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1. 发明授权

US07872245B2 Systems and methods for target material delivery in a laser produced plasma EUV light source 有权
标题翻译：用于激光产生等离子体EUV光源的靶材料输送的系统和方法
公开(公告)号：US07872245B2
公开(公告)日：2011-01-18
申请号：US12214736
申请日：2008-06-19
申请人： Georgiy O. Vaschenko , Alexander N. Bykanov , Norbert R. Bowering , David C. Brandt , Alexander I. Ershov , Rodney D. Simmons , Oleh V. Khodykin , Igor V. Fomenkov
发明人： Georgiy O. Vaschenko , Alexander N. Bykanov , Norbert R. Bowering , David C. Brandt , Alexander I. Ershov , Rodney D. Simmons , Oleh V. Khodykin , Igor V. Fomenkov
IPC分类号： A61N5/00 , G21G5/00
CPC分类号： H05G2/003 , H05G2/006 , H05G2/008
摘要： Devices are disclosed herein which may comprise an EUV reflective optic having a surface of revolution that defines a rotation axis and a circular periphery. The optic may be positioned to incline the axis at a nonzero angle relative to a horizontal plane, and to establish a vertical projection of the periphery in the horizontal plane with the periphery projection bounding a region in the horizontal plane. The device may further comprise a system delivering target material, the system having a target material release point that is located in the horizontal plane and outside the region, bounded by the periphery projection and a system generating a laser beam for irradiating the target material to generate an EUV emission.
摘要翻译：本文公开的装置可以包括具有限定旋转轴线和圆形周边的旋转表面的EUV反射光学元件。光学元件可以被定位成相对于水平面以非零角度倾斜轴，并且在水平面中建立周边的垂直投影，其中周边突起界定水平面中的一个区域。该装置还可以包括传送目标材料的系统，该系统具有位于水平面内的区域外的外围突起的边界材料释放点和产生用于照射目标材料产生的激光束的系统 EUV排放。

2. 发明申请

US20090230326A1 Systems and methods for target material delivery in a laser produced plasma EUV light source 有权
标题翻译：用于激光产生等离子体EUV光源的靶材料输送的系统和方法
公开(公告)号：US20090230326A1
公开(公告)日：2009-09-17
申请号：US12214736
申请日：2008-06-19
申请人： Georgiy O. Vaschenko , Alexander N. Bykanov , Norbert R. Bowering , David C. Brandt , Alexander I. Ershov , Rodney D. Simmons , Oleh V. Khodykin , Igor V. Fomenkov
发明人： Georgiy O. Vaschenko , Alexander N. Bykanov , Norbert R. Bowering , David C. Brandt , Alexander I. Ershov , Rodney D. Simmons , Oleh V. Khodykin , Igor V. Fomenkov
IPC分类号： G21K5/00
CPC分类号： H05G2/003 , H05G2/006 , H05G2/008
摘要： Devices are disclosed herein which may comprise an EUV reflective optic having a surface of revolution that defines a rotation axis and a circular periphery. The optic may be positioned to incline the axis at a nonzero angle relative to a horizontal plane, and to establish a vertical projection of the periphery in the horizontal plane with the periphery projection bounding a region in the horizontal plane. The device may further comprise a system delivering target material, the system having a target material release point that is located in the horizontal plane and outside the region, bounded by the periphery projection and a system generating a laser beam for irradiating the target material to generate an EUV emission.
摘要翻译：本文公开的装置可以包括具有限定旋转轴线和圆形周边的旋转表面的EUV反射光学元件。光学元件可以被定位成相对于水平面以非零角度倾斜轴，并且在水平面中建立周边的垂直投影，其中周边突起界定水平面中的一个区域。该装置还可以包括传送目标材料的系统，该系统具有位于水平面内的区域外的外围突起的边界材料释放点和产生用于照射目标材料产生的激光束的系统 EUV排放。

