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    • 46. 发明授权
    • X-ray detector including integrated electron detector
    • X射线检测器包括集成电子检测器
    • US09341585B2
    • 2016-05-17
    • US14053714
    • 2013-10-15
    • PULSETOR, LLC
    • Nicholas C. BarbiRichard B. Mott
    • G01T1/20H01J37/28G01N23/225H01J37/244
    • G01N23/2257G01T1/2018H01J37/244H01J37/28H01J2237/24415H01J2237/2443
    • An X-ray detector includes a housing and an X-ray sensing device provided within the housing along the axis of the housing, wherein the housing is structured to be coupled to the electron column or sample chamber of a charged particle beam device. The X-ray detector also includes an electron detector structured to detect a plurality of electrons ejected from a sample in response to an electron beam impinging on the sample, the electron detector being coupled to the housing on or near the axis such that a first line of sight to the electron detector from a point at which the electron beam impinges on the sample is similar to a second line of sight to the X-ray sensing device from the point at which the electron beam impinges on the sample such that X-ray and Backscattered electron images will show similar parallax and shadowing effects.
    • X射线检测器包括壳体和沿着壳体的轴线设置在壳体内的X射线感测装置,其中壳体构造成耦合到带电粒子束装置的电子柱或样品室。 X射线检测器还包括电子检测器,其被构造为响应于照射在样品上的电子束来检测从样品喷出的多个电子,电子检测器在轴上或附近耦合到壳体,使得第一线 从电子束撞击样品的点到电子检测器的视线类似于从电子束照射在样品上的点到X射线感测装置的第二视线,使得X射线 背散射电子图像将显示相似的视差和阴影效应。
    • 47. 发明申请
    • Charged-Particle-Beam Device and Specimen Observation Method
    • 带电粒子束装置和样品观察方法
    • US20160126058A1
    • 2016-05-05
    • US14891494
    • 2014-03-12
    • HITACHI HIGH-TECHNOLOGIES CORPORATION
    • Yusuke OMINAMITaku SAKAZUMESukehiro ITO
    • H01J37/22H01J37/26H01J37/20H01J37/10
    • H01J37/22G01N23/046G01N2223/3307G01N2223/418H01J37/10H01J37/20H01J37/222H01J37/244H01J37/26H01J37/261H01J37/28H01J2237/047H01J2237/10H01J2237/221H01J2237/226H01J2237/2443H01J2237/2445H01J2237/24578H01J2237/2611H01J2237/2802
    • An electron microscope has a large depth of focus in comparison with an optical microscope. Thus, information is superimposed on one image in the direction of depth. Therefore, it is necessary to accurately specify the three-dimensional position and density of a structure in a specimen so as to observe the three-dimensional structure of the interior of the specimen by using the electron microscope. Furthermore, a specimen that is observed with the optical microscope on a slide glass is not put into a TEM device of the related art. Thus, performing three-dimensional internal structure observation with the electron microscope on a location that is observed with the optical microscope requires very cumbersome preparation of the specimen. By controlling a vector parameter that defines the interrelationship between a primary charged particle beam and the specimen and by irradiation with the primary charged particle beam with a plurality of different vector parameters, images of transmitted charged particles of the specimen that correspond to each of the vector parameters are obtained. Irradiation with the primary charged particle beam is performed on the specimen that is arranged either directly or through a predetermined member on a detector which detects charged particles transmitted through or scattered by the interior of the specimen.
    • 与光学显微镜相比,电子显微镜具有较大的聚焦深度。 因此,信息在深度方向上叠加在一个图像上。 因此,必须准确地确定试样中的结构的三维位置和密度,以便通过电子显微镜观察试样内部的三维结构。 此外,用幻灯片玻璃上的光学显微镜观察的样品没有放入现有技术的TEM器件中。 因此,在用光学显微镜观察的位置上用电子显微镜进行三维内部结构观察需要非常繁琐的样品制备。 通过控制限定初级带电粒子束和样本之间的相互关系的矢量参数以及通过用多个不同矢量参数照射初级带电粒子束的样本的透射带电粒子对应于每个矢量的图像 获得参数。 对于直接或通过检测器上的预定部件布置的试样进行照射,该检测器检测通过样本内部传播或散射的带电粒子。
    • 48. 发明申请
    • System for Electron Beam Detection
    • 电子束检测系统
    • US20160011110A1
    • 2016-01-14
    • US14686308
    • 2015-04-14
    • KLA-Tencor Corporation
    • Shinichi KojimaHamada WahbaMichael R. GluszczakJoseph A. DiRegolo
    • G01N21/64H01J37/22H01J37/244
    • G01N21/64H01J37/226H01J37/244H01J2237/043H01J2237/2443H01J2237/2446H01J2237/24578
    • An electron beam detection apparatus includes a first aperture element including a first set of apertures. The apparatus includes a second aperture element including a second set of apertures. The second set of apertures is arranged in a pattern corresponding with the pattern of the first plurality of apertures. The detection apparatus includes an electron-photon conversion element configured to receive electrons of the electron beam transmitted through the first and second aperture elements. The electron-photon conversion element is configured to generate photons in response to the received electrons. The detection apparatus includes an optical assembly including one or more optical elements. The detection apparatus includes a detector assembly. The optical elements of the optical assembly are configured to direct the generated photons from the electron-photon conversion system to the detector assembly.
    • 电子束检测装置包括包括第一组孔的第一孔元件。 该装置包括第二孔元件,其包括第二组孔。 第二组孔被布置成与第一多个孔的图案对应的图案。 检测装置包括电子 - 光子转换元件,其被配置为接收通过第一和第二孔元件传输的电子束的电子。 电子 - 光子转换元件被配置为响应于所接收的电子产生光子。 检测装置包括包括一个或多个光学元件的光学组件。 检测装置包括检测器组件。 光学组件的光学元件被配置为将所产生的光子从电子 - 光子转换系统引导到检测器组件。