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51. 发明授权

US07349751B2 Method for autonomic control of a manufacturing system 有权
标题翻译：制造系统的自主控制方法
公开(公告)号：US07349751B2
公开(公告)日：2008-03-25
申请号：US11538821
申请日：2006-10-05
申请人： Brian T. Denton , Kenneth J. Fordyce
发明人： Brian T. Denton , Kenneth J. Fordyce
IPC分类号： G06F19/00
CPC分类号： G05B19/41865 , G05B2219/31411 , G05B2219/32247 , G05B2219/32267 , G05B2219/32271 , G05B2219/32293 , G05B2219/45028 , Y02P90/20
摘要： Disclosed is a method of controlling a manufacturing system. The invention automatically monitors current levels of partially completed products waiting to be processed by a tool (or group of tools) and determines whether the current levels exceed a predetermined limit. If the current levels do exceed the predetermined limit, the invention performs an optimization process. However, if the current levels do not exceed the predetermined limit, the invention performs a dispatching process. In this dispatching process, the invention automatically projects future levels of partially completed products that will be supplied to the tool to identify a future work-in-process (WIP) bubble. The WIP bubble occurs when larger than normal amounts of partially completed products are supplied to the tool. The invention automatically adjusts the operating parameters of the tool based upon both the current levels and the future levels.
摘要翻译：公开了一种控制制造系统的方法。本发明自动监视等待由工具（或一组工具）处理的部分完成的产品的当前水平，并确定当前水平是否超过预定极限。如果当前水平超过预定极限，本发明进行优化处理。然而，如果当前电平不超过预定限度，则本发明执行调度处理。在这个调度过程中，本发明会自动将未来的部分完成产品的水平提供给工具，以识别未来的在制品（WIP）泡沫。当大于正常量的部分完成的产品被提供给工具时，会出现WIP气泡。本发明基于当前水平和未来水平自动调整工具的操作参数。

52. 发明授权

US07327437B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：US07327437B2
公开(公告)日：2008-02-05
申请号：US11005480
申请日：2004-12-07
申请人： Henrikus Herman Marie Cox , Koen Jacobus Johannes Maria Zaal
发明人： Henrikus Herman Marie Cox , Koen Jacobus Johannes Maria Zaal
IPC分类号： G03B27/42 , G03B27/58
CPC分类号： G03F7/70725 , G05B2219/45028
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam, a patterning device support constructed to support a patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate support constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. An actuator assembly is configured to move one of the supports with six degrees of freedom comprising x, y, z, rx, ry and rz directions. A controller controls the actuator assembly, and includes at least one compensator which is designed to dynamically decouple a dynamics of the actuator assembly in the degrees of freedom.
摘要翻译：光刻设备包括被配置为调节辐射束的照明系统，构造成支撑图案形成装置的图案形成装置支撑件，其能够在其横截面中赋予辐射束图案以形成图案化的辐射束，构造的衬底支架以保持基板和配置成将图案化的辐射束投影到基板的目标部分上的投影系统。致动器组件被配置为使包括x，y，z，rx，ry和rz方向的六个自由度中的一个支撑件移动。控制器控制致动器组件，并且包括至少一个补偿器，其被设计成以自由度动态地解耦致动器组件的动力学。

53. 发明授权

US07151972B2 Method for autonomic control of a manufacturing system 有权
标题翻译：制造系统的自主控制方法
公开(公告)号：US07151972B2
公开(公告)日：2006-12-19
申请号：US10905456
申请日：2005-01-05
申请人： Brian T. Denton , Kenneth J. Fordyce , Robert J. Milne
发明人： Brian T. Denton , Kenneth J. Fordyce , Robert J. Milne
IPC分类号： G06F19/00
CPC分类号： G05B19/41865 , G05B2219/31411 , G05B2219/32247 , G05B2219/32267 , G05B2219/32271 , G05B2219/32293 , G05B2219/45028 , Y02P90/20
摘要： Disclosed is a method of controlling a manufacturing system. The invention automatically monitors current levels of partially completed products waiting to be processed by a tool (or group of tools) and determines whether the current levels exceed a predetermined limit. If the current levels do exceed the predetermined limit, the invention performs an optimization process. However, if the current levels do not exceed the predetermined limit, the invention performs a dispatching process. In this dispatching process, the invention automatically projects future levels of partially completed products that will be supplied to the tool to identify a future work-in-process (WIP) bubble. The WIP bubble occurs when larger than normal amounts of partially completed products are supplied to the tool. The invention automatically adjusts the operating parameters of the tool based upon both the current levels and the future levels.
摘要翻译：公开了一种控制制造系统的方法。本发明自动监视等待由工具（或一组工具）处理的部分完成的产品的当前水平，并确定当前水平是否超过预定极限。如果当前水平超过预定极限，本发明进行优化处理。然而，如果当前电平不超过预定限度，则本发明执行调度处理。在这个调度过程中，本发明会自动将未来的部分完成产品的水平提供给工具，以识别未来的在制品（WIP）泡沫。当大于正常量的部分完成的产品被提供给工具时，会出现WIP气泡。本发明基于当前水平和未来水平自动调整工具的操作参数。

