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1. 发明申请

US20090278057A1 Pulsed-Laser Systems and Methods for Producing Holographic Stereograms 有权
标题翻译：脉冲激光系统和产生全息立体图的方法
公开(公告)号：US20090278057A1
公开(公告)日：2009-11-12
申请号：US12404053
申请日：2009-03-13
申请人： Craig Newswanger , Pankaj Lad , Robert L. Sitton , Qiang Huang , Michael A. Klug , Mark E. Holzbach
发明人： Craig Newswanger , Pankaj Lad , Robert L. Sitton , Qiang Huang , Michael A. Klug , Mark E. Holzbach
IPC分类号： G21G5/00
CPC分类号： G03H1/0476 , G02B27/2271 , G03H1/0465 , G03H1/181 , G03H1/268 , G03H2001/0413 , G03H2001/0415 , G03H2001/0423 , G03H2001/048 , G03H2001/0491 , G03H2001/0497 , G03H2001/2271 , G03H2001/2685 , G03H2001/2695 , G03H2222/18 , G03H2222/33 , G03H2223/26 , G03H2225/52 , G03H2225/61 , G03H2260/12
摘要： Pre-sensitization techniques can be used in conjunction with holographic recording materials to allow high quality holographic stereograms to be recorded in those holographic recording materials using pulsed lasers. Additional hologram production system hardware and software designs for use with pulsed lasers are disclosed.
摘要翻译：预致敏技术可以与全息记录材料一起使用，以便使用脉冲激光将高质量全息立体图记录在那些全息记录材料中。公开了用于脉冲激光器的附加全息图制作系统硬件和软件设计。

2. 发明申请

US20070275114A1 Partial Vacuum Environment Imprinting 有权
标题翻译：部分真空环境印刷
公开(公告)号：US20070275114A1
公开(公告)日：2007-11-29
申请号：US11695263
申请日：2007-04-02
申请人： Anshuman Cherala , Pankaj Lad , Ian McMackin , Byung-Jin Choi
发明人： Anshuman Cherala , Pankaj Lad , Ian McMackin , Byung-Jin Choi
IPC分类号： B29C47/76
CPC分类号： G03F7/0002 , B29C43/003 , B29C43/021 , B29C2043/025 , B29C2043/5833 , B82Y10/00 , B82Y40/00
摘要： The present invention is directed towards a method and a system to create and maintain a desired environment in the vicinity of a nano-imprint lithography template by creation of a partial vacuum using channels or holes in the template holding the nano-imprint mold.
摘要翻译：本发明涉及通过使用保持纳米压印模具的模板中的通道或孔产生部分真空来在纳米压印光刻模板附近创建和维持所需环境的方法和系统。

3. 发明申请

US20060121141A1 System for controlling a volume of material on a mold 有权
标题翻译：用于控制模具上的材料体积的系统
公开(公告)号：US20060121141A1
公开(公告)日：2006-06-08
申请号：US11101139
申请日：2005-04-07
申请人： Steven Shackleton , Ian McMackin , Pankaj Lad , Van Truskett
发明人： Steven Shackleton , Ian McMackin , Pankaj Lad , Van Truskett
IPC分类号： B29C35/08
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10S977/887
摘要： A system for controlling a volume of liquid on a mold that features a body defining a volume with an aperture formed into the body and positioned proximate to the mold. A pump system is in fluid communication with the body, and the aperture and the pump system are established to create a stream of fluid moving between the mold and the volume. In this manner a quantity of fluid is removed while retained upon the mold is a desired portion of the fluid to undertake imprint lithographic processes.
摘要翻译：一种用于控制模具上的液体体积的系统，其特征在于，具有限定体积的主体，所述体积具有形成在所述主体中并且定位成靠近所述模具的孔。泵系统与主体流体连通，并且孔和泵系统被建立以产生在模具和体积之间移动的流体流。以这种方式，除去一定量的流体，同时保留在模具上是流体的期望部分以进行压印光刻工艺。

