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51. 发明授权

US5097805A Valve driving system for internal combustion engine 失效
标题翻译：内燃机用阀驱动系统
公开(公告)号：US5097805A
公开(公告)日：1992-03-24
申请号：US591341
申请日：1990-10-01
申请人： Tatsuya Uesugi , Noriyuki Iwata , Osamu Sado , Kazuhiko Hashimoto
发明人： Tatsuya Uesugi , Noriyuki Iwata , Osamu Sado , Kazuhiko Hashimoto
IPC分类号： F01L1/02 , F01L1/053 , F01L1/24 , F01L1/26 , F02B75/18 , F02B75/22
CPC分类号： F01L1/024 , F01L1/02 , F01L1/022 , F01L1/026 , F01L1/053 , F01L1/2405 , F01L1/265 , F01L2001/0537 , F01L2003/251 , F01L2105/00 , F02B2075/1824 , F02B2275/18 , F02B75/22 , Y10T74/19898
摘要： A valve driving device of an engine under the present invention is provided with a cam shaft for exclusive use of intake for driving intake valves and a cam shaft for exclusive use of exhaust for driving exhaust valves. At least either the intake valve or the exhaust valve is pluralized and a transmitting member is trained between the cam shaft with more valves to drive and an engine output shaft. Gears to mesh with each other are provided on said two cam shafts. Under the above composition, only one pulley on the driven side or only one sprocket is required and therefore compactness of the engine can be realized. Also, rotation of the cam shaft having more valves to drive and large torque fluctuation can be stabilized and reliability of gears can be improved, without reinforcing the gears.

52. 发明授权

US5058558A Air feeding system for a vehicle engine equipped with a supercharger 失效
标题翻译：装有超级货车的汽车发动机空气进料系统
公开(公告)号：US5058558A
公开(公告)日：1991-10-22
申请号：US416777
申请日：1989-10-04
申请人： Kazuhiko Ueda , Hiroyuki Oda , Kazuhiko Hashimoto , Kouichi Hatamura , Tsuyoshi Goto , Takashi Ohtsuru , Shigeo Tabata
发明人： Kazuhiko Ueda , Hiroyuki Oda , Kazuhiko Hashimoto , Kouichi Hatamura , Tsuyoshi Goto , Takashi Ohtsuru , Shigeo Tabata
IPC分类号： F02B67/06 , F02B75/22 , F02M35/10 , F02M35/116 , F02M35/16
CPC分类号： F02M35/10354 , F02B67/06 , F02M35/10098 , F02M35/10157 , F02M35/116 , F02M35/161 , F02B2275/06 , F02B29/0406 , F02B75/22 , F02M35/04 , Y02T10/144
摘要： An air feeding system for a vehicle engine equipped with a supercharger comprises an inlet passage provided in an engine room with its first section interconnecting an air cleaner and a throttle valve, its second section interconnecting the throttle valve and the supercharger, and its third section interconnecting the supercharger and an engine body of the vehicle engine for feeding a cylinder in the engine body with intake air introduced through the air cleaner into the first section. The air cleaner is disposed at a front portion of one side half of the engine room and the supercharge is disposed in the other side half of the engine room. A part of the inlet passage including the first and second series is arranged to extend backward from the air cleaner and then to extend further along a dash panel forming a rear end of the engine room from one side half to the other side half of the engine room so as to reach temperature.

