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    • 74. 发明授权
    • Low loss SOI/CMOS compatible silicon waveguide and method of making the same
    • 低损耗SOI / CMOS兼容硅波导及其制造方法
    • US07118682B2
    • 2006-10-10
    • US10806738
    • 2004-03-23
    • Vipulkumar Kantilal PatelPrakash GothoskarRobert Keith MontgomeryMargaret Ghiron
    • Vipulkumar Kantilal PatelPrakash GothoskarRobert Keith MontgomeryMargaret Ghiron
    • B29D11/00
    • G02F1/025
    • A method and structure for reducing optical signal loss in a silicon waveguide formed within a silicon-on-insulator (SOI) structure uses CMOS processing techniques to round the edges/corners of the silicon material along the extent of the waveguiding region. One exemplary set of processes utilizes an additional, sacrificial silicon layer that is subsequently etched to form silicon sidewall fillets along the optical waveguide, the fillets thus “rounding” the edges of the waveguide. Alternatively, the sacrificial silicon layer can be oxidized to consume a portion of the underlying silicon waveguide layer, also rounding the edges. Instead of using a sacrificial silicon layer, an oxidation-resistant layer may be patterned over a blanket silicon layer, the pattern defined to protect the optical waveguiding region. A thermal oxidation process is then used to convert the exposed portion of the silicon layer into silicon dioxide, forming a bird's beak structure at the edges of the silicon layer, thus defining the “rounded” edges of the silicon waveguiding structure.
    • 用于减少在绝缘体上硅(SOI)结构中形成的硅波导中的光信号损耗的方法和结构使用CMOS处理技术来沿着波导区域的范围舍入硅材料的边缘/角。 一个示例性的工艺集合利用附加的牺牲硅层,其随后被蚀刻以沿着光波导形成硅侧壁圆角,因此圆角“波浪”了波导的边缘。 或者,牺牲硅层可以被氧化以消耗下面的硅波导层的一部分,也是边缘的四周。 代替使用牺牲硅层,可以在覆盖硅层上图案化抗氧化层,所述图案被限定为保护光波导区域。 然后使用热氧化工艺将硅层的暴露部分转化成二氧化硅,在硅层的边缘处形成鸟的喙结构,从而限定硅波导结构的“圆形”边缘。