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71. 发明授权

US06192064B1 Narrow band laser with fine wavelength control 有权
标题翻译：窄带激光器，具有良好的波长控制
公开(公告)号：US06192064B1
公开(公告)日：2001-02-20
申请号：US09470724
申请日：1999-12-22
申请人： John M. Algots , Christopher A. Marchi , Frederick G. Erie , Jesse D. Buck , Alexander I. Ershov , Palash P. Das , Igor V. Fomenkov
发明人： John M. Algots , Christopher A. Marchi , Frederick G. Erie , Jesse D. Buck , Alexander I. Ershov , Palash P. Das , Igor V. Fomenkov
IPC分类号： H01S308
CPC分类号： G03F7/70025 , G02B5/1828 , G03F7/70483 , G03F7/70575 , H01S3/02 , H01S3/03 , H01S3/08009 , H01S3/08059 , H01S3/08081 , H01S3/0812 , H01S3/086 , H01S3/10 , H01S3/105 , H01S3/1055 , H01S3/13 , H01S3/134 , H01S3/1392 , H01S3/225 , H01S3/2256
摘要： A smart laser having automatic computer control of pulse energy, wavelength and bandwidth using feedback signals from a wavemeter. Pulse energy is controlled by controlling discharge voltage. Wavelength is controlled by very fine and rapid positioning of an RMAX mirror in a line narrowing module. Bandwidth is controller by adjusting the curvature of a grating in the line narrowing module. Preferred embodiments include automatic feedback control of horizontal and vertical beam profile by automatic adjustment of a prism plate on which beam expander prisms are located and automatic adjustment of the RMAX tilt. Other preferred embodiments include automatic adjustment of the horizontal position of the laser chamber within the resonance cavity. In preferred embodiments, feedback signals from a wavelength monitor are used to position the RMAX mirror. In other preferred embodiments a separate laser beam reflected off the RMAX mirror on to a photodiode array is used to position the mirror.
摘要翻译：智能激光器具有使用来自波形计的反馈信号自动计算脉冲能量，波长和带宽的计算机控制。通过控制放电电压来控制脉冲能量。通过在线窄模块中的RMAX镜子的非常精细和快速的定位来控制波长。带宽是通过调整线窄化模块中的光栅的曲率来控制的。优选实施例包括通过自动调节光束扩展器棱镜所在的棱镜板和自动调整RMAX倾斜来自动反馈水平和垂直光束轮廓。其它优选实施例包括在谐振腔内自动调整激光室的水平位置。在优选实施例中，使用来自波长监视器的反馈信号来定位RMAX镜。在其它优选实施例中，使用从RMAX镜反射到光电二极管阵列上的分离的激光束来定位反射镜。

72. 发明授权

US08198615B2 Gas management system for a laser-produced-plasma EUV light source 有权
标题翻译：用于激光产生等离子体EUV光源的气体管理系统
公开(公告)号：US08198615B2
公开(公告)日：2012-06-12
申请号：US12658133
申请日：2010-02-02
申请人： Alexander N. Bykanov , Alexander I. Ershov , Igor V. Fomenkov , David C. Brandt
发明人： Alexander N. Bykanov , Alexander I. Ershov , Igor V. Fomenkov , David C. Brandt
IPC分类号： H05H1/00 , H05H1/24 , G21K5/00
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70175 , G03F7/70916 , H05G2/005 , H05G2/008 , Y10S422/906
摘要： Devices and corresponding methods of use are described herein which may comprise an enclosing structure defining a closed loop flow path and a system generating a plasma at a plasma site, e.g. laser produced plasma system, where the plasma site may be in fluid communication with the flow path. For the device, a gas may be disposed in the enclosing structure which may include an ion-stopping buffer gas and/or an etchant. A pump may be provided to force the gas through the closed loop flow path. One or more heat exchangers removing heat from gas flowing in the flow path may be provided. In some arrangements, a filter may be used to remove at least a portion of a target species from gas flowing in the flow path.
摘要翻译：本文描述了装置和相应的使用方法，其可以包括限定闭环流动路径的封闭结构和在等离子体位置处产生等离子体的系统，例如，激光产生的等离子体系统，其中等离子体位置可以与流动路径流体连通。对于该装置，气体可以设置在封闭结构中，其可以包括离子停止缓冲气体和/或蚀刻剂。可以提供泵以迫使气体通过闭环流动路径。可以提供一种或多种热交换器来从流动路径中流动的气体中除去热量。在一些布置中，可以使用过滤器来从在流动路径中流动的气体中去除至少一部分目标物种。