53. 发明授权

US5031586A Multi-valve engine 失效
标题翻译：多阀引擎
公开(公告)号：US5031586A
公开(公告)日：1991-07-16
申请号：US588390
申请日：1990-09-26
申请人： Shunji Masuda , Noriyuki Iwata , Osamu Sado , Kazuhiko Hashimoto , Tatsuya Uesugi
发明人： Shunji Masuda , Noriyuki Iwata , Osamu Sado , Kazuhiko Hashimoto , Tatsuya Uesugi
IPC分类号： F01L1/24 , F01L1/26 , F01M11/02 , F02B1/04 , F02F1/24 , F02F1/42
CPC分类号： F01M11/02 , F01L1/2405 , F01L1/265 , F02F1/4221 , F01L2105/00 , F02B1/04 , F02B2275/18 , F02F2001/245
摘要： A multi-valve engine of the type having a line of cylinders, intake and exhaust camshafts, and rocker arms for operatively connecting valves to the camshafts includes a first valve group of three valves consisting of either intake valves or exhaust valves and a second valve group consisting of the other of either intake valves or exhaust valves. Each of the valves of the first valve group is oriented such that a valve stem thereof is inclined outwardly to one side of the line of cylinders, while each of the valve of the second valve group is oriented such that a valve stem thereof inclines outwardly to an opposite side of the line of cylinders. First hydraulic lash adjuster means for a centrally-located valve out of three valves of the first valve group is positioned closer to a bore center of the cylinder than the centrally-located valve, or on a delay side in the rotational direction of the camshaft. Second and third hydraulic lash adjuster means for side-located valves of the three valves of the first valve group are positioned farther from the bore center than the side-located valves, or on a leading side in the rotational direction of the camshaft.

54. 发明授权

US08883048B2 Reflector for light-emitting device, and light-emitting device 有权
标题翻译：发光装置用反射器及发光装置
公开(公告)号：US08883048B2
公开(公告)日：2014-11-11
申请号：US13395013
申请日：2010-09-07
申请人： Kazuhiko Hashimoto , Kazunori Terada , Masafumi Kuramoto , Motohisa Kitani
发明人： Kazuhiko Hashimoto , Kazunori Terada , Masafumi Kuramoto , Motohisa Kitani
IPC分类号： F21V9/00 , G02B5/02 , G02C7/10 , G02F1/361 , G03B11/00 , H01L33/60 , C08K5/3435 , F21V7/00 , C08G69/26 , C08K3/22 , H01L33/48
CPC分类号： C08G69/26 , C08K3/22 , C08K5/3435 , C08K2003/2237 , H01L33/486 , H01L33/60 , H01L2224/32245 , H01L2224/45144 , H01L2224/48091 , H01L2224/48247 , H01L2224/48465 , H01L2224/49107 , H01L2224/73265 , H01L2924/01322 , C08L77/06 , H01L2924/00 , H01L2924/00014
摘要： The present invention relates to a reflector for a light-emitting device consisting of (A) an polyamide composition comprising a polyamide polymerized from (a) a dicarboxylic acid comprising at least 50 mol % of an alicyclic dicarboxylic acid and (b) a diamine comprising at least 50 mol % of a diamine with a branched main chain.
摘要翻译：本发明涉及一种用于发光装置的反射器，其由（A）聚酰胺组合物组成，该聚酰胺组合物包含由（a）包含至少50摩尔％的脂环族二羧酸的二羧酸聚合的聚酰胺和（b）二胺，至少50mol％具有支链主链的二胺。

