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1. 发明授权

US6013411A Positive working photosensitive composition 失效
标题翻译：正光敏组合物
公开(公告)号：US6013411A
公开(公告)日：2000-01-11
申请号：US794890
申请日：1997-02-05
申请人： Toshiaki Aoai , Toru Fujimori , Tsukasa Yamanaka , Kazuya Uenishi
发明人： Toshiaki Aoai , Toru Fujimori , Tsukasa Yamanaka , Kazuya Uenishi
IPC分类号： G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/121 , Y10S430/122
摘要： A positive working photosensitive composition comprising a resin having repeating units represented by the following formulae (I), (II) and (III), respectively and a compound which generates an acid with irradiation of an active ray or radiation: ##STR1## wherein R.sub.1 represents a hydrogen atom or a methyl group; R.sub.2 represents --C(.dbd.O)--O--C(R.sub.6) (R.sub.7) (R.sub.8) or --O--R.sub.5 --C(.dbd.O)--O--(R.sub.6) (R.sub.7) (R.sub.8); R.sub.3 represents --O--C(R.sub.6)(R.sub.7) (R.sub.8), --O--Si(R.sub.6)(R.sub.7)(Rs) or --O--C(R.sub.9)(R.sub.10)--OR.sub.11 ; R.sub.4 represents a hydrogen atom, a halogen atom, an alkyl group, an aryl group, an alkoxy group, an acyl group or an acyloxy group; R.sub.5 represents an alkylene group; R.sub.6, R.sub.7, R.sub.8, R.sub.9 and R.sub.10 each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group or an alkenyl group, provided that at least two among R.sub.6, R.sub.7 and R.sub.8 are groups other than a hydrogen atom; R.sub.11 represents an alkyl group or an aryl group; two groups selected from R.sub.6, R.sub.7 and R.sub.8 and two groups selected from R.sub.9, R.sub.10 and R.sub.11, each two groups may be combined to form a ring; and n is an integer from 1 to 3.
摘要翻译：一种正性感光性组合物，其特征在于，具有分别具有下述式（I），（II）和（III）所示的重复单元的树脂和通过活性射线或辐射照射产生酸的化合物，其中R1表示氢原子或甲基; R2表示-C（= O）-O-C（R6）（R7）（R8）或-O-R5-C（= O）-O-（R6）（R7）（R8） R3表示-O-C（R6）（R7）（R8），-O-Si（R6）（R7）（Rs）或-O-C（R9）（R10）-OR11; R4表示氢原子，卤素原子，烷基，芳基，烷氧基，酰基或酰氧基; R5表示亚烷基; R6，R7，R8，R9和R10各自独立地表示氢原子，烷基，环烷基或烯基，条件是R6，R7和R8中的至少两个是除氢原子以外的基团; R11表示烷基或芳基; 选自R6，R7和R8的两个基团和选自R9，R10和R11的两个基团，可以将两个基团组合形成环; n为1〜3的整数。

2. 发明授权

US5939234A Chemically amplified positive resist composition 失效
标题翻译：化学放大正光刻胶组合物
公开(公告)号：US5939234A
公开(公告)日：1999-08-17
申请号：US655233
申请日：1996-06-05
申请人： Tsukasa Yamanaka , Toshiaki Aoai , Toru Fujimori
发明人： Tsukasa Yamanaka , Toshiaki Aoai , Toru Fujimori
IPC分类号： G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0045 , Y10S430/106 , Y10S430/111 , Y10S430/121
摘要： Disclosed is a chemically amplified positive resist composition which comprises (A) a compound which contains at least one group selected among tert-alkyl ester groups and tert-alkyl carbonate groups and is capable of increasing solubility of the compound in an alkali aqueous solution by the action of an acid, (B) a compound which contains at least one group selected among acetal groups and silyl ether groups and is capable of increasing solubility of the compound in an alkali aqueous solution by the action of an acid, (C) a compound which is capable of generating an acid by irradiation with an active ray or radiation, and (D) an organic basic compound. The resist composition has high resolving power and forms a satisfactory pattern free from undergoing sensitivity decrease, T-top formation, and change in line width which are caused from exposure to post exposure bake.
摘要翻译：公开了一种化学放大型正性抗蚀剂组合物，其包含（A）含有至少一个选自叔烷基酯基和碳酸叔烷基酯基的基团的化合物，并且能够增加化合物在碱性水溶液中的溶解度酸的作用，（B）含有至少一个选自缩醛基团和甲硅烷基醚基团的基团并且能够通过酸的作用增加化合物在碱性水溶液中的溶解度的化合物，（C）化合物其能够通过用活性射线或辐射照射产生酸，和（D）有机碱性化合物。抗蚀剂组合物具有高分辨能力，并且形成了不受曝光曝光烘烤引起的敏感性降低，T顶形成和线宽变化的令人满意的图案。