73. 发明申请

US20100140514A1 Gas management system for a laser-produced-plasma EUV light source 有权
标题翻译：用于激光产生等离子体EUV光源的气体管理系统
公开(公告)号：US20100140514A1
公开(公告)日：2010-06-10
申请号：US12658133
申请日：2010-02-02
申请人： Alexander N. Bykanov , Alexander I. Ershov , Igor V. Fomenkov , David C. Brandt
发明人： Alexander N. Bykanov , Alexander I. Ershov , Igor V. Fomenkov , David C. Brandt
IPC分类号： G21K5/00
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70175 , G03F7/70916 , H05G2/005 , H05G2/008 , Y10S422/906
摘要： Devices and corresponding methods of use are described herein which may comprise an enclosing structure defining a closed loop flow path and a system generating a plasma at a plasma site, e.g. laser produced plasma system, where the plasma site may be in fluid communication with the flow path. For the device, a gas may be disposed in the enclosing structure which may include an ion-stopping buffer gas and/or an etchant. A pump may be provided to force the gas through the closed loop flow path. One or more heat exchangers removing heat from gas flowing in the flow path may be provided. In some arrangements, a filter may be used to remove at least a portion of a target species from gas flowing in the flow path.
摘要翻译：本文描述了装置和相应的使用方法，其可以包括限定闭环流动路径的封闭结构和在等离子体位置处产生等离子体的系统，例如，激光产生的等离子体系统，其中等离子体位置可以与流动路径流体连通。对于该装置，气体可以设置在封闭结构中，其可以包括离子停止缓冲气体和/或蚀刻剂。可以提供泵以迫使气体通过闭环流动路径。可以提供一种或多种热交换器来从流动路径中流动的气体中除去热量。在一些布置中，可以使用过滤器来从在流动路径中流动的气体中去除至少一部分目标物种。

74. 发明申请

US20090095925A1 LPP EUV light source drive laser system 有权
标题翻译： LPP EUV光源驱动激光系统
公开(公告)号：US20090095925A1
公开(公告)日：2009-04-16
申请号：US12288970
申请日：2008-10-24
申请人： Alexander I. Ershov , Alexander N. Bykanov , Oleh Khodykin , Igor V. Fomenkov
发明人： Alexander I. Ershov , Alexander N. Bykanov , Oleh Khodykin , Igor V. Fomenkov
IPC分类号： G01J3/10
CPC分类号： H05G2/003 , H05G2/008
摘要： An apparatus and method is disclosed which may comprise a laser produced plasma EUV system which may comprise a drive laser producing a drive laser beam; a drive laser beam first path having a first axis; a drive laser redirecting mechanism transferring the drive laser beam from the first path to a second path, the second path having a second axis; an EUV collector optical element having a centrally located aperture; and a focusing mirror in the second path and positioned within the aperture and focusing the drive laser beam onto a plasma initiation site located along the second axis. The apparatus and method may comprise the drive laser beam is produced by a drive laser having a wavelength such that focusing on an EUV target droplet of less than about 100 μm at an effective plasma producing energy is not practical in the constraints of the geometries involved utilizing a focusing lens. The drive laser may comprise a CO2 laser. The drive laser redirecting mechanism may comprise a mirror.
摘要翻译：公开了一种可以包括激光产生等离子体EUV系统的装置和方法，其可以包括产生驱动激光束的驱动激光器; 具有第一轴的驱动激光束第一路径; 驱动激光重定向机构，其将所述驱动激光束从所述第一路径传递到第二路径，所述第二路径具有第二轴线; 具有中心定位的孔的EUV收集器光学元件; 以及在第二路径中的聚焦反射镜并且定位在孔内并将驱动激光束聚焦到沿着第二轴线定位的等离子体起始位置。该装置和方法可以包括驱动激光束由具有波长的驱动激光器产生，使得在有效的等离子体产生能量下聚焦在小于约100mum的EUV目标液滴在所涉及的几何形状的约束条件下是不切实际的聚焦镜头。驱动激光器可以包括CO2激光器。驱动激光重定向机构可以包括镜子。