55. 发明授权

US08173350B2 Oxime compound and resist composition containing the same 失效
标题翻译：肟化合物和含有它的抗蚀剂组合物
公开(公告)号：US08173350B2
公开(公告)日：2012-05-08
申请号：US12506925
申请日：2009-07-21
申请人： Tatsuro Masuyama , Kazuhiko Hashimoto , Takashi Hiraoka , Ichiki Takemoto
发明人： Tatsuro Masuyama , Kazuhiko Hashimoto , Takashi Hiraoka , Ichiki Takemoto
IPC分类号： G03F7/004 , G03F7/039 , C07C303/28 , C07C309/65 , C08F12/20
CPC分类号： C07C309/00 , C07C2601/14 , C07C2603/18 , C07C2603/74 , C08F220/28 , G03F7/0045 , G03F7/0046 , G03F7/0395 , G03F7/0397 , G03F7/2041 , Y10S430/111 , Y10S430/12 , Y10S430/122 , Y10S430/126
摘要： An oxime compound represented by the formula (I): wherein Y represents an unsubstituted or substituted n-valent C6-C14 aromatic hydrocarbon group, n represents an integer of 1 to 6, R1 represents a C1-C30 aliphatic hydrocarbon group etc., R2 represents a linear or branched chain C1-C20 aliphatic hydrocarbon group etc., W represents —CO—O— etc., Q1 and Q2 each independently represent a fluorine atom etc., Z represents a C1-C20 halogenated aliphatic hydrocarbon group etc, and the resist composition containing the same.
摘要翻译：由式（I）表示的肟化合物：其中Y表示未取代或取代的n价C6-C14芳族烃基，n表示1〜6的整数，R1表示C1〜C30脂肪族烃基等，R2表示表示直链或支链C 1〜C 20脂族烃基等，W表示-CO-O-等，Q 1和Q 2各自独立地表示氟原子等，Z表示C 1〜C 20卤代脂族烃基等，含有该抗蚀剂组合物的抗蚀剂组合物。

56. 发明授权

US07998656B2 Chemically amplified positive resist composition 有权
标题翻译：化学放大正光刻胶组合物
公开(公告)号：US07998656B2
公开(公告)日：2011-08-16
申请号：US12536239
申请日：2009-08-05
申请人： Masahiko Shimada , Kazuhiko Hashimoto , Satoshi Yamaguchi , Soon Shin Kim , Yoshiyuki Takata , Takashi Hiraoka
发明人： Masahiko Shimada , Kazuhiko Hashimoto , Satoshi Yamaguchi , Soon Shin Kim , Yoshiyuki Takata , Takashi Hiraoka
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , Y10S430/108 , Y10S430/111
摘要： The present invention provides a chemically amplified positive composition comprising: a resin comprising a structural unit represented by the formula (I): wherein R1 represents a hydrogen atom, a halogen atom, a C1-C4 alkyl group or a C1-C4 perfluoroalkyl group, Z represents a single bond or —(CH2)k—CO—X4—, k represents an integer of 1 to 4, X1, X2, X3 and X4 each independently represents an oxygen atom or a sulfur atom, m represents an integer of 1 to 3 and n represents an integer of 0 to 3, and an acid generator.
摘要翻译：本发明提供一种化学放大阳性组合物，其包含：包含由式（I）表示的结构单元的树脂：其中R1表示氢原子，卤素原子，C1-C4烷基或C1-C4全氟烷基， Z表示单键或 - （CH 2）k -CO-X 4 - ，k表示1〜4的整数，X 1，X 2，X 3，X 4各自独立地表示氧原子或硫原子，m表示1的整数 3，n表示0〜3的整数，酸产生剂。