3. 发明授权

US6136504A Positive-working photoresist composition 失效
标题翻译：正光刻胶组合物
公开(公告)号：US6136504A
公开(公告)日：2000-10-24
申请号：US280679
申请日：1999-03-29
申请人： Shiro Tan , Toru Fujimori , Toshiaki Aoai
发明人： Shiro Tan , Toru Fujimori , Toshiaki Aoai
IPC分类号： G03F7/004 , G03F7/039
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： The present invention provides an excellent chemically-sensitized positive-working photoresist composition which exhibits a high resolution and a good dimensional stability with time, generates no development residue (scum) and standing waves and is less liable to loss of lone pattern. A novel positive-working photoresist composition is provided comprising at least (a) a copolymer A having at least structural units representedby the following general formulae (I), (II) and (III), (b) a compound which generates an acid when irradiated with actinic rays or radiation and (c) a solvent: ##STR1## wherein R.sub.1 and R.sub.2 each independently represent a hydrogen atom or methyl group; R.sub.3 represents a tertiary alkyl or cycloalkyl group which may be substituted; and X represents a divalent organic residue.
摘要翻译：本发明提供了一种优异的化学敏化正性光致抗蚀剂组合物，其显示出高分辨率和随时间稳定的尺寸稳定性，不产生显影残渣（浮渣）和驻波，并且不易损失孤单图案。提供了一种新型的正性光致抗蚀剂组合物，其包含至少（a）至少具有由以下通式（I），（II）和（III）表示的结构单元的共聚物A，（b）用光化射线或辐射照射，和（c）溶剂：其中R1和R2各自独立地表示氢原子或甲基; R3表示可以被取代的叔烷基或环烷基; X表示二价有机残基。

4. 发明授权

US06638683B1 Positive photoresist composition 失效
标题翻译：正光致抗蚀剂组合物
公开(公告)号：US06638683B1
公开(公告)日：2003-10-28
申请号：US09103544
申请日：1998-06-24
申请人： Shiro Tan , Toshiaki Aoai , Toru Fujimori
发明人： Shiro Tan , Toshiaki Aoai , Toru Fujimori
IPC分类号： G03C173
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/115
摘要： A positive photoresist composition comprises the combination of (a) Resin A obtained from an alkali-soluble resin containing phenolic hydroxyl groups by replacing from 10 to 80% of the phenolic hydroxyl groups each with a group represented by formula (I) and (b) Resin B obtained from an alkali-soluble resin containing phenolic hydroxyl groups by replacing from 10 to 80% of the phenolic hydroxyl groups each with a group represented by formula (II) or (III) or a nonpolymeric dissolution inhibitive compound which has at least one kind of group selected from tertiary alkyl ester groups and tertiary alkyl carbonate groups; wherein R1, W, n, and R4 are as defined in the specification.
摘要翻译：正型光致抗蚀剂组合物包含（a）由含有酚羟基的碱溶性树脂得到的树脂A的组合，通过用式（I）和（b）表示的基团代替10至80％的酚羟基，通过用式（II）或（III）表示的基团代替10〜80％的酚羟基或由至少一种以上的非聚合物溶解抑制化合物代替的酚醛羟基的碱溶性树脂得到的树脂B 选自叔烷基酯基和叔烷基碳酸酯基的一类基团;其中R 1，W，n和R 4如说明书中所定义。

