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71. 发明申请

US20090257032A1 OPTICAL ELEMENT AND METHOD 有权
标题翻译：光学元件和方法
公开(公告)号：US20090257032A1
公开(公告)日：2009-10-15
申请号：US12402015
申请日：2009-03-11
申请人： Eric Eva , Payam Tayebati , Michael Thier , Markus Hauf , Ulrich Schoenhoff , Ole Fluegge , Arif Kazi , Alexander Sauerhoefer , Gerhard Focht , Jochen Weber , Toralf Gruner
发明人： Eric Eva , Payam Tayebati , Michael Thier , Markus Hauf , Ulrich Schoenhoff , Ole Fluegge , Arif Kazi , Alexander Sauerhoefer , Gerhard Focht , Jochen Weber , Toralf Gruner
IPC分类号： G03B27/52 , G02B7/02
CPC分类号： G03F7/70891 , G02B7/028 , G02B27/0068 , G03F7/70266
摘要： The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.
摘要翻译：本公开涉及一种光学元件，其被配置为至少部分空间地解决可以应用光辐射的光学系统（例如，用于微光刻的投影曝光设备）的波前像差的校正，以及相关的系统和方法。

72. 发明申请

US20090213356A1 ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHY PROJECTION EXPOSURE APPARATUS 有权
标题翻译：微型投影曝光装置照明系统
公开(公告)号：US20090213356A1
公开(公告)日：2009-08-27
申请号：US12390676
申请日：2009-02-23
申请人： Toralf Gruner , Michael Totzeck
发明人： Toralf Gruner , Michael Totzeck
IPC分类号： G03B27/72
CPC分类号： G03F7/70566 , B82Y10/00 , G03F7/70008 , G21K2201/061 , H05G2/00
摘要： An illumination system for a microlithographic projection exposure apparatus includes an EUV light source which generates an emission beam of linearly polarized EUV illumination light. An illumination optics guides the emission beam along an optical axis which causes an illumination field in a reticle plane to be illuminated by the emission beam. The illumination system also includes an illumination subunit of the illumination system. The illumination subunit includes at least the EUV light source and a polarization setting device for setting a defined polarization of the EUV emission beam of the illumination subunit.
摘要翻译：用于微光刻投影曝光装置的照明系统包括产生线偏极化EUV照明光的发射光束的EUV光源。照明光学器件沿着光轴引导发射光束，其使得光栅平面中的照明场被发射光束照射。照明系统还包括照明系统的照明子单元。照明子单元至少包括EUV光源和用于设定照明子单元的EUV发射光束的限定极化的偏振设置装置。

73. 发明申请

US20090207487A1 METHOD OF MANUFACTURING A PROJECTION OBJECTIVE AND PROJECTION OBJECTIVE 有权
标题翻译：制作投影目标和投影目标的方法
公开(公告)号：US20090207487A1
公开(公告)日：2009-08-20
申请号：US12413981
申请日：2009-03-30
申请人： Heiko Feldmann , Toralf Gruner , Alexander Epple
发明人： Heiko Feldmann , Toralf Gruner , Alexander Epple
IPC分类号： G02B17/08 , G06F17/00
CPC分类号： G03F7/70891 , G03F7/70225 , G03F7/70275 , G03F7/705 , G03F7/70983
摘要： The disclosure relates to a method of manufacturing a projection objective, and a projection objective, such as a projection objective configured to be used in a microlithographic process. The method can include defining an initial design for the projection objective and optimizing the design using a merit function. The method can be used in the manufacturing of projection objectives which may be used in a microlithographic process of manufacturing miniaturized devices.
摘要翻译：本公开涉及一种制造投影物镜的方法，以及投影物镜，例如被配置为在微光刻工艺中使用的投影物镜。该方法可以包括定义投影物镜的初始设计，并使用优值函数优化设计。该方法可用于制造可用于制造小型化装置的微光刻工艺中的投影物镜。

74. 发明申请

US20090153831A1 METHOD AND SYSTEM FOR CORRECTING IMAGE CHANGES 有权
标题翻译：用于校正图像变化的方法和系统
公开(公告)号：US20090153831A1
公开(公告)日：2009-06-18
申请号：US12361842
申请日：2009-01-29
申请人： Olaf Conradi , Toralf Gruner
发明人： Olaf Conradi , Toralf Gruner
IPC分类号： G03B27/72
CPC分类号： G03F7/70891 , G03F7/70258
摘要： The disclosure relates to a method for compensating image errors, generated by intensity distributions in optical systems, such as in projection lens arrays of microlithography systems, and to respective optical systems, such as projection lens arrays of microlithography systems.
摘要翻译：本公开涉及一种用于补偿由光学系统中的强度分布产生的图像误差的方法，例如在微光刻系统的投影透镜阵列中，以及相应的光学系统，例如微光刻系统的投影透镜阵列。

