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51. 发明申请

US20070275324A1 Low activation energy photoresist composition and process for its use 失效
标题翻译：低活化能光刻胶组合物及其使用方法
公开(公告)号：US20070275324A1
公开(公告)日：2007-11-29
申请号：US11441965
申请日：2006-05-26
申请人： Robert David Allen , Richard Anthony DiPietro , Ratnam Sooriyakumaran , Hoa D. Truong
发明人： Robert David Allen , Richard Anthony DiPietro , Ratnam Sooriyakumaran , Hoa D. Truong
IPC分类号： G03C1/00
CPC分类号： G03F7/0397 , C08F220/18 , C08F220/24 , C08F220/28 , C08F220/60 , G03F7/0046 , G03F7/2041 , Y10S430/108 , Y10S430/111
摘要： The present invention relates to a radiation sensitive photoresist composition. The composition comprises a polymer comprising at least two monomers. The first monomer has an acid cleavable tertiary ester group. The second monomer is an acidic monomer. The acid cleavable ester group of the polymer has a surprisingly low activation energy which results in improved resist images in lithographic processes.
摘要翻译：本发明涉及一种辐射敏感光刻胶组合物。组合物包含包含至少两种单体的聚合物。第一单体具有酸可裂解的叔酯基。第二单体是酸性单体。聚合物的酸可裂解酯基具有惊人的低活化能，这导致光刻工艺中抗蚀剂图像的改善。

52. 发明授权

US07193023B2 Low activation energy photoresists 有权
标题翻译：低活化能光刻胶
公开(公告)号：US07193023B2
公开(公告)日：2007-03-20
申请号：US10729169
申请日：2003-12-04
申请人： Robert David Allen , Gregory Breyta , Phillip Joe Brock , Richard Anthony DiPietro , Ratnam Sooriyakumaran , Hoa D. Truong , Gregory Michael Wallraff
发明人： Robert David Allen , Gregory Breyta , Phillip Joe Brock , Richard Anthony DiPietro , Ratnam Sooriyakumaran , Hoa D. Truong , Gregory Michael Wallraff
IPC分类号： C08F112/68
CPC分类号： G03F7/0046 , G03F7/0397
摘要： Polymers containing an acetal or ketal linkage and their use in lithographic photoresist compositions, particularly in chemical amplification photoresists, are provided. The polymer is prepared from at least one first olefinic monomer containing an acetal or ketal linkage, the acid-catalyzed cleavage of which renders the polymer soluble in aqueous base; and at least one second olefinic monomer selected from (i) an olefinic monomer containing a pendant fluorinated hydroxyalkyl group RH, (ii) an olefinic monomer containing a pendant fluorinated alkylsulfonamide group RS, and (iii) combinations thereof. The acetal or ketal linkage may be contained within an acid-cleavable substituent RCL in the first olefinic monomer. A method for using the photoresist compositions containing these polymers in preparing a patterned substrate is also provided in which the polymer is rendered soluble in aqueous base at a temperature of less than about 100° C. by acid-catalyzed deprotection of pendent acetal- or ketal-protected carboxylic acid groups.
摘要翻译：提供了含有缩醛或缩酮键的聚合物及其在平版光刻胶组合物中的用途，特别是在化学放大光致抗蚀剂中。聚合物由至少一种含有缩醛或缩酮键的第一烯属单体制备，其酸催化裂解使聚合物可溶于碱水溶液; 和至少一种第二烯烃单体，其选自（i）含有侧氟化羟烷基R H的烯烃单体，（ii）含有侧氟化烷基磺酰胺基R S的烯属单体， SUP），和（iii）其组合。缩醛或缩酮键可以包含在第一烯烃单体中的酸可裂解取代基R CL中。还提供了一种使用含有这些聚合物的光致抗蚀剂组合物来制备图案化基材的方法，其中聚合物在低于约100℃的温度下可溶于碱水溶液，通过酸催化的侧链缩醛或缩酮脱保护保护的羧酸基团。

