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71. 发明授权

US07049607B2 Electron beam writing equipment and electron beam writing method 有权
标题翻译：电子束写入设备和电子束写入方法
公开(公告)号：US07049607B2
公开(公告)日：2006-05-23
申请号：US10951769
申请日：2004-09-29
申请人： Yasunari Sohda , Hiroya Ohta , Osamu Kamimura , Susumu Gotoh
发明人： Yasunari Sohda , Hiroya Ohta , Osamu Kamimura , Susumu Gotoh
IPC分类号： G01N23/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3045 , H01J37/3177 , H01J2237/3045
摘要： Electron beam writing equipment has an electron source and an electron optics system for scanning an electron beam emitted from the electron source on a sample via deflection means having at least two different deflection speeds. An objective lens is used to form a desired pattern on the sample The electron beam is moved by high speed scanning with the deflection means to repeat formation of a patterned beam. The electron beam is moved on the mark for beam correction by low speed scanning with the deflection means in synchronization with one cycle of the repetition. The position or the deflection distance of the electron beam or blanking time is corrected using detectors for back scattered or secondary electrons.
摘要翻译：电子束写入设备具有电子源和电子光学系统，用于通过具有至少两个不同偏转速度的偏转装置扫描从电子源在样品上发射的电子束。使用物镜在样品上形成期望的图案电子束通过用偏转装置的高速扫描移动，以重复形成图案化的束。电子束通过与偏转装置的低速扫描同步于重复的一个周期而在标记上移动以进行光束校正。使用用于背散射或二次电子的检测器校正电子束的位置或偏转距离或消隐时间。

72. 发明授权

US07041988B2 Electron beam exposure apparatus and electron beam processing apparatus 失效
标题翻译：电子束曝光装置和电子束处理装置
公开(公告)号：US07041988B2
公开(公告)日：2006-05-09
申请号：US10431782
申请日：2003-05-08
申请人： Shinichi Hamaguchi , Susumu Goto , Osamu Kamimura , Yasunari Sohda
发明人： Shinichi Hamaguchi , Susumu Goto , Osamu Kamimura , Yasunari Sohda
IPC分类号： G21G5/00 , G21K5/10
CPC分类号： B82Y10/00 , B82Y40/00 , G21K1/093 , H01J37/153 , H01J37/3177 , H01J2237/1536
摘要： An electron beam exposure apparatus for exposing wafer with an electron beam, includes: a first electromagnetic lens system for making the electron beam incident substantially perpendicularly on a first plane be incident on a second plane substantially perpendicularly; a second electromagnetic lens system for making the electron beam that was substantially perpendicularly incident on the second plane be incident on the wafer substantially perpendicularly; a rotation correction lens provided within the first electromagnetic lens system for correcting rotation of the electron beam caused by at least the first electromagnetic lens system; a deflection system for deflecting the electron beam to a position on the wafer; and a deflection-correction optical system provided within the second electromagnetic lens system for correcting deflection aberration caused by the deflection system.
摘要翻译：一种用电子束曝光晶片的电子束曝光装置，包括：用于使基本上垂直于第一平面的电子束入射到第二平面上的第一电磁透镜系统基本垂直入射; 用于使基本上垂直入射在第二平面上的电子束的第二电磁透镜系统基本上垂直入射在晶片上; 旋转校正透镜，设置在第一电磁透镜系统内，用于校正由至少第一电磁透镜系统引起的电子束的旋转; 用于将电子束偏转到晶片上的位置的偏转系统; 以及设置在第二电磁透镜系统内用于校正由偏转系统引起的偏转像差的偏转校正光学系统。

73. 发明申请

US20050040343A1 Electron beam writing equipment and electron beam writing method 有权
标题翻译：电子束写入设备和电子束写入方法
公开(公告)号：US20050040343A1
公开(公告)日：2005-02-24
申请号：US10951769
申请日：2004-09-29
申请人： Yasunari Sohda , Hiroya Ohta , Osamu Kamimura , Susumu Gotoh
发明人： Yasunari Sohda , Hiroya Ohta , Osamu Kamimura , Susumu Gotoh
IPC分类号： G03F7/20 , G01Q30/02 , H01J37/147 , H01J37/304 , H01J37/305 , H01J37/317 , H01L21/027 , G21G5/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3045 , H01J37/3177 , H01J2237/3045
摘要： Electron beam writing equipment has an electron source and an electron optics system for scanning an electron beam emitted from the electron source on a sample via deflection means having at least two different deflection speeds. An objective lens is used to form a desired pattern on the sample The electron beam is moved by high speed scanning with the deflection means to repeat formation of a patterned beam. The electron beam is moved on the mark for beam correction by low speed scanning with the deflection means in synchronization with one cycle of the repetition. The position or the deflection distance of the electron beam or blanking time is corrected using detectors for back scattered or secondary electrons.
摘要翻译：电子束写入设备具有电子源和电子光学系统，用于通过具有至少两个不同偏转速度的偏转装置扫描从电子源在样品上发射的电子束。使用物镜在样品上形成期望的图案电子束通过用偏转装置的高速扫描移动，以重复形成图案化的束。电子束通过与偏转装置的低速扫描同步于重复的一个周期而在标记上移动以进行光束校正。使用用于背散射或二次电子的检测器校正电子束的位置或偏转距离或消隐时间。