5. 发明授权

US06379860B1 Positive photosensitive composition 有权
标题翻译：正光敏组合物
公开(公告)号：US06379860B1
公开(公告)日：2002-04-30
申请号：US09220682
申请日：1998-12-23
申请人： Toru Fujimori , Yasunori Takata , Shiro Tan , Toshiaki Aoai
发明人： Toru Fujimori , Yasunori Takata , Shiro Tan , Toshiaki Aoai
IPC分类号： G03F7004
CPC分类号： G03F7/0392 , G03F7/0397 , Y10S430/115
摘要： A positive photosensitive composition is disclosed which comprises a compound generating an acid upon irradiation with actinic rays or a radiation and a resin having groups which decompose by the action of an acid to enhance solubility in an alkaline developing solution, said resin being obtained by reacting an alkali-soluble resin having phenolic hydroxyl groups with at least one specific enol ether compound under acid conditions in a specific organic solvent. The positive photosensitive composition shows improved discrimination between nonimage areas and image areas, has high sensitivity, high resolving power, and high heat resistance, suffers little change in performance with the lapse of time from exposure to light to heat treatment (PED), and is free from defects, e.g., development defects.
摘要翻译：公开了一种正型感光性组合物，其包含在用光化射线照射时产生酸的化合物或辐射，以及具有通过酸作用分解的基团的树脂，以增强在碱性显影液中的溶解度，所述树脂是通过使具有酚羟基的碱溶性树脂与至少一种特定的烯醇醚化合物在酸性条件下在特定的有机溶剂中。正型感光性组合物显示出非图像区域和图像区域之间的区分改善，具有高灵敏度，高分辨率和高耐热性，随着从曝光到热处理（PED）的时间的流逝，性能几乎没有变化，并且是没有缺陷，例如发展缺陷。

6. 发明授权

US6004721A Positive photoresist composition 失效
标题翻译：正光致抗蚀剂组合物
公开(公告)号：US6004721A
公开(公告)日：1999-12-21
申请号：US18883
申请日：1998-02-05
申请人： Shiro Tan , Toshiaki Aoai , Toru Fujimori
发明人： Shiro Tan , Toshiaki Aoai , Toru Fujimori
IPC分类号： G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106
摘要： A positive photoresist composition is disclosed which comprises (a) a resin obtained from an alkali-soluble resin containing phenolic hydroxyl groups by replacing from 10 to 80% of the phenolic hydroxyl groups each with a group having a specific structure, (b) a compound which generates an acid upon irradiation with actinic rays or a radiation, and (c) a solvent. This composition is an excellent, chemically amplified photoresist composition which has high resolution and gives a resist pattern having no depressions in an upper part thereof and having satisfactory adhesion to the substrate.
摘要翻译：公开了一种正性光致抗蚀剂组合物，其包含（a）通过用具有特定结构的基团代替10至80％的酚羟基，由（b）化合物其在用光化射线或辐射照射时产生酸，和（c）溶剂。该组合物是优异的化学放大型光致抗蚀剂组合物，其具有高分辨率并且在其上部具有不具有凹陷的抗蚀剂图案，并且对基材具有令人满意的粘合性。

7. 发明授权

US06692884B2 Positive photoresist composition 有权
标题翻译：正光致抗蚀剂组合物
公开(公告)号：US06692884B2
公开(公告)日：2004-02-17
申请号：US10116137
申请日：2002-04-05
申请人： Toru Fujimori , Kunihiko Kodama , Kenichiro Sato , Toshiaki Aoai
发明人： Toru Fujimori , Kunihiko Kodama , Kenichiro Sato , Toshiaki Aoai
IPC分类号： G03F7004
CPC分类号： G03F7/0397 , G03F7/0045 , Y10S430/106
摘要： A positive photoresist composition comprises: a compound capable of generating an acid upon irradiation with an actinic ray or a radiation, in which the compound contains (A1) a sulfonate compound of a sulfonium, and (A2) a sulfonate compound of an N-hydroxyimide or a disulfonyldiazomethane compound; and a resin capable of decomposing by the action of an acid to increase the solubility in an alkali developing solution, in which the resin contains a repeating unit having a specific lactone structure.
摘要翻译：正型光致抗蚀剂组合物包括：在光化学射线或辐射照射时能够产生酸的化合物，其中该化合物含有（A1）锍磺酸盐化合物，和（A2）N-羟基酰亚胺的磺酸盐化合物或二磺酰基重氮甲烷化合物; 以及能够通过酸的作用分解以增加在碱性显影液中的溶解度的树脂，其中树脂含有具有特定内酯结构的重复单元。

