专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

71. 发明授权

US08483955B2 Navigation system for a vehicle 失效
标题翻译：车辆导航系统
公开(公告)号：US08483955B2
公开(公告)日：2013-07-09
申请号：US11885342
申请日：2006-03-29
申请人： Hiroshi Tomita , Junichiro Igawa
发明人： Hiroshi Tomita , Junichiro Igawa
IPC分类号： G01C21/36
CPC分类号： G01C21/3691 , G08G1/096716 , G08G1/09675 , G08G1/096775
摘要： When a vehicle is located within the area of coverage of a radio station, a navigation system outputs audio guidance on the basis of traffic information received from the radio station, provided a predetermined audio output condition related to a congested area is satisfied or stores the traffic information in a storage section if the predetermined audio output condition is not satisfied. Then, when the vehicle is located outside of the area of coverage of the radio station, the navigation system outputs the stored traffic information as audio guidance.
摘要翻译：当车辆位于无线电台的覆盖范围内时，导航系统基于从无线电台接收到的话务信息输出音频引导，只要满足与拥挤区域有关的预定音频输出条件，或者存储通信量如果不满足预定音频输出条件，则存储部分中的信息。然后，当车辆位于无线电台的覆盖区域的外部时，导航系统将存储的交通信息作为音频引导输出。

72. 发明申请

US20130122706A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE 审中-公开
标题翻译：制造半导体器件的方法
公开(公告)号：US20130122706A1
公开(公告)日：2013-05-16
申请号：US13428681
申请日：2012-03-23
申请人： Hisashi OKUCHI , Hidekazu Hayashi , Kentaro Shimayama , Hiroshi Tomita
发明人： Hisashi OKUCHI , Hidekazu Hayashi , Kentaro Shimayama , Hiroshi Tomita
IPC分类号： H01L21/306
CPC分类号： H01L21/30604 , H01L21/6835 , H01L2221/68327 , H01L2221/6834
摘要： According to one embodiment, a method of manufacturing of a semiconductor device is provided. In the method, a front surface of a semiconductor substrate and a front surface of a support substrate are bonded to each other by an adhesive. A part of a circumferential part of the support substrate is subjected to water-repellent treatment to thereby form a water-repellent area on the part of the circumferential part in such a manner that the water-repellent area and an end face of the adhesive are in contact with each other. The semiconductor substrate is removed from a rear surface side by wet etching.
摘要翻译：根据一个实施例，提供了半导体器件的制造方法。在该方法中，半导体衬底的前表面和支撑衬底的前表面通过粘合剂彼此粘结。对支撑基板的圆周部分的一部分进行防水处理，从而在周向部分的一部分上形成防水区域，使得防水区域和粘合剂的端面为彼此接触。通过湿法蚀刻从背面侧去除半导体衬底。

73. 发明授权

US08403601B2 Substrate transfer apparatus and substrate treatment system 有权
标题翻译：基板转印装置和基板处理系统
公开(公告)号：US08403601B2
公开(公告)日：2013-03-26
申请号：US12656324
申请日：2010-01-26
申请人： Mitsuteru Yano , Yuichi Douki , Hiroshi Tomita
发明人： Mitsuteru Yano , Yuichi Douki , Hiroshi Tomita
IPC分类号： B65G53/40
CPC分类号： H01L21/6715 , H01L21/67017 , H01L21/6719 , H01L21/67196 , Y10T408/29 , Y10T408/559 , Y10T408/5612
摘要： The present invention is a transfer apparatus for a substrate, including a substrate housing container housing a substrate therein and having a transfer-in/out port for the substrate formed in a side surface thereof; a gas jet unit jetting a predetermined gas toward a rear surface of the substrate in the substrate housing container; and a control unit regulating a supply amount of the predetermined gas supplied from the gas jet unit to control the substrate in the substrate housing container to a predetermined height.
摘要翻译：本发明是一种用于基板的转印装置，包括：基板容纳容器，其容纳基板，并具有用于形成在其侧表面中的基板的转入/输出端口; 气体喷射单元，在所述基板容纳容器内向所述基板的后表面喷射预定的气体; 以及控制单元，其调节从气体喷射单元供给的预定气体的供给量，以将基板容纳容器中的基板控制到预定高度。

