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1. 发明授权

US5340688A Positive type photoresist composition 失效
标题翻译：正型光致抗蚀剂组合物
公开(公告)号：US5340688A
公开(公告)日：1994-08-23
申请号：US15578
申请日：1993-02-10
申请人： Yasumasa Kawabe , Toshiaki Aoai , Tadayoshi Kokubo
发明人： Yasumasa Kawabe , Toshiaki Aoai , Tadayoshi Kokubo
IPC分类号： G03F7/022 , H01L21/027 , G03F7/021 , G03F7/30
CPC分类号： G03F7/022
摘要： Disclosed is a novel positive type photoresist composition comprising a 1,2-naphthoquinonediazido-5-(and/or -4-)sulfonic ester of a member selected from the group consisting of the polyhydroxy compounds represented by the following formula (I), (II) or (III) and an alkali-soluble resin: ##STR1## wherein the variables of Formula I are defined in the specification; ##STR2## wherein the variables of Formula II are defined in the specification; ##STR3## wherein the variables of Formula III are defined in the specification.
摘要翻译：公开了一种新型的正型光致抗蚀剂组合物，其包含选自由下式（I）表示的多羟基化合物，（I），（I）表示的多羟基化合物的组分的1,2-萘醌二叠氮基-5-（和/或-4-）磺酸酯， II）或（III）和碱溶性树脂：其中式I的变量在说明书中定义; （II）其中式II的变量在说明书中定义; （III）其中式III的变量在本说明书中定义。

2. 发明授权

US5318875A Positive quinonediazide photoresist composition containing select hydroxyphenol additive 失效
标题翻译：含有选择性羟基苯酚添加剂的正醌二叠氮化物光致抗蚀剂组合物
公开(公告)号：US5318875A
公开(公告)日：1994-06-07
申请号：US15921
申请日：1993-02-10
申请人： Yasumasa Kawabe , Toshiaki Aoai , Tadayoshi Kokubo , Shiro Tan
发明人： Yasumasa Kawabe , Toshiaki Aoai , Tadayoshi Kokubo , Shiro Tan
IPC分类号： C07C45/46 , G03F7/022 , G03F7/023 , G03C1/61
CPC分类号： G03F7/0226 , C07C45/46 , G03F7/022
摘要： A positive photoresist composition includes an alkali-soluble resin, a quinonediazide compound and a compound selected from the group consisting of compounds represented by formulae (I), (II) and (III): ##STR1## wherein R.sub.1 to R.sub.27, which may be the same or different, each represents a hydrogen atom, hydroxyl group, halogen atom, alkyl group, alkoxy group, nitro group, alkenyl group, aryl group, aralkyl group, alkoxycarbonyl group, arylcarbonyl group, acyloxy group, acyl group, aryloxy group or aralkoxy group; ##STR2## wherein R.sub.31 represents an organic group, single bond, ##STR3## R.sub.32 represents a hydrogen atom, monovalent organic group or ##STR4## R.sub.33 to R.sub.37, which may be the same or different, and in which not all four groups for each of R.sub.33 to R.sub.37 may be the same at the same time, each represents a hydrogen atom, hydroxyl group, halogen atom, alkyl group, alkoxy group or alkenyl group, with the proviso that at least one of R.sub.33 to R.sub.35 is a hydroxyl group; X represents a divalent organic group; and m represents an integer 0 or 1; ##STR5## wherein R.sub.41 to R.sub.44, which may be the same or different and in which not all four groups for each of R.sub.41 to R.sub.44 may be the same at the same time, each represents a hydrogen atom, hydroxyl group, halogen atom, alkyl group, alkoxy group or alkenyl group; R.sub.45 and R.sub.46 each represents a hydrogen atom, alkyl group or ##STR6## a and c each represents an integer 0 or 1; and b represents an integer from 1 to 4.
摘要翻译：正型光致抗蚀剂组合物包括碱溶性树脂，醌二叠氮化合物和选自由式（I），（II）和（III）表示的化合物的化合物：其中R 1至R 27，可以相同或不同，分别表示氢原子，羟基，卤素原子，烷基，烷氧基，硝基，烯基，芳基，芳烷基，烷氧基羰基，芳基羰基，酰氧基，酰基，芳氧基或芳烷氧基; （II）其中R31表示有机基团，单键，R32表示氢原子，一价有机基团或R33至R37，其可以相同或不同，并且其中并不全部为四 R 33〜R 37各自可以相同，各自表示氢原子，羟基，卤素原子，烷基，烷氧基或烯基，条件是R 33〜R 35中的至少一个为羟基; X表示二价有机基团; m表示0或1的整数; （III）其中R41〜R44可以相同或不同，并且其中R41至R44中的每一个不是全部四个基团可以同时相同，各自表示氢原子，羟基，卤素原子，烷基，烷氧基或烯基; R 45和R 46各自表示氢原子，烷基或者a和c各自表示0或1的整数; b表示1〜4的整数。