8. 发明授权

US5693452A Positive chemically amplified resist composition 失效
标题翻译：正化学放大抗蚀剂组合物
公开(公告)号：US5693452A
公开(公告)日：1997-12-02
申请号：US548721
申请日：1995-10-26
申请人： Toshiaki Aoai , Toru Fujimori
发明人： Toshiaki Aoai , Toru Fujimori
IPC分类号： G03F7/039 , C08F8/02 , C08L61/04 , C08L61/06 , G03F7/004 , H01L21/027
CPC分类号： C08F8/02 , G03F7/0045
摘要： A positive chemically amplified resist composition is disclosed, comprising (a) a compound which generates an acid upon irradiation with active light or radiant ray; (b) a resin insoluble in water but soluble in an aqueous alkali solution; and (c) a low molecular acid-decomposable dissolution inhibitor having a molecular weight of 3,000 or less and containing an acid-decomposable alkyl ester group represented by formula (I), and which increases its solubility in an alkali developer by the action of an acid, and having a sodium content and a potassium content each of 30 ppb or less. Also disclosed is a positive chemically amplified resist composition comprising the foregoing compound (a) and (d) a resin having an acid-decomposable alkyl ester group represented by formula (I), and which increases its solubility in an alkali developer by the action of an acid, and having a sodium content and a potassium content each of 30 ppb or less. Still further disclosed are methods for producing the compounds (c) and (d).
摘要翻译：公开了一种正性化学放大抗蚀剂组合物，其包含（a）在用活性光或辐射线照射时产生酸的化合物; （b）不溶于水但可溶于碱性水溶液的树脂; 和（c）分子量为3000以下且含有式（I）所示的酸分解性烷基酯基的低分子酸可分解溶解抑制剂，其通过作用于酸，并且具有30ppb以下的钠含量和钾含量。还公开了一种正化学放大抗蚀剂组合物，其包含上述化合物（a）和（d）具有由式（I）表示的可酸分解的烷基酯基的树脂，并且其通过作用使其在碱性显影剂中的溶解度增加酸，并且具有30ppb以下的钠含量和钾含量。还公开了制备化合物（c）和（d）的方法。

9. 发明授权

US07241551B2 Positive-working resist composition 有权
标题翻译：正面抗蚀剂组成
公开(公告)号：US07241551B2
公开(公告)日：2007-07-10
申请号：US10863347
申请日：2004-06-09
申请人： Hyou Takahashi , Tsukasa Yamanaka , Toru Fujimori
发明人： Hyou Takahashi , Tsukasa Yamanaka , Toru Fujimori
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , G03F7/0045
摘要： A positive-working resist composition comprising (A) a resin that increases solubility in an alkali developing solution by the action of an acid, (B) a compound which generates an acid upon irradiation of an actinic ray or radiation, (C) a nonionic cyclic compound having at least one partial structure represented by the following formula (I) or (II) and at least having either a melting point of 35° C. or more or a boiling point of 100° C./10 mmHg or more: and (D) a solvent.
摘要翻译：一种正性抗蚀剂组合物，其包含（A）通过酸的作用增加在碱性显影液中的溶解性的树脂，（B）在光化射线或辐射照射时产生酸的化合物，（C）非离子表面活性剂具有至少一种由下式（I）或（II）表示的部分结构并且至少具有35℃或更高的熔点或沸点为100℃/ 10mmHg或更高的部分结构的环状化合物：和（D）溶剂。

10. 发明授权

US08877423B2 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same 有权
标题翻译：光化射线敏感性或辐射敏感性树脂组合物和使用其的图案形成方法
公开(公告)号：US08877423B2
公开(公告)日：2014-11-04
申请号：US13378387
申请日：2010-06-30
申请人： Kana Fujii , Toru Fujimori
发明人： Kana Fujii , Toru Fujimori
IPC分类号： G03F7/004 , G03F7/028
CPC分类号： G03F7/0048 , C08F8/02 , C08F12/22 , C08F12/24 , C08F12/32 , C08F212/14 , C09D125/14 , C09D125/18 , G03F7/0397 , C08F220/10 , C08F2220/1841
摘要： An actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin that contains a repeating unit represented by formula (I) as defined in the specification, a repeating unit represented by formula (II) as defined in the specification and a repeating unit represented by formula (III-a) or (III-b) as defined in the specification; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (C) a solvent, wherein the solvent (C) contains ethyl lactate, and a film and a pattern forming method using the composition are provided.
摘要翻译：一种光化射线敏感性或辐射敏感性树脂组合物，其包含：（A）含有本说明书中定义的式（I）表示的重复单元的树脂，由说明书中定义的式（II）表示的重复单元和由本说明书中定义的式（III-a）或（III-b）表示的重复单元; （B）能够在用光化射线或辐射照射时能产生酸的化合物; 和（C）溶剂，其中溶剂（C）含有乳酸乙酯，并且提供使用该组合物的膜和图案形成方法。

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