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1. 发明授权

US07419611B2 Processes and materials for step and flash imprint lithography 有权
标题翻译：步进和闪光压印光刻的工艺和材料
公开(公告)号：US07419611B2
公开(公告)日：2008-09-02
申请号：US11219095
申请日：2005-09-02
申请人： Richard Anthony DiPietro , Mark Whitney Hart , Frances Anne Houle , Hiroshi Ito
发明人： Richard Anthony DiPietro , Mark Whitney Hart , Frances Anne Houle , Hiroshi Ito
IPC分类号： H01L21/302
CPC分类号： G03F7/0755 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/0045
摘要： A method of forming an image. The method includes: a transfer layer on a substrate; forming on the transfer layer, an etch barrier layer; pressing a template having a relief pattern into the etch barrier layer; exposing the etch barrier layer to actinic radiation forming a cured etch barrier layer having thick and thin regions corresponding to the relief pattern; removing the template; removing the thin regions of the cured etch barrier layer; removing regions of the transfer layer not protected by the etch barrier layer; removing regions of the substrate not protected by the transfer layer and any remaining etch barrier layer; and removing remaining transfer layer. The transfer layer may be removed using a solvent, the etch barrier layer may include a release agent and an adhesion layer may be formed between the transfer layer and the etch barrier layer. A reverse tone process is also described.
摘要翻译：一种形成图像的方法。该方法包括：在基板上的转印层; 在转印层上形成蚀刻阻挡层; 将具有浮雕图案的模板压入蚀刻阻挡层中; 将蚀刻阻挡层暴露于形成具有对应于浮雕图案的厚和薄区域的固化蚀刻阻挡层的光化辐射; 删除模板; 去除固化的蚀刻阻挡层的薄区域; 除去未被蚀刻阻挡层保护的转移层的区域; 除去未被转移层保护的衬底的区域和任何剩余的蚀刻阻挡层; 并去除剩余的转移层。可以使用溶剂去除转移层，蚀刻阻挡层可以包括脱模剂，并且可以在转移层和蚀刻阻挡层之间形成粘合层。还描述了反向色调处理。

2. 发明申请

US20120291668A1 AROMATIC VINYL ETHER BASED REVERSE-TONE STEP AND FLASH IMPRINT LITHOGRAPHY 有权
标题翻译：基于芳族乙烯基的反向色调和闪光曝光
公开(公告)号：US20120291668A1
公开(公告)日：2012-11-22
申请号：US13564812
申请日：2012-08-02
申请人： Richard Anthony DiPietro , Mark Whitney Hart , Frances Anne Houle , Hiroshi Ito
发明人： Richard Anthony DiPietro , Mark Whitney Hart , Frances Anne Houle , Hiroshi Ito
IPC分类号： C09D5/00
CPC分类号： C08F2/50 , B82Y10/00 , B82Y40/00 , C08F216/125 , G03F7/0002 , G03F7/0045 , G03F7/038
摘要： A molding composition and a method of forming a pattern. The method includes forming on a substrate a molding layer of a molding composition of aromatic divinyl ethers; pressing the template into the molding layer, the template having a relief pattern, the molding layer filling voids in the relief pattern, the template not contacting the substrate; exposing the molding layer to actinic radiation, the actinic radiation converting the molding layer to a cured molding layer having thick and thin regions corresponding to the relief pattern; removing the template; filling the thin regions of the relief pattern with a backfill material; removing regions of the molding layer not protected by the backfill material to expose regions of the substrate; forming trenches in the exposed regions of the substrate; and removing any remaining molding layer and backfill material. A transfer layer may be used between the molding layer and the substrate.
摘要翻译：成型组合物和形成图案的方法。该方法包括在基材上形成芳族二乙烯基醚的模塑组合物的模塑层; 将模板压入成型层，模板具有浮雕图案，成型层在浮雕图案中填充空隙，模板不接触基板; 将成型层暴露于光化辐射，光化辐射将成型层转化成具有对应于浮雕图案的厚而薄的区域的固化模塑层; 删除模板; 用填充材料填充浮雕图案的薄区域; 除去未被回填材料保护的成型层的区域以暴露基底的区域; 在衬底的暴露区域中形成沟槽; 并移除任何剩余的成型层和回填材料。可以在模塑层和基材之间使用转移层。