74. 发明申请

US20130061492A1 SUPERCRITICAL DRYING METHOD AND SUPERCRITICAL DRYING APPARATUS FOR SEMICONDUCTOR SUBSTRATE 审中-公开
标题翻译：半导体基板超临界干燥方法和超临界干燥装置
公开(公告)号：US20130061492A1
公开(公告)日：2013-03-14
申请号：US13423374
申请日：2012-03-19
申请人： Hisashi OKUCHI , Hidekazu HAYASHI , Linan JI , Yohei SATO , Hiroshi TOMITA
发明人： Hisashi OKUCHI , Hidekazu HAYASHI , Linan JI , Yohei SATO , Hiroshi TOMITA
IPC分类号： F26B5/04
CPC分类号： F26B7/00 , F26B5/04
摘要： According to one embodiment, a supercritical drying apparatus comprises a chamber being hermetically sealable and configured to store a semiconductor substrate, a heater configured to heat an inner side of the chamber, a supply unit configured to supply carbon dioxide to the chamber, a discharge unit configured to discharge carbon dioxide from the chamber, and a rotation unit configured to rotate the chamber by an angle equal to or greater than 90 degrees and equal to or smaller than 180 degrees with respect to the horizontal direction.
摘要翻译：根据一个实施例，超临界干燥装置包括：气室密封并构造成存储半导体衬底;加热器，其构造成加热室的内侧;供应单元，被配置为向室供应二氧化碳;排放单元被构造成从所述室排放二氧化碳，以及旋转单元，其被构造成使所述室相对于水平方向旋转等于或大于90度且等于或小于180度的角度。

75. 发明申请

US20120257813A1 SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND COMPUTER-READABLE RECORDING MEDIUM HAVING PROGRAM FOR EXECUTING THE SUBSTRATE PROCESSING METHOD RECORDED THEREIN 有权
标题翻译：基板处理装置，基板处理方法以及具有用于执行记录的基板处理方法的程序的计算机可读记录介质
公开(公告)号：US20120257813A1
公开(公告)日：2012-10-11
申请号：US13438011
申请日：2012-04-03
申请人： Shinichi SEKI , Hiroshi Tomita , Nobutaka Fukunaga , Toshifumi Sohara
发明人： Shinichi SEKI , Hiroshi Tomita , Nobutaka Fukunaga , Toshifumi Sohara
IPC分类号： G06K9/00 , G01N21/88
CPC分类号： G06T7/0004 , G01N21/9501 , G06T2207/30148
摘要： Provided is a substrate processing apparatus that includes: a peripheral exposing unit that performs a peripheral exposing process by irradiating light to a peripheral portion of a substrate while rotating the substrate held by a substrate holding unit using a rotation driving unit; a substrate inspecting unit that performs a substrate inspecting process based on a picked up image of the substrate while moving the substrate using a movement driving unit; and a control unit. The control unit controls the predetermined substrate processing to be stopped when the peripheral exposing process is included in the predetermined substrate processing and an error occurs in the peripheral exposing unit, and controls the substrate inspecting process to be skipped when no error occurs in both of the peripheral exposing unit and a transport unit, the substrate inspecting process is included in the predetermined substrate processing and an error occurs in the substrate inspecting unit.
摘要翻译：提供了一种基板处理装置，其包括：外围曝光单元，其通过使用旋转驱动单元旋转由基板保持单元保持的基板旋转来对基板的周边部分照射光，进行周边曝光处理; 基板检查单元，其使用移动驱动单元移动所述基板时，基于所述基板的拾取图像执行基板检查处理; 和控制单元。当外围曝光处理被包括在预定的基板处理中并且在外围曝光单元中发生错误时，控制单元控制要停止的预定的基板处理，并且当在两者中没有发生错误时，控制要跳过的基板检查处理外围曝光单元和传送单元，基板检查处理被包括在预定的基板处理中，并且在基板检查单元中发生错误。