3. 发明授权

US08314398B2 EUV light source components and methods for producing, using and refurbishing same 有权
标题翻译： EUV光源组件及其制造，使用和翻新方法
公开(公告)号：US08314398B2
公开(公告)日：2012-11-20
申请号：US13091923
申请日：2011-04-21
申请人： Norbert R. Bowering , Igor V. Fomenkov , Oleh V. Khodykin , Alexander N. Bykanov
发明人： Norbert R. Bowering , Igor V. Fomenkov , Oleh V. Khodykin , Alexander N. Bykanov
IPC分类号： G01J3/10
CPC分类号： G02B5/0891 , B82Y10/00 , G01J1/429 , G03F7/70941 , G03F7/70958 , G03F7/70975 , G21K2201/061 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/008
摘要： A method is disclosed for in-situ monitoring of an EUV mirror to determine a degree of optical degradation. The method may comprise the steps/acts of irradiating at least a portion of the mirror with light having a wavelength outside the EUV spectrum, measuring at least a portion of the light after the light has reflected from the mirror, and using the measurement and a pre-determined relationship between mirror degradation and light reflectivity to estimate a degree of multi-layer mirror degradation. Also disclosed is a method for preparing a near-normal incidence, EUV mirror which may comprise the steps/acts of providing a metallic substrate, diamond turning a surface of the substrate, depositing at least one intermediate material overlying the surface using a physical vapor deposition technique, and depositing a multi-layer mirror coating overlying the intermediate material.
摘要翻译：公开了一种用于EUV反射镜的原位监测以确定光学降解程度的方法。该方法可以包括用具有波长在EUV谱以外的波长的光照射反射镜的至少一部分的步骤/动作，在光已经从反射镜反射之后测量光的至少一部分，并且使用该测量和镜面退化和光反射率之间的预定关系，以估计多层镜面退化的程度。还公开了一种用于制备近似法线入射的EUV反射镜的方法，该反射镜可以包括提供金属基底的步骤/动作，转动基底的表面的金刚石，使用物理气相沉积沉积覆盖表面的至少一种中间材料技术，并沉积覆盖中间材料的多层镜面涂层。

4. 发明申请

US20090159808A1 EUV light source components and methods for producing, using and refurbishing same 有权
标题翻译： EUV光源组件及其制造，使用和翻新方法
公开(公告)号：US20090159808A1
公开(公告)日：2009-06-25
申请号：US12004871
申请日：2007-12-20
申请人： Norbert R. Bowering , Igor V. Fomenkov , Oleh V. Khodykin , Alexander N. Bykanov
发明人： Norbert R. Bowering , Igor V. Fomenkov , Oleh V. Khodykin , Alexander N. Bykanov
IPC分类号： G01J1/42 , C23C16/22
CPC分类号： G02B5/0891 , B82Y10/00 , G01J1/429 , G03F7/70941 , G03F7/70958 , G03F7/70975 , G21K2201/061 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/008
摘要： A method is disclosed for in-situ monitoring of an EUV mirror to determine a degree of optical degradation. The method may comprise the steps/acts of irradiating at least a portion of the mirror with light having a wavelength outside the EUV spectrum, measuring at least a portion of the light after the light has reflected from the mirror, and using the measurement and a pre-determined relationship between mirror degradation and light reflectivity to estimate a degree of multi-layer mirror degradation. Also disclosed is a method for preparing a near-normal incidence, EUV mirror which may comprise the steps/acts of providing a metallic substrate, diamond turning a surface of the substrate, depositing at least one intermediate material overlying the surface using a physical vapor deposition technique, and depositing a multi-layer mirror coating overlying the intermediate material.
摘要翻译：公开了一种用于EUV反射镜的原位监测以确定光学降解程度的方法。该方法可以包括用具有波长在EUV谱以外的波长的光照射反射镜的至少一部分的步骤/动作，在光已经从反射镜反射之后测量光的至少一部分，并且使用该测量和镜面退化和光反射率之间的预定关系，以估计多层镜面退化的程度。还公开了一种用于制备近似法线入射的EUV反射镜的方法，该反射镜可以包括提供金属基底的步骤/动作，转动基底的表面的金刚石，使用物理气相沉积沉积覆盖表面的至少一种中间材料技术，并沉积覆盖中间材料的多层镜面涂层。

