actinic rays or radiation; a pattern forming method using the photosensitive composition; and a specific organic acid.
摘要翻译：本发明提供了一种用于半导体（例如IC）的制造中的液晶，热敏头等电路基板的制造中的光敏性组合物，或者其他的光加工工序，使用该感光性组合物的图案形成方法，和特定的有机酸，其是：包含具有质子受体官能团的化合物并在用光化射线或辐射照射时产生磺酸基以降低或失去受主性质或将质子受体官能团改变为酸性或能够在用光化射线或辐射照射时能够产生特定有机酸的化合物; 使用该感光性组合物的图案形成方法; 和特定的有机酸。

90. 发明申请

US20060068320A1 Resist composition and method of pattern formation with the same 有权
标题翻译：抗蚀剂组成和图案形成方法相同
公开(公告)号：US20060068320A1
公开(公告)日：2006-03-30
申请号：US11229518
申请日：2005-09-20
申请人： Hyou Takahashi , Kenji Wada
发明人： Hyou Takahashi , Kenji Wada
IPC分类号： G03C1/76
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/038 , G03F7/0382 , G03F7/0392 , G03F7/0395 , G03F7/0397 , Y10S430/116
摘要： A resist composition comprises (A) a compound having a molecular weight of 3,000 or lower which has in its molecule a structure having two or more monovalent anions and a structure having two or more monovalent cations.
摘要翻译：抗蚀剂组合物包含（A）分子量为3,000以下的化合物，其分子中具有两个以上一价阴离子的结构和具有两个以上一价阳离子的结构。

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