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61. 发明申请

US20090032071A1 LID FOR A SEMICONDUCTOR DEVICE PROCESSING APPARATUS AND METHODS FOR USING THE SAME 审中-公开
标题翻译：用于半导体器件加工装置的夹具及其使用方法
公开(公告)号：US20090032071A1
公开(公告)日：2009-02-05
申请号：US12245742
申请日：2008-10-04
申请人： Joseph Yudovsky , Hui Chen , Gary Ettinger
发明人： Joseph Yudovsky , Hui Chen , Gary Ettinger
IPC分类号： H01L21/67
CPC分类号： H01L21/67126 , B08B3/02 , B08B3/12 , B08B13/00 , H01L21/67051
摘要： A lid for a semiconductor device processing apparatus is provided. The lid comprises a cover having an opening and a wall formed around the opening, the wall adapted to prevent fluid present on the lid from entering a body of the processing apparatus through the opening, and one or more cover edges including one or more edge walls; an outer door adapted to prevent fluid from entering the body of the processing apparatus through the opening of the cover, wherein the outer door interfaces with the wall formed around the opening and the one or more edge walls; and an inner door coupled to the outer door and adapted to prevent fluid from exiting the body of the processing apparatus through the opening of the cover. Numerous other aspects are provided.
摘要翻译：提供了一种用于半导体器件处理设备的盖子。所述盖包括具有开口和围绕所述开口形成的壁的盖，所述壁适于防止存在于所述盖上的流体通过所述开口进入所述处理设备的主体，以及一个或多个盖边缘，包括一个或多个边缘壁 ; 外门，其适于防止流体通过盖的打开进入加工设备的主体，其中外门与围绕开口和一个或多个边缘壁形成的壁相连; 以及联接到所述外门并适于防止流体通过所述盖的打开而离开所述处理设备的主体的内门。提供了许多其他方面。

62. 发明申请

US20080213542A1 LASER PROCESSING OF METAL NANOPARTICLE/POLYMER COMPOSITES 有权
标题翻译：金属纳米颗粒/聚合物复合材料的激光加工
公开(公告)号：US20080213542A1
公开(公告)日：2008-09-04
申请号：US11774796
申请日：2007-07-09
申请人： QUN HUO , Hui Chen
发明人： QUN HUO , Hui Chen
IPC分类号： B05D3/06 , B32B3/10
CPC分类号： B23K26/16 , B23K26/0006 , B23K26/354 , B23K26/55 , B23K2103/16 , B23K2103/42 , B23K2103/50 , Y10T428/24479 , Y10T428/24612 , Y10T428/24744
摘要： A method of forming articles having closed microchannels includes the steps of providing a substrate including a composite material, the composite having metal nanoparticles dispersed in a polymer matrix. The substrate is irradiated with a laser beam at an intensity and time sufficient to selectively remove the polymer below a surface of said substrate to form at least one microchannel, wherein the intensity and time is low enough to avoid removing the polymer above the microchannel, wherein an article having at least one closed microchannel is formed. A metal nanoparticle/polymer composite composition can have functionality that can undergo addition reactions to seal or join pieces of polymers or composites upon irradiation of the composition placed on one or more pieces.
摘要翻译：形成具有闭合微通道的制品的方法包括提供包括复合材料的基材的步骤，所述复合材料具有分散在聚合物基质中的金属纳米颗粒。以足够的强度和时间照射激光束的衬底，以便选择性地去除所述衬底的表面下方的聚合物以形成至少一个微通道，其中强度和时间足够低以避免去除微通道上方的聚合物，其中形成具有至少一个封闭微通道的制品。金属纳米颗粒/聚合物复合组合物可以具有在放置在一个或多个片上的组合物照射时可以经历加成反应以密封或连接聚合物片或复合材料片的官能团。