5. 发明授权

US07465946B2 Alternative fuels for EUV light source 失效
标题翻译： EUV光源的替代燃料
公开(公告)号：US07465946B2
公开(公告)日：2008-12-16
申请号：US11406216
申请日：2006-04-17
申请人： Norbert R. Bowering , Oleh V. Khodykin , Alexander N. Bykanov , Igor V. Fomenkov
发明人： Norbert R. Bowering , Oleh V. Khodykin , Alexander N. Bykanov , Igor V. Fomenkov
IPC分类号： A61N5/06 , G01J3/10 , H05G2/00
CPC分类号： H05G2/006 , B82Y10/00 , G21K2201/061 , H05G2/003 , H05G2/005 , H05G2/008
摘要： An EUV light source is disclosed which may comprise at least one optical element having a surface, such as a multi-layer collector mirror; a laser source generating a laser beam; and a source material irradiated by the laser beam to form a plasma and emit EUV light. In one aspect, the source material may consist essentially of a tin compound and may generate tin debris by plasma formation which deposits on the optical element and, in addition, the tin compound may include an element that is effective in etching deposited tin from the optical element surface. Tin compounds may include SnBr4, SnBr2 and SnH4. In another aspect, an EUV light source may comprise a molten source material irradiated by a laser beam to form a plasma and emit EUV light, the source material comprising tin and at least one other metal, for example tin with Gallium and/or Indium.
摘要翻译：公开了一种EUV光源，其可以包括具有表面的至少一个光学元件，例如多层收集镜; 产生激光束的激光源; 以及由激光束照射以形成等离子体并发射EUV光的源材料。在一个方面，源材料可以基本上由锡化合物组成，并且可以通过沉积在光学元件上的等离子体形成而产生锡屑，此外，锡化合物可以包括有效地从光学蚀刻沉积的锡的元素元素表面。锡化合物可以包括SnBr4，SnBr2和SnH4。另一方面，EUV光源可以包括由激光束照射以形成等离子体并发射EUV光的熔融源材料，源材料包含锡和至少一种其它金属，例如锡与镓和/或铟。

6. 发明授权

US07928417B2 LPP EUV light source drive laser system 有权
标题翻译： LPP EUV光源驱动激光系统
公开(公告)号：US07928417B2
公开(公告)日：2011-04-19
申请号：US12288970
申请日：2008-10-24
申请人： Alexander I. Ershov , Alexander N. Bykanov , Oleh V. Khodykin , Igor V. Fomenkov
发明人： Alexander I. Ershov , Alexander N. Bykanov , Oleh V. Khodykin , Igor V. Fomenkov
IPC分类号： G01N21/00 , G01N21/33 , G01J1/00
CPC分类号： H05G2/003 , H05G2/008
摘要： An apparatus and method is disclosed which may comprise a laser produced plasma EUV system which may comprise a drive laser producing a drive laser beam; a drive laser beam first path having a first axis; a drive laser redirecting mechanism transferring the drive laser beam from the first path to a second path, the second path having a second axis; an EUV collector optical element having a centrally located aperture; and a focusing mirror in the second path and positioned within the aperture and focusing the drive laser beam onto a plasma initiation site located along the second axis. The apparatus and method may comprise the drive laser beam is produced by a drive laser having a wavelength such that focusing on an EUV target droplet of less than about 100 μm at an effective plasma producing energy is not practical in the constraints of the geometries involved utilizing a focusing lens. The drive laser may comprise a CO2 laser. The drive laser redirecting mechanism may comprise a mirror.
摘要翻译：公开了一种可以包括激光产生等离子体EUV系统的装置和方法，其可以包括产生驱动激光束的驱动激光器; 具有第一轴的驱动激光束第一路径; 驱动激光重定向机构，其将所述驱动激光束从所述第一路径传递到第二路径，所述第二路径具有第二轴线; 具有中心定位的孔的EUV收集器光学元件; 以及在第二路径中的聚焦反射镜并且定位在孔内并将驱动激光束聚焦到沿着第二轴线定位的等离子体起始位置。该装置和方法可以包括驱动激光束由具有波长的驱动激光器产生，使得在有效的等离子体产生能量下聚焦在小于约100μm的EUV目标液滴在所涉及的几何形状的约束条件下是不实际的聚焦镜头。驱动激光器可以包括CO2激光器。驱动激光重定向机构可以包括镜子。

