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61. 发明申请

US20070287081A1 METHOD FOR OBTAINING FORCE COMBINATIONS FOR TEMPLATE DEFORMATION USING NULLSPACE AND METHODS OPTIMIZATION TECHNIQUES 有权
标题翻译：使用空位获取模板变形的力组合的方法和方法优化技术
公开(公告)号：US20070287081A1
公开(公告)日：2007-12-13
申请号：US11695469
申请日：2007-04-02
申请人： Anshuman Cherala , Sidlgata Sreenivasan , Byung-Jin Choi , Ecron Thompson
发明人： Anshuman Cherala , Sidlgata Sreenivasan , Byung-Jin Choi , Ecron Thompson
IPC分类号： G03F9/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/703 , G03F7/70633 , G03F7/70783 , G03F9/7003 , G03F9/7092
摘要： The present invention is directed towards a method for determining deformation parameters that a patterned device would undergo to minimize dimensional variations between a recorded pattern thereon and a reference pattern, the method including, inter alia, comparing spatial variation between features of the recorded pattern with respect to corresponding features of the reference pattern; and determining deformation forces to apply to the patterned device to attenuate the dimensional variations, with the forces having predetermined constraints, wherein a summation of a magnitude of the forces is substantially zero and a summation of moment of the forces is substantially zero.
摘要翻译：本发明涉及一种用于确定图案化装置将经历以使其上的记录图案与参考图案之间的尺寸变化最小化的变形参数的方法，该方法尤其包括将记录图案的特征与相对于参考图案的相应特征; 以及确定施加到所述图案化装置上的变形力以衰减所述尺寸变化，其中所述力具有预定的约束，其中所述力的大小的总和基本上为零，并且所述力的力矩的总和基本上为零。

62. 发明授权

US07303383B1 Imprint lithography system to produce light to impinge upon and polymerize a liquid in superimposition with template overlay marks 有权
标题翻译：压印光刻系统产生光以与模板覆盖标记叠加并聚合液体
公开(公告)号：US07303383B1
公开(公告)日：2007-12-04
申请号：US10864214
申请日：2004-06-09
申请人： Sidlgata V. Sreenivasan , Byung-Jin Choi , Matthew E. Colburn , Todd C. Bailey
发明人： Sidlgata V. Sreenivasan , Byung-Jin Choi , Matthew E. Colburn , Todd C. Bailey
IPC分类号： B29C35/08 , G03C5/00
CPC分类号： B29C35/0888 , B29C37/0053 , B29C43/003 , B29C43/021 , B29C2035/0827 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/00 , Y10S101/36 , Y10T428/24802
摘要： The present invention includes an imprint lithography system for impinging a flux of light upon a liquid to polymerize the liquid, the system including, a source of light producing the flux of light; and a template having overlay marks being disposed between the liquid and the source of light and being opaque to the flux of light, with a pitch of the overlay marks establishing a polarization of the flux of light such that the flux of light impinges upon and polymerizes the liquid in superimposition with the overlay marks.
摘要翻译：本发明包括一种用于将光束照射在液体上以使液体聚合的压印光刻系统，该系统包括产生光通量的光源; 并且具有覆盖标记的模板设置在液体和光源之间，并且对于光通量不透明，叠加标记的间距建立光通量的偏振，使得光束流入并聚合液体与叠加标记叠加。

63. 发明申请

US20070275114A1 Partial Vacuum Environment Imprinting 有权
标题翻译：部分真空环境印刷
公开(公告)号：US20070275114A1
公开(公告)日：2007-11-29
申请号：US11695263
申请日：2007-04-02
申请人： Anshuman Cherala , Pankaj Lad , Ian McMackin , Byung-Jin Choi
发明人： Anshuman Cherala , Pankaj Lad , Ian McMackin , Byung-Jin Choi
IPC分类号： B29C47/76
CPC分类号： G03F7/0002 , B29C43/003 , B29C43/021 , B29C2043/025 , B29C2043/5833 , B82Y10/00 , B82Y40/00
摘要： The present invention is directed towards a method and a system to create and maintain a desired environment in the vicinity of a nano-imprint lithography template by creation of a partial vacuum using channels or holes in the template holding the nano-imprint mold.
摘要翻译：本发明涉及通过使用保持纳米压印模具的模板中的通道或孔产生部分真空来在纳米压印光刻模板附近创建和维持所需环境的方法和系统。

