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61. 发明授权

US6004721A Positive photoresist composition 失效
标题翻译：正光致抗蚀剂组合物
公开(公告)号：US6004721A
公开(公告)日：1999-12-21
申请号：US18883
申请日：1998-02-05
申请人： Shiro Tan , Toshiaki Aoai , Toru Fujimori
发明人： Shiro Tan , Toshiaki Aoai , Toru Fujimori
IPC分类号： G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106
摘要： A positive photoresist composition is disclosed which comprises (a) a resin obtained from an alkali-soluble resin containing phenolic hydroxyl groups by replacing from 10 to 80% of the phenolic hydroxyl groups each with a group having a specific structure, (b) a compound which generates an acid upon irradiation with actinic rays or a radiation, and (c) a solvent. This composition is an excellent, chemically amplified photoresist composition which has high resolution and gives a resist pattern having no depressions in an upper part thereof and having satisfactory adhesion to the substrate.
摘要翻译：公开了一种正性光致抗蚀剂组合物，其包含（a）通过用具有特定结构的基团代替10至80％的酚羟基，由（b）化合物其在用光化射线或辐射照射时产生酸，和（c）溶剂。该组合物是优异的化学放大型光致抗蚀剂组合物，其具有高分辨率并且在其上部具有不具有凹陷的抗蚀剂图案，并且对基材具有令人满意的粘合性。

62. 发明授权

US5955238A Waterless planographic printing plate and method of plate making using the same 失效
标题翻译：无水平版印刷版及其制版方法
公开(公告)号：US5955238A
公开(公告)日：1999-09-21
申请号：US812035
申请日：1997-03-06
申请人： Hiroaki Yokoya , Toshiaki Aoai , Kazuya Uenishi
发明人： Hiroaki Yokoya , Toshiaki Aoai , Kazuya Uenishi
IPC分类号： B41C1/05 , B41C1/055 , B41C1/10 , B41N1/14 , G03F7/00 , G03F7/004 , G03F7/022 , G03F7/075 , G03F7/11 , G03F7/26
CPC分类号： G03F7/0752 , B41C1/1033 , G03F7/0045 , G03F7/022 , B41C2210/16 , Y10S430/145
摘要： A waterless planographic printing plate, wherein the waterless planographic printing plate comprises a laser-light-sensitive layer which constitute a first layer provided on a support, containing a compound (A) generating an acid by irradiating an actinic light thereto, a compound (B) converting a laser light to heat and a polymer compound (C) which is decomposed by heat under an acidic condition; and a layer which constitutes a second layer having an ink repellent surface thereon. The entire surface of the waterless planographic printing plate is exposed with ultraviolet light. The printing plate is irradiated imagewisely with an infrared laser light to heat the portion irradiated with the laser light, and at least a layer having an ink repellent surface at the portion irradiated with the laser light is removed. The present invention can provide a waterless planographic printing plate capable of laser recording with a high sensitivity and separation developing, and having a high resolving power and an excellent storability, and a method of plate making for the printing plate which is simple and accurate.
摘要翻译：一种无水平版印刷版，其中所述无水平版印刷版包括构成设置在载体上的第一层的激光感光层，所述第一层含有通过向其中照射光化光而产生酸的化合物（A），化合物（B ）将激光转化为热，以及在酸性条件下通过加热分解的高分子化合物（C）; 以及构成其上具有拒墨表面的第二层的层。无水平版印刷版的整个表面用紫外线照射。用红外激光成像照射印版，加热照射激光的部分，至少在激光照射部分具有防墨表面的层被去除。本发明可以提供一种能够以高灵敏度和分离显影的激光记录，并且具有高分辨能力和优异的储存性的无水平版印刷版，并且该印版的制版方法简单准确。