53. 发明授权

US06794459B2 Modified polycyclic polymers 有权
标题翻译：改性多环聚合物
公开(公告)号：US06794459B2
公开(公告)日：2004-09-21
申请号：US10224994
申请日：2002-08-21
申请人： Saikumar Jayaraman , George Martin Benedikt , Larry Funderburk Rhodes , Richard Vicari , Robert David Allen , Richard Anthony DiPietro , Ratnam Sooriyakumaran , Thomas Wallow
发明人： Saikumar Jayaraman , George Martin Benedikt , Larry Funderburk Rhodes , Richard Vicari , Robert David Allen , Richard Anthony DiPietro , Ratnam Sooriyakumaran , Thomas Wallow
IPC分类号： C08F3200
CPC分类号： G03F7/039 , C08G61/02 , C08G61/08 , G03F7/0045 , G03F7/0395 , G03F7/0397
摘要： The present invention relates to cyclic polymers and their use in photolithographic applications. The cyclic polymers contain a pendant acid labile functional group and a functional group containing a protected hydroxyl moiety. The polymers are post modified by deprotecting the pendant hydroxyl moiety and reacting the deprotected hydroxyl containing moiety with a coreactant. The post-functionalized polymers find application in chemically amplified photoresist compositions.
摘要翻译：本发明涉及环状聚合物及其在光刻应用中的应用。环状聚合物含有侧链酸不稳定官能团和含有被保护的羟基部分的官能团。通过使侧基羟基部分脱保护并使去保护的含羟基的部分与共反应物反应来对聚合物进行后修饰。后官能化聚合物可用于化学扩增的光致抗蚀剂组合物中。

54. 发明授权

US06723486B2 Photoresist compositions comprising polycyclic polymers with acid labile pendant groups 有权
标题翻译：包含具有酸不稳定侧基的多环聚合物的光致抗蚀剂组合物
公开(公告)号：US06723486B2
公开(公告)日：2004-04-20
申请号：US09850915
申请日：2001-05-08
申请人： Brian L. Goodall , Saikumar Jayaraman , Robert A. Shick , Larry F. Rhodes , Robert David Allen , Richard Anthony DiPietro , Thomas Wallow
发明人： Brian L. Goodall , Saikumar Jayaraman , Robert A. Shick , Larry F. Rhodes , Robert David Allen , Richard Anthony DiPietro , Thomas Wallow
IPC分类号： G03F7004
CPC分类号： G03F7/0045 , C08G61/08 , G03F7/038 , G03F7/039 , Y10S430/109 , Y10S430/111 , Y10S430/115
摘要： The present invention relates to a radiation sensitive photoresist composition comprising a photoacid initiator and a polycyclic polymer comprising repeating units that contain pendant acid labile groups. Upon exposure to an imaging radiation source the photoacid initiator generates an acid which cleaves the pendant acid labile groups effecting a polarity change in the polymer. The polymer is rendered soluble in an aqueous base in the areas exposed to the imaging source.
摘要翻译：本发明涉及包含光酸引发剂和包含含有酸不稳定基团的重复单元的多环聚合物的辐射敏感性光致抗蚀剂组合物。在暴露于成像辐射源时，光酸引发剂产生酸，该酸切割引起聚合物极性变化的侧链酸不稳定基团。聚合物在暴露于成像源的区域中变得可溶于碱性水溶液。

55. 发明授权

US06653048B2 High silicon content monomers and polymers suitable for 193 nm bilayer resists 有权
公开(公告)号：US06653048B2
公开(公告)日：2003-11-25
申请号：US10138498
申请日：2002-05-06
申请人： Phillip Joe Brock , Richard Anthony DiPietro , Donald Clifford Hofer , Ratnam Sooriyakumaran , Gregory Michael Wallraff
发明人： Phillip Joe Brock , Richard Anthony DiPietro , Donald Clifford Hofer , Ratnam Sooriyakumaran , Gregory Michael Wallraff
IPC分类号： G03F7004
CPC分类号： G03F7/094 , G03F7/0045 , G03F7/0382 , G03F7/0395 , G03F7/0758 , G11B5/3163
摘要： Polymerizable monomers having silicon containing groups that are transparent at 193 nm; and ethylenically unsaturated group are provided. Polymers from these monomers can be used in processes for forming sub-100 nm images with a chemically amplified, radiation sensitive bilayer resist. The bilayer resist is disposed on a substrate and comprises (i) a top imaging layer comprising a radiation sensitive acid generator and (ii) an organic underlayer. The bilayer resist can be used in the manufacturing of integrated circuits.

