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    • 61. 发明授权
    • Light-emitting device and method of manufacturing the same
    • 发光装置及其制造方法
    • US08792160B2
    • 2014-07-29
    • US13614646
    • 2012-09-13
    • Rintaro KodaHideki WatanabeMasaru KuramotoShunsuke KonoTakao Miyajima
    • Rintaro KodaHideki WatanabeMasaru KuramotoShunsuke KonoTakao Miyajima
    • H01S5/22
    • H01S5/22B82Y20/00H01S5/0218H01S5/0655H01S5/2031H01S5/34333H01S5/50H01S2301/166
    • Provided is a light-emitting device including (a) a layer structure obtained by sequentially growing on a base substrate a first compound semiconductor layer of a first conductivity type, (b) an active layer formed of a compound semiconductor, and (c) a second compound semiconductor layer of a second conductivity type; a second electrode formed on the second compound semiconductor layer; and a first electrode electrically connected to the first compound semiconductor layer. The layer structure formed of at least a part of the second compound semiconductor layer in a thickness direction of the second compound semiconductor layer. The first compound semiconductor layer has a thickness greater than 0.6 μm. A high-refractive index layer formed of a compound semiconductor material having a refractive index higher than a refractive index of a compound semiconductor material of the first compound semiconductor layer is formed in the first compound semiconductor layer.
    • 提供一种发光器件,其包括(a)通过在基底衬底上依次生长第一导电类型的第一化合物半导体层,(b)由化合物半导体形成的有源层,以及(c) 第二导电类型的第二化合物半导体层; 形成在第二化合物半导体层上的第二电极; 和与第一化合物半导体层电连接的第一电极。 所述层结构由所述第二化合物半导体层的至少一部分在所述第二化合物半导体层的厚度方向上形成。 第一化合物半导体层的厚度大于0.6μm。 在第一化合物半导体层中形成由折射率高于第一化合物半导体层的化合物半导体材料的折射率的化合物半导体材料形成的高折射率层。
    • 62. 发明授权
    • Semiconductor optical amplifier
    • 半导体光放大器
    • US08786941B2
    • 2014-07-22
    • US13166900
    • 2011-06-23
    • Masaru KuramotoMasao IkedaRintaro KodaTomoyuki OkiHideki WatanabeTakao MiyajimaHiroyuki Yokoyama
    • Masaru KuramotoMasao IkedaRintaro KodaTomoyuki OkiHideki WatanabeTakao MiyajimaHiroyuki Yokoyama
    • H01S5/00
    • H01S5/1064H01S5/0425H01S5/0602H01S5/0657H01S5/16H01S5/22H01S5/32341H01S5/34333H01S5/50
    • A semiconductor optical amplifier includes: a laminated structure sequentially including a first compound semiconductor layer composed of GaN compound semiconductor and having a first conductivity type, a third compound semiconductor layer having a light amplification region composed of GaN compound semiconductor, and a second compound semiconductor layer composed of GaN compound semiconductor and having a second conductivity type; a second electrode formed on the second compound semiconductor layer; and a first electrode electrically connected to the first compound semiconductor layer. The laminated structure has a ridge stripe structure. When widths of the ridge stripe structure in a light output end face and the ridge stripe structure in a light incident end face are respectively Wout, and Win, Wout>Win is satisfied. A carrier non-injection region is provided in an internal region of the laminated structure from the light output end face along an axis line of the semiconductor optical amplifier.
    • 半导体光放大器包括:依次包括由GaN化合物半导体构成的第一化合物半导体并具有第一导电类型的层压结构,具有由GaN化合物半导体构成的光放大区域的第三化合物半导体层和第二化合物半导体层 由GaN化合物半导体构成并具有第二导电类型; 形成在第二化合物半导体层上的第二电极; 和与第一化合物半导体层电连接的第一电极。 层叠结构具有脊形条纹结构。 当光输出端面中的棱条结构的宽度和光入射端面中的脊条纹结构的宽度分别为Wout时,满足Win,Wout> Win。 载体非注入区域沿着半导体光放大器的轴线从光输出端面设置在层叠结构的内部区域中。
    • 64. 发明申请
    • LASER DIODE DEVICE
    • 激光二极管器件
    • US20120147917A1
    • 2012-06-14
    • US13310260
    • 2011-12-02
    • Tomoyuki OkiHideki WatanabeRintaro KodaMasaru KuramotoHiroyuki Yokoyama
    • Tomoyuki OkiHideki WatanabeRintaro KodaMasaru KuramotoHiroyuki Yokoyama
    • H01S5/323
    • H01S5/34333B82Y20/00H01S5/06253H01S5/0658H01S5/1014H01S5/1064H01S5/141H01S5/22
    • A laser diode device includes a laminated structure in which a first compound semiconductor layer, a third compound semiconductor layer that has a light emitting region and a saturable absorption region, and a second compound semiconductor layer are sequentially layered, a second electrode, and a first electrode. The laminated structure has ridge stripe structure. The second electrode is separated into a first section to obtain forward bias state by applying a direct current to the first electrode through the light emitting region and a second section to add electric field to the saturable absorption region by an isolation trench. When minimum width of the ridge stripe structure is WMIN, and width of the ridge stripe structure of the second section of the second electrode in an interface between the second section of the second electrode and the isolation trench is W2, 1
    • 激光二极管装置包括其中依次层叠有第一化合物半导体层,具有发光区域和可饱和吸收区域的第三化合物半导体层和第二化合物半导体层的层叠结构,第二电极和第一 电极。 层叠结构具有脊状结构。 将第二电极分离为第一部分,以通过通过发光区域向第一电极施加直流电流以及通过隔离沟槽向可饱和吸收区域加电场的第二部分来获得正向偏置状态。 当脊条纹结构的最小宽度为WMIN时,第二电极的第二部分与隔离沟槽之间的界面中的第二电极的第二部分的脊状条纹结构的宽度为W2,1