专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

71. 发明授权

US07071088B2 Method for fabricating bulbous-shaped vias 失效
标题翻译：制造球状通孔的方法
公开(公告)号：US07071088B2
公开(公告)日：2006-07-04
申请号：US10227105
申请日：2002-08-23
申请人： Michael P. C. Watts , Sidlgata V. Sreenivasan
发明人： Michael P. C. Watts , Sidlgata V. Sreenivasan
IPC分类号： H01L21/44
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , H01L21/0272 , H01L21/28587 , H01L21/312 , H01L21/76804 , H01L21/76817
摘要： The present invention provides a method for fabricating bulbous-shaped vias on a substrate, having a surface, by disposing, on the substrate, a polymerizable fluid composition. A mold is placed in contact with the polymerizable fluid composition. The mold includes a relief structure on a surface thereof to create a recess in a layer of the polymerizable fluid composition. The polymerizable fluid composition is subjected to conditions to cause polymerization, forming a polymerized layer having a solidified indentation. An opening to the surface of the substrate is formed by removing material disposed on the substrate surface through etch processes. In a further embodiment a conductive layer may be disposed in the opening to form a gate. A lift-off process may be employed to remove the polymerized layer.
摘要翻译：本发明提供一种在基板上制造球状通孔的方法，其具有通过在基板上设置可聚合流体组合物的表面。将模具放置成与可聚合流体组合物接触。模具在其表面上包括浮雕结构，以在可聚合流体组合物的层中形成凹部。可聚合流体组合物经历引起聚合的条件，形成具有固化压痕的聚合层。通过蚀刻处理去除设置在基板表面上的材料来形成通向基板表面的开口。在另一个实施例中，导电层可以设置在开口中以形成栅极。可以采用剥离工艺来除去聚合层。

72. 发明授权

US07070405B2 Alignment systems for imprint lithography 有权
标题翻译：刻印光刻对准系统
公开(公告)号：US07070405B2
公开(公告)日：2006-07-04
申请号：US10210894
申请日：2002-08-01
申请人： Sidlgata V Sreenivasan , Michael P. C. Watts , Byung Jin Choi , Ronald D. Voisin , Norman E. Schumaker
发明人： Sidlgata V Sreenivasan , Michael P. C. Watts , Byung Jin Choi , Ronald D. Voisin , Norman E. Schumaker
IPC分类号： B32B37/02
CPC分类号： G03F7/0002 , B29C35/0888 , B29C59/02 , B29C59/026 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00
摘要： Described are systems for patterning a substrate by imprint lithography. Imprint lithography systems include an imprint head configured to hold a template in a spaced relation to a substrate. The imprint lithography system is configured to dispense an activating light curable liquid onto a substrate or template. The system includes a light source that applies activating light to cure the activating light curable liquid. Multiple optical imaging devices are used to align the template with the substrate.
摘要翻译：描述的是通过压印光刻来图案化衬底的系统。压印光刻系统包括压印头，其被配置为将模板保持为与衬底间隔开的关系。压印光刻系统被配置为将激活光可固化液体分配到基底或模板上。该系统包括施加激活光以固化活化光可固化液体的光源。使用多个光学成像装置将模板与衬底对准。

73. 发明申请

US20060121141A1 System for controlling a volume of material on a mold 有权
标题翻译：用于控制模具上的材料体积的系统
公开(公告)号：US20060121141A1
公开(公告)日：2006-06-08
申请号：US11101139
申请日：2005-04-07
申请人： Steven Shackleton , Ian McMackin , Pankaj Lad , Van Truskett
发明人： Steven Shackleton , Ian McMackin , Pankaj Lad , Van Truskett
IPC分类号： B29C35/08
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10S977/887
摘要： A system for controlling a volume of liquid on a mold that features a body defining a volume with an aperture formed into the body and positioned proximate to the mold. A pump system is in fluid communication with the body, and the aperture and the pump system are established to create a stream of fluid moving between the mold and the volume. In this manner a quantity of fluid is removed while retained upon the mold is a desired portion of the fluid to undertake imprint lithographic processes.
摘要翻译：一种用于控制模具上的液体体积的系统，其特征在于，具有限定体积的主体，所述体积具有形成在所述主体中并且定位成靠近所述模具的孔。泵系统与主体流体连通，并且孔和泵系统被建立以产生在模具和体积之间移动的流体流。以这种方式，除去一定量的流体，同时保留在模具上是流体的期望部分以进行压印光刻工艺。