7. 发明授权

US08461560B2 LPP EUV light source drive laser system 有权
标题翻译： LPP EUV光源驱动激光系统
公开(公告)号：US08461560B2
公开(公告)日：2013-06-11
申请号：US13087207
申请日：2011-04-14
申请人： Alexander I. Ershov , Alexander N. Bykanov , Oleh V. Khodykin , Igor V. Fomenkov
发明人： Alexander I. Ershov , Alexander N. Bykanov , Oleh V. Khodykin , Igor V. Fomenkov
IPC分类号： G01N21/00 , G01N21/33 , H05G2/00
CPC分类号： H05G2/003 , H05G2/008
摘要： An apparatus and method is disclosed which includes or employs an EUV light source comprising a laser device outputting a laser beam, a beam delivery system directing the laser beam to an irradiation site, and a material for interaction with the laser beam at the irradiation site to create an EUV light emitting plasma for use in processing substrates.
摘要翻译：公开了一种装置和方法，其包括或使用包括输出激光束的激光装置的EUV光源，将激光束引导到照射部位的光束传递系统，以及用于在照射部位与激光束相互作用的材料创建用于处理衬底的EUV发光等离子体。

8. 发明申请

US20090057567A1 Gas management system for a laser-produced-plasma EUV light source 有权
标题翻译：用于激光产生等离子体EUV光源的气体管理系统
公开(公告)号：US20090057567A1
公开(公告)日：2009-03-05
申请号：US11897644
申请日：2007-08-31
申请人： Alexander N. Bykanov , Alexander I. Ershov , Igor V. Fomenkov , David C. Brandt
发明人： Alexander N. Bykanov , Alexander I. Ershov , Igor V. Fomenkov , David C. Brandt
IPC分类号： H05G2/00 , H01H1/00
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70175 , G03F7/70916 , H05G2/005 , H05G2/008 , Y10S422/906
摘要： Devices and corresponding methods of use are described herein which may comprise an enclosing structure defining a closed loop flow path and a system generating a plasma at a plasma site, e.g. laser produced plasma system, where the plasma site may be in fluid communication with the flow path. For the device, a gas may be disposed in the enclosing structure which may include an ion-stopping buffer gas and/or an etchant. A pump may be provided to force the gas through the closed loop flow path. One or more heat exchangers removing heat from gas flowing in the flow path may be provided. In some arrangements, a filter may be used to remove at least a portion of a target species from gas flowing in the flow path.
摘要翻译：本文描述了装置和相应的使用方法，其可以包括限定闭环流动路径的封闭结构和在等离子体位置处产生等离子体的系统，例如，激光产生的等离子体系统，其中等离子体位置可以与流动路径流体连通。对于该装置，气体可以设置在封闭结构中，其可以包括离子停止缓冲气体和/或蚀刻剂。可以提供泵以迫使气体通过闭环流动路径。可以提供一种或多种热交换器来从流动路径中流动的气体中除去热量。在一些布置中，可以使用过滤器来从在流动路径中流动的气体中去除至少一部分目标物种。

