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71. 发明授权

US08033245B2 Substrate support bushing 有权
标题翻译：基板支撑衬套
公开(公告)号：US08033245B2
公开(公告)日：2011-10-11
申请号：US10779130
申请日：2004-02-12
申请人： Shinichi Kurita , Suhail Anwar , Toshio Kiyotake
发明人： Shinichi Kurita , Suhail Anwar , Toshio Kiyotake
IPC分类号： C23C16/50 , C23C16/503 , C23C16/505 , C23C16/458 , C23F1/00 , H01L21/306 , C23C16/06 , C23C16/22 , F16C29/02 , F16C19/00 , F16C19/50 , F16C43/06 , F16C33/38
CPC分类号： F16C29/046 , B65G49/061 , B65G2249/02 , C03C17/002 , C23C16/4584 , F16C29/045 , H01L21/00
摘要： An apparatus for supporting a substrate within a processing chamber is provided. In one aspect, a substrate support member is provided comprising a housing having a bore formed therethrough, a support pin at least partially disposed within the bore, and a plurality of bearing elements disposed about the housing. In one aspect, the bearing elements comprise a roller having a central bore formed therethrough, a contoured outer surface, and a shaft at least partially disposed through the central bore. In another aspect, the bearing elements comprise a ball assembly comprising a larger spherical member and four smaller spherical members arranged about the larger spherical member.
摘要翻译：提供了一种用于在处理室内支撑衬底的装置。在一个方面，提供了一种基板支撑构件，其包括具有穿过其中形成的孔的壳体，至少部分地设置在孔内的支撑销和围绕壳体设置的多个轴承元件。在一个方面，轴承元件包括具有穿过其形成的中心孔的辊，外形轮廓和至少部分地设置穿过中心孔的轴。在另一方面，轴承元件包括球组件，该球组件包括较大球形构件和围绕较大球形构件布置的四个较小球形构件。

72. 发明申请

US20110076118A1 SUBSTRATE TRANSFER ROBOT WITH CHAMBER AND SUBSTRATE MONITORING CAPABILITY 有权
标题翻译：基板转移机架与底板监测能力
公开(公告)号：US20110076118A1
公开(公告)日：2011-03-31
申请号：US12890281
申请日：2010-09-24
申请人： Shinichi Kurita , Takayuki Matsumoto , Suhail Anwar , Makoto Inagawa
发明人： Shinichi Kurita , Takayuki Matsumoto , Suhail Anwar , Makoto Inagawa
IPC分类号： H01L21/677 , B25J11/00
CPC分类号： H01L21/67742 , H01L21/67259
摘要： A method and apparatus for a transfer robot that having at least one image sensor disposed thereon is provided. The transfer robot includes a lift assembly having a first drive assembly for moving a first platform relative to a second platform in a first linear direction, an end effector assembly disposed on the second platform and movable in a second linear direction by a second drive assembly, the second linear direction being orthogonal to the first linear direction, at least one image sensor, and a lighting device associated with the at least one image sensor.
摘要翻译：提供一种用于传送机器人的方法和装置，其具有设置在其上的至少一个图像传感器。传送机器人包括具有第一驱动组件的提升组件，该第一驱动组件用于沿第一线性方向相对于第二平台移动第一平台;设置在第二平台上并通过第二驱动组件在第二线性方向上可移动的端部执行器组件，所述第二线性方向与所述第一线性方向正交，至少一个图像传感器和与所述至少一个图像传感器相关联的照明装置。

73. 外观设计

USD627625S1 Shadow frame support 有权
标题翻译：阴影框支持
公开(公告)号：USD627625S1
公开(公告)日：2010-11-23
申请号：US29353472
申请日：2010-01-08
申请人： Suhail Anwar , John M. White , Jeffrey A. Kho , Robin L. Tiner
设计人： Suhail Anwar , John M. White , Jeffrey A. Kho , Robin L. Tiner