74. 发明授权

US07041604B2 Method of patterning surfaces while providing greater control of recess anisotropy 失效
标题翻译：图案化表面的方法同时提供更大的凹陷各向异性的控制
公开(公告)号：US07041604B2
公开(公告)日：2006-05-09
申请号：US10946159
申请日：2004-09-21
申请人： Michael N. Miller , Nicholas A. Stacey
发明人： Michael N. Miller , Nicholas A. Stacey
IPC分类号： H01L21/302 , H01L21/461
CPC分类号： H01L21/3081 , B29C43/003 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L21/02118 , H01L21/02126 , H01L21/022 , H01L21/02274 , H01L21/0228 , H01L21/02282 , H01L21/3086 , H01L21/31116 , H01L21/31138 , H01L21/31144 , H01L21/312 , H01L21/3121
摘要： The present invention features a method of patterning a substrate that includes forming, on the substrate, a multi-layer film defining an etch rate interface having a plurality of first portions that having a first etch rate associated therewith. The multi-layer film includes a second portion having a second etch rate associated therewith. Adjacent first portions are separated by the second portion. A pattern is transferred onto the substrate that is defined, in part, by the junction. The difference between the first and second etch rates is selected to minimize bowing of recessed features formed in the pattern.
摘要翻译：本发明的特征在于一种图案化衬底的方法，其包括在衬底上形成限定具有与其相关联的具有第一蚀刻速率的多个第一部分的蚀刻速率界面的多层膜。多层膜包括具有与其相关联的第二蚀刻速率的第二部分。相邻的第一部分由第二部分分开。图案被转移到基底上，该基底部分由接合部限定。选择第一和第二蚀刻速率之间的差异以最小化在图案中形成的凹陷特征的弯曲。

75. 发明授权

US07037639B2 Methods of manufacturing a lithography template 失效
公开(公告)号：US07037639B2
公开(公告)日：2006-05-02
申请号：US10136188
申请日：2002-05-01
申请人： Ronald D. Voisin
发明人： Ronald D. Voisin
IPC分类号： G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F1/34 , G03F7/0017 , G03F7/093
摘要： A method for forming imprint lithography templates is described herein. The method includes forming a masking layer and a conductive layer on a substrate surface. The use of a conductive layer allows patterning of the masking layer using electron beam pattern generators. The substrate is etched using the patterned masking layer to produce a template.

76. 发明申请

US20060076717A1 Step and repeat imprint lithography processes 有权
公开(公告)号：US20060076717A1
公开(公告)日：2006-04-13
申请号：US11127041
申请日：2005-05-11
申请人： Sidlgata Sreenivasan , Byung Choi , Norman Schumaker , Ronald Voisin , Michael Watts , Mario Meissl
发明人： Sidlgata Sreenivasan , Byung Choi , Norman Schumaker , Ronald Voisin , Michael Watts , Mario Meissl
IPC分类号： B29C35/08 , B29C41/02 , B29C41/12
CPC分类号： B81C1/0046 , B82Y10/00 , B82Y30/00 , B82Y40/00 , G03F7/0002
摘要： The present invention is directed to methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. In one embodiment, the imprint process is designed to imprint only a portion of the substrate. The remainder of the substrate is imprinted by moving the template to a different portion of the template and repeating the imprint lithography process.

77. 发明授权

US07027156B2 Scatterometry alignment for imprint lithography 失效
公开(公告)号：US07027156B2
公开(公告)日：2006-04-11
申请号：US10210785
申请日：2002-08-01
申请人： Michael P. C. Watts , Ian McMackin
发明人： Michael P. C. Watts , Ian McMackin
IPC分类号： G01B11/00 , G03F9/00 , G03C5/00
CPC分类号： B29C35/0888 , B29C59/022 , B29C59/026 , B29C2035/0827 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/00
摘要： Described are methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. Alignment of the template with a previously formed layer on a substrate, in one embodiment, is accomplished by using scatterometry.