3. 发明申请

US20080174051A1 AROMATIC VINYL ETHER BASED REVERSE-TONE STEP AND FLASH IMPRINT LITHOGRAPHY 有权
标题翻译：基于芳族乙烯基的反向色调和闪光曝光
公开(公告)号：US20080174051A1
公开(公告)日：2008-07-24
申请号：US12055513
申请日：2008-03-26
申请人： Richard Anthony DiPietro , Mark Whitney Hart , Frances Anne Houle , Hiroshi Ito
发明人： Richard Anthony DiPietro , Mark Whitney Hart , Frances Anne Houle , Hiroshi Ito
IPC分类号： B29C35/08 , B29C39/02 , C08F2/46
CPC分类号： C08F2/50 , B82Y10/00 , B82Y40/00 , C08F216/125 , G03F7/0002 , G03F7/0045 , G03F7/038
摘要： A molding composition and a method of forming an pattern. The method includes forming on a substrate a molding layer of a molding composition of aromatic divinyl ethers; pressing the template into the molding layer, the template having a relief pattern, the molding layer filling voids in the relief pattern, the template not contacting the substrate; exposing the molding layer to actinic radiation, the actinic radiation converting the molding layer to a cured molding layer having thick and thin regions corresponding to the relief pattern; removing the template; filling the thin regions of the relief pattern with a backfill material; removing regions of the molding layer not protected by the backfill material to expose regions of the substrate; forming trenches in the exposed regions of the substrate; and removing any remaining molding layer and backfill material. A transfer layer may be used between the molding layer and the substrate.
摘要翻译：成型组合物和形成图案的方法。该方法包括在基材上形成芳族二乙烯基醚的模塑组合物的模塑层; 将模板压入成型层，模板具有浮雕图案，成型层在浮雕图案中填充空隙，模板不接触基板; 将成型层暴露于光化辐射，光化辐射将成型层转化成具有对应于浮雕图案的厚而薄的区域的固化模塑层; 删除模板; 用填充材料填充浮雕图案的薄区域; 除去未被回填材料保护的成型层的区域以暴露基底的区域; 在衬底的暴露区域中形成沟槽; 并移除任何剩余的成型层和回填材料。可以在模塑层和基材之间使用转移层。

4. 发明申请

US20080169268A1 PROCESSES AND MATERIALS FOR STEP AND FLASH IMPRINT LITHOGRAPHY 有权
标题翻译：用于步进和闪光印刷的方法和材料
公开(公告)号：US20080169268A1
公开(公告)日：2008-07-17
申请号：US12051584
申请日：2008-03-19
申请人： Richard Anthony DiPietro , Mark Whitney Hart , Frances Anne Houle , Hiroshi Ito
发明人： Richard Anthony DiPietro , Mark Whitney Hart , Frances Anne Houle , Hiroshi Ito
IPC分类号： C03C25/68
CPC分类号： G03F7/0755 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/0045
摘要： A method of forming an image. The method includes: a transfer layer on a substrate; forming on the transfer layer, an etch barrier layer; pressing a template having a relief pattern into the etch barrier layer; exposing the etch barrier layer to actinic radiation forming a cured etch barrier layer having thick and thin regions corresponding to the relief pattern; removing the template; removing the thin regions of the cured etch barrier layer; removing regions of the transfer layer not protected by the etch barrier layer; removing regions of the substrate not protected by the transfer layer and any remaining etch barrier layer; and removing remaining transfer layer. The transfer layer may be removed using a solvent, the etch barrier layer may include a release agent and an adhesion layer may be formed between the transfer layer and the etch barrier layer. A reverse tone process is also described.
摘要翻译：一种形成图像的方法。该方法包括：在基板上的转印层; 在转印层上形成蚀刻阻挡层; 将具有浮雕图案的模板压入蚀刻阻挡层中; 将蚀刻阻挡层暴露于形成具有对应于浮雕图案的厚和薄区域的固化蚀刻阻挡层的光化辐射; 删除模板; 去除固化的蚀刻阻挡层的薄区域; 除去未被蚀刻阻挡层保护的转移层的区域; 除去未被转移层保护的衬底的区域和任何剩余的蚀刻阻挡层; 并去除剩余的转移层。可以使用溶剂去除转移层，蚀刻阻挡层可以包括脱模剂，并且可以在转移层和蚀刻阻挡层之间形成粘合层。还描述了反向色调处理。