75. 发明授权

US06094448A Grating assembly with bi-directional bandwidth control 有权
标题翻译：光栅组件，具有双向带宽控制
公开(公告)号：US06094448A
公开(公告)日：2000-07-25
申请号：US248466
申请日：1999-02-11
申请人： Igor V. Fomenkov , Frederick G. Erie , Alexander I. Ershov
发明人： Igor V. Fomenkov , Frederick G. Erie , Alexander I. Ershov
IPC分类号： H01S3/08 , G02B5/18 , G03F7/20 , H01S3/1055 , H01S3/13 , H01S3/137 , H01S3/225
CPC分类号： H01S3/08081 , G02B5/1828 , G03F7/70025 , G03F7/70483 , G03F7/70575 , H01S3/1055 , H01S3/13 , H01S3/225 , H01S3/08009
摘要： A bidirectional bandwidth controlled grating assembly. A spring housing is connected to one of two end plates extending away from the lined surface of the grating. An adjustment rod threaded through the other end plate extends into the spring housing. Inside the spring housing in a preferred embodiment are two compression springs mounted between pressure surfaces in the housing and a piston which is fixed on the adjustment rod. The lined surface of the grating can be made more concave (or less convex) by screwing the rod in a direction into the spring housing compressing one of the springs to push the end plates apart and the surface can be made more convex (or less concave) by screwing the rod in a direction out of the spring housing compressing the other spring to pull the end plates toward each other.
摘要翻译：双向带宽控制光栅组件。弹簧壳体连接到远离光栅的衬里表面延伸的两个端板之一。穿过另一端板的调节杆延伸到弹簧壳体中。在优选实施例中，在弹簧壳体的内部，两个压缩弹簧安装在壳体中的压力表面和固定在调节杆上的活塞之间。光栅的衬里表面可以通过将杆沿着弹簧壳体的方向拧入到压缩其中一个弹簧的方向上而变得更凹（或更小的凸起），以将端板推开，并且可以使表面更加凸出）通过将杆沿着弹簧壳体外的方向旋拧，压缩另一个弹簧以将端板朝向彼此拉动。

76. 发明授权

US08514486B2 Drive laser for EUV light source 有权
标题翻译：驱动激光用于EUV光源
公开(公告)号：US08514486B2
公开(公告)日：2013-08-20
申请号：US12927012
申请日：2010-11-03
申请人： Alexander I. Ershov , Igor V. Fomenkov , Norbert R. Bowering , Jerzy R. Hoffman
发明人： Alexander I. Ershov , Igor V. Fomenkov , Norbert R. Bowering , Jerzy R. Hoffman
IPC分类号： H01S3/00
CPC分类号： H01S3/105 , G03F7/70033 , H01S3/005 , H01S3/115 , H01S3/2232 , H01S3/225 , H01S3/2325 , H01S2301/02 , H05G2/003 , H05G2/008
摘要： A device comprising a laser source producing a continuous output on a beam path and an amplifier is disclosed. The device further includes a partially transmissive, partially reflective optic disposed on said beam path between said laser source and said amplifier. The device further includes a droplet generator positioned to deliver a droplet moving on a path intersecting said beam path, the droplet reflecting light to establish an optical cavity with said optic.
摘要翻译：公开了一种包括在光束路径上产生连续输出的激光源和放大器的装置。该装置还包括设置在所述激光源和所述放大器之间的所述光束路径上的部分透射的部分反射光学元件。该装置还包括液滴发生器，其定位成输送在与所述光束路径相交的路径上移动的液滴，液滴反射光以与所述光学器件建立光学腔。

