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51. 发明授权

US08852857B2 Substrate treatment method 有权
标题翻译：底物处理方法
公开(公告)号：US08852857B2
公开(公告)日：2014-10-07
申请号：US13399041
申请日：2012-02-17
申请人： Shinji Kobayashi
发明人： Shinji Kobayashi
IPC分类号： G03F7/40 , H01L21/67 , H01L21/677
CPC分类号： H01L21/67748 , H01L21/67103
摘要： A substrate treatment method of performing treatment on a substrate on which a pattern mask has been formed by exposure and developing treatment to improve roughness of the pattern mask includes the processes of: mounting and heating the substrate on a stage in a treatment container; then supplying a solvent gas to a center portion of a front surface of the substrate while exhausting the solvent gas from a periphery of the substrate to swell the pattern mask; and while performing the process of supplying and exhausting a solvent gas, forming a temperature gradient in the substrate via the stage such that a temperature at the center portion of the substrate is higher than a temperature at a peripheral portion of the substrate.
摘要翻译：通过曝光和显影处理在其上形成图案掩模的基板上进行处理以改善图案掩模的粗糙度的基板处理方法包括以下处理：将基板安装并加热到处理容器中的台上; 然后在从衬底的周边排出溶剂气体以使图案掩模膨胀的同时将溶剂气体供应到衬底的前表面的中心部分; 并且在进行供给和排出溶剂气体的处理的同时，通过所述工作台在所述基板中形成温度梯度，使得所述基板的中央部的温度高于所述基板的周边部的温度。

52. 发明授权

US08842257B2 Substrate treatment method, substrate treatment apparatus, and non-transitory computer storage medium 有权
标题翻译：基板处理方法，基板处理装置和非暂时性计算机存储介质
公开(公告)号：US08842257B2
公开(公告)日：2014-09-23
申请号：US13401953
申请日：2012-02-22
申请人： Shinji Kobayashi , Fumiko Iwao
发明人： Shinji Kobayashi , Fumiko Iwao
IPC分类号： G03B27/14 , H01L21/677 , H01L21/67
CPC分类号： H01L21/67103 , H01L21/67748
摘要： A substrate treatment method of performing treatment on a substrate on which a pattern mask has been formed by exposure and developing treatment to improve roughness of the pattern mask includes the processes of: mounting the substrate on a stage in a treatment container; and repeating a plurality of times steps of supplying a solvent gas to a center portion of the substrate while exhausting the solvent gas from a periphery of the substrate to swell the pattern mask, and then supplying a drying gas for drying the solvent supplied to the substrate to the center portion of the substrate while exhausting the drying gas from the periphery of the substrate.
摘要翻译：通过曝光和显影处理对已经形成图案掩模的基板进行处理以提高图案掩模的粗糙度的基板处理方法包括以下处理：将基板安装在处理容器中的台上; 并重复多次，将溶剂气体供给到基板的中心部分，同时从基板周围排出溶剂气体，使图案掩模溶胀，然后供给用于干燥供给基板的溶剂的干燥气体到基板的中心部分，同时从基板的周边排出干燥气体。

