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51. 发明授权

US08337104B2 Developing apparatus, developing method and storage medium 有权
标题翻译：显影装置，显影方法和存储介质
公开(公告)号：US08337104B2
公开(公告)日：2012-12-25
申请号：US13024430
申请日：2011-02-10
申请人： Yasushi Takiguchi , Taro Yamamoto , Hiroshi Arima , Kousuke Yoshihara , Yuichi Yoshida
发明人： Yasushi Takiguchi , Taro Yamamoto , Hiroshi Arima , Kousuke Yoshihara , Yuichi Yoshida
IPC分类号： G03D5/00
CPC分类号： G03F7/3021
摘要： There is provided a developing apparatus and a developing method capable of rapidly forming a liquid film of a developing solution on an entire surface of a substrate while reducing a usage amount of the developing solution. The developing apparatus includes an airtightly sealed processing vessel that forms a processing atmosphere therein; a temperature control plate that is provided within the processing vessel and mounts the substrate thereon; an atmosphere gas supply unit that supplies an atmosphere gas including mist and vapor of a developing solution onto a surface of the substrate within the processing vessel; and a first temperature control unit that controls the temperature control plate to a temperature allowing the atmosphere gas to be condensed on the substrate. Here, an inner wall of the processing vessel is maintained at a temperature at which the atmosphere gas is hardly condensed on the inner wall.
摘要翻译：提供了一种能够在减少显影液的使用量的同时在基板的整个表面上快速形成显影液的液膜的显影装置和显影方法。显影装置包括在其中形成处理气氛的气密密封处理容器; 温度控制板，设置在处理容器内并将基板安装在其上; 气氛气体供给单元，其将包含显影液的雾和气体的气氛气体供给到所述处理容器内的所述基板的表面上; 以及第一温度控制单元，其将温度控制板控制为允许气氛气体在基板上冷凝的温度。这里，处理容器的内壁保持在气氛气体几乎不凝结在内壁上的温度。

52. 发明申请

US20110200952A1 DEVELOPING APPARATUS, DEVELOPING METHOD AND STORAGE MEDIUM 有权
标题翻译：开发设备，开发方法和存储介质
公开(公告)号：US20110200952A1
公开(公告)日：2011-08-18
申请号：US13024430
申请日：2011-02-10
申请人： Yasushi Takiguchi , Taro Yamamoto , Hiroshi Arima , Kousuke Yoshihara , Yuichi Yoshida
发明人： Yasushi Takiguchi , Taro Yamamoto , Hiroshi Arima , Kousuke Yoshihara , Yuichi Yoshida
IPC分类号： G03B27/52 , G03F7/30
CPC分类号： G03F7/3021
摘要： There is provided a developing apparatus and a developing method capable of rapidly forming a liquid film of a developing solution on an entire surface of a substrate while reducing a usage amount of the developing solution. The developing apparatus includes an airtightly sealed processing vessel that forms a processing atmosphere therein; a temperature control plate that is provided within the processing vessel and mounts the substrate thereon; an atmosphere gas supply unit that supplies an atmosphere gas including mist and vapor of a developing solution onto a surface of the substrate within the processing vessel; and a first temperature control unit that controls the temperature control plate to a temperature allowing the atmosphere gas to be condensed on the substrate. Here, an inner wall of the processing vessel is maintained at a temperature at which the atmosphere gas is hardly condensed on the inner wall.
摘要翻译：提供了一种能够在减少显影液的使用量的同时在基板的整个表面上快速形成显影液的液膜的显影装置和显影方法。显影装置包括在其中形成处理气氛的气密密封处理容器; 温度控制板，设置在处理容器内并将基板安装在其上; 气氛气体供给单元，其将包含显影液的雾和气体的气氛气体供给到所述处理容器内的所述基板的表面上; 以及第一温度控制单元，其将温度控制板控制为允许气氛气体在基板上冷凝的温度。这里，处理容器的内壁保持在气氛气体几乎不凝结在内壁上的温度。

