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71. 发明申请

US20050173377A1 Semiconductor wafer, apparatus and process for producing the semiconductor wafer 审中-公开
标题翻译：用于制造半导体晶片的半导体晶片，装置和工艺
公开(公告)号：US20050173377A1
公开(公告)日：2005-08-11
申请号：US11051894
申请日：2005-02-04
申请人： Georg Pietsch , Michael Kerstan , Werner Blaha
发明人： Georg Pietsch , Michael Kerstan , Werner Blaha
IPC分类号： B24B7/04 , B24B7/17 , B24B7/22 , B24D7/14 , H01L21/302 , H01L21/304
CPC分类号： H01L21/02013 , B24B7/17 , B24B7/228 , B24D7/14
摘要： The invention relates to a process for producing a semiconductor wafer by double-side grinding of the semiconductor wafer, in which the semiconductor wafer is simultaneously ground on both sides, first by rough-grinding and then by finish-grinding, using a grinding tool. The semiconductor wafer, between the rough-grinding and the finish-grinding, remains positioned in the grinding machine, and the grinding tool continues to apply a substantially constant load during the transition from rough-grinding to finish-grinding. The invention also relates to an apparatus for carrying out the process and to a semiconductor wafer having a local flatness value on a front surface of less than 16 nm in a measurement window of 2 mm×2 mm area and of less than 40 nm in a measurement window of 10 mm×10 mm area.
摘要翻译：本发明涉及通过半导体晶片的双面研磨制造半导体晶片的方法，其中半导体晶片在两侧同时研磨，首先通过粗磨，然后使用研磨工具进行精磨。在粗磨和精磨之间的半导体晶片保持定位在研磨机中，并且研磨工具在从粗磨到精磨过渡期间继续施加基本恒定的载荷。本发明还涉及一种用于在2mm×2mm面积的测量窗口和在测量窗口中小于40nm的小于16nm的前表面上具有局部平坦度值的半导体晶片的实施方法和半导体晶片 10毫米×10毫米的面积。

72. 发明申请

US20050070209A1 Method and system for controlling the chemical mechanical polishing by using a sensor signal of a pad conditioner 有权
公开(公告)号：US20050070209A1
公开(公告)日：2005-03-31
申请号：US10859336
申请日：2004-06-02
申请人： Gerd Marxsen , Jens Kramer , Uwe Stoeckgen
发明人： Gerd Marxsen , Jens Kramer , Uwe Stoeckgen
IPC分类号： B24B7/04 , B24B37/00 , B24B37/04 , B24B49/16 , B24B53/007 , B24B53/02 , B24B49/00
CPC分类号： B24B53/017 , B24B37/00 , B24B37/04 , B24B49/16 , B24B53/02
摘要： In a system and a method according to the present invention, a sensor signal, such as a motor current signal, from a drive assembly of a pad conditioning system is used to control a CMP system to compensate for a change in the conditions of consumables, thereby enhancing process stability.

73. 发明授权

US6042459A Surface machining method and apparatus 失效
公开(公告)号：US6042459A
公开(公告)日：2000-03-28
申请号：US88480
申请日：1998-06-02
申请人： Katsuo Honda
发明人： Katsuo Honda
IPC分类号： B24B7/04 , B24B7/16 , B24B7/22 , B24B5/01
CPC分类号： B24B7/04 , B24B7/16 , B24B7/228
摘要： A wafer is rotated on its axis, which is biased with regard to an axis of a grinding wheel, and revolves around an axis which is biased with regard to the axis of the wafer and the axis of the grinding wheel. In this state, the grinding wheel is abutted against the surface of the wafer. Thus, all abrasive grains on the grinding wheel can act on the whole surface of the wafer.