53. 发明授权

US08813725B2 Evaporated fuel treatment device for vehicle 有权
标题翻译：车用蒸发燃料处理装置
公开(公告)号：US08813725B2
公开(公告)日：2014-08-26
申请号：US13397418
申请日：2012-02-15
申请人： Takeshi Shimura , Ikuo Hara , Tadaaki Nagata , Shinji Kobayashi , Takahiro Imamura
发明人： Takeshi Shimura , Ikuo Hara , Tadaaki Nagata , Shinji Kobayashi , Takahiro Imamura
IPC分类号： F02M33/02
CPC分类号： B60K15/03504 , B60K2015/03514 , B60K2015/0561 , Y10T137/6855
摘要： An evaporated fuel treatment device for a vehicle is provided to suppress the flowout of evaporated fuel into atmospheric air. In the evaporated fuel treatment device, a communication chamber is formed in a fuel supply cap, allowing communication between a charge passage and the inside of a fuel tank in a closed state. In the communication chamber, a positive pressure adjusting valve is openable to supply evaporated fuel in the fuel tank to an evaporated fuel storage unit through the communication chamber and the charge passage, and a negative pressure adjusting valve is openable to supply atmospheric air to the fuel tank from the evaporated fuel storage unit through the communication chamber and the charge passage. An interlocking member is provided between the key cover and the negative pressure adjusting valve, and opens the negative pressure adjusting valve in an interlocking manner with an operation of opening the key cover.
摘要翻译：提供一种用于车辆的蒸发燃料处理装置，以抑制蒸发的燃料流入大气中。在蒸发燃料处理装置中，连通室形成在燃料供给盖中，允许在关闭状态下在充电通道和燃料箱内部之间连通。在通信室中，正压调节阀可打开，以通过连通室和充气通道将燃料箱中的蒸发燃料供应到蒸发燃料存储单元，负压调节阀可打开以向燃料供应大气来自蒸发的燃料存储单元的罐通过通信室和充电通道。在键盖和负压调节阀之间设置有互锁构件，并且通过打开钥匙盖的操作以互锁的方式打开负压调节阀。

54. 发明授权

US08742365B2 Ultraviolet water treatment apparatus 有权
标题翻译：紫外线水处理设备
公开(公告)号：US08742365B2
公开(公告)日：2014-06-03
申请号：US13021185
申请日：2011-02-04
申请人： Norimitsu Abe , Shinji Kobayashi , Seiichi Murayama , Takeshi Ide , Akihiko Shirota , Takahiro Soma
发明人： Norimitsu Abe , Shinji Kobayashi , Seiichi Murayama , Takeshi Ide , Akihiko Shirota , Takahiro Soma
IPC分类号： H01J37/00
CPC分类号： C02F1/325 , C02F2201/004 , C02F2201/3225 , C02F2201/3227 , C02F2201/324 , C02F2303/04
摘要： According to one embodiment, an ultraviolet water treatment apparatus includes an ultraviolet lamp unit provided with a first plumbing flange coupling on each of both ends thereof, and further provided therein with an ultraviolet irradiation tube including an ultraviolet lamp and a lamp protective tube configured to protect the ultraviolet lamp, and a cleaning device drive unit provided with a second plumbing flange coupling on each of both ends thereof and configured to drive a cleaning device configured to clean a surface of the lamp protective tube. The ultraviolet lamp unit and the cleaning device drive unit are coupled with each other on the first and second plumbing flange couplings.
摘要翻译：根据一个实施方案，一种紫外线水处理装置包括：紫外线灯单元，其在其两端各设有第一管道法兰接头，并且还设置有包括紫外线灯和保护管的紫外线照射管，紫外线灯和清洁装置驱动单元，其在其两端的每一端设置有第二管道法兰联接器，并且构造成驱动构造成清洁灯保护管的表面的清洁装置。紫外灯单元和清洁装置驱动单元在第一和第二管道法兰联接器上彼此联接。