5. 发明授权

US08759415B2 Aromatic vinyl ether based reverse-tone step and flash imprint lithography 有权
标题翻译：基于芳族乙烯基醚的反相色阶和闪光印迹光刻
公开(公告)号：US08759415B2
公开(公告)日：2014-06-24
申请号：US13564812
申请日：2012-08-02
申请人： Richard Anthony DiPietro , Mark Whitney Hart , Frances Anne Houle , Hiroshi Ito
发明人： Richard Anthony DiPietro , Mark Whitney Hart , Frances Anne Houle , Hiroshi Ito
IPC分类号： B41J2/16 , C08F2/46 , C08G61/04
CPC分类号： C08F2/50 , B82Y10/00 , B82Y40/00 , C08F216/125 , G03F7/0002 , G03F7/0045 , G03F7/038
摘要： A molding composition and a method of forming a pattern. The method includes forming on a substrate a molding layer of a molding composition of aromatic divinyl ethers; pressing the template into the molding layer, the template having a relief pattern, the molding layer filling voids in the relief pattern, the template not contacting the substrate; exposing the molding layer to actinic radiation, the actinic radiation converting the molding layer to a cured molding layer having thick and thin regions corresponding to the relief pattern; removing the template; filling the thin regions of the relief pattern with a backfill material; removing regions of the molding layer not protected by the backfill material to expose regions of the substrate; forming trenches in the exposed regions of the substrate; and removing any remaining molding layer and backfill material. A transfer layer may be used between the molding layer and the substrate.
摘要翻译：成型组合物和形成图案的方法。该方法包括在基材上形成芳族二乙烯基醚的模塑组合物的模塑层; 将模板压入成型层，模板具有浮雕图案，成型层在浮雕图案中填充空隙，模板不接触基板; 将成型层暴露于光化辐射，光化辐射将成型层转化成具有对应于浮雕图案的厚而薄的区域的固化模塑层; 删除模板; 用填充材料填充浮雕图案的薄区域; 除去未被回填材料保护的成型层的区域以暴露基底的区域; 在衬底的暴露区域中形成沟槽; 并移除任何剩余的成型层和回填材料。可以在模塑层和基材之间使用转移层。

6. 发明授权

US08262961B2 Aromatic vinyl ether based reverse-tone step and flash imprint lithography 有权
标题翻译：基于芳族乙烯基醚的反相色阶和闪光印迹光刻
公开(公告)号：US08262961B2
公开(公告)日：2012-09-11
申请号：US12055513
申请日：2008-03-26
申请人： Richard Anthony DiPietro , Mark Whitney Hart , Frances Anne Houle , Hiroshi Ito
发明人： Richard Anthony DiPietro , Mark Whitney Hart , Frances Anne Houle , Hiroshi Ito
IPC分类号： B29C41/20 , B29C41/22 , B29C59/02 , B29C59/16
CPC分类号： C08F2/50 , B82Y10/00 , B82Y40/00 , C08F216/125 , G03F7/0002 , G03F7/0045 , G03F7/038
摘要： A molding composition and a method of forming an pattern. The method includes forming on a substrate a molding layer of a molding composition of aromatic divinyl ethers; pressing the template into the molding layer, the template having a relief pattern, the molding layer filling voids in the relief pattern, the template not contacting the substrate; exposing the molding layer to actinic radiation, the actinic radiation converting the molding layer to a cured molding layer having thick and thin regions corresponding to the relief pattern; removing the template; filling the thin regions of the relief pattern with a backfill material; removing regions of the molding layer not protected by the backfill material to expose regions of the substrate; forming trenches in the exposed regions of the substrate; and removing any remaining molding layer and backfill material. A transfer layer may be used between the molding layer and the substrate.
摘要翻译：成型组合物和形成图案的方法。该方法包括在基材上形成芳族二乙烯基醚的模塑组合物的模塑层; 将模板压入成型层，模板具有浮雕图案，成型层在浮雕图案中填充空隙，模板不接触基板; 将成型层暴露于光化辐射，光化辐射将成型层转化成具有对应于浮雕图案的厚而薄的区域的固化模塑层; 删除模板; 用填充材料填充浮雕图案的薄区域; 除去未被回填材料保护的成型层的区域以暴露基底的区域; 在衬底的暴露区域中形成沟槽; 并移除任何剩余的成型层和回填材料。可以在模塑层和基材之间使用转移层。

