专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US07727453B2 Step and repeat imprint lithography processes 有权
标题翻译：步骤和重复刻印光刻工艺
公开(公告)号：US07727453B2
公开(公告)日：2010-06-01
申请号：US11127041
申请日：2005-05-11
申请人： Sidlgata V. Sreenivasan , Byung J. Choi , Norman E. Schumaker , Ronald D. Voisin , Michael P. C. Watts , Mario J. Meissl
发明人： Sidlgata V. Sreenivasan , Byung J. Choi , Norman E. Schumaker , Ronald D. Voisin , Michael P. C. Watts , Mario J. Meissl
IPC分类号： B29C35/08 , B29C41/12 , B29C41/52 , B81C1/00
CPC分类号： B81C1/0046 , B82Y10/00 , B82Y30/00 , B82Y40/00 , G03F7/0002
摘要： The present invention is directed to a method of forming a layer on a region of a substrate, the method including, inter alia, positioning a liquid on the substrate; and contacting the liquid with the mold, defining a gap between the mold and the substrate, with the gap enabling positioning of the liquid by capillary forces to generate the layer over the region.
摘要翻译：本发明涉及一种在衬底的区域上形成层的方法，该方法尤其包括将液体定位在衬底上; 并且使液体与模具接触，从而在模具和衬底之间形成间隙，间隙使得能够通过毛细管力定位液体以在该区域上产生层。

2. 发明授权

US07279113B2 Method of forming a compliant template for UV imprinting 有权
标题翻译：形成用于UV印记的兼容模板的方法
公开(公告)号：US07279113B2
公开(公告)日：2007-10-09
申请号：US11298244
申请日：2005-12-09
申请人： Michael P. C. Watts , Ronald D. Voisin , Sidlgata V. Sreenivasan
发明人： Michael P. C. Watts , Ronald D. Voisin , Sidlgata V. Sreenivasan
IPC分类号： B44C1/22
CPC分类号： G03F7/0002 , B29C43/003 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0017
摘要： A method of forming a lithographic template having an elastomer layer positioned between a body and an imprinting layer, the imprinting layer having a pattern formed thereon.
摘要翻译：一种形成具有位于主体和压印层之间的弹性体层的光刻模板的方法，所述压印层具有形成在其上的图案。

3. 发明授权

US06982783B2 Chucking system for modulating shapes of substrates 有权
标题翻译：用于调制基板形状的卡盘系统
公开(公告)号：US06982783B2
公开(公告)日：2006-01-03
申请号：US10864591
申请日：2004-06-09
申请人： Byung J. Choi , Ronald D. Voisin , Sidlgata V. Sreenivasan , Michael P. C. Watts , Daniel Babbs , Mario J. Meissl , Hillman Bailey , Norman E. Schumaker
发明人： Byung J. Choi , Ronald D. Voisin , Sidlgata V. Sreenivasan , Michael P. C. Watts , Daniel Babbs , Mario J. Meissl , Hillman Bailey , Norman E. Schumaker
IPC分类号： G03B27/58 , G03B27/42
CPC分类号： G03F7/70875 , B29C33/20 , B29C43/003 , B29C43/021 , B29C43/36 , B29C43/58 , B29C2043/025 , B29C2043/3233 , B29C2043/3488 , B29C2043/5841 , B29D11/00365 , G03B27/62 , G03F7/707
摘要： The present invention is directed to a chucking system to modulate substrates so as to properly shape and position the same with respect to a wafer upon which a pattern is to be formed with the substrate.
摘要翻译：本发明涉及一种夹持系统，用于调制基板，以便相对于其上将与基底形成图案的晶片适当地成形和定位基板。

4. 发明申请

US20110221095A1 Step and Repeat Imprint Lithography Process 有权
标题翻译：步骤和重复印记平版印刷工艺
公开(公告)号：US20110221095A1
公开(公告)日：2011-09-15
申请号：US13108614
申请日：2011-05-16
申请人： Sidlgata V. Sreenivasan , Byung J. Choi , Norman E. Schumaker , Ronald D. Voisin , Michael P. C. Watts , Mario J. Meissl
发明人： Sidlgata V. Sreenivasan , Byung J. Choi , Norman E. Schumaker , Ronald D. Voisin , Michael P. C. Watts , Mario J. Meissl
IPC分类号： B29C59/02 , B29D11/00
CPC分类号： B81C1/0046 , B82Y10/00 , B82Y30/00 , B82Y40/00 , G03F7/0002
摘要： The present invention is directed to methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. In one embodiment, the imprint process is designed to imprint only a portion of the substrate. The remainder of the substrate is imprinted by moving the template to a different portion of the template and repeating the imprint lithography process.
摘要翻译：本发明涉及通过压印光刻图案化衬底的方法。压印光刻是将液体分配到基板上的过程。使模板与液体接触并且液体被固化。固化液体包括在模板中形成的任何图案的印记。在一个实施例中，压印工艺被设计成仅印刷基板的一部分。通过将模板移动到模板的不同部分并重复压印光刻工艺来印刷衬底的其余部分。