3. 发明授权

US5707777A Light-sensitive composition 失效
标题翻译：感光组合物
公开(公告)号：US5707777A
公开(公告)日：1998-01-13
申请号：US466136
申请日：1995-06-06
申请人： Toshiaki Aoai , Tadayoshi Kokubo
发明人： Toshiaki Aoai , Tadayoshi Kokubo
IPC分类号： G03F7/004 , G03F7/039 , G03F7/075 , H01L21/027 , G03F7/038
CPC分类号： G03F7/0755 , G03F7/0045 , Y10S430/11 , Y10S430/111 , Y10S430/122
摘要： A positive-working light-sensitive composition which comprises: (a) 0.5 to 80% by weight of a compound which has at least one group capable of being decomposed by an acid and whose solubility in an alkaline developer is increased by an acid; (b) 0.01 to 20% by weight of a disulfone compound represented by the following formula (I); R.sup.1 --SO.sub.2 --SO.sub.2 --R.sup.2 (I) wherein R.sup.1 and R.sup.2 may be the same or different and represent a substituted or unsubstituted alkyl, alkenyl or aryl group; and (c) 5 to 99.49% by weight of a resin insoluble in water and soluble in an alkaline water, wherein the compound of the component (a) has a molecular weight of not more than 2,000 and a boiling point of not less than 150.degree. C. and wherein a film of the composition having a thickness of 1 .mu.m has an optical density determined at 248 nm of not more than 1.4 before exposure to light and the optical density of the composition determined at 248 nm is reduced by exposure to light of 248 nm.
摘要翻译：一种正性感光性组合物，其包含：（a）0.5〜80重量％的具有至少一个能够被酸分解并且在碱性显影剂中的溶解度由酸增加的化合物; （b）0.01〜20重量％的由下式（I）表示的二砜化合物; R1-SO2-SO2-R2（Ⅰ）其中R1和R2可以相同或不同，表示取代或未取代的烷基，烯基或芳基; 和（c）5〜99.49重量％的不溶于水且可溶于碱性水的树脂，其中组分（a）的化合物的分子量不大于2,000，沸点不小于150 并且其中具有1μm厚度的组合物的膜在暴露于光之前在248nm处确定为不大于1.4的光密度，并且通过暴露于248nm下测定的组合物的光密度降低 248nm的光。