55. 发明授权

US08629230B2 Method for manufacturing carboxyl group-containing water-soluble polymer 有权
标题翻译：制备含羧基的水溶性聚合物的方法
公开(公告)号：US08629230B2
公开(公告)日：2014-01-14
申请号：US13383339
申请日：2010-07-27
申请人： Yuichiro Morimitsu , Masayuki Toda , Taro Ashida , Masatoyo Yoshinaka , Shinji Kobayashi
发明人： Yuichiro Morimitsu , Masayuki Toda , Taro Ashida , Masatoyo Yoshinaka , Shinji Kobayashi
IPC分类号： C08F220/06 , C08F220/10 , C08F216/12 , C08F2/06
CPC分类号： C08F20/06 , C08F2/06 , C08F20/62 , C08F220/06 , C08F222/1006 , C08F2220/1883 , C08F2220/1891
摘要： In manufacturing of a carboxyl group-containing water-soluble polymer by a precipitation polymerization method, a method which can improve production efficiency with increasing practicality continuously adds a monomer solution wherein a monomer component containing an α,β-unsaturated carboxylic acid is dissolved in an inert solvent in a concentration of 20 to 50% by volume to an inert solvent charged in a reaction vessel. In this case, the amount of the inert solvent charged in the reaction vessel is set so that the concentration of the monomer component in the total amount summed up with the monomer solution is 10 to 24% by volume, and the time period until completion of continuous addition of the total amount of the monomer solution is set so that the conversion of the monomer component at the time of completion of addition of the total amount of the monomer solution is 60% or more. The monomer component may contain a polymerizable compound having two or more ethylenically unsaturated groups.
摘要翻译：在通过沉淀聚合法制造含羧基的水溶性聚合物时，可以连续提高生产效率的方法连续添加单体溶液，其中含有α，β-不饱和羧酸的单体组分溶于惰性溶剂的浓度为20体积％至50体积％的反应容器中的惰性溶剂。在这种情况下，将装入反应容器中的惰性溶剂的量设定为使单体成分总量与单体溶液相加的浓度为10〜24体积％，直到完成时间为止设定单体溶液的总量的连续添加，使得在完成添加总量的单体溶液时的单体组分的转化率为60％以上。单体成分可以含有具有两个以上烯键式不饱和基团的聚合性化合物。

56. 发明授权

US08568288B2 Slide device, mechanical seal, rotary device, pump and auxiliary artificial heart system 有权
标题翻译：滑动装置，机械密封，旋转装置，泵和辅助人造心脏系统
公开(公告)号：US08568288B2
公开(公告)日：2013-10-29
申请号：US13449453
申请日：2012-04-18
申请人： Keiichiro Kaneshima , Takayuki Miyakoshi , Tomoya Kitano , Hideki Kanebako , Shinji Kobayashi , Koshi Adachi , Koki Kanda , Daisuke Suzuki
发明人： Keiichiro Kaneshima , Takayuki Miyakoshi , Tomoya Kitano , Hideki Kanebako , Shinji Kobayashi , Koshi Adachi , Koki Kanda , Daisuke Suzuki
IPC分类号： A61N1/362
CPC分类号： F04D29/046 , A61M1/101 , A61M1/1013 , A61M1/102 , A61M1/122 , F04D29/026 , F05D2300/211 , F16C33/043 , F16C2206/42 , F16C2316/18
摘要： Provided is a slide device which can reduce a frictional force more than a conventional slide device when used in an aqueous liquid containing a blood component. In a slide device which includes: a fixed-side slide member having a slide surface; and a rotary-side slide member having a slide surface, the slide device being used in an aqueous liquid containing a blood component in a state where the slide surface of the fixed-side slide member and the slide surface of the rotary-side slide member face each other in an opposed manner, at least one of the fixed-side slide member and the rotary-side slide member is formed of a member which is made of a material which contains silicon and has hydrate of silicon oxide on the slide surface thereof.
摘要翻译：提供一种滑动装置，当在含有血液成分的含水液体中使用时，能够比常规的滑动装置更多地减小摩擦力。一种滑动装置，包括：具有滑动面的固定侧滑动构件; 以及具有滑动面的旋转侧滑动部件，所述滑动装置用于在所述固定侧滑动部件的滑动面和所述旋转侧滑动部件的滑动面的状态下含有血液成分的水性液体以相对的方式彼此面对，固定侧滑动构件和旋转侧滑动构件中的至少一个由在其滑动表面上由含有硅并具有氧化硅水合物的材料制成的构件形成。