64. 发明申请

US20070228609A1 Imprinting of Partial Fields at the Edge of the Wafer 有权
标题翻译：在晶片边缘打印局部场
公开(公告)号：US20070228609A1
公开(公告)日：2007-10-04
申请号：US11694500
申请日：2007-03-30
申请人： Sidlgata V. Sreenivasan , Byung-Jin Choi
发明人： Sidlgata V. Sreenivasan , Byung-Jin Choi
IPC分类号： B29C43/02
CPC分类号： B29C43/58 , B29C43/003 , B29C43/021 , B29C2043/025 , B29C2043/5808 , B29C2043/5825 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： The present invention is directed towards several aspects of imprint lithography that have to be improved to address imprinting of partial fields and dies at the edge of the wafer.
摘要翻译：本发明涉及压印光刻的几个方面，这些方面必须被改进以解决在晶片边缘处局部场和模具的压印。

65. 发明申请

US20070170617A1 Patterning Substrates Employing Multiple Chucks 有权
标题翻译：使用多个卡盘的图案化基板
公开(公告)号：US20070170617A1
公开(公告)日：2007-07-26
申请号：US11625082
申请日：2007-01-19
申请人： Byung-Jin Choi , Sidlgata V. Sreenivasan
发明人： Byung-Jin Choi , Sidlgata V. Sreenivasan
IPC分类号： B28B11/08
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10S977/887
摘要： The present invention is directed towards a method for patterning first and second substrates in a nanoimprint lithography system, the method including, inter alia, positioning the first substrate on a first substrate chuck; positioning a nanoimprint material on the first substrate; obtaining a spatial relationship between the first substrate and a nanoimprint mold assembly and imprinting a pattern in the nanoimprint material on the first substrate with the nanoimprint mold assembly while concurrently positioning the second substrate on a second substrate chuck; separating the nanoimprint mold assembly from the nanoimprint material on the first substrate; positioning a nanoimprint material on the second substrate; removing the first substrate from the first substrate chuck while concurrently obtaining a spatial relationship between the second substrate and the nanoimprint mold assembly and imprinting a pattern in the nanoimprint material on the second substrate with the nanoimprint mold assembly; and separating the nanoimprint mold assembly from the nanoimprint material on the second substrate, with the first and second substrates being subjected to substantially the same process conditions.
摘要翻译：本发明涉及一种用于在纳米压印光刻系统中图案化第一和第二衬底的方法，该方法尤其包括将第一衬底定位在第一衬底卡盘上; 将纳米压印材料定位在所述第一基板上; 获得所述第一基板和纳米压印模具组件之间的空间关系，并用所述纳米压印模具组件在所述第一基板上的所述纳米压印材料中印刷图案，同时将所述第二基板定位在第二基板卡盘上; 将所述纳米压印模具组件与所述纳米压印材料分离在所述第一基板上; 将纳米压印材料定位在所述第二基板上; 从所述第一基板卡盘移除所述第一基板，同时获得所述第二基板和所述纳米压印模具组件之间的空间关系，并用所述纳米压印模具组件在所述第二基板上的所述纳米压印材料中印刷图案; 以及将所述纳米压印模具组件与所述第二基板上的纳米压印材料分离，其中所述第一和第二基板经受基本上相同的工艺条件。