53. 发明申请

US20100216078A1 DEVELOPING METHOD 有权
标题翻译：发展方法
公开(公告)号：US20100216078A1
公开(公告)日：2010-08-26
申请号：US12710510
申请日：2010-02-23
申请人： Taro YAMAMOTO , Kousuke Yoshihara , Yuichi Yoshida
发明人： Taro YAMAMOTO , Kousuke Yoshihara , Yuichi Yoshida
IPC分类号： G03C7/407
CPC分类号： H01L21/027 , G03F7/3021 , H01L21/67051 , H01L21/6715
摘要： Disclosed is a developing method that develops a substrate, which has a surface coated with a resist having been exposed, while the substrate is held horizontally and is rotating about a vertical axis. The method includes supplying a developing liquid from a discharge port of a developer nozzle onto the surface of the substrate, while moving the developer nozzle, disposed above the substrate, from a central portion of the substrate toward a peripheral portion of the substrate, and supplying a first rinse liquid from a discharge port of a first rinse nozzle onto the surface of the substrate, while moving the first rinse nozzle, disposed above the substrate, from the central portion of the substrate toward the peripheral portion of the substrate. The supplying of the developing liquid and the supplying the first rinse liquid are performed concurrently, while the first rinse nozzle is maintained nearer to a center of the substrate than the developer nozzle.
摘要翻译：公开了一种显影方法，其显影方法是在基板被水平地保持并且围绕垂直轴线旋转的同时，使具有被曝光的抗蚀剂的表面被覆的基板。该方法包括将显影剂喷嘴的排出口的显影液从衬底的中心部分朝向衬底的周边部分移动，将显影剂喷嘴的显影剂供给到衬底的表面上，将第一冲洗喷嘴的第一冲洗液从第一冲洗喷嘴的排出口喷射到基板的表面上，同时将基板上方的第一冲洗喷嘴从基板的中心部朝向基板的周边部分移动。同时进行显影液的供给和供给第一冲洗液，同时第一冲洗喷嘴比显影剂喷嘴更靠近基板的中心。

54. 发明授权

US09162247B2 Coating and development treatment system with airflow control including control unit and movable airflow control plate 有权
标题翻译：涂装开发处理系统，包括控制单元和可移动气流控制板
公开(公告)号：US09162247B2
公开(公告)日：2015-10-20
申请号：US13448526
申请日：2012-04-17
申请人： Kousuke Yoshihara , Koji Takayanagi , Shinichi Hatakeyama , Kohei Kawakami
发明人： Kousuke Yoshihara , Koji Takayanagi , Shinichi Hatakeyama , Kohei Kawakami
IPC分类号： B05C11/00 , B05C13/02 , B05C5/00 , B05C11/02 , B05D1/00 , H01L21/67 , G03F7/16 , B05D3/12 , H01L21/00 , H01L51/00
CPC分类号： H01L21/0337 , B05C11/023 , B05D1/005 , G03F7/162 , G06F19/00 , H01L21/0271 , H01L21/6715 , H01L51/0003 , H01L2224/03418
摘要： A coating treatment apparatus supplying a coating solution to a front surface of a rotated substrate and diffusing the supplied coating solution to an outer periphery side of the substrate to thereby apply the coating solution on the front surface of the substrate includes: a substrate holding part holding a substrate; a rotation part rotating the substrate held on the substrate holding part; a supply part supplying a coating solution to a front surface of the substrate held on the substrate holding part; and an airflow control plate provided at a predetermined position above the substrate held on the substrate holding part for locally changing an airflow above the substrate rotated by the rotation part at an arbitrary position.
摘要翻译：一种涂布处理装置，其将涂布溶液供给到旋转的基板的前表面，并将供给的涂布溶液扩散到基板的外周侧，从而将涂布液涂布在基板的前表面上，包括：保持基板底物; 旋转部，旋转保持在所述基板保持部上的所述基板; 供给部，其向保持在所述基板保持部的所述基板的前表面供给涂布液; 以及气流控制板，其设置在保持在所述基板保持部上的所述基板上方的预定位置，用于在任意位置局部地改变由所述旋转部旋转的所述基板上方的气流。

55. 发明申请

US20130068324A1 CHEMICAL SUPPLY SYSTEM, SUBSTRATE TREATMENT APPARATUS INCORPORATING THE SAME, AND COATING AND DEVELOPING SYSTEM INCORPORATING THE SAME APPARATUS 有权
公开(公告)号：US20130068324A1
公开(公告)日：2013-03-21
申请号：US13695844
申请日：2011-03-16
申请人： Toshinobu Furusho , Takahiro Ookubo , Kousuke Yoshihara , Yusuke Yamamoto , Steffen Hornig
发明人： Toshinobu Furusho , Takahiro Ookubo , Kousuke Yoshihara , Yusuke Yamamoto , Steffen Hornig
IPC分类号： F17D1/00
CPC分类号： B05D1/02 , B01D29/56 , B01D35/02 , B05C9/06 , B05C11/10 , F17D1/00 , H01L21/67017 , H01L21/6715 , H01L21/67173 , H01L21/67178 , Y10T137/794
摘要： A chemical supply system comprises: a first container and a second container for storing a chemical solution; a first pump, located on a first pipe connecting the first and second containers, for directing the solution stored in the first container to the second container; and a first filter, located in the first pipe, for filtering the solution flowing through the first pipe from the first container toward the second container. The system further includes: a second pipe for connecting the first container and the second container; and a second pump, located on the second pipe, for directing the solution stored in the second container to the first container.

