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61. 发明授权

US07588925B2 Phospholipases and uses thereof 失效
标题翻译：磷脂酶及其用途
公开(公告)号：US07588925B2
公开(公告)日：2009-09-15
申请号：US11544679
申请日：2006-10-10
申请人： Kaj Albermann , Wolfram Kemmner , Dieter Maier , Fabio Spreafico , Alexander Stock , Christian Wagner , Lex De Boer , Roelf Bernhard Meima
发明人： Kaj Albermann , Wolfram Kemmner , Dieter Maier , Fabio Spreafico , Alexander Stock , Christian Wagner , Lex De Boer , Roelf Bernhard Meima
IPC分类号： A21D2/00 , C12N9/20 , A23C9/12 , C12N1/00 , C12N9/16 , C07H21/04
CPC分类号： A21D8/042 , C07K2319/00 , C12N9/20
摘要： The invention relates to a newly identified polynucleotide sequence comprising a gene that encodes a novel phospholipase isolated from Aspergillus niger. The invention features the full length nucleotide sequence of the novel gene, the cDNA sequence comprising the full length coding sequence of the novel phospholipase as well as the amino acid sequence of the full-length functional protein and functional equivalents thereof. The invention also relates to methods of using these enzymes in industrial processes and methods of diagnosing fungal infections. Also included in the invention are cells transformed with a polynucleotide according to the invention and cells wherein a phospholipase according to the invention is genetically modified to enhance or reduce its activity and/or level of expression.
摘要翻译：本发明涉及新鉴定的多核苷酸序列，其包含编码从黑曲霉分离的新型磷脂酶的基因。本发明的特征在于新基因的全长核苷酸序列，cDNA序列包含新型磷脂酶的全长编码序列以及全长功能蛋白的氨基酸序列及其功能等同物。本发明还涉及在工业过程中使用这些酶的方法和诊断真菌感染的方法。本发明还包括用根据本发明的多核苷酸转化的细胞和其中根据本发明的磷脂酶被遗传修饰以增强或降低其活性和/或表达水平的细胞。

62. 发明申请

US20090212459A1 Method and System for Post-Treating Preforms 审中-公开
标题翻译：预处理预处理方法与系统
公开(公告)号：US20090212459A1
公开(公告)日：2009-08-27
申请号：US12085793
申请日：2006-11-10
申请人： Witold Neter , Helmut Thoemmes , Rainer Petry , Christian Wagner
发明人： Witold Neter , Helmut Thoemmes , Rainer Petry , Christian Wagner
IPC分类号： B29C71/02 , B29C45/72
CPC分类号： B29C45/7207 , B29B2911/1402 , B29B2911/14026 , B29B2911/14033 , B29B2911/1404 , B29B2911/14106 , B29B2911/14133 , B29C49/06 , B29C49/6427 , B29C49/6463 , B29C2045/7214 , B29C2045/7221 , B29C2045/7228 , B29C2045/7264 , B29K2105/253
摘要： The invention concerns a system for the post-treatment of preforms (7) produced in an injection molding mold, comprising at least two post-treatment tools which each have a receiving plate (4) which has a group of receiving cavities (2) and a pin plate (6) which has a group of post-treatment pins (3), and a device for transferring the preforms (7) from the injection molding mold alternately into the at least two post-treatment tools. In order to provide a method of and a system for the post-treatment of preforms produced in an injection molding mold, which on the one hand allows early removal of the preform from the injection molding tool and which on the other hand allows reliable post-treatment in particular of the interior of the preform after removal from the injection molding mold, it is proposed in accordance with the invention that the post-treatment pins (3) remain in the preforms for a period of time which is longer than the mold stand time.
摘要翻译：本发明涉及一种用于后处理在注塑模具中制造的预成型件（7）的系统，其包括至少两个后处理工具，每个后处理工具都具有接收板（4），该接收板具有一组接收腔（2）和具有一组后处理销（3）的销板（6）和用于将预成型件（7）从注模模具交替地转移到至少两个后处理工具中的装置。为了提供在注塑模具中制造的预成型件的后处理方法和系统，其一方面允许从注射模具中早期移除预型件，另一方面允许可靠的后处理，特别是在从注模模具中取出后预处理的内部，根据本发明提出，后处理销（3）保留在预制件中一段时间比模具架长时间。