66. 发明申请

US20060172553A1 Method of retaining a substrate to a wafer chuck 有权
标题翻译：将基板保持在晶片卡盘上的方法
公开(公告)号：US20060172553A1
公开(公告)日：2006-08-03
申请号：US11047499
申请日：2005-01-31
申请人： Byung-Jin Choi , Anshuman Cherala , Daniel Babbs
发明人： Byung-Jin Choi , Anshuman Cherala , Daniel Babbs
IPC分类号： H01L21/31 , H01L21/469
CPC分类号： H01L21/6831 , H01L21/6838 , Y10T29/4978 , Y10T29/49998
摘要： The present invention is directed towards a method of retaining a substrate to a wafer chuck. The method features accelerating a portion of the substrate toward the wafer chuck, generating a velocity of travel of the substrate toward the wafer chuck, and reducing the velocity before the substrate reaches the wafer chuck. In this manner, the force of impact of the portion with the wafer chuck is greatly reduced, which is believed to reduce the probability that the structural integrity of the substrate, and layers on the substrate and/or the wafer chuck, are damaged.
摘要翻译：本发明涉及将基板保持在晶片卡盘上的方法。该方法特征在于，将基板的一部分朝向晶片卡盘加速，产生基板朝向晶片卡盘的移动速度，并降低基板到达晶片卡盘之前的速度。以这种方式，晶片卡盘的部分的冲击力大大降低，这被认为降低了基板的结构完整性和基板和/或晶片卡盘上的层被损坏的可能性。

67. 发明申请

US20060005657A1 Method and system to control movement of a body for nano-scale manufacturing 审中-公开
标题翻译：用于控制身体运动的方法和系统用于纳米级制造
公开(公告)号：US20060005657A1
公开(公告)日：2006-01-12
申请号：US11142825
申请日：2005-06-01
申请人： Byung-Jin Choi , Sidlgata Sreenivasan
发明人： Byung-Jin Choi , Sidlgata Sreenivasan
IPC分类号： G05G11/00
CPC分类号： G03F7/0002 , B29C43/021 , B29C59/022 , B29C2043/025 , B29C2043/5858 , B29C2059/023 , B82Y10/00 , B82Y40/00 , Y10T74/20341
摘要： The present invention is directed towards a method and system of controlling movement of a body coupled to an actuation system that features translating movement of the body in a plane extending by imparting angular motion in the actuation system with respect to two spaced-apart axes. Specifically, rotational motion is generated in two spaced-apart planes, one of which extends parallel to the plane in which the body translates. This facilitates proper orientation of the body with respect to a surface spaced-apart therefrom.
摘要翻译：本发明涉及一种控制耦合到致动系统的主体的运动的方法和系统，其特征在于，通过相对于两个间隔开的轴线在致动系统中施加角运动而延伸的平面中的本体运动。具体地说，在两个间隔开的平面中产生旋转运动，其中一个平行于主体平移的平面。这有助于身体相对于与其间隔开的表面的适当取向。

68. 发明申请

US20050185169A1 Method and system to measure characteristics of a film disposed on a substrate 有权
标题翻译：测量设置在基板上的膜的特性的方法和系统
公开(公告)号：US20050185169A1
公开(公告)日：2005-08-25
申请号：US10782187
申请日：2004-02-19
申请人： Ian McMackin , Philip Schumaker , Byung-Jin Choi , Sidlgata Sreenivasan , Michael Watts
发明人： Ian McMackin , Philip Schumaker , Byung-Jin Choi , Sidlgata Sreenivasan , Michael Watts
IPC分类号： B81C1/00 , B81C99/00 , G01N21/84 , G03F7/00 , G03F7/20 , G01N21/88
CPC分类号： G03F7/0002 , B29C43/003 , B29C2043/025 , B81C1/0046 , B81C99/004 , B82Y10/00 , B82Y40/00 , G01N21/8422 , G03F7/70625 , G03F7/7065
摘要： The present invention is directed to providing a method and system to measure characteristics of a film disposed on a substrate. The method includes identifying a plurality of processing regions on the film; measuring characteristics of a subset of the plurality of processing regions, defining measured characteristics; determining a variation of one of the measured characteristics; and associating a cause of the variations based upon a comparison of the one of the measured characteristics to measured characteristics associated with the remaining processing regions of the subset. The system carries out the aforementioned method.
摘要翻译：本发明旨在提供一种测量设置在基底上的膜的特性的方法和系统。该方法包括识别胶片上的多个处理区域; 测量所述多个处理区域的子集的特征，定义测量的特征; 确定测量特征之一的变化; 并且基于所测量的特征之一与与所述子集的剩余处理区域相关联的测量特征的比较来将所述变化的原因相关联。系统执行上述方法。