9. 发明授权

US07671349B2 Laser produced plasma EUV light source 有权
标题翻译：激光产生等离子体EUV光源
公开(公告)号：US07671349B2
公开(公告)日：2010-03-02
申请号：US11786145
申请日：2007-04-10
申请人： Alexander N. Bykanov , Norbert Bowering , Igor V. Fomenkov , David C. Brandt , Alexander I. Ershov , Oleh Khodykin , William N. Partlo
发明人： Alexander N. Bykanov , Norbert Bowering , Igor V. Fomenkov , David C. Brandt , Alexander I. Ershov , Oleh Khodykin , William N. Partlo
IPC分类号： H04H1/04
CPC分类号： G03F7/70916 , B82Y10/00 , G03F7/70033 , G03F7/70908 , G03F7/70983 , H05G2/003 , H05G2/008
摘要： A device is disclosed which may comprise a system generating a plasma at a plasma site, the plasma producing EUV radiation and ions exiting the plasma. The device may also include an optic, e.g., a multi-layer mirror, distanced from the site by a distance, d, and a flowing gas disposed between the plasma and optic, the gas establishing a gas pressure sufficient to operate over the distance, d, to reduce ion energy below a pre-selected value before the ions reach the optic. In one embodiment, the gas may comprise hydrogen and in a particular embodiment, the gas may comprise greater than 50 percent hydrogen by volume.
摘要翻译：公开了一种可以包括在等离子体位置处产生等离子体的系统，等离子体产生EUV辐射和离开等离子体的离子的装置。该装置还可以包括一个光学元件，例如多个远离现场的多层反射镜，以及设置在等离子体和光学元件之间的流动气体，该气体建立足以在该距离上操作的气体压力， d，在离子到达光学器件之前，将离子能量降低到预先选定的值以下。在一个实施方案中，气体可以包含氢气，并且在一个具体实施方案中，气体可以包含大于50体积％的氢气。

10. 发明授权

US08198615B2 Gas management system for a laser-produced-plasma EUV light source 有权
标题翻译：用于激光产生等离子体EUV光源的气体管理系统
公开(公告)号：US08198615B2
公开(公告)日：2012-06-12
申请号：US12658133
申请日：2010-02-02
申请人： Alexander N. Bykanov , Alexander I. Ershov , Igor V. Fomenkov , David C. Brandt
发明人： Alexander N. Bykanov , Alexander I. Ershov , Igor V. Fomenkov , David C. Brandt
IPC分类号： H05H1/00 , H05H1/24 , G21K5/00
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70175 , G03F7/70916 , H05G2/005 , H05G2/008 , Y10S422/906
摘要： Devices and corresponding methods of use are described herein which may comprise an enclosing structure defining a closed loop flow path and a system generating a plasma at a plasma site, e.g. laser produced plasma system, where the plasma site may be in fluid communication with the flow path. For the device, a gas may be disposed in the enclosing structure which may include an ion-stopping buffer gas and/or an etchant. A pump may be provided to force the gas through the closed loop flow path. One or more heat exchangers removing heat from gas flowing in the flow path may be provided. In some arrangements, a filter may be used to remove at least a portion of a target species from gas flowing in the flow path.
摘要翻译：本文描述了装置和相应的使用方法，其可以包括限定闭环流动路径的封闭结构和在等离子体位置处产生等离子体的系统，例如，激光产生的等离子体系统，其中等离子体位置可以与流动路径流体连通。对于该装置，气体可以设置在封闭结构中，其可以包括离子停止缓冲气体和/或蚀刻剂。可以提供泵以迫使气体通过闭环流动路径。可以提供一种或多种热交换器来从流动路径中流动的气体中除去热量。在一些布置中，可以使用过滤器来从在流动路径中流动的气体中去除至少一部分目标物种。

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