74. 发明授权

US06809319B2 Electron beam writing equipment and electron beam writing method 失效
标题翻译：电子束写入设备和电子束写入方法
公开(公告)号：US06809319B2
公开(公告)日：2004-10-26
申请号：US10629567
申请日：2003-07-30
申请人： Yasunari Sohda , Hiroya Ohta , Osamu Kamimura , Susumu Gotoh
发明人： Yasunari Sohda , Hiroya Ohta , Osamu Kamimura , Susumu Gotoh
IPC分类号： H01J3728
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3045 , H01J37/3177 , H01J2237/3045
摘要： Electron beam writing equipment has an electron source and an electron optics system for scanning an electron beam emitted from the electron source on a sample via deflection means having at least two different deflection speeds. An objective lens is used to form a desired pattern on the sample. The electron beam is moved by high speed scanning with the deflection means to repeat formation of a patterned beam. The electron beam is moved on the mark for beam correction by low speed scanning with the deflection means in synchronization with one cycle of the repetition. The position or the deflection distance of the electron beam or blanking time is corrected using detectors for back scattered or secondary electrons.
摘要翻译：电子束写入设备具有电子源和电子光学系统，用于通过具有至少两个不同偏转速度的偏转装置扫描从电子源在样品上发射的电子束。物镜用于在样品上形成所需的图案。用偏转装置通过高速扫描来移动电子束以重复形成图案化的束。电子束通过与偏转装置的低速扫描同步于重复的一个周期而在标记上移动以进行光束校正。使用用于背散射或二次电子的检测器校正电子束的位置或偏转距离或消隐时间。

75. 发明授权

US5759423A Electron beam writing method and apparatus for carrying out the same 失效
标题翻译：电子束写入方法及其执行装置
公开(公告)号：US5759423A
公开(公告)日：1998-06-02
申请号：US563329
申请日：1995-11-28
申请人： Yasunari Sohda , Yasuhiro Someda , Hiroyuki Itoh , Katsuhiro Kawasaki , Norio Saitou
发明人： Yasunari Sohda , Yasuhiro Someda , Hiroyuki Itoh , Katsuhiro Kawasaki , Norio Saitou
IPC分类号： G03F7/20 , H01J37/317 , H01L21/027 , B44C1/22 , H01L21/00
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/31776
摘要： An electron beam writing apparatus comprises: an electron beam source for projecting an electron beam; a first mask provided with a first rectangular aperture for passing the electron beam projected by the electron beam source to shape the electron beam in a primary shaped beam having a rectangular cross section; a second mask provided with a second rectangular aperture for passing the primary shaped beam to shape the primary shaped beam in a secondary shaped beam having a rectangular cross section, and triangular apertures for passing the primary shaped beam to form a secondary shaped beam having a triangular cross section; a first electron beam deflecting system for moving the primary shaped beam on the surface of the second mask; and a second electron beam deflecting system for moving the secondary shaped beam on the surface of a workpiece on which a pattern is to be written. Each of the triangular apertures is formed in a size such that the triangular aperture can be entirely covered with a rectangular image formed by the first shaped beam on the surface of the second mask.
摘要翻译：电子束写入装置包括：用于投射电子束的电子束源; 第一掩模，设置有第一矩形孔，用于使由电子束源投影的电子束通过，以将电子束形成为具有矩形横截面的主要形状的梁; 第二掩模，其设置有第二矩形孔，用于使主要成形梁通过，以形成具有矩形截面的次级成形梁的主要成形梁，以及三角形孔，用于使初级成形梁通过以形成具有三角形的二次成形梁横截面; 第一电子束偏转系统，用于将第一形状光束移动到第二掩模的表面上; 以及用于在待写入图案的工件的表面上移动二次成形光束的第二电子束偏转系统。每个三角形孔形成为使得三角形孔可以被由第二掩模的表面上的第一成形束形成的矩形图像完全覆盖的尺寸。