74. 发明授权

US07735710B2 Substrate support 失效
标题翻译：基材支持
公开(公告)号：US07735710B2
公开(公告)日：2010-06-15
申请号：US10990094
申请日：2004-11-16
申请人： Shinichi Kurita , Wendell T. Blonigan , Suhail Anwar , Toshio Kiyotake , Hung T. Nguyen
发明人： Shinichi Kurita , Wendell T. Blonigan , Suhail Anwar , Toshio Kiyotake , Hung T. Nguyen
IPC分类号： H01L21/68
CPC分类号： H01L21/68 , H01L21/68728 , H01L21/68778 , H01L21/68792 , Y10S414/136 , Y10S414/139 , Y10S414/141
摘要： A method and apparatus for supporting a substrate is generally provided. In one aspect, an apparatus for supporting a substrate includes a support plate having a first body disposed proximate thereto. A first pushing member is radially coupled to the first body and adapted to urge the substrate in a first direction parallel to the support plate when the first body rotates. In another aspect, a load lock chamber having a substrate support that supports a substrate placed thereon includes a cooling plate that is moved to actuate at least one alignment mechanism. The alignment mechanism includes a pushing member that urges the substrate in a first direction towards a center of the support. The pushing member may additionally rotate about an axis perpendicular to the first direction.
摘要翻译：通常提供用于支撑衬底的方法和装置。在一个方面，一种用于支撑衬底的装置包括具有靠近其设置的第一主体的支撑板。第一推动构件径向耦合到第一主体并且适于在第一主体旋转时沿平行于支撑板的第一方向推动基板。在另一方面，具有支撑其上放置的基板的基板支撑件的装载锁定室包括移动以致动至少一个对准机构的冷却板。对准机构包括推动构件，其沿朝向支撑件的中心的第一方向推动基板。推动构件可以另外围绕垂直于第一方向的轴旋转。

75. 发明申请

US20100086380A1 SCISSOR LIFT TRANSFER ROBOT 有权
标题翻译： SCISSOR提升机器人
公开(公告)号：US20100086380A1
公开(公告)日：2010-04-08
申请号：US12247135
申请日：2008-10-07
申请人： Shinichi Kurita , Takayuki Matsumoto , Suhail Anwar
发明人： Shinichi Kurita , Takayuki Matsumoto , Suhail Anwar
IPC分类号： B25J9/00 , B25J11/00 , H01L21/677
CPC分类号： B25J15/0616 , B25J9/0096 , B25J11/00 , B66F7/065 , H01L21/68742 , H01L21/68785 , Y10T74/20305
摘要： A method and apparatus for a transfer robot that may be used in a vacuum environment is described. The transfer robot includes a lift assembly comprising a first platform and a second platform coupled to the first platform by a plurality of support members, the plurality of support members comprising a first pair of support members and a second pair of support members, a first drive assembly coupled to a portion of the plurality of support members, the first drive assembly providing a motive force to the plurality of support members to move the second platform in a first linear direction relative to the first platform, and an end effector disposed on the second platform and movable in a second linear direction by a second drive assembly, the second linear direction being orthogonal to the first linear direction.
摘要翻译：描述可用于真空环境中的传送机器人的方法和装置。传送机器人包括提升组件，其包括第一平台和通过多个支撑构件联接到第一平台的第二平台，多个支撑构件包括第一对支撑构件和第二对支撑构件，第一驱动组件联接到所述多个支撑构件的一部分，所述第一驱动组件为所述多个支撑构件提供动力以相对于所述第一平台在第一线性方向上移动所述第二平台，以及设置在所述第二平台上的末端执行器平台，并通过第二驱动组件在第二线性方向上移动，第二线性方向与第一线性方向正交。