63. 发明申请

US20080210258A1 SCRUBBER BOX AND METHODS FOR USING THE SAME 有权
标题翻译： SCRUBBER BOX及其使用方法
公开(公告)号：US20080210258A1
公开(公告)日：2008-09-04
申请号：US12102846
申请日：2008-04-14
申请人： Joseph Yudovsky , Avi Tepman , Kenneth R. Reynolds , Younes Achkire , Dan A. Marohl , Steve G. Ghanayem , Alexander S. Polyak , Gary Ettinger , Haochuan Zhang , Hui Chen
发明人： Joseph Yudovsky , Avi Tepman , Kenneth R. Reynolds , Younes Achkire , Dan A. Marohl , Steve G. Ghanayem , Alexander S. Polyak , Gary Ettinger , Haochuan Zhang , Hui Chen
IPC分类号： B08B7/00 , A47L25/00
CPC分类号： H01L21/67046 , B08B1/04
摘要： A scrubber box is provided that includes a tank adapted to receive a substrate for cleaning, supports outside of the tank and adapted to couple to ends of scrubber brushes disposed within the tank, a motor mounted to each of the supports and adapted to rotate the scrubber brushes, a base to which the supports are pivotally mounted via spherical bearings adapted to permit toe-in of the scrubber brushes, a brush gap actuator adapted, via a crank and rocker mechanism, to substantially simultaneously pivot the supports toward or away from each other so as to permit the scrubber brushes to substantially simultaneously achieve or break contact with the substrate, and a toe-in actuator adapted to move two of the spherical bearings toward or away from each other so as to adjust a toe-in angle between the scrubber brushes.
摘要翻译：提供了一种洗涤器箱，其包括适于接收用于清洁的基底的罐，支撑在罐外部并且适于耦合到设置在罐内的洗涤器刷的端部;马达，其安装到每个支撑件上并适于旋转洗涤器电刷，支架通过适于允许洗涤器刷子进入的球面轴承可枢转地安装的基座，经由曲柄和摇臂机构适应的基本上同时地使支撑件朝向或远离彼此枢转的电刷间隙致动器以便允许洗涤器刷子基本上同时实现或断开与基板的接触，以及适于将两个球形轴承朝向或远离彼此移动的脚趾致动器，以便调节洗涤器之间的束缚角度刷子

64. 发明申请

US20060049578A1 Let me roll Sic Bo 失效
标题翻译：让我滚骰宝
公开(公告)号：US20060049578A1
公开(公告)日：2006-03-09
申请号：US10935020
申请日：2004-09-07
申请人： Hui Chen , Gen Chen
发明人： Hui Chen , Gen Chen
IPC分类号： A63F9/04
CPC分类号： A63F3/00157 , A63F9/04
摘要： Let Me Roll Sic Bo is a dice game blended Sic Bo with traditional craps game. It is using three regular dice (cubes). Each die has six sides and different number of spots on it (from one to six). Each player will take a turn to shoot the dice follow the clockwise. Players can wager on nine main designed betting areas to win different odds.
摘要翻译：让我滚动骰宝是一个骰子游戏混合骰宝与传统的骰子游戏。它使用三个常规骰子（立方体）。每个模具有六面和不同数量的斑点（从一到六）。每个玩家将轮流拍摄骰子顺时针方向。玩家可以投注九个主要设计的投注区域以赢得不同的赔率。

65. 发明申请

US20060017228A1 Blackjack'n baccarat with jokers (B&BJ) 失效
标题翻译：黑社会百家乐与小丑（B＆BJ）
公开(公告)号：US20060017228A1
公开(公告)日：2006-01-26
申请号：US10895572
申请日：2004-07-20
申请人： Hui Chen
发明人： Hui Chen
IPC分类号： A63F1/00
CPC分类号： A63F3/00157 , A63F2001/003
摘要： A variation of baccarat is played with six or eight decks standard 53 playing cards (with one joker). The blackjack side bets provide variety optional betting. The jokers serve as winning cards. Either Banker or Player has the joker would win. There are 9 betting areas, such as tie, banker, banker blackjack, banker 21, banker 17, player, player blackjack, player 21 and player 16.
摘要翻译：百家乐的变化是用6或8个甲板标准的53张扑克牌（有一个小丑）进行的。二十一点赌注提供多种可选投注。小丑作为获奖卡。无论是银行家还是玩家，玩家都会赢得比赛。有9个投注区域，如领带，银行家，银行二十一点，银行家21，银行家17，玩家，玩家二十一点，玩家21和玩家16。

