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    • 2. 发明授权
    • Integrated approach for design, simulation and verification of monolithic, silicon-based opto-electronic circuits
    • 用于单片硅基光电路的设计,仿真和验证的综合方法
    • US07269809B2
    • 2007-09-11
    • US11159283
    • 2005-06-22
    • Kalpendu ShastriSoham PathakPrakash GothoskarPaulius MosinskisBipin Dama
    • Kalpendu ShastriSoham PathakPrakash GothoskarPaulius MosinskisBipin Dama
    • G06F17/50G06F17/10
    • G06F17/5036G06F17/5068
    • Computer-aided design (CAD) tools are used to perform the integrated design, verification and layout of electrical and optical components in a monolithic, silicon-based electro-optic chip. Separate top-level behavioral logic designs are prepared for the three different types of elements included within the final, silicon-based monolithic structure: (1) digital electronic integrated circuit elements; (2) analog/mixed signal electronic integrated circuit elements; and (3) opto-electronic elements (including passive and active optical elements). Once the behavioral logic design is completed, the results are combined and co-simulated. A physical layout design is developed and verified for each different type of element in the circuit. The separate physical layouts are then co-verified, to assess the properties of the overall physical design. The results of the co-simulation are compared to the results of the co-verification, with alterations made in the logic design and/or the physical layout until the desired operating parameters are obtained. Once the desired results are generated, conventional wafer-level fabrication operations are then considered to provide a final product (“tape out”).
    • 计算机辅助设计(CAD)工具用于在单片硅基电光芯片中执行电气和光学部件的集成设计,验证和布局。 为最终的硅基单片结构中包含的三种不同类型的元件准备了独立的顶级行为逻辑设计:(1)数字电子集成电路元件; (2)模拟/混合信号电子集成电路元件; 和(3)光电元件(包括无源和有源光学元件)。 一旦行为逻辑设计完成,结果将被合并并共同模拟。 为电路中的每种不同类型的元件开发和验证物理布局设计。 然后将单独的物理布局共同验证,以评估整体物理设计的属性。 将共模拟的结果与协同验证的结果进行比较,在逻辑设计和/或物理布局中进行改变,直到获得所需的操作参数。 一旦产生期望的结果,则常规晶圆级制造操作被认为是提供最终产品(“磁带输出”)。
    • 3. 发明申请
    • Integrated approach for design, simulation and verification of monolithic, silicon-based opto-electronic circuits
    • 用于单片硅基光电路的设计,仿真和验证的综合方法
    • US20050289490A1
    • 2005-12-29
    • US11159283
    • 2005-06-22
    • Kalpendu ShastriSoham PathakPrakash GothoskarPaulius MosinskisBipin Dama
    • Kalpendu ShastriSoham PathakPrakash GothoskarPaulius MosinskisBipin Dama
    • G06F17/50G06G7/62
    • G06F17/5036G06F17/5068
    • Computer-aided design (CAD) tools are used to perform the integrated design, verification and layout of electrical and optical components in a monolithic, silicon-based electro-optic chip. Separate top-level behavioral logic designs are prepared for the three different types of elements included within the final, silicon-based monolithic structure: (1) digital electronic integrated circuit elements; (2) analog/mixed signal electronic integrated circuit elements; and (3) opto-electronic elements (including passive and active optical elements). Once the behavioral logic design is completed, the results are combined and co-simulated. A physical layout design is developed and verified for each different type of element in the circuit. The separate physical layouts are then co-verified, to assess the properties of the overall physical design. The results of the co-simulation are compared to the results of the co-verification, with alterations made in the logic design and/or the physical layout until the desired operating parameters are obtained. Once the desired results are generated, conventional wafer-level fabrication operations are then considered to provide a final product (“tape out”).
    • 计算机辅助设计(CAD)工具用于在单片硅基电光芯片中执行电气和光学部件的集成设计,验证和布局。 为最终的硅基单片结构中包含的三种不同类型的元件准备了独立的顶级行为逻辑设计:(1)数字电子集成电路元件; (2)模拟/混合信号电子集成电路元件; 和(3)光电元件(包括无源和有源光学元件)。 一旦行为逻辑设计完成,结果将被合并并共同模拟。 为电路中的每种不同类型的元件开发和验证物理布局设计。 然后将单独的物理布局共同验证,以评估整体物理设计的属性。 将共模拟的结果与协同验证的结果进行比较,在逻辑设计和/或物理布局中进行改变,直到获得所需的操作参数。 一旦产生期望的结果,则常规晶圆级制造操作被认为是提供最终产品(“磁带输出”)。
    • 8. 发明申请
    • Low loss SOI/CMOS compatible silicon waveguide and method of making the same
    • 低损耗SOI / CMOS兼容硅波导及其制造方法
    • US20070000862A1
    • 2007-01-04
    • US11516217
    • 2006-09-06
    • Vipulkumar PatelPrakash GothoskarRobert MontgomeryMargaret Ghiron
    • Vipulkumar PatelPrakash GothoskarRobert MontgomeryMargaret Ghiron
    • B29D11/00C23F1/00B44C1/22
    • G02F1/025
    • A method and structure for reducing optical signal loss in a silicon waveguide formed within a silicon-on-insulator (SOI) structure uses CMOS processing techniques to round the edges/corners of the silicon material along the extent of the waveguiding region. One exemplary set of processes utilizes an additional, sacrificial silicon layer that is subsequently etched to form silicon sidewall fillets along the optical waveguide, the fillets thus “rounding” the edges of the waveguide. Alternatively, the sacrificial silicon layer can be oxidized to consume a portion of the underlying silicon waveguide layer, also rounding the edges. Instead of using a sacrificial silicon layer, an oxidation-resistant layer may be patterned over a blanket silicon layer, the pattern defined to protect the optical waveguiding region. A thermal oxidation process is then used to convert the exposed portion of the silicon layer into silicon dioxide, forming a bird's beak structure at the edges of the silicon layer, thus defining the “rounded” edges of the silicon waveguiding structure.
    • 用于减少在绝缘体上硅(SOI)结构中形成的硅波导中的光信号损耗的方法和结构使用CMOS处理技术来沿着波导区域的范围舍入硅材料的边缘/角。 一个示例性的工艺集合利用附加的牺牲硅层,其随后被蚀刻以沿着光波导形成硅侧壁圆角,因此圆角“波浪”了波导的边缘。 或者,牺牲硅层可以被氧化以消耗下面的硅波导层的一部分,也是边缘的四周。 代替使用牺牲硅层,可以在覆盖硅层上图案化抗氧化层,所述图案被限定为保护光波导区域。 然后使用热氧化工艺将硅层的暴露部分转化成二氧化硅,在硅层的边缘处形成鸟的喙结构,从而限定硅波导结构的“圆形”边缘。