76. 发明申请

US20100075453A1 SYSTEM ARCHITECTURE AND METHOD FOR SOLAR PANEL FORMATION 审中-公开
标题翻译：太阳能电池板的系统结构与方法
公开(公告)号：US20100075453A1
公开(公告)日：2010-03-25
申请号：US12626335
申请日：2009-11-25
申请人： Shinichi Kurita , Takako Takehara , Suhail Anwar
发明人： Shinichi Kurita , Takako Takehara , Suhail Anwar
IPC分类号： H01L31/18
CPC分类号： H01L31/206 , H01L21/67155 , H01L21/67161 , H01L21/67167 , H01L21/67184 , H01L21/67207 , H01L21/67236 , Y02E10/50 , Y02P70/521
摘要： A method and apparatus for forming solar panels from n-doped silicon, p-doped silicon, intrinsic amorphous silicon, and intrinsic microcrystalline silicon using a cluster tool is disclosed. The cluster tool comprises at least one load lock chamber and at least one transfer chamber. When multiple clusters are used, at least one buffer chamber may be present between the clusters. A plurality of processing chambers are attached to the transfer chamber. As few as five and as many as thirteen processing chambers can be present.
摘要翻译：公开了一种使用簇工具从n掺杂硅，p掺杂硅，本征非晶硅和本征微晶硅形成太阳能电池板的方法和装置。集群工具包括至少一个装载锁定室和至少一个传送室。当使用多个簇时，可以在簇之间存在至少一个缓冲室。多个处理室附接到传送室。只有五个和多达十三个处理室可以存在。

77. 发明申请

US20100050534A1 SLOTTED TSSL DOOR TO COUPLE O-RING WITH MOVING MATING PART 有权
标题翻译：滑动TSSL门与移动部件接合O形圈
公开(公告)号：US20100050534A1
公开(公告)日：2010-03-04
申请号：US12548553
申请日：2009-08-27
申请人： Mehran Behdjat , Shinichi Kurita , John M. White , Suhail Anwar , Makoto Inagawa
发明人： Mehran Behdjat , Shinichi Kurita , John M. White , Suhail Anwar , Makoto Inagawa
IPC分类号： E06B7/16 , E06B3/00
CPC分类号： H01L21/67201 , F16K15/147 , F16K51/02 , H01L21/67126
摘要： Embodiments disclosed herein generally relate to a slit valve door assembly for sealing an opening in a chamber. A slit valve door that is pressed against the chamber to seal the slit valve opening moves with the chamber as the slit valve opening shrinks so that an o-ring pressed between the slit valve door and the chamber may move with the slit valve door and the chamber. Thus, less rubbing of the o-ring against the chamber may occur. With less rubbing, fewer particles may be generated and the o-ring lifetime may be extended. With a longer lifetime for the o-ring, substrate throughput may be increased.
摘要翻译：本文公开的实施例通常涉及用于密封腔室中的开口的狭缝阀门组件。当狭缝阀开口收缩时，被压靠在腔室上以密封狭缝阀开口的狭缝阀门随着腔室移动，使得压紧在狭缝阀门和腔室之间的O形环可以与狭缝阀门一起移动，并且房间。因此，可能会发生O形环相对于室的摩擦较少。随着摩擦的减少，可能产生更少的颗粒，并且可以延长O形环的寿命。随着O形圈的寿命更长，衬底产量可能会增加。

78. 发明申请

US20090255798A1 METHOD TO PREVENT PARASITIC PLASMA GENERATION IN GAS FEEDTHRU OF LARGE SIZE PECVD CHAMBER 审中-公开
标题翻译：防止大型PECVD室气体排放中PARASITIC PLASMA产生的方法
公开(公告)号：US20090255798A1
公开(公告)日：2009-10-15
申请号：US12271616
申请日：2008-11-14
申请人： Gaku Furuta , Young-Jin Choi , Soo Young Choi , Beom Soo Park , John M. White , Suhail Anwar , Robin L. Tiner
发明人： Gaku Furuta , Young-Jin Choi , Soo Young Choi , Beom Soo Park , John M. White , Suhail Anwar , Robin L. Tiner
IPC分类号： C23C16/513
CPC分类号： C23C16/5096 , C23C16/4405 , C23C16/45561 , H01J37/32091 , H01J37/32357 , H01J37/3244 , H01J37/32449
摘要： The present invention generally includes a plasma enhanced chemical vapor deposition (PECVD) processing chamber having an RF power source coupled to the backing plate at a location separate from the gas source. By feeding the gas into the processing chamber at a location separate from the RF power, parasitic plasma formation in the gas tubes leading to the processing chamber may be reduced. The gas may be fed to the chamber at a plurality of locations. At each location, the gas may be fed to the processing chamber from the gas source by passing through a remote plasma source as well as an RF choke or RF resistor.
摘要翻译：本发明通常包括等离子体增强化学气相沉积（PECVD）处理室，其具有在与气源分开的位置处连接到背板的RF功率源。通过在与RF功率分开的位置处将气体供给到处理室中，可以减少通向处理室的气体管中的寄生等离子体形成。气体可以在多个位置被供给到腔室。在每个位置，气体可以通过远程等离子体源以及RF扼流器或RF电阻器从气体源馈送到处理室。