4. 发明申请

US20050072757A1 Method of creating a turbulent flow of fluid between a mold and a substrate 失效
标题翻译：在模具和基材之间产生流体紊流的方法
公开(公告)号：US20050072757A1
公开(公告)日：2005-04-07
申请号：US10898034
申请日：2004-07-23
申请人： Ian McMackin , Nicholas Stacey , Daniel Babbs , Duane Voth , Michael Watts , Van Truskett , Frank Xu , Ronald Voisin , Pankaj Lad
发明人： Ian McMackin , Nicholas Stacey , Daniel Babbs , Duane Voth , Michael Watts , Van Truskett , Frank Xu , Ronald Voisin , Pankaj Lad
IPC分类号： B01D19/00 , B29C59/02 , C23F1/00 , G03F20060101 , G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10S425/06 , Y10S425/815 , Y10S438/909
摘要： The present invention is directed toward a method of controlling a turbulent flow of a fluid between a substrate and a template, and more specifically, controlling a turbulent flow of a fluid between droplets disposed on a substrate and a template. To that end, the method further comprises the ingression and egression of the fluid through a first and second aperture, and in a further embodiment, a plurality of apertures, to create such a turbulent flow of the fluid.
摘要翻译：本发明涉及一种控制衬底和模板之间的流体的紊流的方法，更具体地说，控制流体在设置在衬底和模板上的液滴之间的紊流。为此，该方法还包括流体通过第一和第二孔的进入和流出，并且在另一实施例中，多个孔，以产生流体的这种湍流。

5. 发明申请

US20050072755A1 Single phase fluid imprint lithography method 有权
标题翻译：单相流体压印光刻法
公开(公告)号：US20050072755A1
公开(公告)日：2005-04-07
申请号：US10677639
申请日：2003-10-02
申请人： Ian McMackin , Nicholas Stacey , Daniel Babbs , Duane Voth , Michael Watts , Van Truskett , Frank Xu , Ronald Voisin , Pankaj Lad
发明人： Ian McMackin , Nicholas Stacey , Daniel Babbs , Duane Voth , Michael Watts , Van Truskett , Frank Xu , Ronald Voisin , Pankaj Lad
IPC分类号： B01D19/00 , B29C59/02 , C23F1/00 , G03F20060101 , G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10S425/06 , Y10S425/815 , Y10S438/909
摘要： The present invention is directed toward a method for reducing pattern distortions in imprinting layers by reducing gas pockets present in a layer of viscous liquid deposited on a substrate. To that end, the method includes varying a transport of the gases disposed proximate to the viscous liquid. Specifically, the atmosphere proximate to the substrate wherein a pattern is to be recorded is saturated with gases that are either highly soluble, highly diffusive, or both with respect to the viscous liquid being deposited. Additionally, or in lieu of saturating the atmosphere, the pressure of the atmosphere may be reduced.
摘要翻译：本发明涉及通过减少存在于沉积在基底上的粘性液体层中的气穴来减少压印层中的图案失真的方法。为此，该方法包括改变靠近粘性液体设置的气体的输送。具体地，其中待记录图案的基板附近的气氛相对于被沉积的粘性液体是高度可溶的，高度扩散的或者两者都被饱和。另外，或者代替饱和气氛，可以降低气氛的压力。

6. 发明申请

US20070141271A1 METHOD FOR CONTROLLING DISTRIBUTION OF FLUID COMPONENTS ON A BODY 有权
标题翻译：控制流体成分在体内分布的方法
公开(公告)号：US20070141271A1
公开(公告)日：2007-06-21
申请号：US11608374
申请日：2006-12-08
申请人： Frank Xu , Ian McMackin , Pankaj Lad , Michael Watts
发明人： Frank Xu , Ian McMackin , Pankaj Lad , Michael Watts
IPC分类号： C08F2/48
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： The present invention provides a method of controlling the distribution of a fluid on a body that features compensating for varying distribution of constituent components of a composition that moved over a surface of a substrate. To that end, the method includes generating a sequence of patterns of liquid upon a substrate, each of which includes a plurality of spaced-apart liquid regions, with voids being defined between adjacent liquid regions. A second of the patterns of liquid of the sequence is arranged so that the liquid regions associated therewith are in superimposition with the voids of a first of the patterns of liquid of the sequence.
摘要翻译：本发明提供一种控制流体在体上的分布的方法，其特征在于补偿在衬底的表面上移动的组合物的组成成分的变化分布。为此，该方法包括在衬底上产生一系列液体图案，每个衬底包括多个间隔开的液体区域，空隙位于相邻的液体区域之间。布置了序列液体的第二种图案，使得与其相关联的液体区域与序列的第一种液体图案的空隙重叠。

7. 发明申请

US20060177535A1 Imprint lithography template to facilitate control of liquid movement 审中-公开
公开(公告)号：US20060177535A1
公开(公告)日：2006-08-10
申请号：US11051941
申请日：2005-02-04
申请人： Ian McMackin , Pankaj Lad , Van Truskett
发明人： Ian McMackin , Pankaj Lad , Van Truskett
IPC分类号： B29C59/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： The present invention is directed to a template that features a control surface extending from a periphery of a mold toward a recessed surface of the template forming an oblique angle between a portion of the control surface disposed proximate to the periphery.