63. 发明授权

US5939234A Chemically amplified positive resist composition 失效
标题翻译：化学放大正光刻胶组合物
公开(公告)号：US5939234A
公开(公告)日：1999-08-17
申请号：US655233
申请日：1996-06-05
申请人： Tsukasa Yamanaka , Toshiaki Aoai , Toru Fujimori
发明人： Tsukasa Yamanaka , Toshiaki Aoai , Toru Fujimori
IPC分类号： G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0045 , Y10S430/106 , Y10S430/111 , Y10S430/121
摘要： Disclosed is a chemically amplified positive resist composition which comprises (A) a compound which contains at least one group selected among tert-alkyl ester groups and tert-alkyl carbonate groups and is capable of increasing solubility of the compound in an alkali aqueous solution by the action of an acid, (B) a compound which contains at least one group selected among acetal groups and silyl ether groups and is capable of increasing solubility of the compound in an alkali aqueous solution by the action of an acid, (C) a compound which is capable of generating an acid by irradiation with an active ray or radiation, and (D) an organic basic compound. The resist composition has high resolving power and forms a satisfactory pattern free from undergoing sensitivity decrease, T-top formation, and change in line width which are caused from exposure to post exposure bake.
摘要翻译：公开了一种化学放大型正性抗蚀剂组合物，其包含（A）含有至少一个选自叔烷基酯基和碳酸叔烷基酯基的基团的化合物，并且能够增加化合物在碱性水溶液中的溶解度酸的作用，（B）含有至少一个选自缩醛基团和甲硅烷基醚基团的基团并且能够通过酸的作用增加化合物在碱性水溶液中的溶解度的化合物，（C）化合物其能够通过用活性射线或辐射照射产生酸，和（D）有机碱性化合物。抗蚀剂组合物具有高分辨能力，并且形成了不受曝光曝光烘烤引起的敏感性降低，T顶形成和线宽变化的令人满意的图案。

64. 发明授权

US5683856A Positive-working photosensitive composition 失效
标题翻译：正性感光组合物
公开(公告)号：US5683856A
公开(公告)日：1997-11-04
申请号：US634529
申请日：1996-04-18
申请人： Toshiaki Aoai , Tsukasa Yamanaka , Kazuya Uenishi
发明人： Toshiaki Aoai , Tsukasa Yamanaka , Kazuya Uenishi
IPC分类号： G03F7/004 , G03C1/492
CPC分类号： G03F7/0045
摘要： A positive working photosensitive composition is disclosed, which comprises: (a) a resin which is insoluble in water but soluble in an alkaline aqueous solution; (b) a compound which generates an acid upon irradiation with active light or radiation; (c) a low molecular acid-decomposable dissolution-inhibitive compound having a molecular weight of 3,000 or less and containing a group decomposable with an acid, and which increases its solubility in an alkaline developer by the action of an acid; and (d) a resin containing a basic nitrogen atom and having a weight-average molecular weight of 2,000 or more. A further positive working photosensitive composition is disclosed, which comprises: (1) a compound which generates an acid upon irradiation with active light or radiation; (2) a resin having a group which undergoes decomposition by an acid whereby increasing its solubility in an alkaline developer; and (3) a resin containing a basic nitrogen atom and having a weight-average molecular weight of 2,000 or more. The positive-working photosensitive composition of the present invention can easily and properly inhibit acid diffusion and acid deactivation on the surface thereof with time between the exposure and the heat treatment, keep the dissolution inhibiting effect exerted by the dissolution-inhibitive compound and exhibit a good profile, a high sensitivity and a high resolving power.
摘要翻译：公开了一种正性感光性组合物，其包括：（a）不溶于水但可溶于碱性水溶液的树脂; （b）在用活性光或辐射照射时产生酸的化合物; （c）分子量为3000以下且含有可与酸分解的基团的低分子酸分解性溶解抑制性化合物，其通过酸的作用增加其在碱性显影剂中的溶解度; 和（d）含有碱性氮原子，重均分子量为2,000以上的树脂。公开了另一种正性光敏组合物，其包括：（1）在用活性光或辐射照射时产生酸的化合物; （2）具有通过酸分解的基团的树脂，从而增加其在碱性显影剂中的溶解度; 和（3）含有碱性氮原子，重均分子量为2,000以上的树脂。本发明的正性感光性组合物可以在曝光和热处理之间的时间内容易且适当地抑制其在表面上的酸扩散和酸失活，保持由溶解抑制性化合物发挥的溶解抑制作用，轮廓，高灵敏度和高分辨力。

