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    • 63. 发明授权
    • File management method, and memory card and terminal apparatus that make use of the method
    • 文件管理方法以及使用该方法的存储卡和终端装置
    • US07024532B2
    • 2006-04-04
    • US10211586
    • 2002-08-05
    • Yoshihiko TakagiYoshiaki NakanishiOsamu SasakiTsutomu Sekibe
    • Yoshihiko TakagiYoshiaki NakanishiOsamu SasakiTsutomu Sekibe
    • G06F12/00
    • G07F7/1008G06Q20/341G06Q20/3552G06Q20/35765
    • A file management method, whereby inconsistencies can be prevented between a file recorded in a memory card and the file management information that a terminal apparatus manages, without leaking the information of a file made and stored in an in-card processing system. According to this method, a flash memory accessible from two processing systems 100 and 300 is provided. First processing system 100 requests a reservation of an use area of flash memory 200a to second processing system 300, which, upon receiving the request, implements a reservation processing for an area of the memory section and reflects the information of the reserve area upon file management section 230. First processing system 100 performs the processing of writing data into the area reserved by second processing system 300. Inconsistencies between the file management information that a terminal manages and a file actually recorded into the memory section of a secure card can be prevented. Furthermore, exclusive control can be implemented, whereby there will be no direct access from a terminal to the area used for a card-dedicated file recorded therein by means of processing that takes place inside the card.
    • 一种文件管理方法,可以防止记录在存储卡中的文件与终端设备管理的文件管理信息之间的不一致性,而不会泄漏在卡内处理系统中制作和存储的文件的信息。 根据该方法,提供从两个处理系统100和300可访问的闪存。 第一处理系统100请求将闪存200a的使用区域预留到第二处理系统300,第二处理系统300在接收到请求时对存储器部分的区域执行预留处理,并将保留区域的信息反映到文件 管理部分230。 第一处理系统100执行将数据写入到由第二处理系统300保留的区域中的处理。 可以防止终端管理的文件管理信息与实际记录在安全卡的存储部分中的文件之间的不一致。 此外,可以实现专用控制,由此通过在卡内部进行的处理,不会从终端直接访问用于其中记录的卡专用文件的区域。
    • 65. 发明授权
    • Potosensitive composition and method of forming a pattern using the same
    • 波纹组合物和使用其形成图案的方法
    • US5332648A
    • 1994-07-26
    • US813694
    • 1991-12-27
    • Naoko KiharaFumihiko YuasaTohru UshirogouchiTsukasa TadaOsamu SasakiTakuya NaitoSatoshi Saito
    • Naoko KiharaFumihiko YuasaTohru UshirogouchiTsukasa TadaOsamu SasakiTakuya NaitoSatoshi Saito
    • G03F7/004G03F7/039H01L21/027H01L21/30G03C1/73
    • G03F7/0045Y10S430/115Y10S430/116Y10S430/118
    • A photosensitive composition comprising: an acid-decomposable compound having at least one substituent which is decomposed by an acid, forming a product which reacts with alkali solution and forms --COO.sup.- or --SO.sub.3.sup.- ; and a compound which generates an acid when exposed to a chemical radiation. If necessary, the composition further comprises an alkali-soluble polymer. The acid-decomposable compound is one which is represented by the following formula (1), and the alkali-soluble polymer has a softening point of 150.degree. C. or more and an average molecular weight of 3000 to 8000. When used as photoresist, the composition can form a fine resist pattern. ##STR1## where R.sub.1 and R.sub.2 are either the same or different, each of which represents at least one selected from the group consisting of hydrogen, halogen atom, cyano group, nitro group, silyl group, and monovalent organic group; X represents >C.dbd.O or --SO.sub.2 --; Y represents a divalent organic group; R.sub.1 and R.sub.2 can be bonded together, forming a ring; and at least one of R.sub.1, R.sub.2, and Y has a substituent which is decomposed by an acid.
    • 一种光敏组合物,其包含:具有至少一个被酸分解的取代基的酸可分解化合物,形成与碱溶液反应形成-COO-或-SO 3 - 的产物; 以及当暴露于化学辐射时产生酸的化合物。 如果需要,组合物还包含碱溶性聚合物。 酸分解性化合物是由下式(1)表示的化合物,碱溶性聚合物的软化点为150℃以上,平均分子量为3000〜8000。当用作光致抗蚀剂时, 该组合物可形成精细的抗蚀剂图案。 (1)其中R1和R2相同或不同,它们各自表示选自氢,卤素原子,氰基,硝基,甲硅烷基和一价有机基团中的至少一种; X表示> C = O或-SO 2 - ; Y表示二价有机基团; R1和R2可以结合在一起,形成环; R 1,R 2和Y中的至少一个具有被酸分解的取代基。