75. 发明申请

US20080309894A1 MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND MEASURING DEVICE FOR A PROJECTION LENS 审中-公开
标题翻译：投影镜头的微观投影曝光装置和测量装置
公开(公告)号：US20080309894A1
公开(公告)日：2008-12-18
申请号：US12195566
申请日：2008-08-21
申请人： Albrecht Ehrmann , Ulrich Wegmann , Rainer Hoch , Joerg Mallmann , Karl-Heinz Schuster , Ulrich Loering , Toralf Gruner , Bernhard Kneer , Bernhard Geuppert , Franz Sorg , Jens Kugler , Norbert Wabra
发明人： Albrecht Ehrmann , Ulrich Wegmann , Rainer Hoch , Joerg Mallmann , Karl-Heinz Schuster , Ulrich Loering , Toralf Gruner , Bernhard Kneer , Bernhard Geuppert , Franz Sorg , Jens Kugler , Norbert Wabra
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70341 , G03F7/70591 , G03F7/70691 , G03F7/7085 , G03F7/70875 , G03F7/70891 , G03F7/70991
摘要： A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.
摘要翻译：微光刻投影曝光装置包括配置为浸没操作的投影透镜。为此，将浸没液体引入位于图像侧的投影透镜的最后一个透镜与待曝光的感光层之间的浸没空间中。为了减少由浸没液体内发生的温度梯度引起的折射率的波动，投影曝光装置包括加热或冷却浸没液的部分体积的传热元件，以便达到至少基本均匀或至少基本上旋转对称的温度在浸液中的分布。

76. 发明申请

US20080304033A1 PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微波投影曝光装置投影目标
公开(公告)号：US20080304033A1
公开(公告)日：2008-12-11
申请号：US12194229
申请日：2008-08-19
申请人： Bernhard Kneer , Norbert Wabra , Toralf Gruner , Alexander Epple , Susanne Beder , Wolfgang Singer
发明人： Bernhard Kneer , Norbert Wabra , Toralf Gruner , Alexander Epple , Susanne Beder , Wolfgang Singer
IPC分类号： G03B27/42 , G03B27/54
CPC分类号： G03F7/70225 , G03F7/70241 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： Another approach to decrease the resolution is to introduce an immersion liquid having high refractive index into the gap that remains between a final lens element on the image side of the projection objective and the photoresist or another photosensitive layer to be exposed. Projection objectives that are designed for immersion operation and are therefore also referred to as immersion objective may reach numerical apertures of more than 1, for example 1.3 or 1.4. The term “immersion liquid” shall, in the context of this application, relate also to what is commonly referred to as “solid immersion”. In the case of solid immersion, the immersion liquid is in fact a solid medium that, however, does not get in direct contact with the photoresist but is spaced apart from it by a distance that is only a fraction of the wavelength used. This ensures that the laws of geometrical optics do not apply such that no total reflection occurs.
摘要翻译：降低分辨率的另一种方法是将具有高折射率的浸没液体引入保留在投影物镜的像侧上的最终透镜元件与待曝光的光致抗蚀剂或另一光敏层之间的间隙中。为浸入式操作设计的投影物镜，因此也称为浸没物镜，可达到大于1，例如1.3或1.4的数值孔径。在本申请的上下文中，术语“浸没液体”还涉及通常称为“固体浸没”的内容。在固体浸渍的情况下，浸没液实际上是固体介质，然而，其不会与光致抗蚀剂直接接触，而是与其隔开距离，其仅是所使用波长的一部分。这确保几何光学的定律不适用于不发生全反射。

77. 发明授权

US07463422B2 Projection exposure apparatus 有权
标题翻译：投影曝光装置
公开(公告)号：US07463422B2
公开(公告)日：2008-12-09
申请号：US11657925
申请日：2007-01-25
申请人： Vladimir Kamenow , Daniel Kraehmer , Michael Totzeck , Toralf Gruner , Aurelian Dodoc , David Shafer , Wilhelm Ulrich , Rudolf von Buenau , Hans-Juergen Mann , Alexander Epple
发明人： Vladimir Kamenow , Daniel Kraehmer , Michael Totzeck , Toralf Gruner , Aurelian Dodoc , David Shafer , Wilhelm Ulrich , Rudolf von Buenau , Hans-Juergen Mann , Alexander Epple
IPC分类号： G02B17/00
CPC分类号： G02B27/0012 , G02B1/02 , G02B17/08 , G03F7/70225 , G03F7/70966 , G03F7/70975
摘要： A method of determining materials of lenses contained in an optical system of a projection exposure apparatus is described. First, for each lens of a plurality of the lenses, a susceptibility factor KLT/LH is determined. This factor is a measure of the susceptibility of the respective lens to deteriorations caused by at least one of lifetime effects and lens heating effects. Then a birefringent fluoride crystal is selected as a material for each lens for which the susceptibility factor KLT/LH is above a predetermined threshold. Theses lenses are assigned to a first set of lenses. For these lenses, measures are determined for reducing adverse effects caused by birefringence inherent to the fluoride crystals.
摘要翻译：描述了确定投影曝光装置的光学系统中所包含的透镜的材料的方法。首先，对于多个透镜的每个透镜，确定敏感度因子KLT / LH。该因子是由寿命效应和透镜加热效果中的至少一种引起的各透镜对恶化的敏感性的量度。然后选择双折射氟化物晶体作为敏感度因子KLT / LH高于预定阈值的每个透镜的材料。这些镜头被分配到第一组透镜。对于这些透镜，确定了减少由氟化物晶体固有的双折射引起的不利影响的措施。