74. 发明授权

US6039635A Surface polishing apparatus including a dresser 失效
标题翻译：表面抛光装置，包括修整器
公开(公告)号：US6039635A
公开(公告)日：2000-03-21
申请号：US141421
申请日：1998-08-27
申请人： Masashige Mitsuhashi , Kenichi Ohno , Kenichi Yoshida
发明人： Masashige Mitsuhashi , Kenichi Ohno , Kenichi Yoshida
IPC分类号： B24B37/00 , B24B53/007 , B24B53/017 , B24B57/02 , B24B7/04
CPC分类号： B24B53/017 , B24B57/02
摘要： A surface polishing apparatus which presses a work piece 12 into contact with the processing surface of a disk-shaped polishing tool 11 which is rotated and driven, to polish the surface of the work piece 12 as supplying abrasive slurry to the processing surface. The surface polishing apparatus includes an abrasive slurry-supply mechanism 13 which supplies abrasive slurry to the processing surface. The slurry supply mechanism is provided on the backward side of the work piece with respect to the rotation direction of the polishing tool. A dresser 23, which sets the processing surface, is provided on the forward side of the work piece an abrasive slurry-suction mechanism, which sucks and recycles abrasive slurry from the processing surface, is provided on the forward side of the dresser and on the backward side of abrasive slurry-supply mechanism 13.
摘要翻译：一种表面抛光装置，其将工件12压向与旋转和驱动的盘形抛光工具11的处理表面接触，以便在将磨料浆料供应到处理表面时抛光工件12的表面。表面抛光装置包括将磨料浆料供给到处理表面的磨料浆料供给机构13。浆料供给机构相对于研磨工具的旋转方向设置在工件的后侧。设置处理表面的修整器23设置在工件的前侧，在修整器的前侧设置有从处理表面吸入和再循环磨料浆料的研磨浆料 - 抽吸机构，研磨浆料供给机构13的后侧。

75. 发明授权

US5980366A Methods and apparatus for polishing using an improved plate stabilizer 失效
标题翻译：使用改进的板稳定剂进行抛光的方法和设备
公开(公告)号：US5980366A
公开(公告)日：1999-11-09
申请号：US986898
申请日：1997-12-08
申请人： Thomas Waddle , Karl Kasprzyk
发明人： Thomas Waddle , Karl Kasprzyk
IPC分类号： B24B37/08 , B24B41/04 , B24B7/04
CPC分类号： B24B37/08 , B24B41/042
摘要： A plate stabilizing apparatus is provided which comprises a lateral support structure conflgured to adjust plate alignment which engages vertical rails secured to a polishing machine housing. thus effectively stabilizing the polishing plate while allowing vertical movement of the plate assembly. In a preferred embodiment, a plate stabilizing apparatus includes an alignment plate secured to a subcylinder close to and axially aligned with the polishing plate universal joint. Adjustment screws are provided for lateral adjustment of the polishing plate which is secured to a substantially rigid lateral support structure. The lateral support structure rides within vertical rails secured to the inner housing walls of the polishing apparatus thus allowing vertical movement of the polishing plate during operation.
摘要翻译：提供了一种板材稳定装置，其包括侧面支撑结构，其配合以调节板对准，其接合固定到抛光机壳体的垂直轨道。从而有效地稳定了抛光板，同时允许板组件的垂直运动。在优选实施例中，板稳定装置包括固定到靠近并与抛光板万向接头轴向对准的副缸的对准板。提供调整螺钉以用于横向调整抛光板，该抛光板被固定到基本上刚性的侧向支撑结构上。横向支撑结构在固定到抛光装置的内壳体壁的垂直轨道内，从而允许抛光板在操作期间垂直运动。

