专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

81. 发明授权

US08180141B2 Wafer repair system 有权
标题翻译：晶圆维修系统
公开(公告)号：US08180141B2
公开(公告)日：2012-05-15
申请号：US11934512
申请日：2007-11-02
申请人： Chin-Hsiang Lin , Burn Jeng Lin , Tsai-Shen Gau
发明人： Chin-Hsiang Lin , Burn Jeng Lin , Tsai-Shen Gau
IPC分类号： G06K9/00 , G03F1/00
CPC分类号： G03F7/7065 , G03F7/70383 , H01L22/22 , H01L2924/0002 , H01L2924/00
摘要： A system for wafer repair, comprising an inspection tool being capable of extracting a wafer image of a semiconductor wafer; a direct-writing tool being capable of locally exposing the semiconductor wafer; and an information processing module configured to compare the wafer image with a reference image and generate data of locations and patterns of defective regions and communicate the data of locations and patterns of defective regions to the direct-writing tool, wherein the reference image comprises a pattern consisting of a scanned image of another die having no defective region.
摘要翻译：一种用于晶片修复的系统，包括能够提取半导体晶片的晶片图像的检查工具; 能够局部暴露半导体晶片的直写工具; 以及信息处理模块，被配置为将晶片图像与参考图像进行比较，并生成缺陷区域的位置和图案的数据，并将缺陷区域的位置和图案的数据传送到直接书写工具，其中参考图像包括图案由没有缺陷区域的另一个芯片的扫描图像组成。

82. 发明申请

US20110267591A1 Apparatus for Method for Immersion Lithography 有权
公开(公告)号：US20110267591A1
公开(公告)日：2011-11-03
申请号：US13176604
申请日：2011-07-05
申请人： Burn Jeng Lin
发明人： Burn Jeng Lin
IPC分类号： G03B27/52
CPC分类号： G02B7/028 , G02B7/04 , G03F7/70341
摘要： An apparatus for immersion lithography that includes an imaging lens which has a front surface, a fluid-containing wafer stage for supporting a wafer that has a top surface to be exposed positioned spaced-apart and juxtaposed to the front surface of the imaging lens, and a fluid that has a refractive index between about 1.0 and about 2.0 filling a gap formed in-between the front surface of the imaging lens and the top surface of the wafer. A method for immersion lithography can be carried out by flowing a fluid through a gap formed in-between the front surface of an imaging lens and a top surface of a wafer. The flow rate and temperature of the fluid can be controlled while particulate contaminants are filtered out by a filtering device.

83. 发明授权

US07924397B2 Anti-corrosion layer on objective lens for liquid immersion lithography applications 有权
标题翻译：用于液浸光刻应用的物镜上的防腐层
公开(公告)号：US07924397B2
公开(公告)日：2011-04-12
申请号：US10702664
申请日：2003-11-06
申请人： Burn Jeng Lin , David Lu
发明人： Burn Jeng Lin , David Lu
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/70983 , G02B1/105 , G02B1/111 , G02B1/113 , G02B1/115 , G02B1/14 , G02B13/143 , G03F7/70341
摘要： Disclosed is an objective lens adapted for use in liquid immersion photolithography and a method for making such a lens. In one example, the objective lens has multiple lens elements, one of which includes a transparent substrate and a layer of anti-corrosion coating (ACC). The ACC is formed proximate to the transparent substrate and is positioned between a liquid used during the liquid immersion photolithography and the transparent substrate to protect the transparent substrate from the liquid.
摘要翻译：公开了适用于液浸光刻的物镜和制造这种透镜的方法。在一个示例中，物镜具有多个透镜元件，其中之一包括透明基板和一层防腐涂层（ACC）。 ACC形成在透明基板附近，并且位于液浸光刻期间使用的液体和透明基板之间，以保护透明基板免于液体。

84. 发明申请

US20100248158A1 HIGH-VOLUME MANUFACTURING MASSIVE E-BEAM MASKLESS LITHOGRAPHY SYSTEM 有权
标题翻译：高容量制造大质量电子束MASTRESS LITHOGRAPHY系统
公开(公告)号：US20100248158A1
公开(公告)日：2010-09-30
申请号：US12411229
申请日：2009-03-25
申请人： Jeng-Horng Chen , Shy-Jay Lin , Burn Jeng Lin
发明人： Jeng-Horng Chen , Shy-Jay Lin , Burn Jeng Lin
IPC分类号： G03F7/20 , G21K5/04
CPC分类号： G03F7/70275 , B82Y10/00 , B82Y40/00 , G03F7/70291 , G03F7/70508 , H01J37/3177 , H01J2237/31762
摘要： The present disclosure provides a maskless lithography apparatus. The apparatus includes a plurality of writing chambers, each including: a wafer stage operable to secure a wafer to be written and a multi-beam module operable to provide multiple radiation beams for writing the wafer; an interface operable to transfer wafers between each of the writing chambers and a track unit for processing an imaging layer to the wafers; and a data path operable to provide a set of circuit pattern data to each of the multiple radiation beams in each of the writing chambers.
摘要翻译：本公开提供一种无掩模光刻设备。该装置包括多个写入室，每个写入室包括：可操作以固定要写入的晶片的晶片台和可操作以提供用于写入晶片的多个辐射束的多光束模块; 可操作以在每个写入室之间传送晶片的接口和用于将成像层处理到晶片的轨道单元; 以及数据路径，其可操作以向每个写入室中的每个多个辐射束提供一组电路图案数据。