63. 再颁专利

USRE40743E1 Projection exposure system having a reflective reticle 有权
标题翻译：具有反射型掩模版的投影曝光系统
公开(公告)号：USRE40743E1
公开(公告)日：2009-06-16
申请号：US10916650
申请日：2004-08-11
申请人： Gerhard Fuerter , Christian Wagner , Uwe Goedecke , Henriette Mueller
发明人： Gerhard Fuerter , Christian Wagner , Uwe Goedecke , Henriette Mueller
IPC分类号： G02B17/00
CPC分类号： G03F7/70066 , G03F7/70225 , G03F7/70283
摘要： A projection exposure system for microlithography includes an illuminating system (2), a reflective reticle (5) and reduction objectives (71, 72). In the reduction objective (71, 72), a first beam splitter cube (3) is provided which superposes the illuminating beam path (100) and the imaging beam path (200). In order to obtain an almost telecentric entry at the reticle, optical elements (71) are provided between beam splitter cube (3) and the reflective reticle (5). Advantageously, the reduction objective is a catadioptric objective having a beam splitter cube (3) whose fourth unused side can be used for coupling in light. The illuminating beam path (100) can also be coupled in with a non-parallel beam splitter plate. The illuminating beam path is refractively corrected in passthrough to compensate for aberrations via the special configuration of the rear side of the beam splitter plate. Advantageously, a beam splitter plate of this kind is used within a reduction objective in lieu of a deflecting mirror and only refractive components are introduced between the beam splitter plate and the reflective reticle.
摘要翻译：用于微光刻的投影曝光系统包括照明系统（2），反射掩模版（5）和还原物镜（71,72）。在还原物镜（71,72）中，设有使照明光束路径（100）和成像光束路径（200）叠置的第一分束器立方体（3）。为了在掩模版处获得几乎远心的入射，在分束器立方体（3）和反射标线片（5）之间提供光学元件（71）。有利地，还原目标是具有分束器立方体（3）的反射折射物镜，其中第四未使用侧可以用于光耦合。照明光束路径（100）也可以与非平行光束分离板耦合。通过透射度折射校正照明光束路径，以通过分束板后侧的特殊配置补偿像差。有利地，这种分束板在减速目标下用于偏转反射镜，并且只有折射分量被引入分束板和反射光罩之间。

64. 发明授权

US07382536B2 Objective with fluoride crystal lenses 有权
标题翻译：目标是氟化物晶体镜片
公开(公告)号：US07382536B2
公开(公告)日：2008-06-03
申请号：US11392027
申请日：2006-03-29
申请人： Daniel Krähmer , Toralf Gruner , Wilhelm Ulrich , Birgit Enkisch , Michael Gerhard , Martin Brunotte , Christian Wagner , Winfried Kaiser , Manfred Maul , Christof Zaczek
发明人： Daniel Krähmer , Toralf Gruner , Wilhelm Ulrich , Birgit Enkisch , Michael Gerhard , Martin Brunotte , Christian Wagner , Winfried Kaiser , Manfred Maul , Christof Zaczek
IPC分类号： G02B5/30
CPC分类号： G03F7/70966 , G02B1/02 , G02B1/08 , G02B5/3083 , G03F7/70225 , G03F7/70241 , G03F7/70566 , G03F7/70958 , Y10S359/90
摘要： An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.
摘要翻译：微光刻投影系统的目的在于至少有一个氟化物晶体透镜。如果晶体透镜的透镜轴基本上垂直于氟化物晶体的{100} - 平面或{100}等价晶面而取向，对图像质量有害的双折射效应将被降低。如果使用两个或多个氟化物晶体透镜，它们应该具有在晶体结构的（100） - ，（111） - 或（110）方向上定向的透镜轴，并且它们应当相对于每个其他。通过使用相互旋转（100） - 相互组合的组相互旋转（111） - 或（110） - 相组合来进一步减少双折射相关效应。通过对物镜的至少一个光学元件施加补偿涂层也可实现进一步的改进。

65. 发明授权

US07345740B2 Polarized radiation in lithographic apparatus and device manufacturing method 有权
标题翻译：光刻设备中的极化辐射和器件制造方法
公开(公告)号：US07345740B2
公开(公告)日：2008-03-18
申请号：US11101630
申请日：2005-04-08
申请人： Christian Wagner , Wilhelmus Petrus De Boeij , Roel De Jonge , Tilmann Heil , Damian Fiolka
发明人： Christian Wagner , Wilhelmus Petrus De Boeij , Roel De Jonge , Tilmann Heil , Damian Fiolka
IPC分类号： G03B27/72
CPC分类号： G03F7/70566 , G03F7/70083 , G03F7/70125 , G03F7/70883 , G03F9/7065
摘要： A lithographic apparatus uses polarized light to improve the imaging properties such as exposure latitude, while maintaining and extending the lifetime of an illumination system in a lithographic apparatus.
摘要翻译：光刻设备使用偏振光来改善诸如曝光宽容度的成像特性，同时保持和延长光刻设备中的照明系统的寿命。