76. 发明授权

US08231285B2 Substrate processing method and apparatus 有权
标题翻译：基板加工方法及装置
公开(公告)号：US08231285B2
公开(公告)日：2012-07-31
申请号：US12610907
申请日：2009-11-02
申请人： Kunie Ogata , Koki Nishimuko , Hiroshi Tomita , Yoshio Kimura , Ryouichi Uemura , Michio Tanaka
发明人： Kunie Ogata , Koki Nishimuko , Hiroshi Tomita , Yoshio Kimura , Ryouichi Uemura , Michio Tanaka
IPC分类号： G03D5/00 , G03B27/53
CPC分类号： H01L21/67253 , G03F7/162 , G03F7/3021 , H01L21/6715
摘要： A resist pattern forming method using a coating and developing apparatus and an aligner being connected thereto which are controlled to form a resist film on a surface of a substrate with a base film and a base pattern formed thereon, followed by inspecting at least one of a plurality of measurement items selected from: reflection ratio and film thickness of the base film and the resist film, line width after a development, an accuracy that the base pattern matches with a resist pattern, a defect on the surface after the development, etc. A parameter subject to amendment is selected based on corresponding data of each measurement item, such as the film thickness of the resist and the line width after the development, and amendment of the parameter is performed. This results in a reduced workload of an operator, and the appropriate amendment can be performed.
摘要翻译：使用涂覆和显影装置和对准器连接的抗蚀剂图案形成方法被控制以在其上形成有基膜和基底图案的基板的表面上形成抗蚀剂膜，然后检查至少一个选自以下的多个测量项目：基膜和抗蚀剂膜的反射率和膜厚度，显影后的线宽度，基底图案与抗蚀剂图案匹配的精度，显影后的表面上的缺陷等。基于每个测量项目的对应数据（例如抗蚀剂的膜厚度和显影后的线宽度）来选择修改参数，并且修改参数。这导致操作者的工作量减少，并且可以执行适当的修改。

77. 发明授权

US08139107B2 Defect inspection method, defect inspection system, and computer readable storage medium 有权
标题翻译：缺陷检查方法，缺陷检查系统和计算机可读存储介质
公开(公告)号：US08139107B2
公开(公告)日：2012-03-20
申请号：US11656956
申请日：2007-01-24
申请人： Makoto Hayakawa , Hiroshi Tomita
发明人： Makoto Hayakawa , Hiroshi Tomita
IPC分类号： H04N7/18
CPC分类号： G01N21/9501
摘要： In the present invention, an image of a substrate is picked up by an image pickup unit with the substrate being held by a transfer member. A drive unit for the transfer member is controlled by a driving signal from a first controller. A driving signal outputted to the first controller is outputted also to a second controller so that the second controller controls the image pickup unit based on the driving signal, thereby synchronizing drive of the transfer member with the image pickup by the image pickup unit. According to the present invention, the throughput in performing a defect inspection for the substrate is improved and a precise image is captured and subjected to accurate inspection.
摘要翻译：在本发明中，基板被转印部件保持的图像拾取单元拾取基板的图像。用于传送构件的驱动单元由来自第一控制器的驱动信号控制。输出到第一控制器的驱动信号也输出到第二控制器，使得第二控制器基于驱动信号控制图像拾取单元，由此通过图像拾取单元使传送部件与图像拾取器的驱动同步。根据本发明，提高了对基板进行缺陷检查的吞吐量，并捕获精确的图像并进行了精确的检查。

78. 发明申请

US20120013859A1 COATING AND DEVELOPING APPARATUS AND METHOD 有权
标题翻译：涂料和开发设备和方法
公开(公告)号：US20120013859A1
公开(公告)日：2012-01-19
申请号：US13177997
申请日：2011-07-07
申请人： Nobuaki Matsuoka , Akira Miyata , Shinichi Hayashi , Suguru Enokida , Hiroshi Tomita , Makoto Hayakawa , Tatsuhei Yoshida
发明人： Nobuaki Matsuoka , Akira Miyata , Shinichi Hayashi , Suguru Enokida , Hiroshi Tomita , Makoto Hayakawa , Tatsuhei Yoshida
IPC分类号： G03B27/52
CPC分类号： G03F7/16 , H01L21/6715
摘要： In one embodiment, a coating and developing apparatus includes a processing block having two early-stage coating unit blocks, two later-stage coating unit blocks and two developing unit blocks, each unit blocks being vertically stacked on each other. The apparatus has at least two operation modes M1 and M2 adapted for abnormality. In mode M1 the processing module that processed the abnormal substrate in the developing unit blocks is identified, and subsequent substrates are transported to the processing module or modules, of the same type as the identified processing module, other than the identified processing module. In mode M2, the developing unit block that processed the abnormal substrate is identified, and subsequent substrates are transported to the developing unit block other than the identified developing unit block.
摘要翻译：在一个实施例中，涂层和显影装置包括具有两个早期涂覆单元块，两个后期涂层单元块和两个显影单元块的处理块，每个单元块彼此垂直堆叠。该装置具有至少两个适于异常的操作模式M1和M2。在模式M1中，识别处理显影单元块中的异常衬底的处理模块，并且随后的衬底被传送到除了所识别的处理模块之外的与所识别的处理模块相同类型的处理模块。在模式M2中，识别处理异常衬底的显影单元块，并且随后的衬底被传送到除了所识别的显影单元块之外的显影单元块。