54. 发明申请

US20060151873A1 Thermal interconnect systems methods of production and uses thereof 失效
标题翻译：热互连系统的生产方法及其用途
公开(公告)号：US20060151873A1
公开(公告)日：2006-07-13
申请号：US10538821
申请日：2004-06-04
申请人： Mark Fery , Nancy Dean
发明人： Mark Fery , Nancy Dean
IPC分类号： H01L23/34
CPC分类号： G05B19/41865 , G05B2219/31411 , G05B2219/32267 , G05B2219/32271 , G05B2219/45028 , H01L23/3735 , H01L23/42 , H01L2924/0002 , H01L2924/09701 , H01L2924/3011 , Y02P80/40 , Y02P90/20 , H01L2924/00
摘要： A thermal transfer material is described herein that includes: a heat spreader component, wherein the heat spreader component comprises a top surface, a bottom surface and at least one heat spreader material, and at least one solder material, wherein the solder material is directly deposited onto the bottom surface of the heat spreader component. Methods of forming layered thermal interface materials and thermal transfer materials include: a) providing a heat spreader component, wherein the heat spreader component comprises a top surface, a bottom surface and at least one heat spreader material; b) providing at least one solder material, wherein the solder material is directly deposited onto the bottom surface of the heat spreader component; and c) depositing the at least one solder material onto the bottom surface of the heat spreader component.
摘要翻译：本文描述的热转印材料包括：散热器部件，其中散热器部件包括顶表面，底表面和至少一个散热器材料以及至少一个焊料材料，其中焊料材料直接沉积到散热器部件的底面上。形成层状热界面材料和热转印材料的方法包括：a）提供散热器部件，其中散热器部件包括顶表面，底表面和至少一个散热器材料; b）提供至少一种焊料材料，其中焊料材料直接沉积到散热器部件的底表面上; 以及c）将所述至少一种焊料材料沉积到所述散热器部件的底表面上。

55. 发明授权

US07061587B2 Control system, lithographic apparatus, device manufacturing method, and device manufactured thereby 失效
标题翻译：控制系统，光刻设备，装置制造方法以及由此制造的装置
公开(公告)号：US07061587B2
公开(公告)日：2006-06-13
申请号：US10842639
申请日：2004-05-11
申请人： Johannes Adrianus Antonius Theodorus Dams
发明人： Johannes Adrianus Antonius Theodorus Dams
IPC分类号： G03B27/58 , G03B27/62 , G03B27/42
CPC分类号： G03F7/70725 , G05B19/19 , G05B2219/37317 , G05B2219/41426 , G05B2219/41432 , G05B2219/41436 , G05B2219/45028
摘要： A control system for a positioning device includes a controller connected in a feedback loop. The controller calculates a current for supply to the positioning device according to the error between a desired current value and a measured current value. This current is converted to a voltage by an amplifier and further modified by a feedforward voltage calculated using mechanical and electrical characteristics of the positioning device and a desired position and/or desired derivatives of position.
摘要翻译：用于定位装置的控制系统包括连接在反馈回路中的控制器。控制器根据期望电流值和测量电流值之间的误差计算供给定位装置的电流。该电流通过放大器转换成电压，并通过使用定位装置的机械和电特性以及期望位置和/或期望的位置导数计算的前馈电压进一步修正。

56. 发明申请

US20050156552A1 Driving apparatus, exposure apparatus, and device manufacturing method 有权
标题翻译：驱动装置，曝光装置和装置的制造方法
公开(公告)号：US20050156552A1
公开(公告)日：2005-07-21
申请号：US11031021
申请日：2005-01-10
申请人： Hiroyuki Sekiguchi
发明人： Hiroyuki Sekiguchi
IPC分类号： H01L21/027 , G03F7/20 , H01L21/02 , B25J9/10 , G05B19/33
CPC分类号： G05B19/414 , G03B27/02 , G03F7/70725 , G03F7/70758 , G03F7/70766 , G03F7/709 , G05B19/404 , G05B2219/41191 , G05B2219/45028 , G05B2219/49257
摘要： This invention provides a technique that can cancel a reaction force accompanying drive of an object while moderating a limit for a driving pattern to drive the object in X and Y directions. A driving apparatus includes a first actuator which drives the object in X and Y directions, a second actuator which drives a reaction force counter which receives a reaction force generated when the first actuator drives the object, and a controller which controls the second actuator on the basis of X- and Y-direction positions of the object to cancel, by the second actuator, the reaction force to be received by the reaction force counter when the object is driven by the first actuator.
摘要翻译：本发明提供一种技术，其可以缓和伴随着物体驱动的反作用力，同时缓和用于在X和Y方向上驱动物体的驱动图案的极限。驱动装置包括在X和Y方向上驱动物体的第一致动器，驱动反作用力计数器的第二致动器，其接收当第一致动器驱动物体时产生的反作用力;以及控制器，其控制第二致动器通过第二致动器，物体的X方向和Y方向位置的基础，当物体被第一致动器驱动时，由反力计数器接收的反作用力抵消。