4. 发明授权

US5110709A Light-sensitive positive working composition containing a pisolfone compound 失效
标题翻译：含有酚醛化合物的敏感正性工作组合物
公开(公告)号：US5110709A
公开(公告)日：1992-05-05
申请号：US680733
申请日：1991-04-05
申请人： Toshiaki Aoai , Tadayoshi Kokubo
发明人： Toshiaki Aoai , Tadayoshi Kokubo
IPC分类号： G03F7/039 , H01L21/027
CPC分类号： G03F7/039
摘要： A positive working light-sensitive composition which comprises:(a) 10 to 95% by weight of a compound which has at least one acid-decomposable group and whose solubility in an alkaline developer increases by the action of an acid,(b) 0.01 to 20% by weight of a disulfone compound represented by the formula (I):R.sup.1 --SO.sub.2 --SO.sub.2 --R.sup.2 (I) wherein R.sup.1 and R.sup.2 may be same or different and represent substituted or unsubstituted alkyl groups, substituted or unsubstituted alkenyl groups or substituted or unsubstituted aryl groups, and(c) 3 to 85% by weight of a water-insoluble but alkaline water-soluble resin, wherein the optical density at 248 nm of 1 .mu.m thick coating of the composition is not more than 1.4 and the optical density at 248 nm of the coating exposed to light of 248 nm is less than the optical density of the coating before exposed to light.The light-sensitive composition is highly responsive to light of Deep-UV regions and excellent in image resolution.
摘要翻译：一种正性工作感光性组合物，其包含：（a）10至95重量％的具有至少一个酸可分解基团并且其在碱性显影剂中的溶解度随着酸的作用而增加的化合物，（b）0.01 至20重量％的由式（I）表示的二砜化合物：R 1 -SO 2 -SO 2 -R 2（I）其中R 1和R 2可以相同或不同，表示取代或未取代的烷基，取代或未取代的烯基或取代或未取代的芳基，和（c）3-85重量％的不溶于水的碱性水溶性树脂，其中组合物的1μm厚涂层的248nm处的光密度不大于1.4，曝光于248nm的涂层的248nm处的光密度小于曝光前的涂层的光密度。感光组合物对深UV区域的光敏感性高，图像分辨率优异。

5. 发明授权

US5576143A Light-sensitive composition 失效
标题翻译：感光组合物
公开(公告)号：US5576143A
公开(公告)日：1996-11-19
申请号：US985262
申请日：1992-12-03
申请人： Toshiaki Aoai , Tadayoshi Kokubo
发明人： Toshiaki Aoai , Tadayoshi Kokubo
IPC分类号： G03F7/004 , G03C1/492
CPC分类号： G03F7/0045 , Y10S430/156
摘要： A positive type or negative type light-sensitive composition providing high sensitivity and high resolution in the manufacture of a semiconductor device, and contains:(a) a compound which has at least one group capable of decomposing by acid and a solubility that is increased in an alkaline developing solution,(b) a compound which generates acid by an irradiation with actinic rays or radiation,(c) a compound which generates a base at 50.degree. C. or higher, and(d) a resin which is insoluble in water and soluble in an alkaline aqueous solution.
摘要翻译：在半导体器件的制造中提供高灵敏度和高分辨率的正型或负型光敏组合物，其包含：（a）具有至少一个能够被酸分解的基团和溶解度增加的化合物碱性显影液，（b）通过光化射线或辐射照射产生酸的化合物，（c）在50℃以上产生碱的化合物，和（d）不溶于水的树脂并溶于碱性水溶液。

6. 发明授权

US4842986A Positively working resist material 失效
标题翻译：积极的抗拒材料
公开(公告)号：US4842986A
公开(公告)日：1989-06-27
申请号：US889707
申请日：1986-07-28
申请人： Nobuaki Matsuda , Tadayoshi Kokubo , Toshiaki Aoai , Akira Umehara , Yoshimasa Aotani
发明人： Nobuaki Matsuda , Tadayoshi Kokubo , Toshiaki Aoai , Akira Umehara , Yoshimasa Aotani
IPC分类号： G03C7/10 , C08G77/46 , G03C1/72 , G03F7/039 , G03F7/075 , H01L21/027
CPC分类号： G03C1/72 , G03F7/0758 , Y10T403/3926 , Y10T403/3933 , Y10T403/556 , Y10T403/60
摘要： A positively working resist material is disclosed, comprising a compound having at least one silyl ether group and capable of directly dissociating an Si-O-C bond upon irradiation with far ultraviolet rays, X-rays, an electron beam, or an ion beam. The resist material has high sensitivity to high energy radiation, excellent resistance to dry etching, and can be developed with an alkaline aqueous solution.
摘要翻译：公开了一种正性抗蚀剂材料，其包含具有至少一个甲硅烷基醚基团且能够在远紫外线，X射线，电子束或离子束照射时直接解离Si-O-C键的化合物。抗蚀剂材料对高能量辐射具有高灵敏度，优异的抗干蚀刻性，并且可以用碱性水溶液显影。

