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1. 发明授权

US08808960B2 Compound and chemically amplified positive resist composition 有权
标题翻译：化合物和化学放大阳性抗蚀剂组合物
公开(公告)号：US08808960B2
公开(公告)日：2014-08-19
申请号：US12719505
申请日：2010-03-08
申请人： Makoto Akita , Isao Yoshida , Kazuhiko Hashimoto
发明人： Makoto Akita , Isao Yoshida , Kazuhiko Hashimoto
IPC分类号： G03F7/039 , C08F32/08 , C08F20/30
CPC分类号： C07C69/00 , C07C69/78 , C07C2603/24 , C08F12/24 , C08F212/14 , C08F220/30 , G03F7/0045 , G03F7/0397 , C08F220/18 , C08F2220/185 , C08F2220/303
摘要： A compound represented by the formula (I): wherein R1 represents a hydrogen atom etc., R2 and R3 each independently represent a hydrogen atom etc., R4 represents a C1-C8 divalent hydrocarbon group, R5 represents a single bond etc., and R6 represents an unsubstituted or substituted C6-C20 aromatic hydrocarbon group, a polymer comprising a structural unit derived from the compound represented by the formula (I) and a chemically amplified positive resist composition comprising the polymer, at least one acid generator and at least one solvent.
摘要翻译：由式（I）表示的化合物：其中R1表示氢原子等，R2和R3各自独立地表示氢原子等，R4表示C1-C8二价烃基，R5表示单键等，以及 R6表示未取代或取代的C6-C20芳族烃基，包含衍生自由式（I）表示的化合物的结构单元的聚合物和包含聚合物，至少一种酸产生剂和至少一种酸溶剂。

2. 发明授权

US07893293B2 Chemically amplified positive resist composition 有权
标题翻译：化学放大正光刻胶组合物
公开(公告)号：US07893293B2
公开(公告)日：2011-02-22
申请号：US12143268
申请日：2008-06-20
申请人： Makoto Akita , Isao Yoshida , Kazuhiko Hashimoto
发明人： Makoto Akita , Isao Yoshida , Kazuhiko Hashimoto
IPC分类号： C07C69/753 , C07C43/21 , C07C43/215 , C08F12/32 , G03F7/039
CPC分类号： G03F7/0397 , C07C69/00 , C07C2603/24 , C08F212/14 , C08F212/34 , C08F220/18 , G03F7/0045 , G03F7/0046 , Y10S430/106
摘要： A chemically amplified positive resist composition comprising (A) a resin which comprises (i) a polymerization unit represented by the formula (I): wherein R7 represents a hydrogen atom etc., R8 represents a C1-C4 alkyl group, p represents an integer of 1 to 3, and q represents an integer of 0 to 2, (ii) at least one polymerization unit selected from a group consisting of a polymerization unit represented by the formula (II): wherein R1 represents a hydrogen atom etc., R2 represents a C1-C8 alkyl group and ring X represents an alicyclic hydrocarbon group, and a polymerization unit represented by the formula (IV): wherein R3 represents a hydrogen atom etc., R4 and R5 independently represents a hydrogen atom etc., R10 represents a C1-C6 alkyl group etc., and (iii) a polymerization unit represented by the formula (III): wherein R3, R4 and R5 are the same as defined above, E represents a divalent hydrocarbon group, G represents a single bond etc., Z represents a carbonyl group etc. and L represents an anthryl group etc., and (B) at least one acid generator.
摘要翻译：一种化学放大正型抗蚀剂组合物，其包含（A）树脂，其包含（i）由式（I）表示的聚合单元：其中R7表示氢原子等，R8表示C1-C4烷基，p表示整数为1〜3，q为0〜2的整数，（ii）至少一种选自由式（II）表示的聚合单元的聚合单元：其中，R1表示氢原子等，R2 代表C1-C8烷基，X代表脂环族烃基，和由式（Ⅳ）表示的聚合单元：其中R3表示氢原子等，R4和R5独立地表示氢原子等，R10表示 C 1 -C 6烷基等，和（iii）由式（III）表示的聚合单元：其中R3，R4和R5与上述定义相同，E表示二价烃基，G表示单键等 Z表示羰基等，L r 表示蒽基等，和（B）至少一种酸发生剂。