78. 发明申请

US20060063277A1 Method of forming an in-situ recessed structure 有权
标题翻译：形成原位凹陷结构的方法
公开(公告)号：US20060063277A1
公开(公告)日：2006-03-23
申请号：US10946565
申请日：2004-09-21
申请人： David Vidusek , Sidlgata Sreenivasan , David Wang
发明人： David Vidusek , Sidlgata Sreenivasan , David Wang
IPC分类号： B44C1/22 , H01L21/00
CPC分类号： B81C1/00626
摘要： The present invention features a method of patterning a substrate that includes forming from a first material, disposed on the substrate, a first film having an original pattern that includes a plurality of projections. The projections extend from a nadir surface terminating in an apex surface defining a height therebetween. A portion of the first film in superimposition with the nadir surface defines a nadir portion. The nadir portion is removed to expose a region of the substrate in superimposition therewith, defining a plurality of recessions. A second material is disposed upon the first film to form a second film having a surface spaced-apart from the apex surface of the plurality of projections and filling the plurality of recessions to form a multi-film stack. The first film and portions of the second film are removed to create a plurality of spaced-apart projections of the second material on the substrate.
摘要翻译：本发明的特征在于一种图案化衬底的方法，其包括由设置在衬底上的第一材料形成具有包括多个突起的原始图案的第一膜。突起从最终的表面延伸，终止于限定其间的高度的顶点表面。第一膜中与最低点表面重叠的部分限定最低点部分。去除最低点部分以暴露衬底的区域，从而限定多个凹陷。第二材料设置在第一膜上以形成具有与多个突起的顶点表面间隔开的表面并填充多个凹陷以形成多层叠层的第二膜。去除第一膜和第二膜的部分以在基板上产生多个间隔开的第二材料的突出部分。

79. 发明申请

US20060005657A1 Method and system to control movement of a body for nano-scale manufacturing 审中-公开
标题翻译：用于控制身体运动的方法和系统用于纳米级制造
公开(公告)号：US20060005657A1
公开(公告)日：2006-01-12
申请号：US11142825
申请日：2005-06-01
申请人： Byung-Jin Choi , Sidlgata Sreenivasan
发明人： Byung-Jin Choi , Sidlgata Sreenivasan
IPC分类号： G05G11/00
CPC分类号： G03F7/0002 , B29C43/021 , B29C59/022 , B29C2043/025 , B29C2043/5858 , B29C2059/023 , B82Y10/00 , B82Y40/00 , Y10T74/20341
摘要： The present invention is directed towards a method and system of controlling movement of a body coupled to an actuation system that features translating movement of the body in a plane extending by imparting angular motion in the actuation system with respect to two spaced-apart axes. Specifically, rotational motion is generated in two spaced-apart planes, one of which extends parallel to the plane in which the body translates. This facilitates proper orientation of the body with respect to a surface spaced-apart therefrom.
摘要翻译：本发明涉及一种控制耦合到致动系统的主体的运动的方法和系统，其特征在于，通过相对于两个间隔开的轴线在致动系统中施加角运动而延伸的平面中的本体运动。具体地说，在两个间隔开的平面中产生旋转运动，其中一个平行于主体平移的平面。这有助于身体相对于与其间隔开的表面的适当取向。

80. 发明授权

US06936194B2 Functional patterning material for imprint lithography processes 失效
标题翻译：用于压印光刻工艺的功能图案材料
公开(公告)号：US06936194B2
公开(公告)日：2005-08-30
申请号：US10235314
申请日：2002-09-05
申请人： Michael P. C. Watts
发明人： Michael P. C. Watts
IPC分类号： G02B6/12 , G02B6/138 , G03F7/00 , B29D11/00
CPC分类号： G03F7/0002 , B29L2011/0016 , B82Y10/00 , B82Y40/00 , G02B6/138 , G02B2006/12147
摘要： The present invention provides a method for forming an optical coupling device on a substrate by disposing a material onto the substrate that is polymerizable in response to actinic radiation. A stack of the material is formed by contacting the material with a template having a stepped-recess formed therein. The material is then solidified into an optically transparent body with a surface having a plurality of steps by subjecting the stack to actinic radiation. To that end, the material may comprise an acrylate component selected from a set of acrylates consisting essentially of ethylene dio diacrylate, t-butyl acrylate, bisphenol A diacrylate, acrylate terminated polysiloxane, polydifluoromethylene diacrylate, perfluoropolyether diacrylates and chlorofluorodiacrylates. Alternatively, the material may include a silylated component selected from a group consisting essentially of (3-acryloxypropyltristrimethylsiloxy) silane.
摘要翻译：本发明提供一种在基板上形成光耦合装置的方法，该方法是将材料设置在基于光化辐射可聚合的基板上。通过使材料与其中形成有阶梯形凹部的模板接触来形成材料的堆叠。然后将该材料固化成光学透明体，其表面具有多个步骤，通过使叠层经受光化辐射。为此，该材料可以包括丙烯酸酯组分，其选自基本上由二丙烯酸二乙酯，丙烯酸叔丁酯，双酚A二丙烯酸酯，丙烯酸酯封端的聚硅氧烷，聚二氟亚甲基二丙烯酸酯，全氟聚醚二丙烯酸酯和氯氟代二丙烯酸酯组成的一组丙烯酸酯。或者，材料可以包括选自基本上由（3-丙烯酰氧基丙基三甲基甲硅烷氧基）硅烷组成的组的甲硅烷基化组分。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式