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71. 发明授权

US5310580A Electroless metal adhesion to organic dielectric material with phase separated morphology 失效
标题翻译：无机金属与相分离形态的有机介电材料粘合
公开(公告)号：US5310580A
公开(公告)日：1994-05-10
申请号：US874665
申请日：1992-04-27
申请人： Eugene J. O'Sullivan , Terrence R. O'Toole , Judith M. Roldan , Lubomyr T. Romankiw , Carlos J. Sambucetti , Ravi Saraf
发明人： Eugene J. O'Sullivan , Terrence R. O'Toole , Judith M. Roldan , Lubomyr T. Romankiw , Carlos J. Sambucetti , Ravi Saraf
IPC分类号： B05D1/34 , C23C18/20 , H05K3/18 , H05K3/38 , B05D2/06
CPC分类号： H05K3/387 , B05D1/34 , C23C18/20 , C23C18/2033 , C23C18/208 , C23C18/24 , C23C18/30 , H05K2201/0154 , H05K2201/0212 , H05K2203/0759 , H05K2203/0773 , H05K2203/0793 , H05K3/181 , H05K3/381
摘要： Improved adhesion of electroless metal deposited on an organic dielectric layer with phase separated morphology is accomplished by the spontaneous formation of a morphologically and topographically rough surface. In one embodiment a ternary solution of a polar solvent and two polymer precursors of the same polymer which are separable in two phases of different order are cast in film on a substrate and heated to form two phases of different order to spontaneously produce a rough surface. Upon exposure to an alkaline solution, one phase is etched at a faster rate than the other. Seeding and electroless deposition of a metal on the rough surface results in improved adhesion of the metal to the dielectric layer. In a second embodiment a quaternary solution of a polar solvent, a seeding agent, two polymer precursors of the same polymer which are separable in two phases of different order are cast in a thin film on a substrate and heated to form three phases. Upon curing the precursors there is surface roughening as a result of phase separation. Upon exposure to alkaline solution there is etching of one of the polymer phases at a faster rate and simultaneous opening of the seeding colloid. The rough surface is overcoated with a photoresist, exposed and developed. Subsequent electroless metal deposition results in improved metal to dielectric layer adhesion. The method is applicable to selective deposition of electroless copper onto a polyimide layer.
摘要翻译：沉积在具有相分离形态的有机电介质层上的化学金属的改善的粘附通过自发形成形态和形貌上粗糙的表面来实现。在一个实施方案中，可以将不同顺序的两相分离的相同聚合物的极性溶剂和两种聚合物前体的三元溶液在基材上成膜并加热形成不同阶数的两相以自发产生粗糙表面。在暴露于碱性溶液时，以比另一相更快的速率蚀刻一相。在粗糙表面上的金属的接种和无电沉积导致金属对电介质层的附着力提高。在第二个实施方案中，将极性溶剂，接种剂，可以在两相中分离的相同聚合物的两种聚合物前体的四元溶液浇铸在基材上的薄膜中，并加热形成三相。固化前体由于相分离而导致表面粗糙化。暴露在碱性溶液中时，以更快的速率蚀刻聚合物相之一并同时打开接种胶体。粗糙表面用光致抗蚀剂涂覆，曝光和显影。随后的无电金属沉积导致金属与电介质层粘附性的改善。该方法适用于将化学镀铜选择性沉积到聚酰亚胺层上。

72. 发明授权

US5217586A Electrochemical tool for uniform metal removal during electropolishing 失效
标题翻译：电解抛光时用于均匀金属去除的电化学工具
公开(公告)号：US5217586A
公开(公告)日：1993-06-08
申请号：US819298
申请日：1992-01-09
申请人： Madhav Datta , Lubomyr T. Romankiw
发明人： Madhav Datta , Lubomyr T. Romankiw
IPC分类号： B23H3/04 , C25F7/00
CPC分类号： C25F7/00
摘要： The present invention relates to an electropolishing tool for the removal of metal from a workpiece, said electropolishing tool comprising a container means for retaining an electrolytic solution, a cathode assembly in the shape of a pyramid the height of which is adjustable, a power supply means including a negative terminal and a positive terminal with said negative terminal being electrically connectable to said cathode assembly, a plate means for holding the workpiece and for forming an electrical connection to the workpiece, said plate means connected to the positive terminal of said power supply means, and an enclosure means placed over the workpiece leaving only the surface of the workpiece which is to be polished exposed to the electrolytic solution such that when the workpiece is secured to said plate means and said cathode assembly is connected to the negative terminal of said power supply means and is placed over the said enclosure means directly facing the workpiece enclosed therein, that portion of the workpiece exposed to the electrolytic solution undergoes electropolishing.
摘要翻译：本发明涉及一种用于从工件去除金属的电抛光工具，所述电抛光工具包括用于保持电解液的容器装置，高度可调的金字塔形状的阴极组件，电源装置包括负端子和正极端子，所述负极端子可电连接到所述阴极组件;板装置，用于保持所述工件并形成与所述工件的电连接，所述板装置连接到所述电源装置的正极端子以及放置在工件上的外壳装置，仅留下要被抛光的工件的表面暴露于电解溶液，使得当工件固定到所述板装置并且所述阴极组件连接到所述电源的负极端子时供给装置并且被放置在直接面向工件的所述外壳装置上在其中暴露于电解液的工件的那部分进行电解抛光。