66. 发明申请

US20050276027A1 Electronic device for shielding EMI 审中-公开
标题翻译：用于屏蔽EMI的电子设备
公开(公告)号：US20050276027A1
公开(公告)日：2005-12-15
申请号：US11142529
申请日：2005-06-01
申请人： Ling-Ling Shen , Yu-Xiang Wang , Hui Chen
发明人： Ling-Ling Shen , Yu-Xiang Wang , Hui Chen
IPC分类号： G12B17/02 , H05K1/02 , H05K9/00
CPC分类号： H05K9/0037 , H05K1/0218 , H05K2201/09354 , H05K2201/10371
摘要： A electronic device for shielding electromagnetic interference (EMI) including a metal shield, a printed circuit board (PCB) having a ground layer, and a number of ground pads arranged at edges of the PCB and in electrical conductivity with the ground layer. The ground pads lies close to edges of the metal shield. During solder reflowing process, solder is laid on the ground pads, and a height of the solder is adjusted to meet spaces or gaps of the shield. When the PCB is placed into the shield, the solder on the ground pads is in electrical conductivity with the metal shield to eliminate spaces or gaps thereof. So the EMI coupling which causes EMI signals interfering with sensitive components is avoided.
摘要翻译：一种用于屏蔽包括金属屏蔽的电磁干扰（EMI）的电子设备，具有接地层的印刷电路板（PCB）和布置在PCB的边缘处并与接地层导电的多个接地焊盘。接地垫靠近金属屏蔽层的边缘。在焊锡回流过程中，将焊料铺设在接地焊盘上，并调整焊料的高度以满足屏蔽层的空间或间隙。当PCB被放置在屏蔽层中时，接地焊盘上的焊料与金属屏蔽层导电，以消除其间隙或间隙。因此避免了导致EMI信号干扰敏感元件的EMI耦合。

67. 发明申请

US20050211276A1 Lid for a semiconductor device processing apparatus and methods for using the same 审中-公开
标题翻译：用于半导体器件处理装置的盖子及其使用方法
公开(公告)号：US20050211276A1
公开(公告)日：2005-09-29
申请号：US11080361
申请日：2005-03-15
申请人： Joseph Yudovsky , Hui Chen , Gary Ettinger
发明人： Joseph Yudovsky , Hui Chen , Gary Ettinger
IPC分类号： B08B3/02 , B08B3/12 , B08B3/14 , B08B13/00 , H01L21/00
CPC分类号： H01L21/67126 , B08B3/02 , B08B3/12 , B08B13/00 , H01L21/67051
摘要： A lid for a semiconductor device processing apparatus is provided. The lid includes a cover having an opening and may include (1) a wall formed around the opening, the wall adapted to prevent fluid present on the lid from entering a body of the processing apparatus through the opening; (2) an outer door adapted to prevent fluid from entering the body of the processing apparatus through the opening of the cover; (3) an inner door coupled to the outer door and adapted to prevent fluid from exiting the body of the processing apparatus through the opening of the cover; and/or (4) a rinsing mechanism adapted to rinse a top surface of the cover. Numerous other aspects are provided.
摘要翻译：提供了一种用于半导体器件处理设备的盖子。盖子包括具有开口的盖，并且可以包括（1）围绕开口形成的壁，所述壁适于防止存在于盖上的流体通过开口进入处理装置的主体; （2）外门，其适于防止流体通过盖的打开进入加工设备的主体; （3）内门，其联接到所述外门并且适于防止流体通过所述盖的打开而离开所述处理设备的主体; 和/或（4）适于冲洗所述盖的顶表面的冲洗机构。提供了许多其他方面。

68. 发明申请

US20050066778A1 WRENCH CAPABLE OF CLAMPING A SCREWED MEMBER AND PREVENTING THE SCREWED MEMBER FROM SLIPPING OUT OF A SOCKET OF THE WRENCH AND PERMITTING THE SCREWED MEMBER TO PASS THROUGH THE SOCKET 有权
标题翻译：扳手能够夹紧一个螺丝的会员，并防止螺丝的会员从扳手的插座中滑出并允许螺丝的会员通过插座
公开(公告)号：US20050066778A1
公开(公告)日：2005-03-31
申请号：US10673274
申请日：2003-09-30
申请人： Hui Chen
发明人： Hui Chen
IPC分类号： B25B13/04 , B25B23/10 , B25B13/02
CPC分类号： B25B23/101 , B25B13/04
摘要： A wrench including a stem having a head section at one end of the stem and a polygonal socket formed in the head section for fitting onto a screwed member. A resilient ring is disposed at the head section and pivotally connected with a controlling switch pivotally disposed at the head section. By means of operating the controlling switch, the resilient ring is driven to expand or close. In the closed position, the resilient ring obstructs at least one inner angle of the socket to prevent the screwed member from detaching out of the socket and clamp the screwed member in the socket. In the expanded position, the resilient ring frees the inner angle, permitting the screwed member to freely pass through the socket.
摘要翻译：一种扳手，其包括在杆的一端具有头部部分的杆，以及形成在头部中用于装配到螺纹部件上的多边形插座。弹性环设置在头部，并与枢转地设置在头部的控制开关枢转连接。通过操作控制开关，弹性环被驱动以膨胀或关闭。在关闭位置，弹性环阻挡插座的至少一个内角，以防止螺纹部件脱离插座并将螺纹部件夹紧在插座中。在扩展位置，弹性环释放内角，允许螺纹构件自由地穿过插座。