66. 发明申请

US20070012871A1 CATADIOPTRIC PROJECTION OBJECTIVE WITH ADAPTIVE MIRROR AND PROJECTION EXPOSURE METHOD 有权
标题翻译：具有自适应镜像和投射曝光方法的目标投影目标
公开(公告)号：US20070012871A1
公开(公告)日：2007-01-18
申请号：US11533632
申请日：2006-09-20
申请人： Christian Wagner , Michael Gerhard , Gerald Richter
发明人： Christian Wagner , Michael Gerhard , Gerald Richter
IPC分类号： H01J3/14
CPC分类号： G02B17/0892 , G02B17/08 , G02B26/06 , G02B26/0825 , G02B27/0025 , G02B27/0043 , G03F7/70225 , G03F7/70266
摘要： A catadioptric projection objective for microlithography has at least one curved mirror that is deformable and adjusting elements that can deform the deformable mirror. The adjusting elements are matched to given image errors and their correction. The invention is suitable for astigmatism, fourfold wavefront-deformations due to lens heating, compaction, and the like.
摘要翻译：用于微光刻的反射折射投射物镜具有至少一个可变形的弯曲镜，并且可调节可变形反射镜的元件。调整元素与给定的图像误差及其校正匹配。本发明适用于散光，由于透镜加热，压实等引起的四重波前变形。

67. 发明授权

US06972831B2 Projection exposure system for microlithography and method for generating microlithographic images 失效
标题翻译：用于微光刻的投影曝光系统和用于产生微光刻图像的方法
公开(公告)号：US06972831B2
公开(公告)日：2005-12-06
申请号：US10984256
申请日：2004-11-09
申请人： Karl-Heinz Schuster , Christian Wagner , Martin Schriever
发明人： Karl-Heinz Schuster , Christian Wagner , Martin Schriever
IPC分类号： G02B19/00 , G02B5/30 , G02B17/08 , G02B27/28 , G03F7/20 , G03F9/00 , H01L21/027 , G03B27/54 , G03B27/42 , G03B27/72
CPC分类号： G02B17/0892 , G02B17/08 , G02B27/28 , G03B27/72 , G03F7/70125 , G03F7/70225 , G03F7/70566
摘要： An arrangement for microlithographic projection exposure at high aperture achieve a contrast increase by the polarization of the light perpendicular to the plane of incidence on the resist. Arrangements are provided which influence the tangential polarization or the linear polarization adapted to the dipole illumination in the illuminating system and in the reduction objective.
摘要翻译：用于在高孔径处的微光刻投影曝光的布置通过垂直于抗蚀剂入射平面的光的偏振实现对比度增加。提供了影响在照明系统和还原目标中适应于偶极子照明的切向偏振或线偏振的布置。

68. 发明申请

US20050254120A1 Optical imaging system, in particular catadioptric reduction objective 审中-公开
标题翻译：光学成像系统，特别是反射折射减影目标
公开(公告)号：US20050254120A1
公开(公告)日：2005-11-17
申请号：US11066923
申请日：2005-02-28
申请人： Christoph Zaczek , Birgit Kurz , Jens Ullmann , Christian Wagner
发明人： Christoph Zaczek , Birgit Kurz , Jens Ullmann , Christian Wagner
IPC分类号： G02B5/30 , G02B13/14 , G02B13/24 , G02B17/08 , G03F7/20 , H01L21/027 , G02B26/08
CPC分类号： G02B17/0892 , G02B17/08 , G03F7/70225 , G03F7/70308 , G03F7/70566
摘要： An optical reproduction system, which can be configured for example as a catadioptric projection lens. This system includes an optical axis and a first deflection mirror, which is tilted in relation to the optical axis at a given tilt angle. One of the deflection mirrors has a ratio Rsp of the reflection coefficient Rs for s-polarised light to the reflection coefficient Rp for p-polarised light, in an incidence angle range that includes the tilt angle, of greater than one, whereas the corresponding ratio for the other deflection mirror is less than one. The deflection mirrors thus ensure that the polarization-dependant influence of the travel light remains minimal.
摘要翻译：可以配置为例如反射折射投影透镜的光学再现系统。该系统包括光轴和第一偏转镜，其以给定的倾斜角相对于光轴倾斜。偏转镜中的一个具有对于s偏振光的反射系数R S s的反射系数R p S的比值R s SP与对于p的反射系数R p p 在包括倾斜角的入射角范围内的棱镜光大于1，而另一偏转镜的对应比率小于1。因此，偏转镜确保行进光的偏振相关影响保持最小。