57. 发明申请

US20110183264A1 RESIST PROCESSING METHOD AND USE OF POSITIVE TYPE RESIST COMPOSITION 审中-公开
标题翻译：电阻加工方法和正极型电阻组合物的使用
公开(公告)号：US20110183264A1
公开(公告)日：2011-07-28
申请号：US13063670
申请日：2009-09-08
申请人： Kazuhiko Hashimoto , Mitsuhiro Hata , Satoshi Yamamoto
发明人： Kazuhiko Hashimoto , Mitsuhiro Hata , Satoshi Yamamoto
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： G03F7/0035 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/40
摘要： A resist processing method has the steps of: (1) forming a first resist film by applying a first resist composition comprising: a resin (A) including a structural unit represented by the formula (XX), and having an acid-labile group, being insoluble or poorly soluble in alkali aqueous solution, and being rendered soluble in alkali aqueous solution through the action of an acid, and a photo acid generator (B) onto a substrate and drying; (2) prebaking the first resist film; (3) exposing the first resist film; (4) post-exposure baking of the first resist film; (5) developing with a first alkali developer to obtain a first resist pattern; (6) hard-baking the first resist pattern, (7) obtaining a second resist film by applying a second resist composition onto the first resist pattern, and then drying; (8) pre-baking the second resist film; (9) exposing the second resist film; (10) post-exposure baking the second resist film; and (11) developing with a second alkali developer to obtain a second resist pattern. wherein, Ra1 represents a hydrogen atom, a halogen atom or a C1 to C3 saturated hydrocarbon group which may be substituted with a halogen atom; Ra2 represents a single bond or a divalent organic group; Ra3 represents a hydrogen atom, a C1 to C12 saturated hydrocarbon group which may be substituted with a hydroxy group etc., and Ra4 represent a C1 to C12 saturated hydrocarbon group.
摘要翻译：抗蚀剂处理方法具有以下步骤：（1）通过施加第一抗蚀剂组合物形成第一抗蚀剂膜，所述第一抗蚀剂组合物包含：包含由式（XX）表示的结构单元并具有酸不稳定基团的树脂（A）在碱性水溶液中不溶或难溶，并且通过酸的作用使碱溶液和光酸产生剂（B）溶解在基材上并干燥; （2）预烘第一抗蚀膜; （3）曝光第一抗蚀膜; （4）第一抗蚀剂膜的曝光后烘烤; （5）用第一碱性显影剂显影以获得第一抗蚀剂图案; （6）对第一抗蚀剂图案进行硬烘烤，（7）通过将第二抗蚀剂组合物施加到第一抗蚀剂图案上，然后干燥获得第二抗蚀剂膜; （8）预烘烤第二抗蚀剂膜; （9）使第二抗蚀剂膜曝光; （10）曝光后烘烤第二抗蚀膜; 和（11）用第二碱性显影剂显影以获得第二抗蚀剂图案。其中，Ra1表示氢原子，卤素原子或可被卤素原子取代的C1〜C3饱和烃基; Ra2表示单键或二价有机基团; Ra3表示氢原子，可被羟基取代的C1〜C12饱和烃基等，Ra4表示C1〜C12饱和烃基。

58. 发明授权

US07972763B2 Chemically amplified positive resist composition 有权
标题翻译：化学放大正光刻胶组合物
公开(公告)号：US07972763B2
公开(公告)日：2011-07-05
申请号：US11984098
申请日：2007-11-13
申请人： Masumi Suetsugu , Makoto Akita , Kazuhiko Hashimoto
发明人： Masumi Suetsugu , Makoto Akita , Kazuhiko Hashimoto
IPC分类号： G03F7/039
CPC分类号： G03F7/0045 , G03F7/0392 , Y10S430/106
摘要： The present invention provides a chemically amplified positive resist composition comprising (A) a resin obtainable by reacting a novolak resin, a poly(hydroxystyrene) and a compound having at least two vinyl ether structures, and (B) an acid generator.
摘要翻译：本发明提供了一种化学放大正型抗蚀剂组合物，其包含（A）可通过使酚醛清漆树脂，聚（羟基苯乙烯）和具有至少两个乙烯基醚结构的化合物反应获得的树脂和（B）酸产生剂。