73. 发明授权

US4842886A Method for electroless plating 失效
标题翻译：化学镀方法
公开(公告)号：US4842886A
公开(公告)日：1989-06-27
申请号：US117164
申请日：1987-11-04
申请人： Nathaniel C. Anderson , Marlin E. Miner , Lubomyr T. Romankiw , Steven F. Starcke
发明人： Nathaniel C. Anderson , Marlin E. Miner , Lubomyr T. Romankiw , Steven F. Starcke
IPC分类号： C23C18/16 , C23C18/31 , C23C18/50
CPC分类号： C23C18/1619 , C23C18/1675 , Y10S428/90 , Y10S428/928
摘要： The mixed potential of a standard reference electrode and an electrically conductive article that is being electrolessly plated is compared to a DC reference voltage. A predetermined level of comparison indicates the start of electroless plating. This comparison starts a timer. After a predetermined time interval has expired, plating is terminated. The result is a plated coating that is uniform and of a closely controlled thickness. The article to be plated is a thin film magnetic recording disk upon which a thin cobalt containing layer, in the range of about 850 angstroms thick, is to be plated.

74. 发明授权

US4440609A Method of electrodepositing a low coercine force, corrosion-resistant alloy of nickel, iron and boron 失效
标题翻译：电沉积低co力的方法，镍，铁和硼的耐腐蚀合金
公开(公告)号：US4440609A
公开(公告)日：1984-04-03
申请号：US493499
申请日：1983-05-11
申请人： Marybelle C. Blakeslee , Judith D. Olsen , Lubomyr T. Romankiw
发明人： Marybelle C. Blakeslee , Judith D. Olsen , Lubomyr T. Romankiw
IPC分类号： C25D3/56 , H01F41/26
CPC分类号： C25D3/562 , H01F41/26
摘要： The present invention deals with alloys consisting essentially of the elements nickel, iron and boron. Boron is present at from 0.1 to 2.0% by weight; iron is present from 17 to 27% by weight and the balance is nickel. The alloy has high resistance to corrosion and H.sub.o and H.sub.c are less than 0.1 Oe in films 3000.ANG. thick. It is prepared by electrodeposition from a bath having a pH of 2.5 or less, and containing a borane reducing agent.
摘要翻译：本发明涉及基本上由元素镍，铁和硼组成的合金。硼以0.1至2.0重量％存在; 铁的含量为17〜27重量％，余量为镍。该合金具有较高的耐腐蚀性，并且厚度为3000的薄膜中，Ho和Hc小于0.1Oe。通过从pH为2.5以下的浴中电沉积并含有硼烷还原剂制备。

75. 发明授权

US4315985A Fine-line circuit fabrication and photoresist application therefor 失效
标题翻译：细线电路制造及其光刻胶应用
公开(公告)号：US4315985A
公开(公告)日：1982-02-16
申请号：US865344
申请日：1977-12-28
申请人： Eugene E. Castellani , Ian M. Croll , Aloysius T. Pfeiffer , Lubomyr T. Romankiw
发明人： Eugene E. Castellani , Ian M. Croll , Aloysius T. Pfeiffer , Lubomyr T. Romankiw
IPC分类号： G03F7/16 , G11B5/31 , H01L21/00 , H01L21/288 , H01L23/522 , H05K3/10 , H05K3/38 , G03C5/00 , G03C1/76
CPC分类号： H05K3/108 , G03F7/162 , G11B5/3163 , H01L21/00 , H01L21/288 , H01L23/522 , H01L2924/0002 , H01L2924/09701 , H05K2203/0759 , H05K3/388 , Y10S430/136
摘要： A method is disclosed for the production of thick and smooth layers of photoresist on the order of 2-15 microns thick. The substrate is flooded with resist as in the standard spin resist method, but instead of following the flooding step with spinning as usual, the second step is to provide a drying time for the flooded resist. Then at the end of the measured drying time, the resist is spun as usual. This can be used to produce fine line closely spaced circuitry in which the thickness of the lines in proportion to their width, or their aspect ratio, is large. Aspect ratios greater than 0.4 and as high as 1.5 are contemplated by the invention.
摘要翻译：公开了用于生产厚度为2-15微米厚的光致抗蚀剂厚的光滑层的方法。如标准自旋抗蚀剂方法那样，衬底上充满抗蚀剂，但不像以往那样按照旋转进行浸渍步骤，所以第二步是为浸渍抗蚀剂提供干燥时间。然后在测量的干燥时间结束时，抗蚀剂照常旋转。这可以用于产生细线紧密间隔的电路，其中线的厚度与它们的宽度或它们的纵横比成比例大。本发明考虑了大于0.4且高达1.5的长宽比。