56. 发明申请

US20090246397A1 RESIST SOLUTION SUPPLY APPARATUS, RESIST SOLUTION SUPPLY METHOD, AND COMPUTER STORAGE MEDIUM 审中-公开
标题翻译：电阻解决方案供应设备，电阻解决方案供应方法和计算机存储介质
公开(公告)号：US20090246397A1
公开(公告)日：2009-10-01
申请号：US12408262
申请日：2009-03-20
申请人： Kousuke Yoshihara , Kentaro Yoshihara
发明人： Kousuke Yoshihara , Kentaro Yoshihara
IPC分类号： B05D3/00 , B05C9/00 , B05C11/00
CPC分类号： G03F7/162 , H01L21/6715
摘要： The present invention is a resist solution supply apparatus for supplying a resist solution to a coating nozzle for discharging the resist solution to a substrate, including: a resist solution supply source storing the resist solution therein; a supply tube for supplying the resist solution from the resist solution supply source to the coating nozzle; a heating means provided on a side of the resist solution supply source along the supply tube for heating the resist solution in the supply tube to a predetermined temperature higher than room temperature; and a cooling means provided on a side of the coating nozzle along the supply tube for cooling the resist solution in the supply tube down to room temperature.
摘要翻译：本发明是一种用于将抗蚀剂溶液供应到用于将抗蚀剂溶液排放到基底的涂布喷嘴的抗蚀剂溶液供给装置，包括：将抗蚀剂溶液存储在其中的抗蚀剂溶液供给源; 供给管，用于将抗蚀剂溶液从抗蚀剂溶液供给源供给到涂布喷嘴; 沿着供给管设置在抗蚀剂溶液供给源侧的加热装置，用于将供应管中的抗蚀剂溶液加热到高于室温的预定温度; 以及冷却装置，其沿着供给管设置在涂料喷嘴的一侧，用于将供应管中的抗蚀剂溶液冷却至室温。

57. 发明授权

US07208066B2 Substrate processing apparatus and substrate processing method 失效
标题翻译：基板加工装置及基板处理方法
公开(公告)号：US07208066B2
公开(公告)日：2007-04-24
申请号：US10649780
申请日：2003-08-28
申请人： Junichi Kitano , Yuji Matsuyama , Takahiro Kitano , Takayuki Katano , Hidefumi Matsui , Yo Suzuki , Masami Yamashita , Toru Aoyama , Hiroyuki Iwaki , Satoru Shimura , Masatoshi Deguchi , Kousuke Yoshihara , Naruaki Iida
发明人： Junichi Kitano , Yuji Matsuyama , Takahiro Kitano , Takayuki Katano , Hidefumi Matsui , Yo Suzuki , Masami Yamashita , Toru Aoyama , Hiroyuki Iwaki , Satoru Shimura , Masatoshi Deguchi , Kousuke Yoshihara , Naruaki Iida
IPC分类号： C23F1/00 , H01L21/306 , B05C11/00
CPC分类号： H01L21/67178 , G03F7/70991 , H01L21/67017 , H01L21/6715 , H01L21/67161 , H01L21/67184 , H01L21/67742 , H01L21/67778 , Y10T29/41
摘要： On top of respective areas divided by partition plates, that is, a cassette station, a processing station, and an interface section in a coating and developing processing system, gas supply sections for supplying an inert gas into the respective areas are provided. Exhaust pipes for exhausting atmospheres in the respective areas are provided at the bottom of the respective areas. The atmospheres in the respective areas are maintained in a clean condition by supplying the inert gas not containing impurities such as oxygen and fine particles from the respective gas supply sections into the respective areas and exhausting the atmospheres in the respective areas from the exhaust pipes.
摘要翻译：在涂覆和显影处理系统中由分隔板，即盒式磁带站，加工站和界面部分划分的各个区域之上，提供用于向各个区域供应惰性气体的气体供应部分。在各个区域的底部设置用于各区域的排气的排气管。通过将不含杂质的惰性气体（例如氧气和细颗粒）从各个气体供应区域供应到各个区域中并且从排气管排出各个区域中的气氛，将各个区域中的气氛保持在清洁状态。