3. 发明申请

US20100233628A1 COMPOUND AND CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION 有权
标题翻译：化学和化学放大的积极抵抗组合物
公开(公告)号：US20100233628A1
公开(公告)日：2010-09-16
申请号：US12719505
申请日：2010-03-08
申请人： Makoto AKITA , Isao Yoshida , Kazuhiko Hashimoto
发明人： Makoto AKITA , Isao Yoshida , Kazuhiko Hashimoto
IPC分类号： G03F7/004 , C07C69/76 , C08F232/08
CPC分类号： C07C69/00 , C07C69/78 , C07C2603/24 , C08F12/24 , C08F212/14 , C08F220/30 , G03F7/0045 , G03F7/0397 , C08F220/18 , C08F2220/185 , C08F2220/303
摘要： A compound represented by the formula (I): wherein R1 represents a hydrogen atom etc., R2 and R3 each independently represent a hydrogen atom etc., R4 represents a C1-C8 divalent hydrocarbon group, R5 represents a single bond etc., and R6 represents an unsubstituted or substituted C6-C20 aromatic hydrocarbon group, a polymer comprising a structural unit derived from the compound represented by the formula (I) and a chemically amplified positive resist composition comprising the polymer, at least one acid generator and at least one solvent.
摘要翻译：由式（I）表示的化合物：其中R1表示氢原子等，R2和R3各自独立地表示氢原子等，R4表示C1-C8二价烃基，R5表示单键等，以及 R6表示未取代或取代的C6-C20芳族烃基，包含衍生自由式（I）表示的化合物的结构单元的聚合物和包含聚合物，至少一种酸产生剂和至少一种酸溶剂。

4. 发明申请

US20090004600A1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION 有权
标题翻译：化学放大正电阻组合物
公开(公告)号：US20090004600A1
公开(公告)日：2009-01-01
申请号：US12143268
申请日：2008-06-20
申请人： Makoto Akita , Isao Yoshida , Kazuhiko Hashimoto
发明人： Makoto Akita , Isao Yoshida , Kazuhiko Hashimoto
IPC分类号： G03C1/053
CPC分类号： G03F7/0397 , C07C69/00 , C07C2603/24 , C08F212/14 , C08F212/34 , C08F220/18 , G03F7/0045 , G03F7/0046 , Y10S430/106
摘要： A chemically amplified positive resist composition comprising (A) a resin which comprises (i) a polymerization unit represented by the formula (I): wherein R7 represents a hydrogen atom etc., R8 represents a C1-C4 alkyl group, p represents an integer of 1 to 3, and q represents an integer of 0 to 2, (ii) at least one polymerization unit selected from a group consisting of a polymerization unit represented by the formula (II): wherein R1 represents a hydrogen atom etc., R2 represents a C1-C8 alkyl group and ring X represents an alicyclic hydrocarbon group, and a polymerization unit represented by the formula (IV): wherein R3 represents a hydrogen atom etc., R4 and R5 independently represents a hydrogen atom etc., R10 represents a C1-C6 alkyl group etc., and (iii) a polymerization unit represented by the formula (III): wherein R3, R4 and R5 are the same as defined above, E represents a divalent hydrocarbon group, G represents a single bond etc., Z represents a carbonyl group etc. and L represents an anthryl group etc., and (B) at least one acid generator.
摘要翻译：一种化学放大正型抗蚀剂组合物，其包含（A）树脂，其包含（i）由式（I）表示的聚合单元：其中R7表示氢原子等，R8表示C1-C4烷基，p表示整数为1〜3，q为0〜2的整数，（ii）至少一种选自由式（II）表示的聚合单元的聚合单元：其中，R1表示氢原子等，R2 代表C1-C8烷基，X代表脂环族烃基，和由式（Ⅳ）表示的聚合单元：其中R3表示氢原子等，R4和R5独立地表示氢原子等，R10表示 C 1 -C 6烷基等，和（iii）由式（III）表示的聚合单元：其中R3，R4和R5与上述定义相同，E表示二价烃基，G表示单键等 Z表示羰基等，L r 表示蒽基等，和（B）至少一种酸发生剂。