76. 发明授权

US4295173A Thin film inductive transducer 失效
标题翻译：薄膜感应传感器
公开(公告)号：US4295173A
公开(公告)日：1981-10-13
申请号：US83182
申请日：1979-10-18
申请人： Lubomyr T. Romankiw , David A. Thompson
发明人： Lubomyr T. Romankiw , David A. Thompson
IPC分类号： G11B5/31 , G11B5/12 , G11B5/20 , G11B5/22
CPC分类号： G11B5/313 , G11B5/3113 , G11B5/3116
摘要： A thin film inductive transducer head includes a magnetic circuit with a pair of legs and inductive coils. The legs are thinner near the pole tip than in the back gap region. The legs are also narrower in the pole tip region than in the back gap region. Resolution is enhanced by the thin pole tips and saturation of the yoke structure is avoided by increasing the cross-sectional area of the yoke structure away from the pole tip region.
摘要翻译：薄膜感应传感器头包括具有一对腿和感应线圈的磁路。在极尖附近的腿比后隙区域更薄。腿部在极尖区域中也比在后间隙区域中窄。通过薄极尖增强分辨率，并且通过增加轭结构远离极尖区域的横截面积来避免轭结构的饱和。

77. 发明授权

US3981844A Stable emulsion and method for preparation thereof 失效
标题翻译：稳定的乳液及其制备方法
公开(公告)号：US3981844A
公开(公告)日：1976-09-21
申请号：US591981
申请日：1975-06-30
申请人： Lubomyr T. Romankiw
发明人： Lubomyr T. Romankiw
IPC分类号： C09K3/00 , A63H33/00 , B01J13/00 , G09F9/37 , H01F1/37 , H01F1/44 , H01F1/00
CPC分类号： H01F1/445 , H01F1/37 , C10M2201/00 , C10M2201/02 , C10M2201/061 , C10M2201/062 , C10M2201/16 , C10M2201/18 , C10M2203/02 , C10M2203/022 , C10M2203/024 , C10M2203/04 , C10M2203/06 , C10M2203/10 , C10M2203/102 , C10M2203/104 , C10M2203/106 , C10M2203/108 , C10M2207/125 , C10M2207/129 , C10M2211/022 , C10M2211/06 , C10M2215/04 , C10M2215/26 , C10M2219/082 , C10M2223/06 , C10M2223/061 , C10N2240/08 , C10N2240/20 , C10N2240/201 , C10N2240/202 , C10N2240/203 , C10N2240/204 , C10N2240/205
摘要： An emulsion of water; a water immiscible liquid including a solution of a liquid nonpolar hydrocarbon and a liquid halogenated aliphatic hydrocarbon; and a colloidal suspension of magnetic particles and a surface active agent.
摘要翻译：水的乳液; 包括液体非极性烃和液体卤代脂族烃的溶液的水不混溶液体; 和磁性颗粒和表面活性剂的胶体悬浮液。

78. 发明申请

US20080314565A1 METHOD AND APPARATUS FOR CHIP COOLING 有权
标题翻译：芯片冷却的方法和装置
公开(公告)号：US20080314565A1
公开(公告)日：2008-12-25
申请号：US11766533
申请日：2007-06-21
申请人： Yves C. Martin , Lubomyr T. Romankiw , Theodore G. Van Kessel
发明人： Yves C. Martin , Lubomyr T. Romankiw , Theodore G. Van Kessel
IPC分类号： H05K7/20
CPC分类号： H01L23/427 , H01L2924/0002 , Y10S165/908 , H01L2924/00
摘要： In one embodiment, the invention is a method and apparatus for chip cooling. One embodiment of a system for cooling a heat-generating device, such as a semiconductor chip, includes a vaporization chamber for at least partially vaporizing a stream of liquid in a stream of a gas to produce a mixture of gas, vapor and liquid and a heat sink coupled to the vaporization chamber for transferring heat from the heat-generating device to the mixture.
摘要翻译：在一个实施例中，本发明是用于芯片冷却的方法和装置。用于冷却诸如半导体芯片的发热装置的系统的一个实施例包括蒸发室，用于至少部分地蒸发气体流中的液体流以产生气体，蒸气和液体的混合物，以及耦合到蒸发室的散热器，用于将热量从发热装置传递到混合物。

