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    • 75. 发明授权
    • Viewing tube for microscope
    • 观察显微镜管
    • US5532872A
    • 1996-07-02
    • US274389
    • 1994-07-13
    • Shinobu SakamotoTakeshi Fujino
    • Shinobu SakamotoTakeshi Fujino
    • G02B21/00G02B7/24G02B21/24G02B23/00
    • G02B21/24G02B7/24
    • A viewing tube for a microscope has an optical deflecting element such as a mirror for deflecting light from an objective, a supporting member for supporting the optical deflecting element and an eyepiece portion into which the light deflected by the optical deflecting element enters. The supporting member is rotatable around a first shaft and the eyepiece portion is rotatable around a second shaft. An engaging member is mounted on the eyepiece portion in a position whose distance from the second shaft is equal to the distance between the first shaft and the second shaft. Guiding members are provided on the supporting member for engaging with the engaging member and restricting the engaging member in the circumferential direction around the first shaft, so that the supporting member and the optical deflecting element are rotated around the first shaft in accordance with rotation of the eyepiece portion around the second shaft.
    • 用于显微镜的观察管具有光学偏转元件,例如用于偏转物镜的光的反射镜,用于支撑光学偏转元件的支撑构件和由光学偏转元件偏转的光进入的目镜部分。 支撑构件可围绕第一轴旋转,并且目镜部分可围绕第二轴旋转。 接合构件在与第二轴的距离等于第一轴和第二轴之间的距离的位置安装在目镜部分上。 引导构件设置在支撑构件上,用于与接合构件接合并围绕第一轴限制接合构件沿圆周方向,使得支撑构件和光学偏转构件根据第一轴的旋转围绕第一轴旋转 目镜部分围绕第二轴。
    • 76. 发明授权
    • Method of forming pattern and method of manufacturing photomask using
such method
    • 使用这种方法形成图案的方法和制造光掩模的方法
    • US5266424A
    • 1993-11-30
    • US849602
    • 1992-03-12
    • Takeshi FujinoYaichiro Watakabe
    • Takeshi FujinoYaichiro Watakabe
    • G03F1/76G03F1/78G03F7/004G03F7/039G03F7/26G03F7/36G03F7/38H01L21/027H01L21/30G03F9/00
    • G03F7/36G03F7/039G03F7/265
    • The present invention is mainly directed to provision of a method of producing a highly precise resist pattern, even when a high energy beam is used. Resist containing a base resin including a hydroxyl group, an acid generating agent irradiated with radiation for generating sulfonic acid, and a cross linking agent reacting with the hydroxyl group of the base resin by the catalytic action of the proton of the sulfonic acid thereby cross linking said base resin is applied onto a substrate. The resist is irradiated selectively with radiation, whereby the resist is divided into the exposed part and the non exposed part and the sulfonic acid is generated in the resist of the exposed part. The resist is heated to a first temperature so as to cross link the irradiated part of the resist. The resist is heated to a second temperature and exposed in an atmosphere of a silylating agent, and the surface of the exposed part of the resist is silylated. The resist is dry-developed with oxygen plasma.
    • 本发明主要涉及提供一种制造高精度抗蚀剂图案的方法,即使使用高能量束也是如此。 含有羟基的基础树脂,用辐射产生磺酸的酸产生剂的抗蚀剂和通过磺酸的质子的催化作用与基础树脂的羟基反应的交联剂进行交联 所述基础树脂施加到基底上。 用辐射选择性地照射抗蚀剂,由此将抗蚀剂分成暴露部分和非暴露部分,并且在暴露部分的抗蚀剂中产生磺酸。 将抗蚀剂加热至第一温度,以使抗蚀剂的照射部分交联。 将抗蚀剂加热至第二温度并在甲硅烷基化剂的气氛中暴露,并将抗蚀剂的暴露部分的表面甲硅烷基化。 抗氧化剂用氧等离子体干发展。