7. 发明授权

US08128832B2 Processes and materials for step and flash imprint lithography 有权
标题翻译：步进和闪光压印光刻的工艺和材料
公开(公告)号：US08128832B2
公开(公告)日：2012-03-06
申请号：US12051584
申请日：2008-03-19
申请人： Richard Anthony DiPietro , Mark Whitney Hart , Frances Anne Houle , Hiroshi Ito
发明人： Richard Anthony DiPietro , Mark Whitney Hart , Frances Anne Houle , Hiroshi Ito
IPC分类号： H01L21/302
CPC分类号： G03F7/0755 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/0045
摘要： A method of forming an image. The method includes: a transfer layer on a substrate; forming on the transfer layer, an etch barrier layer; pressing a template having a relief pattern into the etch barrier layer; exposing the etch barrier layer to actinic radiation forming a cured etch barrier layer having thick and thin regions corresponding to the relief pattern; removing the template; removing the thin regions of the cured etch barrier layer; removing regions of the transfer layer not protected by the etch barrier layer; removing regions of the substrate not protected by the transfer layer and any remaining etch barrier layer; and removing remaining transfer layer. The transfer layer may be removed using a solvent, the etch barrier layer may include a release agent and an adhesion layer may be formed between the transfer layer and the etch barrier layer. A reverse tone process is also described.
摘要翻译：一种形成图像的方法。该方法包括：在基板上的转印层; 在转印层上形成蚀刻阻挡层; 将具有浮雕图案的模板压入蚀刻阻挡层中; 将蚀刻阻挡层暴露于形成具有对应于浮雕图案的厚和薄区域的固化蚀刻阻挡层的光化辐射; 删除模板; 去除固化的蚀刻阻挡层的薄区域; 除去未被蚀刻阻挡层保护的转移层的区域; 除去未被转移层保护的衬底的区域和任何剩余的蚀刻阻挡层; 并去除剩余的转移层。可以使用溶剂去除转移层，蚀刻阻挡层可以包括脱模剂，并且可以在转移层和蚀刻阻挡层之间形成粘合层。还描述了反向色调处理。

8. 发明申请

US20070298176A1 AROMATIC VINYL ETHER BASED REVERSE-TONE STEP AND FLASH IMPRINT LITHOGRAPHY 审中-公开
标题翻译：基于芳族乙烯基的反向色调和闪光曝光
公开(公告)号：US20070298176A1
公开(公告)日：2007-12-27
申请号：US11426363
申请日：2006-06-26
申请人： Richard Anthony DiPietro , Mark Whitney Hart , Frances Anne Houle , Hiroshi Ito
发明人： Richard Anthony DiPietro , Mark Whitney Hart , Frances Anne Houle , Hiroshi Ito
IPC分类号： B05D3/12 , C08F2/46
CPC分类号： C08F2/50 , B82Y10/00 , B82Y40/00 , C08F216/125 , G03F7/0002 , G03F7/0045 , G03F7/038
摘要： A molding composition and a method of forming an pattern. The method includes forming on a substrate a molding layer of a molding composition of aromatic divinyl ethers; pressing the template into the molding layer, the template having a relief pattern, the molding layer filling voids in the relief pattern, the template not contacting the substrate; exposing the molding layer to actinic radiation, the actinic radiation converting the molding layer to a cured molding layer having thick and thin regions corresponding to the relief pattern; removing the template; filling the thin regions of the relief pattern with a backfill material; removing regions of the molding layer not protected by the backfill material to expose regions of the substrate; forming trenches in the exposed regions of the substrate; and removing any remaining molding layer and backfill material. A transfer layer may be used between the molding layer and the substrate.
摘要翻译：成型组合物和形成图案的方法。该方法包括在基材上形成芳族二乙烯基醚的模塑组合物的模塑层; 将模板压入成型层，模板具有浮雕图案，成型层在浮雕图案中填充空隙，模板不接触基板; 将成型层暴露于光化辐射，光化辐射将成型层转化成具有对应于浮雕图案的厚而薄的区域的固化模塑层; 删除模板; 用填充材料填充浮雕图案的薄区域; 除去未被回填材料保护的成型层的区域以暴露基底的区域; 在衬底的暴露区域中形成沟槽; 并移除任何剩余的成型层和回填材料。可以在模塑层和基材之间使用转移层。