77. 发明申请

US20120305810A1 Laser-Produced-Plasma EUV Light Source 有权
标题翻译：激光产生的等离子体EUV光源
公开(公告)号：US20120305810A1
公开(公告)日：2012-12-06
申请号：US13493871
申请日：2012-06-11
申请人： Alexander I. Ershov , Igor V. Fomenkov
发明人： Alexander I. Ershov , Igor V. Fomenkov
IPC分类号： G21K5/04 , F21V21/00
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70175 , G03F7/70916 , H05G2/005 , H05G2/008 , Y10S422/906
摘要： Devices and corresponding methods of use are described herein that may include an enclosing structure defining a closed loop flow path and a system generating a plasma at a plasma site, e.g. laser produced plasma system, where the plasma site may be in fluid communication with the flow path. For the device, a gas may be disposed in the enclosing structure which may include an ion-stopping buffer gas and/or an etchant. A pump may be provided to force the gas through the closed loop flow path. One or more heat exchangers removing heat from gas flowing in the flow path may be provided. In some arrangements, a filter may be used to remove at least a portion of a target species from gas flowing in the flow path.
摘要翻译：本文描述了设备和相应的使用方法，其可以包括限定闭环流动路径的封闭结构和在等离子体位置处产生等离子体的系统，例如，激光产生的等离子体系统，其中等离子体位置可以与流动路径流体连通。对于该装置，气体可以设置在封闭结构中，其可以包括离子停止缓冲气体和/或蚀刻剂。可以提供泵以迫使气体通过闭环流动路径。可以提供一种或多种热交换器来从流动路径中流动的气体中除去热量。在一些布置中，可以使用过滤器来从在流动路径中流动的气体中去除至少一部分目标物种。

78. 发明授权

US07872245B2 Systems and methods for target material delivery in a laser produced plasma EUV light source 有权
标题翻译：用于激光产生等离子体EUV光源的靶材料输送的系统和方法
公开(公告)号：US07872245B2
公开(公告)日：2011-01-18
申请号：US12214736
申请日：2008-06-19
申请人： Georgiy O. Vaschenko , Alexander N. Bykanov , Norbert R. Bowering , David C. Brandt , Alexander I. Ershov , Rodney D. Simmons , Oleh V. Khodykin , Igor V. Fomenkov
发明人： Georgiy O. Vaschenko , Alexander N. Bykanov , Norbert R. Bowering , David C. Brandt , Alexander I. Ershov , Rodney D. Simmons , Oleh V. Khodykin , Igor V. Fomenkov
IPC分类号： A61N5/00 , G21G5/00
CPC分类号： H05G2/003 , H05G2/006 , H05G2/008
摘要： Devices are disclosed herein which may comprise an EUV reflective optic having a surface of revolution that defines a rotation axis and a circular periphery. The optic may be positioned to incline the axis at a nonzero angle relative to a horizontal plane, and to establish a vertical projection of the periphery in the horizontal plane with the periphery projection bounding a region in the horizontal plane. The device may further comprise a system delivering target material, the system having a target material release point that is located in the horizontal plane and outside the region, bounded by the periphery projection and a system generating a laser beam for irradiating the target material to generate an EUV emission.
摘要翻译：本文公开的装置可以包括具有限定旋转轴线和圆形周边的旋转表面的EUV反射光学元件。光学元件可以被定位成相对于水平面以非零角度倾斜轴，并且在水平面中建立周边的垂直投影，其中周边突起界定水平面中的一个区域。该装置还可以包括传送目标材料的系统，该系统具有位于水平面内的区域外的外围突起的边界材料释放点和产生用于照射目标材料产生的激光束的系统 EUV排放。