69. 发明申请

US20050009342A1 Method for etching an organic anti-reflective coating (OARC) 审中-公开
标题翻译：蚀刻有机抗反射涂层（OARC）的方法
公开(公告)号：US20050009342A1
公开(公告)日：2005-01-13
申请号：US10616098
申请日：2003-07-08
申请人： Hui Chen , Chun Yan
发明人： Hui Chen , Chun Yan
IPC分类号： H01L21/302 , H01L21/311 , H01L21/461
CPC分类号： H01L21/31138 , H01L21/31144
摘要： A method for etching an organic anti-reflective coating (OARC) using a halogen-free gas chemistry is disclosed. The organic anti-reflective coating (OARC) is etched using a gas mixture comprising at least one of a hydrocarbon-containing gas and an oxygen-containing gas. The method provides high etch selectivity for the organic anti-reflective coating (OARC) over metal layers (e.g., copper (Cu), aluminum (Al), and the like) or dielectric layers (silicon dioxide (SiO2), and the like).
摘要翻译：公开了一种使用无卤素气体化学蚀刻有机抗反射涂层（OARC）的方法。使用包含含烃气体和含氧气体中的至少一种的气体混合物来蚀刻有机抗反射涂层（OARC）。该方法对金属层（例如铜（Cu），铝（Al）等）或电介质层（二氧化硅（SiO 2）等）上的有机抗反射涂层（OARC）提供高蚀刻选择性，。

70. 发明授权

US06762127B2 Etch process for dielectric materials comprising oxidized organo silane materials 失效
标题翻译：包括氧化有机硅烷材料的电介质材料的蚀刻工艺
公开(公告)号：US06762127B2
公开(公告)日：2004-07-13
申请号：US09938432
申请日：2001-08-23
申请人： Yves Pierre Boiteux , Hui Chen , Ivano Gregoratto , Chang-Lin Hsieh , Hoiman Hung , Sum-Yee Betty Tang
发明人： Yves Pierre Boiteux , Hui Chen , Ivano Gregoratto , Chang-Lin Hsieh , Hoiman Hung , Sum-Yee Betty Tang
IPC分类号： H01L21304
CPC分类号： H01L21/76808 , H01L21/02126 , H01L21/02164 , H01L21/022 , H01L21/02211 , H01L21/02274 , H01L21/31116 , H01L21/31633 , H01L21/76802 , H01L21/76807 , H01L2221/1036
摘要： The present invention provides a novel etching technique for etching a layer of C-doped silicon oxide, such as a partially oxidized organo silane material. This technique, employing CH2F2/Ar chemistry at low bias and low to intermediate pressure, provides high etch selectivity to silicon oxide and improved selectivity to organic photoresist. Structures including a layer of partially oxidized organo silane material (1004) deposited on a layer of silicon oxide (1002) were etched according to the novel technique, forming relatively narrow trenches (1010, 1012, 1014, 1016, 1030, 1032, 1034 and 1036) and wider trenches (1020, 1022, 1040 and 1042). The technique is also suitable for forming dual damascene structures (1152, 1154 and 1156). In additional embodiments, manufacturing systems (1410) are provided for fabricating IC structures of the present invention. These systems include a controller (1400) that is adapted for interacting with a plurality of fabricating stations (1420, 1422, 1424, 1426 and 1428).
摘要翻译：本发明提供一种用于蚀刻C掺杂氧化硅层的新颖蚀刻技术，例如部分氧化的有机硅烷材料。这种在低偏压和低至中压下使用CH2F2 / Ar化学的技术为氧化硅提供了高蚀刻选择性，并提高了对有机光致抗蚀剂的选择性。根据新技术蚀刻包括沉积在氧化硅层（1002）上的部分氧化的有机硅烷材料层（1004）的结构，形成相对窄的沟槽（1010,1012,1014,1016,1030,1032,1034和 1036）和较宽的沟槽（1020,1022,1040和1042）。该技术也适用于形成双镶嵌结构（1152,1154和1156）。在另外的实施例中，提供制造系统（1410）用于制造本发明的IC结构。这些系统包括适于与多个制造站（1420,1422,1424,1426和1428）相互作用的控制器（1400）。

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