9. 发明授权

US07468330B2 Imprint process using polyhedral oligomeric silsesquioxane based imprint materials 有权
标题翻译：使用多面体低聚倍半硅氧烷的压印材料的印刷工艺
公开(公告)号：US07468330B2
公开(公告)日：2008-12-23
申请号：US11398135
申请日：2006-04-05
申请人： Robert David Allen , Richard Anthony DiPietro , Geraud Jean-Michel Dubois , Mark Whitney Hart , Robert Dennis Miller , Ratnam Sooriyakumaran
发明人： Robert David Allen , Richard Anthony DiPietro , Geraud Jean-Michel Dubois , Mark Whitney Hart , Robert Dennis Miller , Ratnam Sooriyakumaran
IPC分类号： H01L21/469
CPC分类号： B05D3/067 , C09D183/04 , C09D183/06 , H01L21/02126 , H01L21/02203 , H01L21/02216 , H01L21/02282 , H01L21/02348 , H01L21/311 , H01L21/3122 , H01L21/31695 , H01L21/76807 , H01L21/76817 , H01L21/7682 , H01L2221/1047 , H05K3/1258
摘要： A method of forming a structure. The method including: forming a layer of a polymerizable composition including one or more polyhedral silsesquioxane oligomers each having one or more polymerizable groups, one or more polymerizable diluents, one or more photoacid generators and/or one or more photoinitiators; pressing a surface of a template having a relief pattern into the layer, the template, the layer filling voids in the relief pattern; polymerizing the layer to have thick and thin regions corresponding to the relief pattern; removing the template; removing the thin regions of the dielectric layer; and either curing the layer to create a porous dielectric layer followed by filling spaces between the thick regions of the porous dielectric layer with an electrically conductive material or filling spaces between the thick regions of the dielectric layer with an electrically conductive material followed by curing the dielectric layer to create a porous dielectric layer.
摘要翻译：一种形成结构的方法。该方法包括：形成一层可聚合组合物，其包含一种或多种各自具有一个或多个可聚合基团的多面体倍半硅氧烷低聚物，一种或多种可聚合稀释剂，一种或多种光酸产生剂和/或一种或多种光引发剂; 将具有浮雕图案的模板的表面压入该层，模板，填充浮雕图案中的层填充空隙; 聚合该层以具有对应于浮雕图案的厚而薄的区域; 删除模板; 去除介电层的薄区域; 并且固化该层以形成多孔介电层，然后用导电材料填充该多孔电介质层的较厚区域之间的空间，或者在该电介质层的该较厚区域之间用导电材料填充空间，然后使该电介质固化层以形成多孔介电层。

10. 发明申请

US20080166871A1 POLYHEDRAL OLIGOMERIC SILSESQUIOXANE BASED IMPRINT MATERIALS AND IMPRINT PROCESS USING POLYHEDRAL OLIGOMERIC SILSESQUIOXANE BASED IMPRINT MATERIALS 有权
标题翻译：基于聚硅氧烷基硅烷基紫外线的印刷材料的聚合低密度硅树脂基印刷材料和印刷工艺
公开(公告)号：US20080166871A1
公开(公告)日：2008-07-10
申请号：US12053893
申请日：2008-03-24
申请人： Robert David Allen , Richard Anthony DiPietro , Geraud Jean-Michel Dubois , Mark Whitney Hart , Robert Dennis Miller , Ratnam Sooriyakumaran
发明人： Robert David Allen , Richard Anthony DiPietro , Geraud Jean-Michel Dubois , Mark Whitney Hart , Robert Dennis Miller , Ratnam Sooriyakumaran
IPC分类号： H01L21/4763 , C08L83/00
CPC分类号： B05D3/067 , C09D183/04 , C09D183/06 , H01L21/02126 , H01L21/02203 , H01L21/02216 , H01L21/02282 , H01L21/02348 , H01L21/311 , H01L21/3122 , H01L21/31695 , H01L21/76807 , H01L21/76817 , H01L21/7682 , H01L2221/1047 , H05K3/1258
摘要： A method of forming low dielectric contrast structures by imprinting a silsesquioxane based polymerizable composition. The imprinting composition including: one or more polyhedral silsesquioxane oligomers each having one or more polymerizable groups, wherein each of the one or more polymerizable group is bound to a different silicon atom of the one or more polyhedral silsesquioxane oligomers; and one or more polymerizable diluents, the diluents constituting at least 50% by weight of the composition.
摘要翻译：通过压印基于倍半硅氧烷的可聚合组合物形成低介电对比度结构的方法。所述印记组合物包括：一个或多个多面体倍半硅氧烷低聚物，其各自具有一个或多个可聚合基团，其中所述一个或多个可聚合基团中的每一个与所述一个或多个多面体倍半硅氧烷低聚物的不同硅原子结合; 和一种或多种可聚合稀释剂，所述稀释剂占组合物的至少50重量％。

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