65. 发明授权

US5340688A Positive type photoresist composition 失效
标题翻译：正型光致抗蚀剂组合物
公开(公告)号：US5340688A
公开(公告)日：1994-08-23
申请号：US15578
申请日：1993-02-10
申请人： Yasumasa Kawabe , Toshiaki Aoai , Tadayoshi Kokubo
发明人： Yasumasa Kawabe , Toshiaki Aoai , Tadayoshi Kokubo
IPC分类号： G03F7/022 , H01L21/027 , G03F7/021 , G03F7/30
CPC分类号： G03F7/022
摘要： Disclosed is a novel positive type photoresist composition comprising a 1,2-naphthoquinonediazido-5-(and/or -4-)sulfonic ester of a member selected from the group consisting of the polyhydroxy compounds represented by the following formula (I), (II) or (III) and an alkali-soluble resin: ##STR1## wherein the variables of Formula I are defined in the specification; ##STR2## wherein the variables of Formula II are defined in the specification; ##STR3## wherein the variables of Formula III are defined in the specification.
摘要翻译：公开了一种新型的正型光致抗蚀剂组合物，其包含选自由下式（I）表示的多羟基化合物，（I），（I）表示的多羟基化合物的组分的1,2-萘醌二叠氮基-5-（和/或-4-）磺酸酯， II）或（III）和碱溶性树脂：其中式I的变量在说明书中定义; （II）其中式II的变量在说明书中定义; （III）其中式III的变量在本说明书中定义。

66. 发明授权

US5294511A Photosensitive composition 失效
标题翻译：感光组合物
公开(公告)号：US5294511A
公开(公告)日：1994-03-15
申请号：US998129
申请日：1992-12-29
申请人： Toshiaki Aoai , Mitsunori Ono
发明人： Toshiaki Aoai , Mitsunori Ono
IPC分类号： G03F7/039 , C08F20/22 , C08F20/26 , C08F26/00 , C08F28/00 , C08F28/02 , C08F34/00 , C08F212/00 , C08F212/08 , G03F7/004 , H01L21/027
CPC分类号： G03F7/0045
摘要： A photosensitive composition containing a compound having a group represented by formula(I) or (II), said group, when irradiated with actinic radiation, forming a carboxylic acid or a sulfonic acid: ##STR1## wherein R.sub.1 represents hydrogen, an alkyl group, or an aryl group; andR.sub.2 to R.sub.6 may be the same or different and each represents hydrogen, a halogen, an alkoxyl group, an aryloxyl group, cyano group, or an alkyl group, provided that at least one of R.sub.2 to R.sub.6 represents an alkoxyl or aryloxyl group and two of R.sub.2 to R.sub.6 may link to form a ring.
摘要翻译：含有具有式（I）或（II）所示基团的化合物的光敏组合物，所述基团用光化辐射照射时形成羧酸或磺酸：（*化学结构*）（I）（*化学式结构*）（II）其中R1表示氢，烷基或芳基; 并且R 2至R 6可以相同或不同，各自表示氢，卤素，烷氧基，芳氧基，氰基或烷基，条件是R 2至R 6中的至少一个表示烷氧基或芳氧基， R2到R6中的两个可以链接形成环。

67. 发明授权

US5278273A Siloxane polymers and positive working light-sensitive compositions comprising the same 失效
标题翻译：硅氧烷聚合物和包含其的正性工作光敏组合物
公开(公告)号：US5278273A
公开(公告)日：1994-01-11
申请号：US3501
申请日：1993-01-12
申请人： Toshiaki Aoai , Kazuyoshi Mizutani
发明人： Toshiaki Aoai , Kazuyoshi Mizutani
IPC分类号： C08G77/22 , C08G77/382 , G03F7/075
CPC分类号： C08G77/22 , C08G77/382 , G03F7/0757
摘要： A novel siloxane polymer having at least 1 mol % of a structural unit derived from a cyclic heat addition product between a diene compound of formula (I) or (II) and an olefin or actylene compound of formula (III), (IV) or (V): ##STR1## and a positive working light-sensitive composition comprising the siloxane polymer.
摘要翻译：一种新型硅氧烷聚合物，其具有至少1摩尔％的衍生自式（I）或（II）的二烯化合物与烯烃或式（III），（IV）或（IV）的烯化合物的环状加热产物的结构单元，（Ⅴ）：（*化学结构*）（I）（*化学结构*）（II）（*化学结构*）（III）（*化学结构*）（Ⅳ）（*化学结构*）包含硅氧烷聚合物的正性工作感光组合物。