5. 发明申请

US20080153036A1 Chemically amplified positive resist compostion 有权
标题翻译：化学放大阳性抗蚀剂组合
公开(公告)号：US20080153036A1
公开(公告)日：2008-06-26
申请号：US11984098
申请日：2007-11-13
申请人： Masumi Suetsugu , Makoto Akita , Kazuhiko Hashimoto
发明人： Masumi Suetsugu , Makoto Akita , Kazuhiko Hashimoto
IPC分类号： G03F7/004
CPC分类号： G03F7/0045 , G03F7/0392 , Y10S430/106
摘要： The present invention provides a chemically amplified positive resist composition comprising (A) a resin obtainable by reacting a novolak resin, a poly(hydroxystyrene) and a compound having at least two vinyl ether structures, and (B) an acid generator.
摘要翻译：本发明提供了一种化学放大正型抗蚀剂组合物，其包含（A）可通过使酚醛清漆树脂，聚（羟基苯乙烯）和具有至少两个乙烯基醚结构的化合物反应获得的树脂和（B）酸产生剂。

6. 发明授权

US07972763B2 Chemically amplified positive resist composition 有权
标题翻译：化学放大正光刻胶组合物
公开(公告)号：US07972763B2
公开(公告)日：2011-07-05
申请号：US11984098
申请日：2007-11-13
申请人： Masumi Suetsugu , Makoto Akita , Kazuhiko Hashimoto
发明人： Masumi Suetsugu , Makoto Akita , Kazuhiko Hashimoto
IPC分类号： G03F7/039
CPC分类号： G03F7/0045 , G03F7/0392 , Y10S430/106
摘要： The present invention provides a chemically amplified positive resist composition comprising (A) a resin obtainable by reacting a novolak resin, a poly(hydroxystyrene) and a compound having at least two vinyl ether structures, and (B) an acid generator.
摘要翻译：本发明提供了一种化学放大正型抗蚀剂组合物，其包含（A）可通过使酚醛清漆树脂，聚（羟基苯乙烯）和具有至少两个乙烯基醚结构的化合物反应获得的树脂和（B）酸产生剂。

7. 发明授权

US07794913B2 Chemically amplified positive resist composition 有权
标题翻译：化学放大正光刻胶组合物
公开(公告)号：US07794913B2
公开(公告)日：2010-09-14
申请号：US12121458
申请日：2008-05-15
申请人： Makoto Akita , Masumi Suetsugu , Kazuhiko Hashimoto
发明人： Makoto Akita , Masumi Suetsugu , Kazuhiko Hashimoto
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , C08F8/12 , C08F8/14 , C08F12/22 , C08F212/14 , C08F212/32 , C08F220/18 , C08F2220/1891 , Y10S430/106 , Y10S430/111
摘要： A chemically amplified positive resist composition comprising (A) a resin which comprises (i) a polymerization unit represented by the formula (I): (ii) a polymerization unit represented by the formula (II): and (iii) at least one polymerization unit selected from the group consisting of a polymerization unit represented by the formula (III): and a polymerization unit represented by the formula (IV): and (B) at least one acid generator.
摘要翻译：一种化学放大正型抗蚀剂组合物，其包含（A）树脂，其包含（i）由式（I）表示的聚合单元：（ii）由式（II）表示的聚合单元：和（iii）至少一种聚合选自由式（III）表示的聚合单元组的单元和由式（IV）表示的聚合单元：和（B）至少一种酸产生剂。

8. 发明申请

US20080286691A1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION 有权
标题翻译：化学放大正电阻组合物
公开(公告)号：US20080286691A1
公开(公告)日：2008-11-20
申请号：US12121458
申请日：2008-05-15
申请人： Makoto AKITA , Masumi Suetsugu , Kazuhiko Hashimoto
发明人： Makoto AKITA , Masumi Suetsugu , Kazuhiko Hashimoto
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , C08F8/12 , C08F8/14 , C08F12/22 , C08F212/14 , C08F212/32 , C08F220/18 , C08F2220/1891 , Y10S430/106 , Y10S430/111
摘要： A chemically amplified positive resist composition comprising (A) a resin which comprises (i) a polymerization unit represented by the formula (I): (ii) a polymerization unit represented by the formula (II): and (iii) at least one polymerization unit selected from the group consisting of a polymerization unit represented by the formula (III): and a polymerization unit represented by the formula (IV): and (B) at least one acid generator.
摘要翻译：一种化学放大正型抗蚀剂组合物，其包含（A）树脂，其包含（i）由式（I）表示的聚合单元：（ii）由式（II）表示的聚合单元：和（iii）至少一种聚合选自由式（III）表示的聚合单元组的单元和由式（IV）表示的聚合单元：和（B）至少一种酸产生剂。