76. 发明授权

US5674116A Disc with coolant passages for an abrasive machining assembly 失效
标题翻译：具有磨料加工组件的冷却剂通道的盘
公开(公告)号：US5674116A
公开(公告)日：1997-10-07
申请号：US731032
申请日：1996-10-09
申请人： Daniel L. Merrill , John R. Synder , Chuck O. Eckholm, Jr. , Steve M. Sunday , John L. Seaver
发明人： Daniel L. Merrill , John R. Synder , Chuck O. Eckholm, Jr. , Steve M. Sunday , John L. Seaver
IPC分类号： B24B7/04 , B24B27/00 , B24D7/10 , B24B5/00
CPC分类号： B24B27/0046 , B24B7/04 , B24D7/10
摘要： An abrasive machining assembly (10) wherein a worktable (14) is rotatably supported on a frame (12) for rotation about a table axis (A) and a plurality of platens (32) are supported on the worktable (14) with each of the platens (32) being adapted for supporting a workpiece to be machined by a machining disc (38) rotating about a tool axis (B). Each platen (32) is rotatably supported for rotation about a platen axis (C) which is radially spaced from the table axis (A) a different distance than the tool axis (B) whereby each of the platens (32) rotates about a platen axis (C) which is parallel to and offset from the tool axis (B) when positioned in the workstation. The assembly is characterized by a drive mechanism for selective driving engagement with the workstation platen (32) to rotate the workstation platen (32) and for disengaging the workstation platen (32) during the indexing of the worktable (14) to move the workstation platen (32) out of the workstation while moving another platen (32) into the workstation. This drive mechanism comprises a vertically movable shaft (56) which is rotated by a pulley (70) and selectively moved up and down by a pneumatic actuator (64) to engage and disengage the workstation platen (32).
摘要翻译：一种研磨加工组件（10），其中工作台（14）可旋转地支撑在框架（12）上以围绕工作台轴线（A）旋转并且多个压板（32）被支撑在工作台（14）上，每个所述压板（32）适于通过围绕工具轴线（B）旋转的加工盘（38）来支撑待加工的工件。每个压盘（32）被可旋转地支撑以围绕与工作台轴线（A）径向间隔的与工具轴线（B）不同的距离的压板轴线（C）旋转，由此每个压板（32）围绕压盘轴线（C），当位于工作站中时平行于刀具轴线（B）并偏离刀具轴线（B）。组件的特征在于驱动机构，用于与工作台压板（32）选择性地驱动接合以旋转工作台压板（32）并且在工作台（14）的分度期间使工作台压板（32）脱离以移动工作台压板（32）移出工作站，同时将另一个压板（32）移动到工作站中。该驱动机构包括一个由滑轮（70）旋转并由气动致动器（64）选择性地上下移动以使工作台压板（32）接合和脱离的可垂直移动的轴（56）。

77. 发明授权

US5433652A Glass sheet partial chamfering machine 失效
标题翻译：玻璃板偏斜机
公开(公告)号：US5433652A
公开(公告)日：1995-07-18
申请号：US180563
申请日：1994-01-12
申请人： Kyung Park
发明人： Kyung Park
IPC分类号： B24B9/10 , C03C19/00 , B24B7/04
CPC分类号： B24B9/107 , C03C19/00
摘要： The present invention discloses a glass sheet chamfering machine which is improved such that it is suitable for a partial chamfering for a glass sheet. In the conventional glass sheet chamfering machine, and in carrying out a partial chamfering with this conventional machine, at the moment when one of the two glass sheet shape sensing rollers departs from the end point of the glass sheet, one of the rollers is turned to the direction of the straight edge, so that the chamfering wheel is also automatically turned. Consequently, the chamfering direction is deviated, with the result that the chamfering becomes impossible, or a defective chamfering is generated. The present invention eliminates such conventional disadvantage, by arranging that, even if one of the two rollers departs from the corner, the chamfering wheel is not turned. A horizontal supporting pad 20 mounts a glass sheet shape sensing device 19, and also mounts an adjusting key control plate 26 which is provided with an adjusting key guide slot 27, an adjusting key end portion 25a being pivoted through the adjusting key guide slot 27. Under the supporting pad 20, there is installed a pneumatic cylinder 28 for fixing an adjusting key 25. The pneumatic cylinder 28 is actuated through numeric controls, and the adjusting key 25 is controlled by the pneumatic cylinder 28, so that the glass sheet shape sensing device 19 should be fixed or released at exactly required positions. Thus the chamfering machine of the present invention carries out a partial chamfering automatically and continuously.
摘要翻译：本发明公开了一种改进的玻璃板倒角机，适用于玻璃板的部分倒角。在传统的玻璃板倒角机中，在用这种传统的机器进行局部倒角的同时，当两个玻璃板形状传感辊中的一个偏离玻璃板的端点时，其中一个辊转向直边的方向，使倒角轮也自动转动。因此，倒角方向偏离，导致倒角变得不可能，或者产生倒角不良。本发明消除了这种传统的缺点，即通过设置即使两个辊中的一个离开角落，倒角轮也不会转动。水平支撑垫20安装玻璃板形状检测装置19，并且还安装调节键控制板26，调节键控制板26设置有调节键引导槽27，调节键端部25a通过调节键引导槽27枢转。在支撑垫20的下方安装有用于固定调节键25的气缸28.气缸28通过数字控制致动，调节键25由气缸28控制，使得玻璃板形状感测设备19应在完全所需的位置固定或释放。因此，本发明的倒角机自动连续地执行部分倒角。

