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    • 45. 发明申请
    • Optical gratings, lithography tools including such optical gratings and methods for using same for alignment
    • 光栅,包括这种光栅的光刻工具和用于对准的方法
    • US20080094629A1
    • 2008-04-24
    • US11584461
    • 2006-10-20
    • Wei WuWarren RobinettShih-Yuan WangJun GaoZhaoning Yu
    • Wei WuWarren RobinettShih-Yuan WangJun GaoZhaoning Yu
    • G01B11/00
    • G03F9/7049G03F9/7003
    • Lithography tools and substrates are aligned by generating geometric interference patterns using optical gratings associated with the lithography tools and substrates. In some embodiments, the relative position between a substrate and lithography tool is adjusted to cause at least one geometric shape to have a predetermined size or shape representing acceptable alignment. In additional embodiments, Moiré patterns that exhibit varying sensitivity are used to align substrates and lithography tools. Furthermore, lithography tools and substrates are aligned by causing radiation to interact with optical gratings positioned between the lithography tools and substrates. Lithography tools include an optical grating configured to generate a portion of an interference pattern that exhibits a sensitivity that increases as the relative position between the tools and a substrate moves towards a predetermined alignment position.
    • 通过使用与光刻工具和衬底相关的光栅产生几何干涉图案来对准平版印刷工具和衬底。 在一些实施例中,调整衬底和光刻工具之间的相对位置以使得至少一个几何形状具有表示可接受对准的预定尺寸或形状。 在另外的实施例中,使用呈现不同灵敏度的莫尔图案来对准衬底和光刻工具。 此外,光刻工具和衬底通过使辐射与位于光刻工具和衬底之间的光栅相互作用来对准。 平版印刷工具包括光栅,其被配置为产生表现出灵敏度的一部分干涉图案,该灵敏度随着工具和基板之间的相对位置朝向预定对准位置移动而增加。
    • 46. 发明申请
    • Raman signal-enhancing structures and devices
    • 拉曼信号增强结构和器件
    • US20070252982A1
    • 2007-11-01
    • US11413910
    • 2006-04-28
    • Shih-Yuan WangR. WilliamsRaymond BeausoleilTheodore KaminsZhiyong LiWei Wu
    • Shih-Yuan WangR. WilliamsRaymond BeausoleilTheodore KaminsZhiyong LiWei Wu
    • G01J3/44G01N21/65
    • G01N21/658G01J3/44
    • Raman systems include a radiation source, a radiation detector, and a Raman device or signal-enhancing structure. Raman devices include a tunable resonant cavity and a Raman signal-enhancing structure coupled to the cavity. The cavity includes a first reflective member, a second reflective member, and an electro-optic material disposed between the reflective members. The electro-optic material exhibits a refractive index that varies in response to an applied electrical field. Raman signal-enhancing structures include a substantially planar layer of Raman signal-enhancing material having a major surface, a support structure extending from the major surface, and a substantially planar member comprising a Raman signal-enhancing material disposed on an end of the support structure opposite the layer of Raman signal-enhancing material. The support structure separates at least a portion of the planar member from the layer of Raman signal-enhancing material by a selected distance of less than about fifty nanometers.
    • 拉曼系统包括辐射源,辐射检测器和拉曼器件或信号增强结构。 拉曼器件包括耦合到空腔的可调谐谐振腔和拉曼信号增强结构。 空腔包括第一反射构件,第二反射构件和设置在反射构件之间的电光材料。 电光材料表现出响应于所施加的电场而变化的折射率。 拉曼信号增强结构包括具有主表面的基本平坦的拉曼信号增强材料层,从主表面延伸的支撑结构和包括设置在支撑结构的端部上的拉曼信号增强材料的基本上平面的构件 与拉曼信号增强材料层相对。 支撑结构将平面构件的至少一部分与拉曼信号增强材料层分开小于约五十纳米的选定距离。
    • 47. 发明申请
    • Contact lithography apparatus, system and method
    • 接触光刻设备,系统和方法
    • US20070035717A1
    • 2007-02-15
    • US11580621
    • 2006-10-13
    • Wei WuShih-Yuan WangZhiyong LiRobert Walmsley
    • Wei WuShih-Yuan WangZhiyong LiRobert Walmsley
    • G03B27/02
    • G03F7/0002B82Y10/00B82Y40/00G03F7/7035
    • A contact lithography system includes a patterning tool bearing a pattern; a substrate chuck for chucking a substrate to receive the pattern from the patterning tool; where the system deflects a portion of either the patterning tool or the substrate to bring the patterning tool and a portion of the substrate into contact; and a stepper for repositioning either or both of the patterning tool and substrate to align the pattern with an additional portion of the substrate to also receive the pattern. A method of performing contact lithography comprising: deflecting a portion of either a patterning tool or a substrate to bring the patterning tool and a portion of the substrate into contact; and repositioning either or both of the patterning tool and substrate to align a pattern on the patterning tool with an additional portion of the substrate to also receive the pattern.
    • 接触光刻系统包括具有图案的图案形成工具; 用于夹持基板以从图案形成工具接收图案的基板卡盘; 其中所述系统使所述图案化工具或所述衬底的一部分偏转以使所述图案形成工具和所述衬底的一部分接触; 以及步进器,用于重新定位图案形成工具和衬底中的一个或两个,以使图案与衬底的附加部分对准以也接收图案。 一种执行接触光刻的方法,包括:使图案形成工具或衬底的一部分偏转以使所述图案化工具和所述衬底的一部分接触; 以及重新定位所述图案形成工具和衬底中的一个或两个,以将所述图案形成工具上的图案与所述衬底的附加部分对准以也接收所述图案。