7. 发明授权

US5153096A Positive type photoresist composition comprising as a photosensitive ingredient a derivative of a triphenylmethane condensed with an o-quinone diazide 失效
标题翻译：正型光致抗蚀剂组合物，其包含与邻醌重氮化物缩合的三苯甲烷的衍生物作为感光成分
公开(公告)号：US5153096A
公开(公告)日：1992-10-06
申请号：US670513
申请日：1991-03-18
申请人： Kazuya Uenishi , Yasumasa Kawabe , Tadayoshi Kokubo
发明人： Kazuya Uenishi , Yasumasa Kawabe , Tadayoshi Kokubo
IPC分类号： G03C1/72 , G03F7/022 , H01L21/027
CPC分类号： G03F7/022
摘要： A positive type photoresist composition comprising at least one light-sensitive material, as defined herein, and an alkali-soluble novolak resin, has a high resolving power, particularly when used in semiconductor devices, accurately reproduces mask dimensions over a wide photomask line width range, from a resist pattern in a cross-sectional form having a high aspect ratio in a pattern having a line width of no greater than 1 .mu.m, has a wide developing latitude and excellent heat resistance.
摘要翻译：包含如本文所定义的至少一种感光材料和碱溶性酚醛清漆树脂的正型光致抗蚀剂组合物具有高分辨能力，特别是当用于半导体器件时，在宽的光掩模线宽度范围内精确地再现掩模尺寸从具有不大于1μm的线宽的图案的具有高纵横比的横截面形式的抗蚀剂图案具有宽的显影宽度和优异的耐热性。

8. 发明授权

US5576139A Positive type photoresist composition comprising a novolak resin made with a silica-magnesia solid catalyst 失效
标题翻译：正型光致抗蚀剂组合物，其包含用二氧化硅 - 氧化镁固体催化剂制备的酚醛清漆树脂
公开(公告)号：US5576139A
公开(公告)日：1996-11-19
申请号：US783346
申请日：1991-10-28
申请人： Kazuya Uenishi , Shiro Tan , Yasumasa Kawabe , Tadayoshi Kokubo
发明人： Kazuya Uenishi , Shiro Tan , Yasumasa Kawabe , Tadayoshi Kokubo
IPC分类号： C08G8/08 , C08L61/04 , C08L61/06 , G03F7/022 , G03F7/023 , H01L21/027
CPC分类号： C08G8/08 , G03F7/022 , G03F7/0236
摘要： A novel positive type photoresist composition is provided, comprising an alkali-soluble novolak resin obtained by the condensation of substituted or unsubstituted phenols and aldehydes in the presence of a silica-magnesia solid catalyst and a light-sensitive material containing 1,2-naphthoquinone-diazido-5-(and/or -4-) sulfonate as main component.
摘要翻译：提供了一种新型的正型光致抗蚀剂组合物，其包含通过在二氧化硅 - 氧化镁固体催化剂和含有1,2-萘醌的固体催化剂存在下缩合取代或未取代的酚和醛而获得的碱溶性酚醛清漆树脂，重氮基-5-（和/或-4-）磺酸盐为主要成分。