76. 发明授权

US08816277B2 Pattern evaluation method, device therefor, and electron beam device 有权
标题翻译：图案评估方法，装置和电子束装置
公开(公告)号：US08816277B2
公开(公告)日：2014-08-26
申请号：US13386540
申请日：2010-07-26
申请人： Yasunari Sohda , Takeyoshi Ohashi , Muneyuki Fukuda , Toru Yamanashi
发明人： Hiromasa Yamanashi , Yasunari Sohda , Takeyoshi Ohashi , Muneyuki Fukuda
IPC分类号： G01N23/04 , G01N23/00
CPC分类号： H01J37/28 , G06T7/74 , G06T2207/10061 , G06T2207/30148 , G06T2207/30204 , H01J37/1478 , H01J2237/24578 , H01J2237/2611 , H01J2237/2817
摘要： An amount of pattern position displacement between observation images acquired by irradiating from two different directions is changed depending on beam deflection for moving an image acquisition position. In a pattern evaluation method that measures astigmatic difference or focus position displacement having a small amount of dose at a high speed using parallax caused by the tilted beam, a correction value obtained in advance by measurement is reflected in an amount of pattern position displacement between observation images obtained by irradiating from at least two different directions and generated in accordance with the amount of beam deflection for moving an image acquisition position. A processing unit calculates an amount of correction of an amount of pattern position displacement depending on beam deflection of a beam deflecting unit for moving an image acquisition position on the sample at a high speed.
摘要翻译：通过从两个不同方向照射获取的观察图像之间的图案位置位移量根据用于移动图像获取位置的光束偏转而改变。在使用由倾斜光束引起的视差来高速度地测量具有少量剂量的散光差异或聚焦位置位移的图案评估方法中，通过测量预先获得的校正值反映在观察之间的图案位置位移量通过从至少两个不同方向照射而产生的并且根据用于移动图像获取位置的光束偏转量而产生的图像。处理单元计算取决于用于在高速下移动样本上的图像获取位置的光束偏转单元的光束偏转的图案位置位移量的校正量。

77. 发明授权

US08766183B2 Charged particle beam device 有权
标题翻译：带电粒子束装置
公开(公告)号：US08766183B2
公开(公告)日：2014-07-01
申请号：US13058712
申请日：2009-09-10
申请人： Muneyuki Fukuda , Hiromasa Yamanashi , Yasunari Sohda
发明人： Muneyuki Fukuda , Hiromasa Yamanashi , Yasunari Sohda
IPC分类号： H01J3/12 , H01J37/153
CPC分类号： H01J37/153 , H01J37/265 , H01J37/28 , H01J2237/004 , H01J2237/1532 , H01J2237/216 , H01J2237/221
摘要： The astigmatism control processing time is decreased to 1 second or less by improving the astigmatic difference measurement accuracy. A charged particle beam device includes: a stage on which a sample is loaded; a transport mechanism which carries the sample onto the stage; a charged particle beam optical system which irradiates the sample on the stage with a charged particle beam and detects secondary charged particles generated from the sample; and a controller which determines setup parameters for the charged particle beam optical system and controls the charged particle beam optical system. The controller registers and holds electro-optical system setup parameters for irradiation with a beam tilted from a normal line on the sample as the charged particle beam, compares observation images obtained by the tilted beam, measures the amount and direction of movement and calculates the amount of astigmatism correction from the amount of movement and the direction.
摘要翻译：散光控制处理时间通过改善像散差测量精度而降低到1秒以下。带电粒子束装置包括：加载样品的载物台; 将样品携带到舞台上的运送机构; 带电粒子束光学系统，其用带电粒子束照射台上的样品，并检测从样品产生的二次带电粒子; 以及控制器，其确定带电粒子束光学系统的设置参数并控制带电粒子束光学系统。控制器注册并保持电子光学系统设置参数，用于照射来自样品上的法线的光束作为带电粒子束，比较通过倾斜光束获得的观察图像，测量移动量和移动方向，从运动量和方向上矫正散光。