56. 发明授权

US6139778A Vibrational methods of deaggregation of electrically conductive polymers and precursors thereof 有权
标题翻译：导电聚合物及其前体解聚的振动方法
公开(公告)号：US6139778A
公开(公告)日：2000-10-31
申请号：US521481
申请日：2000-03-09
申请人： Marie Angelopoulos , Richard Anthony DiPietro , Jane Margaret Shaw
发明人： Marie Angelopoulos , Richard Anthony DiPietro , Jane Margaret Shaw
IPC分类号： C08G61/12 , C08G73/02 , H01B1/12
CPC分类号： C08G61/12 , C08G61/122 , C08G73/0266 , H01B1/128
摘要： The present invention is directed to vibrational methods of fabricating electrically conducting polymers and precursors thereof in which the polymer chains are deaggregated. Such deaggregated conducting polymers and precursors thereof exhibit better solution processability and higher electrical conductivity than do the corresponding aggregated polymers. The polymers in the non-doped precursor form or in the conducting form in solution or during the polymerization process are exposed to ultrasound and shear mixing. Due to this treatment, the chains become deaggregated. Furthermore, ultrasound and shear mixing is used during the doping of the precursor polymers. This treatment allows more uniform doping, enhanced solubility, and higher electrical conductivity. The solutions treated with ultrasound/shear mixing are subsequently processed into a structural part, a film, or a fiber.
摘要翻译：本发明涉及制造其中聚合物链解聚的导电聚合物及其前体的振动方法。这种解聚集的导电聚合物及其前体与相应的聚合聚合物相比表现出更好的溶液加工性能和更高的电导率。在溶液中或在聚合过程中，非掺杂前体形式或导电形式的聚合物暴露于超声和剪切混合。由于这种处理，链变得解聚。此外，在掺杂前体聚合物期间使用超声和剪切混合。该处理允许更均匀的掺杂，增强的溶解度和更高的导电性。用超声/剪切混合处理的溶液随后加工成结构部分，薄膜或纤维。

57. 发明授权

US08716535B2 Precursors to fluoroalkanol-containing olefin monomers, and associated methods of synthesis and use 失效
公开(公告)号：US08716535B2
公开(公告)日：2014-05-06
申请号：US12253083
申请日：2008-10-16
申请人： Gregory Breyta , Richard Anthony DiPietro , Daniel Joseph Dawson
发明人： Gregory Breyta , Richard Anthony DiPietro , Daniel Joseph Dawson
IPC分类号： C07C35/22 , C07C35/18 , C07C35/06 , C07C35/08
CPC分类号： C07C33/44 , C07C33/423 , C07C69/653 , C07C69/753 , C07C2601/10 , C07C2601/16 , C07C2602/42
摘要： The invention provides alkene fluoroalkanol and fluorinated polyol precursors to fluoroalkanol-substituted α,β-unsaturated esters. The fluoroalkanol-substituted α,β-unsaturated esters are olefins that can be readily polymerized to provide fluoroalkanol-substituted polymers useful in lithographic photoresist compositions. Also provided are methods for synthesizing the alkene fluoroalkanol and fluorinated polyol precursors.

58. 发明授权

US07495135B2 Precursors to fluoroalkanol-containing olefin monomers, and associated methods of synthesis and use 失效
标题翻译：含氟链烷醇的烯烃单体的前体，以及相关的合成和使用方法
公开(公告)号：US07495135B2
公开(公告)日：2009-02-24
申请号：US10729511
申请日：2003-12-04
申请人： Gregory Breyta , Richard Anthony DiPietro , Daniel Joseph Dawson
发明人： Gregory Breyta , Richard Anthony DiPietro , Daniel Joseph Dawson
IPC分类号： C07C35/22 , C07C35/18 , C07C35/06 , C07C35/08
CPC分类号： C07C33/44 , C07C33/423 , C07C69/653 , C07C69/753 , C07C2601/10 , C07C2601/16 , C07C2602/42
摘要： The invention provides alkene fluoroalkanol and fluorinated polyol precursors to fluoroalkanol-substituted α,β-unsaturated esters. The fluoroalkanol-substituted α,β-unsaturated esters are olefins that can be readily polymerized to provide fluoroalkanol-substituted polymers useful in lithographic photoresist compositions. Also provided are methods for synthesizing the alkene fluoroalkanol and fluorinated polyol precursors.
摘要翻译：本发明提供氟链烷醇取代的α，β-不饱和酯的烯烃氟烷醇和氟化多元醇前体。氟烷醇取代的α，β-不饱和酯是可以容易地聚合以提供用于平版印刷光刻胶组合物的氟代烷醇取代的聚合物的烯烃。还提供了用于合成烯烃氟烷醇和氟化多元醇前体的方法。