8. 发明申请

US20060121728A1 Method for fast filling of templates for imprint lithography using on template dispense 有权
标题翻译：使用模板分配快速填充压印光刻模板的方法
公开(公告)号：US20060121728A1
公开(公告)日：2006-06-08
申请号：US11101140
申请日：2005-04-07
申请人： Ian McMackin , Pankaj Lad , Van Truskett
发明人： Ian McMackin , Pankaj Lad , Van Truskett
IPC分类号： H01L21/4763
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10S977/887
摘要： A method of depositing material upon a substrate features filling recesses of a substrate with liquid and removing material present on the substrate, outside of the recesses using fluid, i.e., apply a vacuum of a jet of fluid. To that end, one method of the present invention includes depositing a measure of liquid upon a surface of a substrate having a recess formed therein to ingress into a volume of the recess with a portion of the liquid. A quantity of the liquid is disposed upon regions of the surface proximate to the recess. Thereafter, the quantity of liquid is removed while maintaining the portion within the volume. In this manner, the portion may be transferred onto an additional substrate. More specifically, the portion may be placed in contact with a layer of flowable material and cross-linking therewith by exposing the liquid and the flowable material to actinic radiation.
摘要翻译：在衬底上沉积材料的方法特征在于，用液体填充衬底的凹槽，并且使用流体在凹槽外部除去存在于衬底上的材料，即施加流体射流的真空。为此，本发明的一种方法包括在其中形成有凹部的基底的表面上沉积液体量，以一部分液体进入凹部的体积。液体的数量被设置在靠近凹部的表面的区域上。此后，在将该部分保持在体积内的同时除去液体的量。以这种方式，该部分可以被转移到另外的基底上。更具体地说，该部分可以与一层可流动的材料接触并与之交联，通过将液体和可流动材料暴露于光化辐射。

9. 发明申请

US20060098260A1 Pulsed-laser systems and methods for producing holographic stereograms 有权
公开(公告)号：US20060098260A1
公开(公告)日：2006-05-11
申请号：US11301528
申请日：2005-12-13
申请人： Craig Newswanger , Pankaj Lad , Robert Sitton , Qiang Huang , Michael Klug , Mark Holzbach
发明人： Craig Newswanger , Pankaj Lad , Robert Sitton , Qiang Huang , Michael Klug , Mark Holzbach
IPC分类号： G02B5/32
CPC分类号： G03H1/0476 , G02B27/2271 , G03H1/0465 , G03H1/181 , G03H1/268 , G03H2001/0413 , G03H2001/0415 , G03H2001/0423 , G03H2001/048 , G03H2001/0491 , G03H2001/0497 , G03H2001/2271 , G03H2001/2685 , G03H2001/2695 , G03H2222/18 , G03H2222/33 , G03H2223/26 , G03H2225/52 , G03H2225/61 , G03H2260/12
摘要： Pre-sensitization techniques can be used in conjunction with holographic recording materials to allow high quality holographic stereograms to be recorded in those holographic recording materials using pulsed lasers. Additional hologram production system hardware and software designs for use with pulsed lasers are disclosed.

10. 发明申请

US20060035029A1 Method to provide a layer with uniform etch characteristics 有权
标题翻译：提供具有均匀蚀刻特性的层的方法
公开(公告)号：US20060035029A1
公开(公告)日：2006-02-16
申请号：US10919224
申请日：2004-08-16
申请人： Frank Xu , Christopher Mackay , Pankaj Lad , Ian McMackin , Van Truskett , Wesley Martin , Edward Fletcher , David Wang , Nicholas Stacey , Michael Watts
发明人： Frank Xu , Christopher Mackay , Pankaj Lad , Ian McMackin , Van Truskett , Wesley Martin , Edward Fletcher , David Wang , Nicholas Stacey , Michael Watts
IPC分类号： B05D3/12 , B05D3/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10T428/1386
摘要： The present invention includes a method and a composition to form a layer on a substrate having uniform etch characteristics. To that end, the method includes controlling variations in the characteristics of a solid layer, such etch characteristics over the area of the solid layer as a function of the relative rates of evaporation of the liquid components that comprise the composition from which the solid layer is formed.
摘要翻译：本发明包括在具有均匀蚀刻特性的基底上形成层的方法和组合物。为此，该方法包括控制固体层的特性的变化，这种固体层面积上的这种蚀刻特性是构成组合物的液体组分的相对蒸发速率的函数的函数，其中固体层是固体层形成。

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