9. 发明授权

US5429905A Positive working photoresist composition containing naphthoquinone diazide sulfonic acid ester of polyhydroxy compound 失效
标题翻译：含有多羟基化合物的萘醌二叠氮磺酸酯的正性光刻胶组合物
公开(公告)号：US5429905A
公开(公告)日：1995-07-04
申请号：US227011
申请日：1994-04-13
申请人： Shiro Tan , Yasumasa Kawabe , Tadayoshi Kokubo
发明人： Shiro Tan , Yasumasa Kawabe , Tadayoshi Kokubo
IPC分类号： G03F7/022 , H01L21/027 , G03F7/023
CPC分类号： G03F7/022
摘要： The present invention relates to a positive-working photoresist composition comprising at least one of the 1,2-naphthoquinonediazido-5- sulfonic acid ester of a polyhydroxy compound represented by formula (1) and the 1,2-naphthoquinonediazido-4-sulfonic acid ester of a polyhydroxy compound represented by formula (1): ##STR1## wherein R represents a hydrogen atom, a hydroxy group, a halogen atom, a nitro group, an alkyl group having from 1 to 6 carbon atoms, an aryl group, or an alkenyl group; and R.sub.1 to R.sub.15, which may be the same or different, each represents a hydrogen atom, a hydroxy group, a halogen atom, an alkyl group having from 1 to 6 carbon atoms, an alkoxy group, or a substituted or unsubstituted cycloalkyl group, with the proviso that at least one of R.sub.1 to R.sub.15 is a substituted or unsubstituted cycloalkyl group.
摘要翻译：本发明涉及一种正性光致抗蚀剂组合物，其包含由式（1）表示的多羟基化合物的1,2-萘醌二叠氮基-5-磺酸酯和1,2-萘醌二叠氮基-4-磺酸中的至少一种由式（1）表示的多羟基化合物的酯：其中R表示氢原子，羟基，卤素原子，硝基，具有1至6个碳原子的烷基，芳基基团或烯基; R 1〜R 15可以相同或不同，表示氢原子，羟基，卤素原子，碳原子数1〜6的烷基，烷氧基或取代或未取代的环烷基，条件是R 1至R 15中的至少一个是取代或未取代的环烷基。

10. 发明授权

US5030550A Developer for positive type photoresists 失效
标题翻译：正型光刻胶的开发商
公开(公告)号：US5030550A
公开(公告)日：1991-07-09
申请号：US333928
申请日：1989-04-06
申请人： Yasumasa Kawabe , Hiroshi Matsumoto , Tadayoshi Kokubo
发明人： Yasumasa Kawabe , Hiroshi Matsumoto , Tadayoshi Kokubo
IPC分类号： G03C1/72 , G03F7/32 , H01L21/027
CPC分类号： G03F7/322
摘要： A positive photoresist developer containing a basic compound and from 10 to 10,000 ppm of a non-ionic surfactant represented by formula (I): ##STR1## wherein X represents an oxyethylene group; Y represents an oxypropylene group; R represents hydrogen, an alkyl group containing from 1 to 8 carbon atoms, R', or ##STR2## R' represents --O--(X).sub.m (Y).sub.n --H; R" represents R' of an alkyl group containing l carbon atoms; m and n each is an integer from 1 to 50, provided that m:n is from 20:80 to 80:20; p is 0 or 1, and q and s each is o or an integer from 1 to 4, provided that p+q+s=4; and l is an integer from 1 to 4; and r is an integer from 1 to 8, provided that l+r is an integer of 9 or more. The developer has superior art in forming properties, and prevents film residues, surface layer peeling, and film reduction.
摘要翻译：含有碱性化合物的正性光致抗蚀剂显影剂和10〜10,000ppm由式（I）表示的非离子型表面活性剂：其中X表示氧化乙烯基; Y表示氧丙烯基; R表示氢，含有1至8个碳原子的烷基，R'或R'表示-O-（X）m（Y）n -H; R“表示含有1个碳原子的烷基的R'; m和n各自为1至50的整数，条件是m：n为20:80至80:20; p为0或1，q和s各自为o或1至4的整数，条件是p + q + s = 4; l为1〜4的整数，并且r为1〜8的整数，条件是l + r为9以上的整数。显影剂具有优异的成型性能，并且防止膜残留，表面层剥离和膜还原。

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