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    • 41. 发明申请
    • METHOD FOR MANUFACTURING ORGANIC ELECTROLUMINESCENT ELEMENT
    • 制造有机电致发光元件的方法
    • US20130122625A1
    • 2013-05-16
    • US13810994
    • 2011-07-15
    • Shuichi SassaYoshinobu Ono
    • Shuichi SassaYoshinobu Ono
    • H01L51/00
    • H01L51/0003H01L51/0024H01L51/5092H01L51/56
    • A method for manufacturing an organic electroluminescent element that includes an anode (32), a cathode (34), a layered structure placed between the anode and the cathode and formed by stacking a plurality of organic layers including an electron injection layer (44) provided in contact with the cathode, the method including the steps of: preparing a first component (12) in which either the anode alone is or both the anode and at least a part of the organic layers to make up the layered structure are provided on a first substrate (22); preparing a second component (14) in which either the cathode alone is or both the cathode and the rest part to make up the layered structure excluding the part provided in the first component is provided on a second substrate (24); and laminating the first component and the second component to form the layered structure placed between the anode and the cathode, in which the electron injection layer that contains an ionic polymer is formed in the step of preparing the first component or in the step of preparing the second component.
    • 一种制造有机电致发光元件的方法,其包括阳极(32),阴极(34),位于阳极和阴极之间的层状结构,并且通过堆叠包括电子注入层(44)的多个有机层形成 所述方法包括以下步骤:制备第一组分(12),其中单独的阳极或阳极和至少一部分有机层以构成层状结构,其设置在 第一基板(22); 制备第二组分(14),其中单独的阴极或阴极和静止部分两者以构成除了设置在第一组分中的部分之外的层状结构设置在第二衬底上; 并且层压第一部件和第二部件以形成放置在阳极和阴极之间的层状结构,其中在制备第一部件的步骤中形成含有离子聚合物的电子注入层,或者在制备 第二部分。
    • 44. 发明授权
    • Method of manufacturing Group III-V compound semiconductor
    • III-V族化合物半导体的制造方法
    • US06617235B2
    • 2003-09-09
    • US08623534
    • 1996-03-29
    • Yasushi IyechikaYoshinobu OnoTomoyuki Takada
    • Yasushi IyechikaYoshinobu OnoTomoyuki Takada
    • H01L213205
    • C30B29/40C30B25/02H01L21/0242H01L21/02458H01L21/0254H01L21/02579H01L21/0262H01L21/02661Y10S438/93
    • The present invention provides for a method of manufacturing a Group III-V compound semiconductor, which grows a nitrogen-contained Group III-V compound semiconductor of the p-type conductivity, without performing any particular post-processing after growing the compound semiconductor, and which prevents a deterioration in the yield of manufacturing light emitting elements due to post-processing. A first embodiment is directed to a method of manufacturing a Group III-V compound semiconductor which contains p-type impurities and which is expressed by a general formula InxGayAlzN (0≧x≧1,0≧z≧1, x+y+z=1), by thermal decomposition vapor phase method using metalorganics, the method being characterized in that carrier gas is inert gas in which the concentration of hydrogen is 0.5 % or smaller by volume. A second embodiment is directed to a method of manufacturing a Group III-V compound semiconductor which contains p-type impurities and which is expressed by a general formula InxGayAlzN (0≧x≧1, 0≧y≧1,0≧1, x+y+z=1), by thermal decomposition vapor phase method using metalorganics, the method being characterized in that after etching within a reaction furnace using at least one compound which is selected from a compound group consisting of compounds of halogenated hydrogen, compounds of halogen and Group V elements and compounds of halogen, hydrogen and Group V elements, inert gas in which the concentration of hydrogen is 0.5% or smaller by volume is used as carrier gas.
    • 本发明提供一种制造III-V族化合物半导体的方法,其生长p型导电性的含氮III-V族化合物半导体,而在化合物半导体生长之后不进行任何特定的后处理,以及 这防止了由于后处理而导致制造发光元件的产量的劣化。 第一实施例涉及一种制造含有p型杂质的III-V族化合物半导体的方法,其通过通式In x Ga y Al z N(0> = x> = 1,0> = z> = 1,x + y + z = 1),通过使用金属有机物的热分解气相法,其特征在于载气是氢浓度为0.5体积%以下的惰性气体。 第二实施例涉及一种制造含有p型杂质的III-V族化合物半导体的方法,其由通式In x Ga y Al z N(0> = x> = 1,0,...,y = 1,0 > = 1,x + y + z = 1),通过使用金属有机物的热分解气相法,其特征在于,使用至少一种选自由化合物 卤化氢,卤素和V族元素的化合物和卤素,氢和V族元素的化合物,其中氢的浓度为0.5体积%或更小的惰性气体用作载气。
    • 50. 发明授权
    • Plasma generating device with stepped waveguide transition
    • 等离子体发生器件,具有阶梯式波导过渡
    • US4788473A
    • 1988-11-29
    • US63972
    • 1987-06-19
    • Haruhisa MoriMotoo NakanoYoshinobu OnoTakashi IgarashiMasanao Hotta
    • Haruhisa MoriMotoo NakanoYoshinobu OnoTakashi IgarashiMasanao Hotta
    • H01J27/18H01J37/08H01J37/32H01J3/04
    • H01J37/32229H01J27/18H01J37/08
    • A plasma generating device comprises:a rectangular wave guide for transmitting microwaves, wherein the width of the plasma generating device is decreased in the direction of an electrical field of the microwaves; a plasma generating chamber wherein plasma is generated by absorbing, in a gas, microwave energy transmitted by the rectangular wave guide, and a part of the plasma generating chamber has a rectangular cross-section taken along the plane perpendicular to the microwave propagation direction. A magnetic field generating device is provided having the same axial direction as the direction of propagation of the microwaves and applies a magnetic field having an Electron Cyclotron Resonance intensity to the plasma generating chamber. The magnetic field generating device is provided at least one location outside of the direction of the microwave electrical field direction, and a dielectric window is provided between the rectangular wave guide and the plasma generating chamber to realize a vacuum seal of the plasma generating chamber.
    • 一种等离子体产生装置包括:用于传输微波的矩形波导,其中所述等离子体产生装置的宽度在所述微波的电场方向上减小; 等离子体产生室,其中通过在气体中吸收由矩形波导传输的微波能量而产生等离子体,并且等离子体产生室的一部分具有沿着与微波传播方向垂直的平面截取的矩形截面。 提供具有与微波传播方向相同轴向的磁场产生装置,并向等离子体产生室施加具有电子回旋共振强度的磁场。 磁场产生装置设置在微波电场方向外的至少一个位置处,并且在矩形波导和等离子体发生室之间设置介质窗,以实现等离子体发生室的真空密封。