59. 发明申请

US20080174051A1 AROMATIC VINYL ETHER BASED REVERSE-TONE STEP AND FLASH IMPRINT LITHOGRAPHY 有权
标题翻译：基于芳族乙烯基的反向色调和闪光曝光
公开(公告)号：US20080174051A1
公开(公告)日：2008-07-24
申请号：US12055513
申请日：2008-03-26
申请人： Richard Anthony DiPietro , Mark Whitney Hart , Frances Anne Houle , Hiroshi Ito
发明人： Richard Anthony DiPietro , Mark Whitney Hart , Frances Anne Houle , Hiroshi Ito
IPC分类号： B29C35/08 , B29C39/02 , C08F2/46
CPC分类号： C08F2/50 , B82Y10/00 , B82Y40/00 , C08F216/125 , G03F7/0002 , G03F7/0045 , G03F7/038
摘要： A molding composition and a method of forming an pattern. The method includes forming on a substrate a molding layer of a molding composition of aromatic divinyl ethers; pressing the template into the molding layer, the template having a relief pattern, the molding layer filling voids in the relief pattern, the template not contacting the substrate; exposing the molding layer to actinic radiation, the actinic radiation converting the molding layer to a cured molding layer having thick and thin regions corresponding to the relief pattern; removing the template; filling the thin regions of the relief pattern with a backfill material; removing regions of the molding layer not protected by the backfill material to expose regions of the substrate; forming trenches in the exposed regions of the substrate; and removing any remaining molding layer and backfill material. A transfer layer may be used between the molding layer and the substrate.
摘要翻译：成型组合物和形成图案的方法。该方法包括在基材上形成芳族二乙烯基醚的模塑组合物的模塑层; 将模板压入成型层，模板具有浮雕图案，成型层在浮雕图案中填充空隙，模板不接触基板; 将成型层暴露于光化辐射，光化辐射将成型层转化成具有对应于浮雕图案的厚而薄的区域的固化模塑层; 删除模板; 用填充材料填充浮雕图案的薄区域; 除去未被回填材料保护的成型层的区域以暴露基底的区域; 在衬底的暴露区域中形成沟槽; 并移除任何剩余的成型层和回填材料。可以在模塑层和基材之间使用转移层。

60. 发明申请

US20080169268A1 PROCESSES AND MATERIALS FOR STEP AND FLASH IMPRINT LITHOGRAPHY 有权
标题翻译：用于步进和闪光印刷的方法和材料
公开(公告)号：US20080169268A1
公开(公告)日：2008-07-17
申请号：US12051584
申请日：2008-03-19
申请人： Richard Anthony DiPietro , Mark Whitney Hart , Frances Anne Houle , Hiroshi Ito
发明人： Richard Anthony DiPietro , Mark Whitney Hart , Frances Anne Houle , Hiroshi Ito
IPC分类号： C03C25/68
CPC分类号： G03F7/0755 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/0045
摘要： A method of forming an image. The method includes: a transfer layer on a substrate; forming on the transfer layer, an etch barrier layer; pressing a template having a relief pattern into the etch barrier layer; exposing the etch barrier layer to actinic radiation forming a cured etch barrier layer having thick and thin regions corresponding to the relief pattern; removing the template; removing the thin regions of the cured etch barrier layer; removing regions of the transfer layer not protected by the etch barrier layer; removing regions of the substrate not protected by the transfer layer and any remaining etch barrier layer; and removing remaining transfer layer. The transfer layer may be removed using a solvent, the etch barrier layer may include a release agent and an adhesion layer may be formed between the transfer layer and the etch barrier layer. A reverse tone process is also described.
摘要翻译：一种形成图像的方法。该方法包括：在基板上的转印层; 在转印层上形成蚀刻阻挡层; 将具有浮雕图案的模板压入蚀刻阻挡层中; 将蚀刻阻挡层暴露于形成具有对应于浮雕图案的厚和薄区域的固化蚀刻阻挡层的光化辐射; 删除模板; 去除固化的蚀刻阻挡层的薄区域; 除去未被蚀刻阻挡层保护的转移层的区域; 除去未被转移层保护的衬底的区域和任何剩余的蚀刻阻挡层; 并去除剩余的转移层。可以使用溶剂去除转移层，蚀刻阻挡层可以包括脱模剂，并且可以在转移层和蚀刻阻挡层之间形成粘合层。还描述了反向色调处理。

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