57. 发明申请

US20130068964A1 ULTRAVIOLET IRRADIATION DEVICE 审中-公开
标题翻译：超紫外线辐射装置
公开(公告)号：US20130068964A1
公开(公告)日：2013-03-21
申请号：US13561927
申请日：2012-07-30
申请人： Shinji Kobayashi , Norimitsu Abe , Akihiko Shirota , Kenji Takeuchi , Takahiro Soma
发明人： Shinji Kobayashi , Norimitsu Abe , Akihiko Shirota , Kenji Takeuchi , Takahiro Soma
IPC分类号： C02F1/32
CPC分类号： C02F1/325 , C02F1/283 , C02F1/52 , C02F1/76 , C02F2201/3227 , C02F2201/324 , C02F2201/328 , C02F2303/04
摘要： An ultraviolet irradiation device includes a treatment vessel, an ultraviolet irradiation member, and a support member. The treatment vessel has a water inlet and a water outlet and through which water to be treated as a treatment target flows in a first direction from the water inlet toward the water outlet, the treatment vessel receiving the water to be treated through the water inlet and discharging the water to be treated through the water outlet. The ultraviolet irradiation member is provided inside the treatment vessel along a second direction crossing the first direction and which irradiates the water to be treated flowing through the treatment vessel with an ultraviolet ray. The support member is provided inside the treatment vessel along the second direction with both end portions of the support member being firmly fixed to wall surfaces of the treatment vessel.
摘要翻译：紫外线照射装置包括处理容器，紫外线照射部件和支撑部件。处理容器具有进水口和出水口，待处理水作为处理对象的第一方向从入口向出水口流动，处理容器通过进水口接收待处理的水，通过出水口排放待处理的水。紫外线照射部件沿着与第一方向交叉的第二方向设置在处理容器内部，并且通过紫外线照射流过处理容器的被处理水。支撑构件沿着第二方向设置在处理容器内部，支撑构件的两个端部牢固地固定在处理容器的壁表面上。

58. 发明授权

US08304517B2 Method for producing granulated carboxyl group-containing polymer particle and granulated carboxyl group-containing polymer particle 有权
标题翻译：含有颗粒状含羧基的聚合物粒子和含有粒状的含羧基的聚合物粒子的制造方法
公开(公告)号：US08304517B2
公开(公告)日：2012-11-06
申请号：US12663650
申请日：2008-06-09
申请人： Yuichiro Morimitsu , Masatoyo Yoshinaka , Shinji Kobayashi
发明人： Yuichiro Morimitsu , Masatoyo Yoshinaka , Shinji Kobayashi
IPC分类号： C08F6/00 , C08G64/00
CPC分类号： C08J3/12 , C08J2300/105 , Y10T428/2982
摘要： An object of the present invention is to provide a method for easily producing granular carboxyl group-containing polymer particles that have a high bulk density and readily swell in water. The present invention provides a method for producing granular carboxyl group-containing polymer particles, which includes: producing carboxyl group-containing polymer particles; preparing an aggregate of the carboxyl group-containing polymer particles by allowing the carboxyl group-containing polymer particles to absorb an polar organic solvent to a liquid content of 5 to 25% by mass; and drying the aggregate of the carboxyl group-containing polymer particles and then grinding the dried aggregate.
摘要翻译：本发明的目的是提供一种容易制造具有高堆积密度并容易在水中溶胀的颗粒状含羧基聚合物颗粒的方法。本发明提供一种含有颗粒状含羧基的聚合物粒子的制造方法，其包括：制造含有羧基的聚合物粒子; 通过使含羧基的聚合物颗粒吸收极性有机溶剂至液体含量为5至25质量％，从而制备含羧基聚合物颗粒的聚集体; 并干燥含羧基聚合物颗粒的聚集体，然后研磨干燥的聚集体。