69. 发明申请

US20050126093A1 Method of providing a joint between a plate member and a frame profile, and a frame structure comprising such a joint 审中-公开
标题翻译：提供板构件和框架型材之间的接头的方法，以及包括这种接头的框架结构
公开(公告)号：US20050126093A1
公开(公告)日：2005-06-16
申请号：US10507900
申请日：2003-03-19
申请人： Christian Wagner , Per Gregersen
发明人： Christian Wagner , Per Gregersen
IPC分类号： E04D13/03 , E04D13/04 , E04D13/15 , E06B3/30 , E04G21/00
CPC分类号： E04D13/15 , E04D13/0305 , E04D2013/0468
摘要： The invention relates to a method of providing a joint between a plate member (1) and a frame profile (2) with a free edge (8) at the surface of the plate member. The joint is provided by applying two adhesives (9, 10). A first adhesive which, only after a curing time, obtains sufficient bearing capacity to support the plate member, is arranged on one of the surfaces to be connected by the joint, such that the adhesive (9) in the assembled condition will be placed close to said free edge. A second adhesive (10) which, immediately or shortly after, compared to the curing time of the first adhesive, obtains sufficient bearing capacity to keep the plate member in place, is arranged between said first adhesive and the free edge of the profile. The second adhesive (10) fits so tightly to plate member and profile that it prevents the first adhesive (9) from forcing its way past the free edge (8) of the profile. Further, the invention relates to a frame structure comprising such a joint.
摘要翻译：本发明涉及一种在板构件（1）和框架轮廓（2）之间提供在板构件的表面处具有自由边缘（8）的接头的方法。通过施加两个粘合剂（9,10）来提供接头。第一粘合剂，其仅在固化时间之后获得足够的承载能力以支撑板构件，布置在要由接头连接的一个表面上，使得在组装状态下的粘合剂（9）将被放置在靠近到自由边。与第一粘合剂的固化时间相比，立即或不久之后，第二粘合剂（10）获得足够的承载能力以将板构件保持在适当位置，布置在所述第一粘合剂和型材的自由边缘之间。第二粘合剂（10）与板构件和轮廓紧密地配合，以防止第一粘合剂（9）迫使其穿过型材的自由边缘（8）。此外，本发明涉及包括这种接头的框架结构。

70. 发明申请

US20050122594A1 Objective with fluoride crystal lenses 有权
标题翻译：目标是氟化物晶体镜片
公开(公告)号：US20050122594A1
公开(公告)日：2005-06-09
申请号：US11029788
申请日：2005-01-05
申请人： Daniel Krahmer , Toralf Gruner , Wilhelm Ulrich , Birgit Enkisch , Michael Gerhard , Martin Brunotte , Christian Wagner , Winfried Kaiser , Manfred Maul , Christoph Zaczek
发明人： Daniel Krahmer , Toralf Gruner , Wilhelm Ulrich , Birgit Enkisch , Michael Gerhard , Martin Brunotte , Christian Wagner , Winfried Kaiser , Manfred Maul , Christoph Zaczek
IPC分类号： G02B13/24 , G02B1/02 , G02B5/30 , G02B17/08 , G03F7/20 , H01L21/027 , G02B27/28
CPC分类号： G03F7/70966 , G02B1/02 , G02B1/08 , G02B5/3083 , G03F7/70225 , G03F7/70241 , G03F7/70566 , G03F7/70958 , Y10S359/90
摘要： An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.
摘要翻译：微光刻投影系统的目的在于至少有一个氟化物晶体透镜。如果晶体透镜的透镜轴基本上垂直于氟化物晶体的{100} - 平面或{100}等价晶面而取向，对图像质量有害的双折射效应将被降低。如果使用两个或多个氟化物晶体透镜，它们应该具有在晶体结构的（100） - ，（111） - 或（110）方向上定向的透镜轴，并且它们应当相对于每个其他。通过使用相互旋转（100） - 相互组合的组相互旋转（111） - 或（110） - 相组合来进一步减少双折射相关效应。通过对物镜的至少一个光学元件施加补偿涂层也可实现进一步的改进。

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