79. 发明授权

US08074886B2 Systems and methods for preserving and maintaining document integrity 有权
标题翻译：用于维护和维护文档完整性的系统和方法
公开(公告)号：US08074886B2
公开(公告)日：2011-12-13
申请号：US12168028
申请日：2008-07-03
申请人： Hiroshi Tomita
发明人： Hiroshi Tomita
IPC分类号： G06K7/10 , G06K9/18
CPC分类号： G06F17/24 , G06F17/2288
摘要： Systems and methods consistent with embodiments of the present invention provide for a method for preserving and maintaining document integrity. In some methods for preserving and maintaining document integrity, the contents of a document, or contents of a document layer may be encoded into a machine-readable form. In some embodiments, the encoded information may be represented using a 2-dimensional bar code. In some methods for preserving and maintaining document integrity, the machine-readable code is printed along with contents of the document based on space available in the document. In some embodiments, a printed document containing the machine-readable code may be scanned and digitized, and content extracted from the scanned data. In some embodiments, the machine-readable code printed on the document is used to recreate layer data from the printed document.
摘要翻译：与本发明的实施例一致的系统和方法提供了一种用于维护和维护文档完整性的方法。在用于保持和维护文档完整性的一些方法中，文档的内容或文档层的内容可以被编码成机器可读形式。在一些实施例中，编码信息可以使用二维条形码来表示。在一些维护和维护文档完整性的方法中，机器可读代码根据文档中可用的空间与文档的内容一起打印。在一些实施例中，可以扫描并数字化包含机器可读代码的打印文档，并从扫描数据中提取内容。在一些实施例中，打印在文档上的机器可读代码用于从打印文档重建层数据。

80. 发明授权

US08066020B2 Substrate cleaning apparatus and substrate cleaning method 失效
标题翻译：基板清洗装置和基板清洗方法
公开(公告)号：US08066020B2
公开(公告)日：2011-11-29
申请号：US11588393
申请日：2006-10-27
申请人： Hiroshi Tomita , Hiroaki Yamada , Kunihiro Miyazaki , Hajime Onoda
发明人： Hiroshi Tomita , Hiroaki Yamada , Kunihiro Miyazaki , Hajime Onoda
IPC分类号： B08B3/00
CPC分类号： H01L21/67057 , B08B3/08 , B08B3/10
摘要： A substrate cleaning apparatus, comprises a process tank that holds a mixture containing a hydrogen peroxide solution and sulfuric acid and is used for cleaning a substrate immersed in said mixture; circulation piping that extends between a primary side of said process tank on which said mixture is injected into said process tank and a secondary side of said process tank on which said mixture is discharged from said process tank and has a pump for causing circulation of said mixture; a heater disposed in said circulation piping configured to heat said mixture to a predetermined temperature; a chemical injection pipe configured to inject a hydrogen peroxide solution into said circulation piping at a position between the primary side of said process tank and a secondary side, which is a downstream side, of said heater; and a filter disposed in said circulation piping configured to remove particles in said mixture.
摘要翻译：一种基板清洗装置，包括保持含有过氧化氢溶液和硫酸的混合物的处理罐，用于清洗浸在所述混合物中的基板; 所述循环管道在所述处理罐的初级侧之间延伸，所述处理罐的所述混合物被注入到所述处理罐中，所述处理罐的二次侧在所述处理罐的二次侧上从所述处理罐排出所述混合物，并且具有用于使所述混合物循环的泵 ; 设置在所述循环管道中的加热器，被配置为将所述混合物加热至预定温度; 化学注入管，被配置为在所述处理罐的初级侧和位于所述加热器的下游侧的次级侧之间的位置处将过氧化氢溶液注入到所述循环管道中; 以及设置在所述循环管道中的过滤器，其构造成去除所述混合物中的颗粒。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式