59. 发明申请

US20110091818A1 PROCESS FOR PRODUCING PHOTORESIST PATTERN 审中-公开
标题翻译：生产光电子图案的工艺
公开(公告)号：US20110091818A1
公开(公告)日：2011-04-21
申请号：US12906522
申请日：2010-10-18
申请人： Mitsuhiro HATA , Kazuhiko Hashimoto
发明人： Mitsuhiro HATA , Kazuhiko Hashimoto
IPC分类号： G03F7/20
CPC分类号： G03F7/0035 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/40
摘要： The present invention provides a process for producing a photoresist pattern comprising the following steps (1) to (11): (1) a step of applying the first photoresist composition comprising a resin comprising a structural unit having an acid-labile group in its side chain and being itself insoluble or poorly soluble in an alkali aqueous solution but becoming soluble in an alkali aqueous solution by the action of an acid, and an acid generator, on a substrate followed by conducting drying, thereby forming the first photoresist film, (2) a step of prebaking the first photoresist film, (3) a step of exposing the prebaked first photoresist film to radiation, (4) a step of baking the exposed first photoresist film, (5) a step of developing the baked first photoresist film with the first alkaline developer, thereby forming the first photoresist pattern, (6) a step of forming a coating layer on the first photoresist pattern, (7) a step of applying the second photoresist composition on the coating layer followed by conducting drying, thereby forming the second photoresist film, (8) a step of prebaking the second photoresist film, (9) a step of exposing the prebaked second photoresist film to radiation, (10) a step of baking the exposed second photoresist film, and (11) a step of developing the baked second photoresist film with the second alkaline developer, thereby forming the second photoresist pattern.
摘要翻译：本发明提供了一种制备光致抗蚀剂图案的方法，包括以下步骤（1）至（11）：（1）将包含具有酸不稳定基团的结构单元的树脂在其侧面上施加的第一光致抗蚀剂组合物的步骤并且本身不溶于或难溶于碱性水溶液，但是通过酸和酸产生剂在碱性水溶液中溶解，然后进行干燥，从而形成第一光致抗蚀剂膜（2 ）预烘烤第一光致抗蚀剂膜的步骤，（3）将预焙蚀的第一光致抗蚀剂膜暴露于辐射的步骤，（4）烘烤曝光的第一光致抗蚀剂膜的步骤，（5）与第一碱性显影剂，由此形成第一光致抗蚀剂图案，（6）在第一光致抗蚀剂图案上形成涂层的步骤，（7）将第二光致抗蚀剂组合物涂布在涂层上然后进行干燥，从而形成第二光致抗蚀剂膜，（8）预烘烤第二光致抗蚀剂膜的步骤，（9）将预焙烧的第二光致抗蚀剂膜暴露于辐射的步骤，（10）第二光致抗蚀剂膜，和（11）用第二碱性显影剂显影所焙烧的第二光致抗蚀剂膜的步骤，从而形成第二光致抗蚀剂图案。

60. 发明申请

US20100233628A1 COMPOUND AND CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION 有权
标题翻译：化学和化学放大的积极抵抗组合物
公开(公告)号：US20100233628A1
公开(公告)日：2010-09-16
申请号：US12719505
申请日：2010-03-08
申请人： Makoto AKITA , Isao Yoshida , Kazuhiko Hashimoto
发明人： Makoto AKITA , Isao Yoshida , Kazuhiko Hashimoto
IPC分类号： G03F7/004 , C07C69/76 , C08F232/08
CPC分类号： C07C69/00 , C07C69/78 , C07C2603/24 , C08F12/24 , C08F212/14 , C08F220/30 , G03F7/0045 , G03F7/0397 , C08F220/18 , C08F2220/185 , C08F2220/303
摘要： A compound represented by the formula (I): wherein R1 represents a hydrogen atom etc., R2 and R3 each independently represent a hydrogen atom etc., R4 represents a C1-C8 divalent hydrocarbon group, R5 represents a single bond etc., and R6 represents an unsubstituted or substituted C6-C20 aromatic hydrocarbon group, a polymer comprising a structural unit derived from the compound represented by the formula (I) and a chemically amplified positive resist composition comprising the polymer, at least one acid generator and at least one solvent.
摘要翻译：由式（I）表示的化合物：其中R1表示氢原子等，R2和R3各自独立地表示氢原子等，R4表示C1-C8二价烃基，R5表示单键等，以及 R6表示未取代或取代的C6-C20芳族烃基，包含衍生自由式（I）表示的化合物的结构单元的聚合物和包含聚合物，至少一种酸产生剂和至少一种酸溶剂。

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