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    • 42. 发明授权
    • Erase procedure
    • 擦除程序
    • US5636162A
    • 1997-06-03
    • US664013
    • 1996-06-12
    • Tim M. CoffmanSung-Wei LinPhat C. Truong
    • Tim M. CoffmanSung-Wei LinPhat C. Truong
    • G11C16/02G11C16/16G11C16/34G11C29/12G11C16/06
    • G11C16/3409G11C16/16G11C16/3404G11C16/3445
    • A procedure for erasing a Flash EPROM array (AR) includes applying a series of erase pulses to all of the subarrays (S1, S2, etc.) of a Flash EPROM array (AR) simultaneously. Between each erase pulse, the memory cells (10) of each sub array (S1, S2, etc.) are simultaneously checked one row at a time and one column position at a time, to see whether or not any cell (10) is over-erased. If, at any time during the procedure a cell (10) is found to be over-erased, the over-erased condition is corrected and the erase procedure continues, but with erase pulses applied only to those subarrays (S1, S2, etc.) having non-erased memory cells (10) as in prior-art subarray erase procedures. Under almost all circumstances, the procedure of this invention decreases over-all erase time.
    • 擦除闪存EPROM阵列(AR)的过程包括同时向闪存EPROM阵列(AR)的所有子阵列(S1,S2等)应用一系列擦除脉冲。 在每个擦除脉冲之间,每个子阵列(S1,S2等)的存储单元(10)同时一次检查一行一列,同时检查任何单元(10)是否为 过度消失 如果在程序过程中发现单元(10)被过度擦除的任何时候,都会修正过擦除状态,擦除过程继续进行,但擦除脉冲仅施加于这些子阵列(S1,S2等) )具有如现有技术的子阵列擦除过程中的未擦除的存储器单元(10)。 在几乎所有情况下,本发明的程序减少了全部擦除时间。
    • 46. 发明授权
    • Method of making electrically-erasable, electrically-programmable
read-only memory cell having a tunnel window insulator and forming
implanted regions for isolation between wordlines
    • 制造具有隧道窗绝缘体并形成用于字线间隔离的注入区域的电可擦除电可编程只读存储单元的方法
    • US5081055A
    • 1992-01-14
    • US648248
    • 1991-01-31
    • Manzur GillSebastiano D'ArrigoSung-Wei Lin
    • Manzur GillSebastiano D'ArrigoSung-Wei Lin
    • H01L27/115H01L29/788
    • H01L27/115H01L29/7883
    • An electrically-erasable, programmable ROM cell, or an EEPROM cell, is constructed using an enhancement transistor merged with a floating-gate transistor, where the floating-gate transistor has a small tunnel window, in a contact-free cell layout, enhancing the ease of manufacture and reducing cell size. The bitlines and source/drain regions are buried beneath relatively thick silicon oxide, which allows a favorable ration of control gate to floating gate capacitance. Programming and erasure are provided by the tunnel window area, which is located near or above the channel side of the source. The window has a thinner dielectric than the remainder of the floating gate, to allow Fowler-Nordheim tunneling. By using dedicated drain or ground lines, rather than a virtual-ground layout, and by using thick oxide for isolation between bitlines, the floating gate can extend onto adjacent bitlines and isolation area, resulting in a favorable coupling ratio. Isolation between cells in the wordline direction is by a self-aligned implanted region, in this embodiment.
    • 使用与浮栅晶体管合并的增强晶体管构造电可擦除可编程ROM单元或EEPROM单元,其中浮栅晶体管具有小的隧道窗,以无接触电池布局,增强了 易于制造和减小电池尺寸。 位线和源极/漏极区域被埋在相对厚的氧化硅之下,这允许控制栅极对浮置栅极电容的有利比例。 编程和擦除由位于源的通道侧附近或上方的隧道窗口区域提供。 窗口具有比浮动栅极的其余部分更薄的电介质,以允许Fowler-Nordheim隧道。 通过使用专用的漏极或接地线,而不是虚拟接地布局,并且通过使用厚氧化物在位线之间隔离,浮动栅极可以延伸到相邻的位线和隔离区域,从而产生良好的耦合比。 在本实施例中,字线方向上的单元之间的隔离是通过自对准注入区域。
    • 48. 发明授权
    • Electrically-erasable, electrically-programmable read-only memory
    • 电可擦除,电可编程只读存储器
    • US5012307A
    • 1991-04-30
    • US494060
    • 1990-03-15
    • Manzur GillSebastiano D'ArrigoSung-Wei Lin
    • Manzur GillSebastiano D'ArrigoSung-Wei Lin
    • H01L27/115H01L29/788
    • H01L27/115H01L29/7883
    • An electrically-erasable, programmable ROM cell, or an EEPROM cell, is constructed using an enhancement transistor merged with a floating-gate transistor, where the floating-gate transistor has a small tunnel window, in a contact-free cell layout, enhancing the ease of manufacture and reducing cell size. The bitlines and source/drain regions are buried beneath relatively thick silicon oxide, which allows a favorable ratio of control gate to floating gate capacitance. Programming and erasing are provided by the tunnel window are near or above the channel side of the source. The window has a thinner dielectric than the remainder of the floating gate, to allow Fowler-Nordheim tunneling. By using dedicated drain or ground lines, rather than a virtual-ground layout, and by using thick oxide for isolation between bitlines, the floating gate can extend onto adjacent bitlines and isolation area, resulting in a favorable coupling ratio. Isolation between wordlines is also by thick thermal oxide in a preferred embodiment, further improving the coupling ratio. Bitline and wordline spacing may be selected for optimum pitch or aspect ratio. Bitline to substrate capacitance is minimized.
    • 使用与浮栅晶体管合并的增强晶体管构造电可擦除可编程ROM单元或EEPROM单元,其中浮栅晶体管具有小的隧道窗,无接触电池布局,增强了 易于制造和减小电池尺寸。 位线和源极/漏极区域被埋在相对较厚的氧化硅之下,这允许控制栅极与浮动栅极电容的有利比例。 隧道窗口提供的编程和擦除靠近或高于源的通道侧。 窗口具有比浮动栅极的其余部分更薄的电介质,以允许Fowler-Nordheim隧道。 通过使用专用的漏极或接地线,而不是虚拟接地布局,并且通过使用厚氧化物在位线之间隔离,浮动栅极可以延伸到相邻的位线和隔离区域,从而产生良好的耦合比。 在优选实施例中,字线之间的隔离也是厚氧化物,进一步提高了耦合比。 可以选择位线和字线间距来获得最佳间距或宽高比。 位线到基板电容最小化。