79. 发明授权

US5800175A Method and apparatus for re-implanting teeth 失效
标题翻译：重新植入牙齿的方法和装置
公开(公告)号：US5800175A
公开(公告)日：1998-09-01
申请号：US615849
申请日：1996-03-12
申请人： Zenon Zuk , Lubomyr T. Romankiw , Roger Stambaugh
发明人： Zenon Zuk , Lubomyr T. Romankiw , Roger Stambaugh
IPC分类号： A61C5/00 , A61C8/00 , C23C14/02 , C23C14/04 , C23C14/18 , C23C14/30
CPC分类号： A61C8/0036 , A61C5/00 , C23C14/02 , C23C14/042 , C23C14/18 , C23C14/30
摘要： A method and apparatus for extraction and re-implantation of a natural tooth, such tooth being cleaned and repaired while extracted. The crown of the repaired tooth is mechanically masked and the tooth is then mounted in a partitioned vacuum cavity wherein gradual application of vacuum is used to degas and dehydrate the tooth root. Following degassing and dehydration of the tooth root a mass of titanium is heated in the cavity partition, by way of an electron beam source, the energy output of the beam source being thereafter ramped up to vaporize the mass. The partition in the cavity is then opened to expose the root to the titanium vapor after which the tooth may be reinserted into the original void.
摘要翻译：用于提取和重新植入天然牙齿的方法和装置，所述牙齿在被提取时被清洁和修复。修复的牙齿的冠部被机械地掩蔽，然后将牙齿安装在分隔的真空腔中，其中逐渐施加真空以使齿根脱气和脱水。在牙根脱气和脱水之后，通过电子束源在空腔分隔件中加热一块钛，然后将光束源的能量输出向上升高以蒸发质量。然后将空腔中的隔板打开以将根部暴露于钛蒸汽，之后将牙齿重新插入原始空隙。

80. 发明授权

US5352350A Method for controlling chemical species concentration 失效
标题翻译：控制化学物质浓度的方法
公开(公告)号：US5352350A
公开(公告)日：1994-10-04
申请号：US837468
申请日：1992-02-14
申请人： Panayotis C. Andricacos , John O. Dukovic , Lubomyr T. Romankiw
发明人： Panayotis C. Andricacos , John O. Dukovic , Lubomyr T. Romankiw
IPC分类号： C23C18/16 , C23F1/00 , C25D21/14 , G03F7/30 , G05D11/13 , G05D21/02 , C25D21/18 , C25D21/20
CPC分类号： G03F7/3071 , C23C18/1617 , C23F1/00 , C25D21/14 , G05D11/139 , G05D21/02 , B01J2208/00628
摘要： A method is described for maintaining constant chemical composition in solutions used for wet chemical processing. All chemical species that are deliberately included in the bath are kept at constant concentration primarily by a method of compensating for their depletion or generation with a set of feed solutions that are formulated and dosed into the bath in accordance with an overall material balance. Further, all chemical species not deliberately included in the bath are kept at constant concentration primarily by keeping the aggregate volume of replenishing stocks in strict proportion to the process service performed by the bath (e.g. the charge passed in an electroplating cell). Finally, a time-based scheme completes the control of the concentration of all bath species by controlling any species (whether deliberately included in the bath or not) that is depleted or generated as the result of chemical reactions which occur independently and/or spontaneously with time. Maintaining all bath chemical species at constant concentration prevents bath aging and permits production of more uniform work pieces from the bath.
摘要翻译：描述了一种用于在用于湿化学处理的溶液中保持恒定化学成分的方法。有意包含在浴中的所有化学物质主要通过补偿其消耗或产生的方法保持恒定浓度，所述方法通过根据整体物料平衡配制并投入浴中的一组进料溶液。此外，不是故意包括在浴中的所有化学物质都保持恒定浓度，主要是通过保持补充料的总体积与由浴进行的处理服务（例如在电镀槽中通过的电荷）严格成比例。最后，基于时间的方案通过控制任何物种（无论是故意包括在浴中）是否完全控制所有沐浴物种的浓度，由于化学反应的结果而耗尽或产生，这些化学反应独立地和/或自发地发生，时间。保持恒定浓度的所有浴化学物质可以防止沐浴老化，并允许从浴中生产更均匀的工件。

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