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    • 62. 发明申请
    • MEMORY WITH SEPARATE READ AND WRITE PATHS
    • 具有单独读取和写入数据的存储器
    • US20110090733A1
    • 2011-04-21
    • US12974679
    • 2010-12-21
    • Haiwen XiHongyue LiuMichael Xuefei TangAntoine KhoueirSong S. Xue
    • Haiwen XiHongyue LiuMichael Xuefei TangAntoine KhoueirSong S. Xue
    • G11C11/15
    • G11C11/161G11C11/1655G11C11/1657G11C11/1659G11C11/1673G11C11/1675
    • A memory unit includes a giant magnetoresistance cell electrically coupled between a write bit line and a write source line. The giant magnetoresistance cell includes a free magnetic layer separated from a first pinned magnetic layer by a first non-magnetic electrically conducting layer. A magnetic tunnel junction data cell is electrically coupled between a read bit line and a read source line. The magnetic tunnel junction data cell includes the free magnetic layer separated from a second pinned magnetic layer by an oxide barrier layer. A write current passes through the giant magnetoresistance cell to switche the giant magnetoresistance cell between a high resistance state and a low resistance state. The magnetic tunnel junction data cell is configured to switch between a high resistance state and a low resistance state by magnetostatic coupling with the giant magnetoresistance cell, and be read by a read current passing though the magnetic tunnel junction data cell.
    • 存储单元包括电耦合在写位线和写入源线之间的巨磁电阻单元。 巨磁阻单元包括通过第一非磁性导电层与第一固定磁性层分离的自由磁性层。 磁性隧道结数据单元电耦合在读取位线和读取源极线之间。 磁性隧道结数据单元包括通过氧化物阻挡层与第二固定磁性层分离的自由磁性层。 写入电流通过巨磁电阻单元,以在高电阻状态和低电阻状态之间切换巨磁电阻单元。 磁隧道结数据单元被配置为通过与巨磁电阻单元的静磁耦合在高电阻状态和低电阻状态之间切换,并且通过通过磁性隧道结数据单元的读取电流来读取。
    • 65. 发明授权
    • Short bridge phase change memory cells
    • 短桥相变存储单元
    • US07825397B2
    • 2010-11-02
    • US12125970
    • 2008-05-23
    • Haiwen XiSong S. Xue
    • Haiwen XiSong S. Xue
    • H01L45/00
    • H01L45/16H01L27/2436H01L45/06H01L45/1226H01L45/1253H01L45/144
    • Random access memory cells having a short phase change bridge structure and methods of making the bridge structure via shadow deposition. The short bridge structure reduces the heating efficiency needed to switch the logic state of the memory cell. In one particular embodiment, the memory cell has a first electrode and a second electrode with a gap therebetween. The first electrode has an end at least partially non-orthogonal to the substrate and the second electrode has an end at least partially non-orthogonal to the substrate. A phase change material bridge extends over at least a portion of the first electrode, over at least a portion of the second electrode, and within the gap. An insulative material encompasses at least a portion of the phase change material bridge.
    • 具有短相变桥结构的随机存取存储单元和通过阴影沉积制造桥结构的方法。 短桥结构降低了切换存储单元的逻辑状态所需的加热效率。 在一个特定实施例中,存储单元具有第一电极和在其之间具有间隙的第二电极。 第一电极具有至少部分地与衬底非正交的端部,并且第二电极具有至少部分地与衬底非正交的端部。 相变材料桥在第一电极的至少一部分上延伸到第二电极的至少一部分上,并在间隙内延伸。 绝缘材料包含相变材料桥的至少一部分。
    • 67. 发明申请
    • WRITE VERIFY METHOD FOR RESISTIVE RANDOM ACCESS MEMORY
    • 用于电阻随机访问存储器的写作验证方法
    • US20090290411A1
    • 2009-11-26
    • US12123647
    • 2008-05-20
    • Haiwen XiSong S. Xue
    • Haiwen XiSong S. Xue
    • G11C11/00
    • G11C13/0069G11C11/5664G11C11/5685G11C13/0007G11C13/0014G11C13/0016G11C13/0064G11C2013/0073G11C2211/5621G11C2213/31G11C2213/32
    • Write verify methods for resistance random access memory (RRAM) are disclosed. The methods include applying a reset operation voltage pulse across a RRAM cell to change a resistance of the RRAM cell from a low resistance state to a high resistance state and setting a counter to zero. Then the method includes applying a forward resetting voltage pulse across the RRAM cell if the RRAM cell has a high resistance state resistance value less than a selected lower resistance limit value and adding one to the counter. This step is repeated until either the counter reaches a predetermined number or until the high resistance state resistance value is greater than the lower resistance limit value. The method also includes applying a reverse resetting voltage pulse across the RRAM cell if the RRAM cell has a high resistance state resistance values is greater than a selected upper resistance limit value and adding one to the counter. The reverse resetting voltage pulse has a second polarity being opposite the first polarity. This step is repeated until either the counter reaches a predetermined number or until all the high resistance state resistance value is less than the upper resistance limit value.
    • 公开了电阻随机存取存储器(RRAM)的写验证方法。 所述方法包括在RRAM单元之间施加复位操作电压脉冲,以将RRAM单元的电阻从低电阻状态改变为高电阻状态,并将计数器设置为零。 然后,该方法包括如果RRAM单元具有小于所选择的较低电阻极限值的高电阻状态电阻值并且将一个加到计数器上,则在RRAM单元之间施加正向复位电压脉冲。 重复该步骤直到计数器达到预定数量,或者直到高电阻状态电阻值大于下限电阻值。 该方法还包括如果RRAM单元具有高电阻状态电阻值大于所选上限电阻值并将一个加到计数器上,则在RRAM单元之间施加反向复位电压脉冲。 反向复位电压脉冲具有与第一极性相反的第二极性。 重复该步骤直到计数器达到预定数量,或者直到所有高电阻状态电阻值都小于上限电阻值。
    • 69. 发明授权
    • Write-once magentic junction memory array
    • 一次写入磁存储器阵列
    • US08659852B2
    • 2014-02-25
    • US12106363
    • 2008-04-21
    • Haiwen XiSong S. Xue
    • Haiwen XiSong S. Xue
    • G11B5/33
    • G11C11/1675G11C11/161G11C11/1673
    • A magnetic junction memory array and methods of using the same are described. The magnetic junction memory array includes a plurality of electrically conductive word lines extending in a first direction, a plurality of electrically conductive bit lines extending in a second direction and forming a cross-point array with the plurality of electrically conductive word lines, and a memory cell proximate to, at least selected, cross-points forming a magnetic junction memory array. Each memory cell includes a magnetic pinned layer electrically between a magnetic bit and an isolation transistor. The isolation transistor has a current source and a gate. The current source is electrically coupled to the cross-point bit line and the gate is electrically coupled to the cross-point word line. An electrically conductive cover layer is disposed on and in electrical communication with the magnetic bits.
    • 描述了磁结存储器阵列及其使用方法。 磁结存储器阵列包括沿第一方向延伸的多个导电字线,沿第二方向延伸的多个导电位线,并与多个导电字线形成交叉点阵列,以及存储器 靠近,至少选择的形成磁结存储器阵列的交叉点的单元。 每个存储单元包括在磁性位和隔离晶体管之间电气的磁性固定层。 隔离晶体管具有电流源和栅极。 电流源电耦合到交叉点位线,并且栅极电耦合到交叉点字线。 导电覆盖层设置在与磁头电气连接的位置上。