68. 发明授权

US4898803A Light-sensitive o-quinone diazide composition with acidic polyurethane resin 失效
标题翻译：光敏邻苯醌二叠氮化合物与酸性聚氨酯树脂
公开(公告)号：US4898803A
公开(公告)日：1990-02-06
申请号：US119578
申请日：1987-11-12
申请人： Toshiaki Aoai , Keitaro Aoshima , Akira Nagashima
发明人： Toshiaki Aoai , Keitaro Aoshima , Akira Nagashima
IPC分类号： G03C1/72 , C08G18/08 , C08G18/34 , G03F7/00 , G03F7/004 , G03F7/023 , G03F7/035
CPC分类号： C08G18/348 , C08G18/0823 , G03F7/0045 , G03F7/0233
摘要： A light-sensitive composition comprises at least one polyuretane resin having repeating unit represented by formula (I) and/or repeating unit represented by formula (II) and which is insoluble in water and soluble in aqueous alkaline solution; and at least one positive-working light-sensitive compound: ##STR1## wherein R.sub.1 represents a bivalent aliphatic or aromatic hydrocarbon which may have a substituent; R.sub.2 represents hydrogen atom or an alkyl, an aralkyl, an aryl, an alkoxy or an aryloxy group which may be substituted with a substituent; R.sub.3, R.sub.4 and R.sub.5 may be the same or different and independently represent a single bond or a bivalent aliphatic or aromatic hydrocarbon group which may have a substituent and Ar represents a trivalent aromatic hydrocarbon group which may have a substituent. The composition has good coating properties and makes it possible to impart excellent wear resistance and printing durability to the resultant light-sensitive products such as PS plates, print-circuit boards, photomasks and the like.
摘要翻译：光敏性组合物包含至少一种具有由式（I）表示的重复单元和/或由式（II）表示的重复单元的聚氧乙烯树脂，其不溶于水并可溶于碱性水溶液; 和至少一种正性光敏化合物：其中R 1表示可以具有取代基的二价脂族或芳族烃;（I） R2表示氢原子或可被取代基取代的烷基，芳烷基，芳基，烷氧基或芳氧基; R 3，R 4和R 5可以相同或不同，并且独立地表示可以具有取代基的单键或二价脂族或芳族烃基，Ar表示可以具有取代基的三价芳族烃基。该组合物具有良好的涂层性能，并且可以对所得的光敏性产品如PS板，印刷电路板，光掩模等赋予优异的耐磨性和印刷耐久性。

69. 发明授权

US4816375A Photosolubilizable composition with silyl ether or silyl ester compound 失效
标题翻译：具有甲硅烷基醚或甲硅烷基酯化合物的可溶胀组合物
公开(公告)号：US4816375A
公开(公告)日：1989-03-28
申请号：US44161
申请日：1987-04-30
申请人： Toshiaki Aoai
发明人： Toshiaki Aoai
IPC分类号： G03F7/075 , G03C1/495
CPC分类号： G03F7/0757 , G03F7/0755 , G03F7/0758 , Y10S430/115 , Y10S430/117 , Y10S430/12 , Y10S430/121 , Y10S430/126
摘要： A photosolubilizable composition contains both a compound capable of producing an acid by irradiation with actinic rays and a compound which has at least one silyl ether or silyl ester group capable of being decomposed by an acid; optionally, a compound having at least one silyl ether group has at least one hydrophilic group, providing for increased solubility in a developing solution under the action of an acid, thus enhancing the photosensitivity and the development latitude of the composition.

70. 发明授权

US07709550B2 Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate 有权
标题翻译：油墨组合物，喷墨记录方法，印刷材料，平版印刷版的制造方法和平版印刷版
公开(公告)号：US07709550B2
公开(公告)日：2010-05-04
申请号：US11516650
申请日：2006-09-07
申请人： Toshiaki Aoai
发明人： Toshiaki Aoai
IPC分类号： C08F2/50 , C08J3/28
CPC分类号： C09D11/101 , Y10T428/24802
摘要： An ink composition is provided that includes a cationically polymerizable compound (a), a compound (b) that generates an acid when exposed to radiation, a colorant (c), and a salt of a weak acid having a pKa of 4 to 8 (d). There is also provided an inkjet recording method that includes a step of discharging the ink composition onto a recording medium, and a step of irradiating the discharged ink composition with radiation so as to cure the ink composition.
摘要翻译：提供一种油墨组合物，其包含阳离子聚合性化合物（a），暴露于辐射时产生酸的化合物（b），着色剂（c）和pKa为4-8的弱酸盐（ d）。还提供了一种喷墨记录方法，其包括将油墨组合物排出到记录介质上的步骤，以及用放射线照射排出的油墨组合物以固化油墨组合物的步骤。

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