85. 发明授权

US07394080B2 Mask superposition for multiple exposures 有权
标题翻译：多重曝光的面膜叠加
公开(公告)号：US07394080B2
公开(公告)日：2008-07-01
申请号：US11317974
申请日：2005-12-23
申请人： Burn Jeng Lin
发明人： Burn Jeng Lin
IPC分类号： H01J37/08 , G21K5/10 , G03F7/20
CPC分类号： G03F7/70275 , G03F7/70208 , G03F7/70283
摘要： An exposure system includes a mask stage module adapted for holding a first mask and a second mask, wherein the first mask is configured for illumination by a first beam to form a transformed first beam having a first pattern from the first mask and the second mask is configured for illumination by a second beam to form a transformed second beam having a second pattern from the second mask. The exposure system also includes a beam combiner configured to combine the transformed first and second beams to form a resultant beam, wherein the resultant beam is projected into a substrate coated with a photoresist layer.
摘要翻译：曝光系统包括适于保持第一掩模和第二掩模的掩模台模块，其中第一掩模被配置为由第一光束照明以形成具有来自第一掩模的第一图案的变换的第一光束，而第二掩模是被配置为由第二光束照明以形成具有来自第二掩模的第二图案的变换的第二光束。曝光系统还包括光束组合器，其被配置为组合变换的第一和第二光束以形成合成光束，其中所得到的光束投射到涂覆有光致抗蚀剂层的基板中。

86. 发明授权

US07151593B2 Method for imaging wafers using a projection mask aligner 有权
标题翻译：使用投影掩模对准器成像晶片的方法
公开(公告)号：US07151593B2
公开(公告)日：2006-12-19
申请号：US11412555
申请日：2006-04-27
申请人： Burn Jeng Lin
发明人： Burn Jeng Lin
IPC分类号： G03B27/32 , G03B27/62 , G03F1/00 , G03C5/00
CPC分类号： G03F1/62 , G03F7/70866 , G03F7/70975 , G03F7/70983 , G03F7/70991
摘要： A method uses a projection mask aligner that includes a hard pellicle mounting apparatus having an enclosure with an interior cavity, an inlet port for receiving a mask with a protective cover, and an outlet port for outputting a mask covered by a hard pellicle, that has a demounting portion for removing the protective cover from the mask, that has a mounting portion for mounting the hard pellicle on the mask, and that has a conduit for receiving a light-transmitting gas. The method includes: forming a hard pellicle/mask assembly having at least one hard pellicle mounted thereon; positioning the hard pellicle/mask assembly between a light source and an imaging lens; positioning a photoresist-coated semiconductor wafer under the imaging lens with a photoresist layer facing the lens; and imaging microelectronics circuits from the hard pellicle/mask assembly onto the semiconductor wafer.
摘要翻译：一种方法使用投影掩模对准器，其包括具有具有内腔的外壳的硬膜保护装置，用于接收具有保护盖的掩模的入口端口和用于输出由硬膜覆盖的掩模的出口，所述掩模具有用于从掩模中去除保护盖的拆卸部分，其具有用于将硬膜安装在掩模上的安装部分，并且具有用于接收透光气体的导管。该方法包括：形成安装在其上的至少一层硬膜的硬膜/掩模组件; 将硬膜/掩模组件定位在光源和成像透镜之间; 将光致抗蚀剂涂覆的半导体晶片定位在成像透镜下面，其中光致抗蚀剂层面向透镜; 以及将硬膜组件/掩模组件的微电子电路成像到半导体晶片上。