9. 发明申请

US20120228564A1 REFLECTOR FOR LIGHT-EMITTING DEVICE, AND LIGHT-EMITTING DEVICE 有权
标题翻译：用于发光装置的反射器和发光装置
公开(公告)号：US20120228564A1
公开(公告)日：2012-09-13
申请号：US13395013
申请日：2010-09-07
申请人： Kazuhiko Hashimoto , Kazunori Terada , Masafumi Kuramoto , Motohisa Kitani
发明人： Kazuhiko Hashimoto , Kazunori Terada , Masafumi Kuramoto , Motohisa Kitani
IPC分类号： C08G69/26 , G02B5/26
CPC分类号： C08G69/26 , C08K3/22 , C08K5/3435 , C08K2003/2237 , H01L33/486 , H01L33/60 , H01L2224/32245 , H01L2224/45144 , H01L2224/48091 , H01L2224/48247 , H01L2224/48465 , H01L2224/49107 , H01L2224/73265 , H01L2924/01322 , C08L77/06 , H01L2924/00 , H01L2924/00014
摘要： The present invention relates to a reflector for a light-emitting device consisting of (A) an polyamide composition comprising a polyamide polymerized from (a) a dicarboxylic acid comprising at least 50 mol % of an alicyclic dicarboxylic acid and (b) a diamine comprising at least 50 mol % of a diamine with a branched main chain.
摘要翻译：本发明涉及一种用于发光装置的反射器，其由（A）聚酰胺组合物组成，该聚酰胺组合物包含由（a）包含至少50摩尔％的脂环族二羧酸的二羧酸聚合的聚酰胺和（b）二胺，至少50mol％具有支链主链的二胺。

10. 发明授权

US08003296B2 Chemically amplified positive resist composition 有权
标题翻译：化学放大正光刻胶组合物
公开(公告)号：US08003296B2
公开(公告)日：2011-08-23
申请号：US12536386
申请日：2009-08-05
申请人： Masahiko Shimada , Kazuhiko Hashimoto , Junji Shigematsu , Takayuki Miyagawa , Satoshi Yamamoto
发明人： Masahiko Shimada , Kazuhiko Hashimoto , Junji Shigematsu , Takayuki Miyagawa , Satoshi Yamamoto
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/0395 , Y10S430/108 , Y10S430/111
摘要： The present invention provides a chemically amplified positive composition comprising: (A) a resin comprising a structural unit having an acid-labile group and being itself insoluble or poorly soluble in an alkali aqueous solution but becoming soluble in an alkali aqueous solution by the action of an acid, (B) a resin comprising a structural unit represented by the formula (I): wherein R1 represents a hydrogen atom, a halogen atom, a C1-C4 alkyl group or a C1-C4 perfluoroalkyl group, Z represents a single bond or —(CH2)k—CO—X4—, k represents an integer of 1 to 4, X1, X2, X3 and X4 each independently represents an oxygen atom or a sulfur atom, m represents an integer of 1 to 3 and n represents an integer of 0 to 3, and a structural unit having a fluorine atom in a side chain, and an acid generator.
摘要翻译：本发明提供了一种化学放大阳性组合物，其包含：（A）包含具有酸不稳定基团的结构单元的树脂，其本身不溶于或难溶于碱性水溶液，但通过作用于酸，（B）包含由式（I）表示的结构单元的树脂：其中R1表示氢原子，卤素原子，C1-C4烷基或C1-C4全氟烷基，Z表示单键或 - （CH 2）k -CO-X 4 - ，k表示1〜4的整数，X 1，X 2，X 3，X 4各自独立地表示氧原子或硫原子，m表示1〜3的整数，n表示 0〜3的整数，侧链具有氟原子的结构单元和酸发生剂。

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