79. 发明申请

US20090057567A1 Gas management system for a laser-produced-plasma EUV light source 有权
标题翻译：用于激光产生等离子体EUV光源的气体管理系统
公开(公告)号：US20090057567A1
公开(公告)日：2009-03-05
申请号：US11897644
申请日：2007-08-31
申请人： Alexander N. Bykanov , Alexander I. Ershov , Igor V. Fomenkov , David C. Brandt
发明人： Alexander N. Bykanov , Alexander I. Ershov , Igor V. Fomenkov , David C. Brandt
IPC分类号： H05G2/00 , H01H1/00
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70175 , G03F7/70916 , H05G2/005 , H05G2/008 , Y10S422/906
摘要： Devices and corresponding methods of use are described herein which may comprise an enclosing structure defining a closed loop flow path and a system generating a plasma at a plasma site, e.g. laser produced plasma system, where the plasma site may be in fluid communication with the flow path. For the device, a gas may be disposed in the enclosing structure which may include an ion-stopping buffer gas and/or an etchant. A pump may be provided to force the gas through the closed loop flow path. One or more heat exchangers removing heat from gas flowing in the flow path may be provided. In some arrangements, a filter may be used to remove at least a portion of a target species from gas flowing in the flow path.
摘要翻译：本文描述了装置和相应的使用方法，其可以包括限定闭环流动路径的封闭结构和在等离子体位置处产生等离子体的系统，例如，激光产生的等离子体系统，其中等离子体位置可以与流动路径流体连通。对于该装置，气体可以设置在封闭结构中，其可以包括离子停止缓冲气体和/或蚀刻剂。可以提供泵以迫使气体通过闭环流动路径。可以提供一种或多种热交换器来从流动路径中流动的气体中除去热量。在一些布置中，可以使用过滤器来从在流动路径中流动的气体中去除至少一部分目标物种。

80. 发明授权

US07491954B2 Drive laser delivery systems for EUV light source 失效
标题翻译：驱动用于EUV光源的激光输送系统
公开(公告)号：US07491954B2
公开(公告)日：2009-02-17
申请号：US11580414
申请日：2006-10-13
申请人： Alexander N. Bykanov , Igor V. Fomenkov , Oleh Khodykin , Alexander I. Ershov
发明人： Alexander N. Bykanov , Igor V. Fomenkov , Oleh Khodykin , Alexander I. Ershov
IPC分类号： H01J35/20
CPC分类号： H05G2/003 , G03F7/70033 , H01S3/0064 , H01S3/073 , H01S3/0805 , H01S3/08054 , H01S3/08059 , H01S3/083 , H01S3/10092 , H01S3/105 , H01S3/1066 , H01S3/115 , H01S3/121 , H01S3/127 , H01S3/2232 , H01S3/2316 , H01S3/2325 , H01S3/2383 , H05G2/008
摘要： An LPP EUV light source is disclosed having an optic positioned in the plasma chamber for reflecting EUV light generated therein and a laser input window. For this aspect, the EUV light source may be configured to expose the optic to a gaseous etchant pressure for optic cleaning while the window is exposed to a lower gaseous etchant pressure to avoid window coating deterioration. In another aspect, an EUV light source may comprise a target material positionable along a beam path to participate in a first interaction with light on the beam path; an optical amplifier; and at least one optic directing photons scattered from the first interaction into the optical amplifier to produce a laser beam on the beam path for a subsequent interaction with the target material to produce an EUV light emitting plasma.
摘要翻译：公开了一种LPP EUV光源，其具有位于等离子体室中的光学器件，用于反射在其中产生的EUV光和激光输入窗口。对于该方面，EUV光源可以被配置为将窗口暴露于更低的气体蚀刻剂压力以将窗口暴露于气体蚀刻剂压力以进行光学清洁，以避免窗口涂层变质。在另一方面，EUV光源可以包括沿着光束路径定位以参与与光束路径上的光的第一相互作用的目标材料; 光放大器; 以及至少一个光导向光子从第一相互作用散射到光放大器中以在光束路径上产生激光束，用于随后与目标材料的相互作用以产生EUV发光等离子体。

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