79. 发明授权

US07570130B2 Apparatus and methods for a fixed impedance transformation network for use in connection with a plasma chamber 有权
标题翻译：用于与等离子体室结合使用的固定阻抗变换网络的装置和方法
公开(公告)号：US07570130B2
公开(公告)日：2009-08-04
申请号：US11179036
申请日：2005-07-11
申请人： Carl A. Sorensen , John M. White , Suhail Anwar
发明人： Carl A. Sorensen , John M. White , Suhail Anwar
IPC分类号： H03H5/00
CPC分类号： H01J37/32082 , H01J37/32183
摘要： In certain embodiments, an apparatus for providing a fixed impedance transformation network for driving a plasma chamber includes a pre-match network adapted to couple between an Active RF match network and a plasma chamber load associated with the plasma chamber. The pre-match network includes (1) a first capacitive element; (2) an inductive element connected in parallel with the first capacitive element to form a parallel circuit that presents a stepped-up impedance to an output of the Active RF match network such that a voltage required to drive the plasma chamber load is reduced; and (3) a second capacitive element coupled to the parallel circuit and adapted to couple to the plasma chamber load. The second capacitive element reduces or cancels at least in part a reactance corresponding to an inductance associated with the plasma chamber load. Numerous other aspects are provided.
摘要翻译：在某些实施例中，用于提供用于驱动等离子体室的固定阻抗变换网络的装置包括适于在有源RF匹配网络和与等离子体室相关联的等离子体室负载之间耦合的预匹配网络。预匹配网络包括（1）第一电容元件; （2）与所述第一电容元件并联连接的电感元件，以形成并联电路，所述并联电路向所述有源RF匹配网络的输出提供升压阻抗，使得驱动所述等离子体室负载所需的电压降低; 和（3）耦合到并联电路并且适于耦合到等离子体室负载的第二电容元件。第二电容元件至少部分地减小或抵消与等离子体室负载相关联的电感的电抗。提供了许多其他方面。

80. 发明申请

US20090114153A1 METHOD AND APPARATUS FOR SEALING AN OPENING OF A PROCESSING CHAMBER 审中-公开
标题翻译：用于密封加工室的开口的方法和装置
公开(公告)号：US20090114153A1
公开(公告)日：2009-05-07
申请号：US12252055
申请日：2008-10-15
申请人： Shinichi Kurita , Takayuki Matsumoto , Robin L. Tiner , John M. White , Suhail Anwar
发明人： Shinichi Kurita , Takayuki Matsumoto , Robin L. Tiner , John M. White , Suhail Anwar
IPC分类号： C23C16/513 , B65D51/00 , B65D53/00 , B65D43/14 , B65D43/26
CPC分类号： C23C16/54 , C23C16/45517
摘要： A method and apparatus for sealing an opening of a processing chamber are provided. In one embodiment, the invention generally provides a closure member integrated within a wall of a process chamber for sealing an opening within the wall of the chamber. In another embodiment, the invention provides a closure member configured to seal an opening in the wall of a processing chamber from the inside of the chamber.
摘要翻译：提供一种用于密封处理室的开口的方法和装置。在一个实施例中，本发明通常提供集成在处理室的壁内的封闭构件，用于密封腔室壁内的开口。在另一个实施例中，本发明提供了一种封闭构件，其构造成将处理室的壁中的开口与室的内部密封。

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