58. 发明授权

US08480319B2 Coating and developing apparatus, coating and developing method and non-transitory tangible medium 有权
标题翻译：涂层和显影装置，涂层和显影方法以及非瞬态有形介质
公开(公告)号：US08480319B2
公开(公告)日：2013-07-09
申请号：US13221072
申请日：2011-08-30
申请人： Shinichi Hayashi , Yuichi Douki , Akira Miyata , Yuuichi Yamamoto , Kousuke Yoshihara , Nobuaki Matsuoka , Suguru Enokida
发明人： Shinichi Hayashi , Yuichi Douki , Akira Miyata , Yuuichi Yamamoto , Kousuke Yoshihara , Nobuaki Matsuoka , Suguru Enokida
IPC分类号： G03D5/00
CPC分类号： H01L21/6715 , G03F7/162 , G03F7/3021 , H01L21/67178 , H01L21/6719 , H01L21/67745
摘要： A process block is formed by arranging a heating-process related block on the side of a carrier block, a group of liquid-process related unit blocks, and a heating block on the side of an interface block, in this order from the side of the carrier block to the side of the interface block. The group of liquid-process related unit blocks is composed of: a group of unit blocks for coating films that is formed by stacking upward a unit block for an antireflection film, a unit block for a resist film, and a unit block for an upper layer film, in this order; and unit blocks for developing that are stacked on one another in the up and down direction with respect to the group of unit blocks for coating films. Liquid process modules of each of the liquid-process related unit blocks are arranged on the right and left sides of a transfer path for a substrate.
摘要翻译：通过在接口块的侧面上的载体块，一组液体处理相关单元块和加热块的侧面上布置加热处理相关块来形成处理块，从侧面载波块到接口块的一侧。一组液相处理相关单元块由以下组成：一组用于涂覆膜的单元块，其通过向上堆叠用于抗反射膜的单元块，用于抗蚀剂膜的单元块和用于上部的单元块层膜，按顺序; 以及用于显影的单元块相对于用于涂膜的单元块组在上下方向上彼此堆叠。每个液体处理相关单元块的液体处理模块布置在用于基板的传送路径的右侧和左侧。

59. 发明申请

US20120021611A1 COATING TREATMENT METHOD, NON-TRANSITORY COMPUTER STORAGE MEDIUM AND COATING TREATMENT APPARATUS 有权
标题翻译：涂层处理方法，非终端计算机存储介质和涂层处理设备
公开(公告)号：US20120021611A1
公开(公告)日：2012-01-26
申请号：US13181565
申请日：2011-07-13
申请人： Kousuke Yoshihara , Shinichi Hatakeyama
发明人： Kousuke Yoshihara , Shinichi Hatakeyama
IPC分类号： H01L21/31 , B05C11/08
CPC分类号： H01L21/6715
摘要： A coating treatment method includes: a first step of rotating a substrate at a first rotation number; a second step of rotating the substrate at a second rotation number being slower than the first rotation number; a third step of rotating the substrate at a third rotation number being faster than the second rotation number and slower than the first rotation number; a fourth step of rotating the substrate at a fourth rotation number being slower than the third rotation number; and a fifth step of rotating the substrate at a fifth rotation number being faster than the fourth rotation number. A supply of a coating solution to a central portion of the substrate is continuously performed from the first step to a middle of the second step or during the first step, and the fourth rotation number is more than 0 rpm and 500 rpm or less.
摘要翻译：一种涂布处理方法，包括：以第一转数旋转基板的第一工序; 第二步骤，以比第一转数慢的第二转数旋转衬底; 第三步骤，以比所述第二转数快并且慢于所述第一转数的第三转数旋转所述衬底; 第四步骤，以比第三转数慢的第四转数旋转衬底; 以及以比第四转数快的第五转数旋转衬底的第五步骤。从第一步骤到第二步骤的中间或第一步骤期间，连续地向基材的中心部分供给涂布液，第四转数大于0rpm，500rpm以下。

60. 发明申请

US20070071890A1 Apparatus and method of forming an applied film 有权
标题翻译：形成涂膜的装置和方法
公开(公告)号：US20070071890A1
公开(公告)日：2007-03-29
申请号：US11501740
申请日：2006-08-10
申请人： Kousuke Yoshihara , Hiroichi Inada
发明人： Kousuke Yoshihara , Hiroichi Inada
IPC分类号： B05D3/12 , B05C11/02 , B05B15/04 , B05C11/00
CPC分类号： H01L21/67051 , G03F7/162 , H01L21/6715
摘要： There is provided an apparatus including: a processing cup having an opening opened upward to allow a substrate to be loaded and unloaded, an exhaust port for exhausting an unnecessary atmosphere produced in forming a film applied on the substrate, and an aspiration port for aspirating external air; and an aspiration device aspirating the unnecessary atmosphere through the exhaust port, wherein when the substrate is accommodated in the opening of the processing cup, the substrate has a perimeter spaced from the opening by a predetermined gap, and below the substrate accommodated in the processing cup there is formed an exhaust flow path extending from the aspiration port to the exhaust port.
摘要翻译：提供了一种装置，包括：处理杯，其具有向上开口以允许衬底被装载和卸载的开口;排出端口，用于排出在形成施加在衬底上的膜时产生的不必要的气氛;以及抽吸端口，用于吸入外部空气; 以及抽吸装置，其通过所述排气口吸入不需要的气氛，其中当所述基板容纳在所述加工杯的开口中时，所述基板具有与所述开口间隔开预定间隙的周边，并且在容纳在所述加工杯中的所述基板的下方形成从抽吸口向排气口延伸的排气流路。

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