69. 发明授权

US08678633B2 Lamp electrode printed circuit board and backlight unit including the same 有权
标题翻译：灯电极印刷电路板和背光单元包括它们
公开(公告)号：US08678633B2
公开(公告)日：2014-03-25
申请号：US12153267
申请日：2008-05-15
申请人： Byung-Jin Choi , Hong-Sung Song , Woong-Ki Min
发明人： Byung-Jin Choi , Hong-Sung Song , Woong-Ki Min
IPC分类号： F21V7/04
CPC分类号： H05K1/111 , G02F1/133604 , G02F1/133608 , G02F2001/133612 , H05K1/118 , H05K1/148 , H05K3/301 , H05K3/3405 , H05K3/361 , H05K2201/09036 , H05K2201/09381 , H05K2201/0969 , H05K2201/10113 , H05K2201/10136 , H05K2201/10287 , H05K2201/1031 , Y02P70/611
摘要： A lamp electrode printed circuit board of a backlight unit includes an insulating substrate, first and second conductive patterns on the insulating substrates along a first direction and in parallel, a connecting pattern extending from one of the first and second conductive patterns, a connecting pad at one end of the connecting pattern, auxiliary patterns extending from an edge of the connecting pad, and lamp holders electrically connected to the first and second conductive patterns and spaced apart from each other along the first direction.
摘要翻译：背光单元的灯电极印刷电路板包括绝缘基板，绝缘基板上的沿着第一方向并且平行的第一和第二导电图案，从第一和第二导电图案之一延伸的连接图案，连接图案的一端，从连接焊盘的边缘延伸的辅助图案和电连接到第一和第二导电图案并沿着第一方向彼此间隔开的灯座。

70. 发明授权

US08318066B2 Step and repeat imprint lithography process 有权
标题翻译：步骤和重复压印光刻工艺
公开(公告)号：US08318066B2
公开(公告)日：2012-11-27
申请号：US13108614
申请日：2011-05-16
申请人： Sidlgata V. Sreenivasan , Byung-Jin Choi , Norman E. Schumaker , Ronald D. Voisin , Michael P. C. Watts , Mario Johannes Meissl
发明人： Sidlgata V. Sreenivasan , Byung-Jin Choi , Norman E. Schumaker , Ronald D. Voisin , Michael P. C. Watts , Mario Johannes Meissl
IPC分类号： B29C41/12 , B29C71/00 , B81C1/00
CPC分类号： B81C1/0046 , B82Y10/00 , B82Y30/00 , B82Y40/00 , G03F7/0002
摘要： The present invention is directed to methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. In one embodiment, the imprint process is designed to imprint only a portion of the substrate. The remainder of the substrate is imprinted by moving the template to a different portion of the template and repeating the imprint lithography process.
摘要翻译：本发明涉及通过压印光刻对衬底图案化的方法。压印光刻是将液体分配到基板上的过程。使模板与液体接触并且液体被固化。固化液体包括在模板中形成的任何图案的印记。在一个实施例中，压印工艺被设计成仅印刷基板的一部分。通过将模板移动到模板的不同部分并重复压印光刻工艺来印刷衬底的其余部分。

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