78. 发明授权

US07408616B2 Microlithographic exposure method as well as a projection exposure system for carrying out the method 有权
标题翻译：微光刻曝光方法以及用于实施该方法的投影曝光系统
公开(公告)号：US07408616B2
公开(公告)日：2008-08-05
申请号：US10949396
申请日：2004-09-27
申请人： Toralf Gruner , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
发明人： Toralf Gruner , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
IPC分类号： G03B27/42
CPC分类号： G03F7/70566 , G03F7/70108 , G03F7/70225 , G03F7/70308
摘要： In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.
摘要翻译：在用于曝光布置在投影物镜的像面的区域中的基板以及用于执行该方法的投影曝光系统中的曝光方法中，产生了指向基板并具有输出偏振态的输出辐射。通过借助于至少一个偏振操纵装置对输出偏振状态的可变调节，输出偏振状态可以形成为接近标称输出偏振状态。可以在基于偏振光学测量数据的控制回路中进行极化处理。

79. 发明授权

US07355791B2 Optical system and photolithography tool comprising same 有权
标题翻译：包括其的光学系统和光刻工具
公开(公告)号：US07355791B2
公开(公告)日：2008-04-08
申请号：US11251300
申请日：2005-10-14
申请人： Vladimir Kamenov , Toralf Gruner
发明人： Vladimir Kamenov , Toralf Gruner
IPC分类号： G02B5/30
CPC分类号： G03F7/70225 , G02B5/3091 , G02B17/02 , G02B17/08 , G02B17/0892 , G03F7/70241 , G03F7/70958 , G03F7/70966
摘要： An optical system, for example a lens for a photolithography tool, includes a group of optical elements (L1, L2) that each comprise a birefringent cubic crystal such as CaF2. The crystal lattices of the crystals have different orientations, e.g. for reducing the overall retardance of the group by mutual compensation. The [110] crystal axis of at least one optical element (L1, L2) is tilted with respect to an optical axis (34) of the system (10) by a predefined tilting angle (θ1, θ2) having an absolute value between 1° and 20°. This reduces the magnitude, but not significantly changes the orientation of intrinsic birefringence. By selecting an appropriate tilting angle it is possible to achieve a better performance of the optical system. For example, the overall retardance of the optical system may be reduced, or the angular retardance distribution may be symmetrized.
摘要翻译：光学系统，例如用于光刻工具的透镜，包括一组各自包括诸如CaF 2 2的双折射立方晶体的光学元件（L 1，L 2）。晶体的晶格具有不同的取向，例如通过相互补偿减少集团的整体延迟。至少一个光学元件（L 1，L 2）的[110]晶轴相对于系统（10）的光轴（34）倾斜预定倾斜角（θ1 >，θ2> 2），其绝对值在1°和20°之间。这降低了幅度，但并没有显着地改变固有双折射的取向。通过选择适当的倾斜角度，可以实现光学系统的更好的性能。例如，可以减小光学系统的总体延迟，或者可以对角度延迟分布进行对称化。

80. 发明申请

US20080019013A1 Lens Made of a Crystalline Material 有权
标题翻译：透镜由结晶材料制成
公开(公告)号：US20080019013A1
公开(公告)日：2008-01-24
申请号：US11864193
申请日：2007-09-28
申请人： Birgit Enkisch , Hartmut Enkisch , Toralf Gruner
发明人： Birgit Enkisch , Hartmut Enkisch , Toralf Gruner
IPC分类号： G02B3/00
CPC分类号： G03F7/70966 , B24B13/00 , G02B1/02 , G02B3/00
摘要： As a preliminary stage in manufacturing a lens or lens part for an objective, in particular a projection objective for a microlithography projection system, an optical blank is made from a crystal material. As a first step in manufacturing the optical blank, one determines the orientation of a first crystallographic direction that is defined in the crystallographic structure of the material. The material is then machined into an optical blank so that the first crystallographic direction is substantially perpendicular to an optical blank surface of the optical blank. Subsequently, a marking is applied to the optical blank or to a mounting element of the optical blank. The marking has a defined relationship to a second crystallographic direction which is oriented at a non-zero angle relative to the first crystallographic direction.
摘要翻译：作为用于物镜的透镜或透镜部件的制造的初步阶段，特别是用于微光刻投影系统的投影物镜，光学坯料由晶体材料制成。作为制造光学坯料的第一步，确定在材料的晶体结构中限定的第一晶体方向的取向。然后将该材料加工成光学坯料，使得第一结晶方向基本上垂直于光学坯料的光学坯料表面。随后，将标记施加到光学毛坯或光学毛坯的安装元件。标记与第二结晶方向具有定义的关系，其相对于第一结晶方向定向成非零角度。

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