78. 发明授权

US08742342B2 Electron microscope 有权
标题翻译：电子显微镜
公开(公告)号：US08742342B2
公开(公告)日：2014-06-03
申请号：US13505951
申请日：2010-11-01
申请人： Nobuhiro Okai , Yasunari Sohda
发明人： Nobuhiro Okai , Yasunari Sohda
IPC分类号： H01J37/04 , H01J37/145 , H01J37/14
CPC分类号： H01J37/04 , H01J37/026 , H01J37/14 , H01J37/145 , H01J37/153 , H01J37/28 , H01J2237/004 , H01J2237/0044 , H01J2237/121 , H01J2237/153
摘要： A scanning electron microscope suppresses a beam drift by reducing charging on a sample surface while suppressing resolution degradation upon observation of an insulator sample. An electron microscope includes an electron source and an objective lens that focuses an electron beam emitted from the electron source, which provides an image using a secondary signal generated from the sample irradiated with the electron beam. A magnetic body with a continuous structure and an inside diameter larger than an inside diameter of an upper pole piece that forms the objective lens is provided between the objective lens and the sample.
摘要翻译：扫描电子显微镜通过减少对样品表面的充电而抑制光束偏移，同时在观察绝缘体样品时抑制分辨率劣化。电子显微镜包括电子源和物镜，其聚焦从电子源发射的电子束，其使用从照射电子束的样品产生的二次信号来提供图像。在物镜和样品之间设置具有连续结构且内径大于形成物镜的上极片的内径的磁体。

79. 发明授权

US08125518B2 Scanning electron microscope 有权
标题翻译：扫描电子显微镜
公开(公告)号：US08125518B2
公开(公告)日：2012-02-28
申请号：US13139315
申请日：2009-11-24
申请人： Nobuhiro Okai , Yasunari Sohda
发明人： Nobuhiro Okai , Yasunari Sohda
IPC分类号： H04N9/47
CPC分类号： G01B15/00 , H01J37/222 , H01J37/28
摘要： Provided is a scanning electron microscope including: an image recording unit (112) which stores a plurality of acquired frame images; a correction analyzing handling unit (113) which calculates a drift amount between frame images and a drift amount between a plurality of field images constituting a frame image; and a data handling unit (111) which corrects positions of respective field images constituting the plurality of fields images according to the drift amount between the field images and superimposes the field images on one another so as to create a new frame image. This provides a scanning electron microscope which can obtain a clear frame image even if an image drift is caused during observation of a pattern on a semiconductor substrate or an insulating object.
摘要翻译：提供一种扫描电子显微镜，包括：图像记录单元，其存储多个获取的帧图像; 校正分析处理单元，其计算帧图像之间的漂移量和构成帧图像的多个场图像之间的漂移量; 以及数据处理单元（111），其根据场图像之间的漂移量校正构成多个场图像的各个场图像的位置，并将场图像彼此叠加，从而创建新的帧图像。这提供了即使在观察半导体衬底或绝缘物体上的图案时引起图像漂移，也可以获得清晰的帧图像的扫描电子显微镜。

80. 发明申请

US20110147586A1 Charged Particle Beam Device 有权
标题翻译：带电粒子束装置
公开(公告)号：US20110147586A1
公开(公告)日：2011-06-23
申请号：US13058712
申请日：2009-09-10
申请人： Muneyuki Fukuda , Hiromasa Yamanashi , Yasunari Sohda
发明人： Muneyuki Fukuda , Hiromasa Yamanashi , Yasunari Sohda
IPC分类号： H01J37/153 , G01N23/00
CPC分类号： H01J37/153 , H01J37/265 , H01J37/28 , H01J2237/004 , H01J2237/1532 , H01J2237/216 , H01J2237/221
摘要： The astigmatism control processing time is decreased to 1 second or less by improving the astigmatic difference measurement accuracy. A charged particle beam device includes: a stage on which a sample is loaded; a transport mechanism which carries the sample onto the stage; a charged particle beam optical system which irradiates the sample on the stage with a charged particle beam and detects secondary charged particles generated from the sample; and a controller which determines setup parameters for the charged particle beam optical system and controls the charged particle beam optical system. The controller registers and holds electro-optical system setup parameters for irradiation with a beam tilted from a normal line on the sample as the charged particle beam, compares observation images obtained by the tilted beam, measures the amount and direction of movement and calculates the amount of astigmatism correction from the amount of movement and the direction.
摘要翻译：散光控制处理时间通过改善像散差测量精度而降低到1秒以下。带电粒子束装置包括：加载样品的载物台; 将样品携带到舞台上的运送机构; 带电粒子束光学系统，其用带电粒子束照射台上的样品，并检测从样品产生的二次带电粒子; 以及控制器，其确定带电粒子束光学系统的设置参数并控制带电粒子束光学系统。控制器注册并保持电子光学系统设置参数，用于用作为带电粒子束的样品上从法线上倾斜的光束照射，比较通过倾斜光束获得的观察图像，测量移动量和移动方向，从运动量和方向上矫正散光。

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