78. 发明授权

US5187901A Circumferential pattern finishing machine 失效
标题翻译：圆形图案整理机
公开(公告)号：US5187901A
公开(公告)日：1993-02-23
申请号：US473894
申请日：1990-02-02
申请人： Chris E. Karlsrud
发明人： Chris E. Karlsrud
IPC分类号： B24B7/04 , B24B7/10 , B24B7/16 , B24B27/00 , B24B37/08 , G11B5/84
CPC分类号： B24B37/08 , B24B27/0023 , B24B7/10 , B24B7/16
摘要： A disc finishing machine comprising an annular upper platen, lower platen, a center driving ring, a plurality of a clamping guide rollers, a plurality of stationary guide rollers, a clamping guide roller, and stationary guide roller perpendicularly attached to one of a plurality of a roller stanchions. The polishing machine capable of imparting a circumferential pattern on a plurality of disc-shaped work pieces.
摘要翻译：一种圆盘整理机，包括环形上压板，下压板，中心驱动环，多个夹紧导向辊，多个固定导辊，夹紧导向辊和垂直附接到多个一个滚子支柱。该抛光机能够在多个盘状工件上赋予圆周图案。

79. 发明授权

US4583325A Grinding machine 失效
公开(公告)号：US4583325A
公开(公告)日：1986-04-22
申请号：US661809
申请日：1984-10-17
申请人： Shuji Tabuchi
发明人： Shuji Tabuchi
IPC分类号： B24B7/04 , B24B7/16 , B24B27/00 , B24B9/00
CPC分类号： B24B27/0023 , B24B7/16
摘要： A grinding machine adapted for grinding surfaces of thin workpieces comprises a rotating table provided with at least a workpiece holder on which a workpiece to be ground is held, and a plurality of grinding wheels having different grain sizes ranging from coarse to fine, and rotating independently of each other the wheels are disposed above the table and in arrangement so that, as the table rotates, the wheels grind successively the surface of the workpiece to provide a desired total thickness of grind and a reasonable surface finish through one rotation of the table.

80. 发明授权

US4575605A Apparatus and method for detecting the location of an electrical discharge along the electrode wire of an EDM apparatus 失效
标题翻译：用于检测沿着EDM装置的电极线的放电位置的装置和方法
公开(公告)号：US4575605A
公开(公告)日：1986-03-11
申请号：US647415
申请日：1984-09-05
申请人： Roland Martin
发明人： Roland Martin
IPC分类号： B24B7/00 , B23H7/02 , B23H7/04 , B24B7/04
CPC分类号： B23H7/04
摘要： In a travelling wire EDM apparatus, the location of an electric discharge along the portion of the electrode wire in the machining zone between the electrode wire and the workpiece, in the course of a cut being effected on the electrode workpiece by electrical discharges, is measured by measuring the currents flowing through each of the two lines connecting one output of the pulse generator associated with the EDM apparatus to the electrode wire on one side and the other of the machining zone. The measured currents are added and subtracted and the position, or location, of an electrical discharge is determined by a signal proportional to the quotient of the difference by the sum of the currents.
摘要翻译：在行走线电火花加工设备中，测量在通过放电对电极工件进行切割的过程中沿着电极线在电极线和工件之间的加工区域中的部分的放电位置，通过测量将与EDM设备相关联的脉冲发生器的一个输出连接到加工区域的一侧和另一侧的电极线的两条线中的每一条流的电流。测量的电流被加和减去，并且放电的位置或位置由与差值的乘积与电流之和成比例的信号确定。

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