87. 发明授权

US09330933B2 Method and apparatus for planarizing a polymer layer 有权
标题翻译：聚合物层平坦化的方法和装置
公开(公告)号：US09330933B2
公开(公告)日：2016-05-03
申请号：US12137259
申请日：2008-06-11
申请人： Burn Jeng Lin
发明人： Burn Jeng Lin
IPC分类号： B29C59/02 , H01L21/3105 , H01L21/67
CPC分类号： H01L21/67092 , H01L21/31051 , H01L21/31058
摘要： A method for planarizing a polymer layer is provided which includes providing a substrate having the polymer layer formed thereon, providing a structure having a substantially flat surface, pressing the flat surface of the structure to a top surface of the polymer layer such that the top surface of the polymer layer substantially conforms to the flat surface of the structure, and separating the flat surface of the structure from the top surface of the polymer material layer.
摘要翻译：提供了一种用于平面化聚合物层的方法，其包括提供其上形成有聚合物层的基底，提供具有基本平坦表面的结构，将该结构的平坦表面压在聚合物层的顶表面上，使得顶表面的聚合物层基本上符合结构的平坦表面，并且将结构的平坦表面与聚合物材料层的顶表面分离。

88. 发明授权

US09182660B2 Methods for electron beam patterning 有权
标题翻译：电子束图案化方法
公开(公告)号：US09182660B2
公开(公告)日：2015-11-10
申请号：US13486000
申请日：2012-06-01
申请人： Wen-Chuan Wang , Shy-Jay Lin , Jaw-Jung Shin , Burn Jeng Lin
发明人： Wen-Chuan Wang , Shy-Jay Lin , Jaw-Jung Shin , Burn Jeng Lin
IPC分类号： G03F1/56 , G03F1/78 , H01L21/027 , G03F7/20
CPC分类号： G03F1/56 , G03F1/78 , G03F7/2063 , H01L21/0276 , H01L21/0277
摘要： A method for electron-beam patterning includes forming a conductive material layer on a substrate; forming a bottom anti-reflective coating (BARC) layer on the conductive material layer; forming a resist layer on the BARC layer; and directing an electron beam (e-beam) to the sensitive resist layer for an electron beam patterning process. The BARC layer is designed such that a top electrical potential of the resist layer is substantially zero during the e-beam patterning process.
摘要翻译：电子束图案化方法包括在基板上形成导电材料层; 在导电材料层上形成底部抗反射涂层（BARC）层; 在BARC层上形成抗蚀剂层; 并将电子束（电子束）引导到用于电子束图案化工艺的敏感抗蚀剂层。 BARC层被设计成使得在电子束图案化工艺期间抗蚀剂层的顶部电势基本为零。

89. 发明授权

US08762900B2 Method for proximity correction 有权
标题翻译：邻近校正方法
公开(公告)号：US08762900B2
公开(公告)日：2014-06-24
申请号：US13534765
申请日：2012-06-27
申请人： Jaw-Jung Shin , Shy-Jay Lin , Hua-Tai Lin , Burn Jeng Lin
发明人： Jaw-Jung Shin , Shy-Jay Lin , Hua-Tai Lin , Burn Jeng Lin
IPC分类号： G06F17/50
CPC分类号： G06F17/5081 , G03F1/36 , G03F1/70
摘要： A method of an integrated circuit (IC) design includes receiving an IC design layout. The IC design layout includes an IC feature with a first outer boundary and a first target points assigned to the first outer boundary. The method also includes generating a second outer boundary for the IC feature and moving all the first target points to the second outer boundary to form a modified IC design layout.
摘要翻译：集成电路（IC）设计的方法包括接收IC设计布局。 IC设计布局包括具有第一外边界的IC特征和分配给第一外边界的第一目标点。该方法还包括为IC特征产生第二外部边界并将所有第一目标点移动到第二外部边界以形成修改的IC设计布局。

90. 发明授权

US08722286B2 Devices and methods for improved reflective electron beam lithography 有权
标题翻译：用于改进反射电子束光刻的装置和方法
公开(公告)号：US08722286B2
公开(公告)日：2014-05-13
申请号：US13484588
申请日：2012-05-31
申请人： Chen-Hua Yu , Jaw-Jung Shin , Shy-Jay Lin , Burn Jeng Lin
发明人： Chen-Hua Yu , Jaw-Jung Shin , Shy-Jay Lin , Burn Jeng Lin
IPC分类号： G03F1/20
CPC分类号： G03F1/20 , B82Y10/00 , B82Y40/00 , H01J37/045 , H01J37/3175 , H01J37/3177 , H01J2237/31774 , H01J2237/31789 , Y10S430/143
摘要： A device for reflective electron-beam lithography and methods of producing the same are described. The device includes a substrate, a plurality of conductive layers formed on the substrate, which are parallel to each other and separated by insulating pillar structures, and a plurality of apertures in each conductive layer. Apertures in each conductive layer are vertically aligned with the apertures in other conductive layers and a periphery of each aperture includes conductive layers that are suspended.
摘要翻译：对反射型电子束光刻装置及其制造方法进行说明。该装置包括基板，形成在基板上的多个导电层，它们彼此平行并由绝缘柱结构分隔开，并且在每个导电层中形成多个孔。每个导电层中的孔与其它导电层中的孔垂直对准，并且每个孔的周边包括悬浮的导电层。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式