57. 发明申请

US20050029689A1 Lithophane-like article and method of manufacture 审中-公开
标题翻译：类似海藻的物品和制造方法
公开(公告)号：US20050029689A1
公开(公告)日：2005-02-10
申请号：US10939691
申请日：2004-09-13
申请人： John Dufort
发明人： John Dufort
IPC分类号： A23G3/00 , A23G3/28 , A23G3/50 , B29C33/38 , B44C1/22 , B44C3/04 , B44F1/06 , G05B19/4099 , G05B19/42 , B29D11/00
CPC分类号： A23G3/50 , A23G3/28 , B29C33/38 , B29C33/3842 , B29C45/006 , B29C45/1671 , B29C45/372 , B29C2045/1673 , B29K2995/0029 , B44C1/225 , B44C1/228 , B44C1/24 , B44C3/04 , B44C3/085 , B44F1/06 , G05B19/4099 , G05B19/4205 , G05B2219/36324 , G05B2219/45028 , G05B2219/45163 , G05B2219/45204 , G05B2219/45212 , G05B2219/49006 , G05B2219/49007 , G05B2219/49235
摘要： An article and a method of forming an article, for example formed of plastics, confectionery product, soap, wax or liquid, by determining the intensity of different points of an original image, and forming the article with a thickness at each point of the article related to the intensity of the corresponding point of the original image. Preferable, the article is formed by forming a mould, and moulding the article.
摘要翻译：通过确定原始图像的不同点的强度以及在物品的每个点处形成具有厚度的物品，形成制品的制品和方法，例如由塑料，糖果产品，肥皂，蜡或液体形成的物品与原始图像的对应点的强度相关。优选地，通过形成模具和模制该制品来形成制品。

58. 发明授权

US11994845B2 Determining a correction to a process 有权
公开(公告)号：US11994845B2
公开(公告)日：2024-05-28
申请号：US17367901
申请日：2021-07-06
申请人： ASML NETHERLANDS B.V.
发明人： Sarathi Roy , Edo Maria Hulsebos , Roy Werkman , Junru Ruan
IPC分类号： G05B19/418 , G03F7/00 , G05B13/02 , G06N3/044
CPC分类号： G05B19/41875 , G03F7/70508 , G03F7/70525 , G05B13/027 , G05B19/41885 , G06N3/044 , G05B2219/33025 , G05B2219/45028 , G05B2219/45031
摘要： A method for configuring a semiconductor manufacturing process, the method including: obtaining a first value of a first parameter based on measurements associated with a first operation of a process step in the semiconductor manufacturing process and a first sampling scheme; using a recurrent neural network to determine a predicted value of the first parameter based on the first value; and using the predicted value of the first parameter in configuring a subsequent operation of the process step in the semiconductor manufacturing process.

59. 发明授权

US11994797B2 System and method for shaping a film with a scaled calibration measurement parameter 有权
公开(公告)号：US11994797B2
公开(公告)日：2024-05-28
申请号：US17082420
申请日：2020-10-28
申请人： CANON KABUSHIKI KAISHA
发明人： Nilabh K. Roy , Mario Johannes Meissl , Xiaoming Lu
IPC分类号： G03F7/00 , G05B19/4099
CPC分类号： G03F7/0002 , G05B19/4099 , G05B2219/45028
摘要： A system and method of shaping a film with a template on a substrate. Generating a first series of parameters from tests performed on a first series of films formed with: a set of shaping conditions; a calibration measurement parameter determined for each substrate prior to shaping; and a first scaling parameter. Generating a second series of parameters from the tests performed on a second series of films produced formed with the set of shaping conditions. The second series of films produced with the calibration measurement parameter determined for each substrate; and a second scaling parameter; or without the calibration measurement parameter. Generating a scaling parameter from: the first series of the parameters; and the second series of parameters. Generating the calibration measurement parameter prior to forming the film. Forming the film using the set of shaping conditions, the calibration measurement parameter, and the scaling parameter.

60. 发明公开

US20230418260A1 LITHOGRAPHY MODEL GENERATING METHOD BASED ON DEEP LEARNING, AND MASK MANUFACTURING METHOD INCLUDING THE LITHOGRAPHY MODEL GENERATING METHOD 审中-公开
公开(公告)号：US20230418260A1
公开(公告)日：2023-12-28
申请号：US18106091
申请日：2023-02-06
申请人： SAMSUNG ELECTRONICS CO., LTD.
发明人： Sangchul Yeo , Jaewon Yang , Hyeok Lee
IPC分类号： G05B19/4099 , G05B13/02
CPC分类号： G05B19/4099 , G05B2219/45028 , G05B13/0265
摘要： A reliable lithography model generating method reflecting a mask bias variation and a mask manufacturing method including the lithography model generating method are provided. The lithography model generating method includes preparing basic image data for learning, preparing transform image data that indicates a mask bias variation, generating a lithography model by performing deep learning by combining the basic image data and the transform image data, and verifying the lithography model.

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