5. 发明授权

US07077992B2 Step and repeat imprint lithography processes 有权
标题翻译：步骤和重复刻印光刻工艺
公开(公告)号：US07077992B2
公开(公告)日：2006-07-18
申请号：US10194991
申请日：2002-07-11
申请人： Sidlgata V. Sreenivasan , Byung J. Choi , Norman E. Schumaker , Ronald D. Voisin , Michael P. C. Watts , Mario J. Meissl
发明人： Sidlgata V. Sreenivasan , Byung J. Choi , Norman E. Schumaker , Ronald D. Voisin , Michael P. C. Watts , Mario J. Meissl
IPC分类号： B29C33/40 , B29C35/08 , B29C41/02 , B29C41/22 , B29C59/02
CPC分类号： B81C1/0046 , B82Y10/00 , B82Y30/00 , B82Y40/00 , G03F7/0002
摘要： The present invention is directed to methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. In one embodiment, the imprint process is designed to imprint only a portion of the substrate. The remainder of the substrate is imprinted by moving the template to a different portion of the template and repeating the imprint lithography process.
摘要翻译：本发明涉及通过压印光刻图案化衬底的方法。压印光刻是将液体分配到基板上的过程。使模板与液体接触并且液体被固化。固化液体包括在模板中形成的任何图案的印记。在一个实施例中，压印工艺被设计成仅印刷基板的一部分。通过将模板移动到模板的不同部分并重复压印光刻工艺来印刷衬底的其余部分。

6. 发明授权

US07071088B2 Method for fabricating bulbous-shaped vias 失效
标题翻译：制造球状通孔的方法
公开(公告)号：US07071088B2
公开(公告)日：2006-07-04
申请号：US10227105
申请日：2002-08-23
申请人： Michael P. C. Watts , Sidlgata V. Sreenivasan
发明人： Michael P. C. Watts , Sidlgata V. Sreenivasan
IPC分类号： H01L21/44
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , H01L21/0272 , H01L21/28587 , H01L21/312 , H01L21/76804 , H01L21/76817
摘要： The present invention provides a method for fabricating bulbous-shaped vias on a substrate, having a surface, by disposing, on the substrate, a polymerizable fluid composition. A mold is placed in contact with the polymerizable fluid composition. The mold includes a relief structure on a surface thereof to create a recess in a layer of the polymerizable fluid composition. The polymerizable fluid composition is subjected to conditions to cause polymerization, forming a polymerized layer having a solidified indentation. An opening to the surface of the substrate is formed by removing material disposed on the substrate surface through etch processes. In a further embodiment a conductive layer may be disposed in the opening to form a gate. A lift-off process may be employed to remove the polymerized layer.
摘要翻译：本发明提供一种在基板上制造球状通孔的方法，其具有通过在基板上设置可聚合流体组合物的表面。将模具放置成与可聚合流体组合物接触。模具在其表面上包括浮雕结构，以在可聚合流体组合物的层中形成凹部。可聚合流体组合物经历引起聚合的条件，形成具有固化压痕的聚合层。通过蚀刻处理去除设置在基板表面上的材料来形成通向基板表面的开口。在另一个实施例中，导电层可以设置在开口中以形成栅极。可以采用剥离工艺来除去聚合层。

7. 发明授权

US07070405B2 Alignment systems for imprint lithography 有权
标题翻译：刻印光刻对准系统
公开(公告)号：US07070405B2
公开(公告)日：2006-07-04
申请号：US10210894
申请日：2002-08-01
申请人： Sidlgata V Sreenivasan , Michael P. C. Watts , Byung Jin Choi , Ronald D. Voisin , Norman E. Schumaker
发明人： Sidlgata V Sreenivasan , Michael P. C. Watts , Byung Jin Choi , Ronald D. Voisin , Norman E. Schumaker
IPC分类号： B32B37/02
CPC分类号： G03F7/0002 , B29C35/0888 , B29C59/02 , B29C59/026 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00
摘要： Described are systems for patterning a substrate by imprint lithography. Imprint lithography systems include an imprint head configured to hold a template in a spaced relation to a substrate. The imprint lithography system is configured to dispense an activating light curable liquid onto a substrate or template. The system includes a light source that applies activating light to cure the activating light curable liquid. Multiple optical imaging devices are used to align the template with the substrate.
摘要翻译：描述的是通过压印光刻来图案化衬底的系统。压印光刻系统包括压印头，其被配置为将模板保持为与衬底间隔开的关系。压印光刻系统被配置为将激活光可固化液体分配到基底或模板上。该系统包括施加激活光以固化活化光可固化液体的光源。使用多个光学成像装置将模板与衬底对准。

