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    • 71. 发明授权
    • Variable temperature scanning probe microscope based on a peltier device
    • 基于peltier装置的可变温度扫描探针显微镜
    • US5654546A
    • 1997-08-05
    • US551836
    • 1995-11-07
    • Stuart M. Lindsay
    • Stuart M. Lindsay
    • G01Q30/02G01Q30/10G01Q30/14G01Q30/20H01J37/20H01L35/00H01J37/26
    • G01Q30/10B82Y35/00H01J2237/2001H01J2237/2818Y10S977/871
    • A compact Peltier Device is used to heat or cool a small sample stage of a scanning probe (AFM or STM) microscope. The entire heating/cooling system may fit onto a small platen which may be suspended below the scanning probe where it may be held in place against magnetic balls. Alternatively, the sample stage may be supported by a Peltier Device, itself supported by a scanner such as a Piezoelectric scanner with a scanning probe tip held fixedly above the sample stage. The side of the Peltier Device in contact with the platen is cooled (or heated) by a small flow of water through a heat exchanger. The reservoir of water is held at ambient temperature, minimizing the temperature gradient generated between the sample platen and the main body of the microscope. The small mass of the sample stage results in rapid heating or cooling so that an equilibrium is attained rapidly. Heat transfer through the scanning tip is negligible. Condensation and contamination of the sample is prevented by operating the entire sample chamber in an inert gas environment. The inert gas is also at ambient temperature. Water and other contaminants are first removed from the gas by passing it over cold baffles. It is then equilibrated back up to ambient temperature in a heat exchanger.
    • 使用紧凑型珀尔帖装置来加热或冷却扫描探针(AFM或STM)显微镜的小样品台。 整个加热/冷却系统可以装配在可以悬挂在扫描探针下方的小压板上,在该压板上可以将其保持在适当的位置以防止磁珠。 或者,样品台可以由珀尔帖装置支撑,珀尔帖装置本身由诸如压电扫描仪的扫描仪支撑,扫描探针尖端固定在样品台上方。 与压板接触的珀耳帖装置的侧面通过热交换器被小量的水冷却(或加热)。 水的储存器保持在环境温度,使样品台板和显微镜主体之间产生的温度梯度最小化。 样品台的小质量导致快速加热或冷却,从而快速获得平衡。 通过扫描尖端的热传递可以忽略不计。 通过在惰性气体环境中操作整个样品室来防止样品的冷凝和污染。 惰性气体也处于环境温度。 首先将水和其他污染物通过冷气挡板从气体中排出。 然后将其在热​​交换器中平衡回到环境温度。
    • 73. 发明授权
    • Controlled force microscope for operation in liquids
    • 控制力显微镜在液体中操作
    • US5515719A
    • 1996-05-14
    • US246035
    • 1994-05-19
    • Stuart Lindsay
    • Stuart Lindsay
    • B81B3/00G01B21/30G01Q10/06G01Q30/14G01Q60/24G01Q60/32G01B5/28
    • G01Q30/14G01Q10/06G01Q60/38B82Y35/00Y10S977/863Y10S977/865
    • An atomic force microscope in which the deflection of the force sensing probe owing to surface forces is canceled by an opposing magnetic force applied to a small magnetic particle on a force sensing cantilever. A deflection of the force sensing cantilever is detected by reflecting a laser beam from the cantilever into a position sensitive detector. The voltage signal from the position sensitive detector is used to drive an integrating servo loop which drives a current in a solenoid placed close to the force sensing cantilever, and exerts a force opposing the atomic force of attraction between the force sensing cantilever and the sample surface via a small magnetic particle attached to the cantilever and having its magnetic moment aligned with the axis of the solenoid. In this way, deflection of the force sensing cantilever is prevented for any force within the range of the servo control system. The driving signal for the cantilever is a measure of the operating force of the microscope and can be used to drive a conventional atomic force microscope controller to generate topographical images of the surface. The system works submerged in water and other liquids and can be used for profiling soft surfaces while avoiding the problem of the force sensing cantilever being pulled into the sample surface by attractive interactions between the sample surface and the force sensing cantilever.