59. 发明申请

US20110091821A1 RESIST TREATMENT UNIT, RESIST COATING AND DEVELOPING APPARATUS, AND RESIST TREATMENT METHOD 审中-公开
标题翻译：电阻治疗单元，电阻涂层和发展装置和电阻治疗方法
公开(公告)号：US20110091821A1
公开(公告)日：2011-04-21
申请号：US13000234
申请日：2009-06-10
申请人： Shinji Kobayashi
发明人： Shinji Kobayashi
IPC分类号： G03F7/26 , B05C9/12 , G03B27/52
CPC分类号： G03F7/26 , G03F7/168
摘要： A resist treatment unit for performing treatment on a resist film which has been formed on a substrate is disclosed. This resist treatment unit includes: a treatment container capable of maintaining a vacuum therein; a mounting table provided in the treatment container for mounting the substrate on which the resist film has been formed thereon; a gas supply part for jetting a mixture gas containing a first gas and a second gas which are chemically inert toward the mounting table at a predetermined flow rate; and an exhaust part capable of exhausting the treatment container to a degree of vacuum at which the mixture gas jetted from the gas supply part at the predetermined flow rate is able to be a molecular beam in the treatment container.
摘要翻译：公开了一种用于对形成在基板上的抗蚀剂膜进行处理的抗蚀剂处理单元。该抗蚀剂处理单元包括：能够保持真空的处理容器; 设置在处理容器中的安装台，用于安装其上形成有抗蚀剂膜的基板; 气体供给部，用于以预定的流量向装载台喷射含有第一气体和第二气体的化学惰性的混合气体; 以及能够将处理容器排出到以规定流量从气体供给部喷射的混合气体能够成为处理容器内的分子束的真空度的排气部。

60. 发明授权

US07879251B2 Thin film removing device and thin film removing method 有权
标题翻译：薄膜去除装置和薄膜去除方法
公开(公告)号：US07879251B2
公开(公告)日：2011-02-01
申请号：US11925467
申请日：2007-10-26
申请人： Shinji Kobayashi , Norihisa Koga
发明人： Shinji Kobayashi , Norihisa Koga
IPC分类号： H01L21/302
CPC分类号： H01L21/6708 , Y10S134/902 , Y10T156/1111 , Y10T156/1928 , Y10T156/1989
摘要： A thin film removing device and a thin film removing method are capable of removing straight parts of a thin film formed on a square substrate from corners of the substrate, and of suppressing the formation of mists. An approach stage 20 having flat stage plates 23 capable of being disposed substantially flush with the surface of a substrate M mounted on a support table 22 is positioned close to the substrate M mounted on the support table 22. Removing nozzles 30 jet a solvent toward edge parts of the substrate M and suck a solution produced by dissolving part of the resist in the solvent while the removing nozzles 30 are moved along side edges of the substrate M and the approach stage 20 disposed close to the substrate M. Thus, the removing nozzles 30 jet the solvent uniformly over the edge parts and corners of the substrate M and suck the solution without changing modes of jetting the solvent and sucking the solution. Consequently, straight parts of a thin film formed on the square substrate M can be removed from the corners of the substrate M, and the formation of mists can be suppressed.
摘要翻译：薄膜去除装置和薄膜去除方法能够从基板的角部去除在正方形基板上形成的薄膜的直线部分，并且抑制雾的形成。具有能够与安装在支撑台22上的基板M的表面基本齐平的平台台23的接近台20靠近安装在支撑台22上的基板M定位。去除喷嘴30向边缘喷射溶剂将基板M的一部分吸附并且将去除喷嘴30沿着基板M和接近台20的侧边缘移动而将抗蚀剂的一部分溶解在溶剂中而产生的溶液。因此，除去喷嘴 30将溶剂均匀地喷射在基板M的边缘部分和拐角上，并吸取溶液，而不改变喷射溶剂并吸取溶液的模式。因此，可以从基板M的角部去除在正方形基板M上形成的薄膜的直线部分，并且可以抑制雾的形成。

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