8. 发明授权

US06916584B2 Alignment methods for imprint lithography 有权
标题翻译：压印光刻对准方法
公开(公告)号：US06916584B2
公开(公告)日：2005-07-12
申请号：US10210780
申请日：2002-08-01
申请人： Sidlgata V Sreenivasan , Michael P. C. Watts , Byung J. Choi , Ronald D. Voisin
发明人： Sidlgata V Sreenivasan , Michael P. C. Watts , Byung J. Choi , Ronald D. Voisin
IPC分类号： B29C35/08 , B29C59/00 , B29C59/02 , G03F7/00 , G03F9/00 , G03C5/00
CPC分类号： B82Y10/00 , B29C35/0888 , B29C59/002 , B29C59/02 , B29C59/026 , B29C2035/0827 , B29C2059/023 , B82Y40/00 , G03F7/0002 , G03F9/00
摘要： Described are methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. Alignment of the template with the substrate is performed prior to curing the liquid. Alignment of the template with the substrate includes rotational alignment of the template with respect to the substrate.
摘要翻译：描述了通过压印光刻图案化衬底的方法。压印光刻是将液体分配到基板上的过程。使模板与液体接触并且液体被固化。固化液体包括在模板中形成的任何图案的印记。在固化液体之前进行模板与基底的对准。模板与衬底的对准包括模板相对于衬底的旋转对准。

9. 发明授权

US08066930B2 Forming a layer on a substrate 有权
标题翻译：在基材上形成一层
公开(公告)号：US08066930B2
公开(公告)日：2011-11-29
申请号：US12749552
申请日：2010-03-30
申请人： Sidlgata V. Sreenivasan , Michael P. C. Watts
发明人： Sidlgata V. Sreenivasan , Michael P. C. Watts
IPC分类号： B29C41/12 , B81C1/00
CPC分类号： G03F7/0002 , B29C59/02 , B82Y10/00 , B82Y40/00
摘要： The present invention is directed to a method of forming an imprinting layer on a substrate including high resolution features, and transferring the features into a solidified region of the substrate. Desired thickness of the residual layer may be minimized in addition to visco-elastic behavior of the material.
摘要翻译：本发明涉及一种在包括高分辨率特征的基板上形成压印层的方法，并将特征转移到基板的固化区域中。除了材料的粘弹性行为之外，残留层的期望厚度可以最小化。

10. 发明授权

US07442336B2 Capillary imprinting technique 有权
标题翻译：毛细管压印技术
公开(公告)号：US07442336B2
公开(公告)日：2008-10-28
申请号：US10645306
申请日：2003-08-21
申请人： Byung-Jin Choi , Sidlgata V. Sreenivasan , Michael P. C. Watts
发明人： Byung-Jin Choi , Sidlgata V. Sreenivasan , Michael P. C. Watts
IPC分类号： B29C35/08 , B29C41/12 , B81C1/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , C23F1/08
摘要： The present invention provides a method for patterning a substrate with a template having a mold that features positioning conformable material between the substrate and the mold and filling a volume defined between the mold and the substrate with the conformable material through capillary action between the conformable material and one of the mold and the substrate. Thereafter, the conformable material is solidified. Specifically, the distance between the mold and the substrate is controlled to a sufficient degree to attenuate, if not avoid, compressive forces between the mold and the substrate. As a result, upon initial contact of the mold with the conformable material, spontaneous capillary filling of the volume between the mold and the substrate occurs.
摘要翻译：本发明提供了一种用模板图案化模板的方法，该模板具有在基板和模具之间具有定位适形材料的模具，并且通过适形材料之间的毛细管作用在适形材料之间填充限定在模具和基板之间的体积，模具和基材之一。此后，使适形材料固化。具体地说，模具和基板之间的距离被控制到足够的程度以减小模具和基板之间的压缩力（如果不是避免的话）。结果，在模具与适形材料初次接触时，发生模具和基板之间的体积的自发毛细管填充。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式