    • 原子力显微镜,其中由于表面力的力传感探针的偏转被施加到力感测悬臂上的小磁性颗粒的相反的磁力抵消。 通过将来自悬臂的激光束反射到位置敏感检测器来检测力感测悬臂的偏转。 来自位置敏感检测器的电压信号用于驱动积分伺服回路,其驱动靠近力感测悬臂的螺线管中的电流,并施加与力感测悬臂与样本表面之间的原子吸力相反的力 通过附着在悬臂上的小磁性颗粒并使其磁矩与螺线管的轴线对齐。 以这种方式,可以防止在伺服控制系统的范围内的力的力传感悬臂的偏转。 悬臂的驱动信号是显微镜操作力的量度,可用于驱动常规的原子力显微镜控制器以产生表面的地形图像。 该系统工作在淹没在水和其他液体中,可以用于表面软化表面,同时避免通过样品表面和力感测悬臂之间的有吸引力的相互作用将力感测悬臂拉入样品表面的问题。
    • 78. 发明授权
    • Method and apparatus of inspecting foreign matters during mass
production start-up and mass production line in semiconductor
production process
    • 在半导体生产过程中批量生产启动和批量生产线中检查异物的方法和装置
    • US5233191A
    • 1993-08-03
    • US679317
    • 1991-04-02
    • Minori NoguchiYukio KemboHiroshi MoriokaHiroshi YamaguchiMakiko KohnoYoshimasa Ohshima
    • Minori NoguchiYukio KemboHiroshi MoriokaHiroshi YamaguchiMakiko KohnoYoshimasa Ohshima
    • G01N21/94G01N21/956G01Q10/00G01Q30/02G01Q30/04G01Q30/14G01Q60/10G01R31/311H01J37/256H01L21/00H01L21/66
    • H01L21/67253G01R31/311H01J37/256H01L21/67276H01L21/67288H01L22/20B82Y35/00G01N2021/8822G01N21/94G01N21/95623
    • Method and apparatus of detecting, analyzing and evaluating the content of foreign matters such as dusts and impurities contained in various materials, units, processes and environment standing for constituting components of a mass production line during mass production start-up and during mass production, in order to manage a semiconductor production process. A mass production off-line system including an apparatus for detecting, analyzing and evaluating the content of foreign matters during the mass production start-up is separated from the production line and installed independently thereof. Monitors for detection of foreign matters are provided at necessary locations in the production line and monitor data is evaluated through various units to manage the content of foreign matters in the production line, permitting efficient and economical mass production start-up and mass production. The kind of element of a foreign matter on sampling wafer detected in the mass production line is analyzed by means of STM/STS and the results are compared with a data base to effect identification. A foreign matter or a contaminant is detected by detecting a scatttered beam, of a light spot which scans the surface of a substrate. The detection of the scattered beam is carried out under the condition that Rayleigh scattering of the light spot on the light spot irradiation and reflection paths and Rayleigh scattering of the scattered beam on the scattered beam detection path are suppressed to a minimum. For the suppression of Rayleigh scattering, a low-pressure or low-temperature atmosphere may be used.
    • 检测,分析和评估大规模生产启动期间和批量生产期间大规模生产线组成部件的各种材料,单位,工艺和环境中所含的灰尘和杂质等杂质的含量, 为了管理半导体生产过程。 包括用于在批量生产启动期间检测,分析和评估异物含量的装置的批量生产离线系统与生产线分离并独立安装。 在生产线必需的位置提供检测异物的监测器,通过各种单位对监测数据进行评估,对生产线内的异物含量进行管理,实现高效,经济的批量生产启动和批量生产。 通过STM / STS分析在大规模生产线上检测到的采样晶圆上的异物元素的种类,并将结果与​​数据库进行比较以进行识别。 通过检测扫描基板表面的光斑的光斑光束来检测异物或污染物。 在光点照射和反射路径上的光斑的瑞利散射和散射光束检测路径上的散射光束的瑞利散射被抑制到最小的条件下进行散射光束的检测。 为了抑制瑞利散射,可以使用低压或低温气氛。